Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2005
10/11/2005US6953908 Plasma processing apparatus
10/11/2005US6953743 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
10/11/2005US6953739 Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps
10/11/2005US6953731 Fabrication process of a semiconductor device
10/11/2005US6953609 High-density plasma process for depositing a layer of silicon nitride
10/11/2005US6953608 Solution for FSG induced metal corrosion & metal peeling defects with extra bias liner and smooth RF bias ramp up
10/11/2005US6953605 Method for densifying porous substrates by chemical vapour infiltration with preheated gas
10/11/2005US6953531 Methods of etching silicon-oxide-containing materials
10/11/2005US6953005 Plasma processing apparatus utilizing a surface wave plasma
10/11/2005US6952949 Arrangement for coupling microwave energy into a treatment chamber
10/06/2005WO2005094140A1 Plasma generating equipment
10/06/2005WO2005094131A1 Organic device and manufacturing method thereof
10/06/2005WO2005093845A1 Semiconductor device and method for manufacture thereof
10/06/2005WO2005093809A1 Unit layer posttreating catalytic chemical vapor deposition apparatus and method of film formation therewith
10/06/2005WO2005093799A1 Process for producing semiconductor device and substrate treating apparatus
10/06/2005WO2005093798A1 Method and apparatus for forming silicon dots
10/06/2005WO2005093136A1 Support and method for processing semiconductor substrate
10/06/2005WO2005093127A2 Method for the deposition in particular of metal oxides by non-continuous precursor injection
10/06/2005WO2005093126A1 Method for forming dielectric or metallic films
10/06/2005WO2005093125A1 Method and device for forming thin silicon nitride layers on the surface of substrates
10/06/2005WO2005093120A1 Film-forming apparatus and film-forming method
10/06/2005WO2005092809A1 Method for depositing gallium oxide coatings on flat glass
10/06/2005WO2005092715A1 Synthetic resin container with high gas barrier performance
10/06/2005WO2005092608A1 Surface coating member and cutting tool
10/06/2005WO2005010964A3 Silicon crystallization using self-assembled monolayers
10/06/2005WO2005003404A3 Composite refractory metal carbide coating on a substrate and method for making thereof
10/06/2005WO2004079764B1 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
10/06/2005US20050221729 Method of repairing a pedestal surface
10/06/2005US20050221625 Method for forming tungsten nitride film
10/06/2005US20050221622 Deposition method and semiconductor device
10/06/2005US20050221618 System for controlling a plenum output flow geometry
10/06/2005US20050221592 Method of growing III-V compound semiconductor layer, substrate product, and semiconductor device
10/06/2005US20050221552 Substrate support for in-situ dry clean chamber for front end of line fabrication
10/06/2005US20050221021 Method and system for performing atomic layer deposition
10/06/2005US20050221020 Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
10/06/2005US20050221006 Yttrium metal-doped aluminum oxide consisting of yttrium, aluminum, and oxygen; mole ratio of the yttrium to aluminum is 1:99 to 10:90; semiconductor substrate; formed by chemical vapor deposition or atomic layer deposition
10/06/2005US20050221005 Precoat film forming method
10/06/2005US20050221004 Vapor reactant source system with choked-flow elements
10/06/2005US20050221002 Forming a protective coating on a ceramic substrate heater by exposing the substrate to a metal-containing gas to deposit a first layer of the metal (e.g., Ru3(CO)12 to deposit Ru); and exposing to a non-metal-containing gas to deposit a non-metal (e.g., SiH4 to deposit Si)
10/06/2005US20050221001 Method for extending time between chamber cleaning processes
10/06/2005US20050221000 Method of forming a metal layer
10/06/2005US20050220998 Noble metal layer formation for copper film deposition
10/06/2005US20050220984 Method and system for control of processing conditions in plasma processing systems
10/06/2005US20050220694 Method for producing nitrides
10/06/2005US20050220604 Substrate support bushing
10/06/2005US20050218803 Organic EL device and method of manufacturing the same
10/06/2005US20050218507 Lid assembly for front end of line fabrication
10/06/2005US20050218435 Semiconductor integrated circuit device and production method thereof
10/06/2005US20050218124 Thermal flux processing by scanning a focused line beam
10/06/2005US20050217993 Lock chamber device for vacuum treatment unit and procedures for its operation
10/06/2005US20050217798 Plasma processing apparatus
10/06/2005US20050217705 Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
10/06/2005US20050217695 Apparatus for applying disparate etching solutions to interior and exterior surfaces
10/06/2005US20050217585 Substrate susceptor for receiving a substrate to be deposited upon
10/06/2005US20050217583 Wafer chuck having thermal plate with interleaved heating and cooling elements
10/06/2005US20050217582 Chemical vapor deposition method
10/06/2005US20050217581 Coating and developing apparatus
10/06/2005US20050217580 Gas distribution system
10/06/2005US20050217579 Method and apparatus for production of metal film or the like
10/06/2005US20050217578 Reactor having a movable shutter
10/06/2005US20050217577 Vertical type semiconductor device producing apparatus
10/06/2005US20050217576 Vacuum Processing Apparatus
10/06/2005US20050217575 Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
10/06/2005US20050217569 Methods of depositing an elemental silicon-comprising material over a semiconductor substrate and methods of cleaning an internal wall of a chamber
10/06/2005US20050217567 Covering assembly for crucible used for evaporation of raw materials
10/06/2005US20050217564 Vapor phase epitaxy device
10/06/2005US20050217561 Low-resistance n type semiconductor diamond and process for producing the same
10/06/2005DE102004013306A1 Beschichtungsverfahren Coating process
10/06/2005CA2561360A1 Synthetic resin container with high gas barrier performance
10/05/2005EP1583142A2 Deposition method and semiconductor device
10/05/2005EP1582607A1 Loadlock arrangement for a vacuum treatment apparatus and method of operating it
10/05/2005EP1582606A1 Vacuum treating apparatus with variable pumping arrangement.
10/05/2005EP1582270A1 Method and apparatus for coating a substrate using dielectric barrier discharge
10/05/2005EP1581676A1 High-speed diamond growth using a microwave plasma in pulsed mode
10/05/2005EP1581667A1 Support system for a treatment apparatus
10/05/2005CN1679151A Semiconductor device and method for manufacturing semiconductor device
10/05/2005CN1679142A Barrier coatings produced by atmospheric glow discharge
10/05/2005CN1679136A Gas tube end cap for a microwave plasma generator
10/05/2005CN1678767A Method and apparatus for providing gas to a processing chamber
10/05/2005CN1678151A Organic elctroluminescence device and method of manufacturing the same
10/05/2005CN1677625A Deposition method and semiconductor device
10/05/2005CN1677624A Plasma processing device and method thereof
10/05/2005CN1676666A Method and apparatus for maintaining by-product volatility in deposition process
10/05/2005CN1676665A Vacuum working apparatus and method for preventing vacuometer corrosion
10/05/2005CN1676664A Method for rapidly preparing carbon/carbon composite material under physics field by CVD
10/05/2005CN1676485A Lock chamber device for vacuum treatment unit and procedures for its operation
10/05/2005CN1676477A Manufacturing method of die for optical element molding
10/05/2005CN1222014C Method of forming TiN barrier by chemical vapour phase deposition
10/04/2005US6951828 Plasma CVD method
10/04/2005US6951827 Controlling surface chemistry on solid substrates
10/04/2005US6951826 Silicon carbide deposition for use as a low dielectric constant anti-reflective coating
10/04/2005US6951821 Processing system and method for chemically treating a substrate
10/04/2005US6951815 Method and device for heat treatment
10/04/2005US6951814 Methods for forming a metal wiring layer on an integrated circuit device at reduced temperatures
10/04/2005US6951813 Methods of forming metal-containing layers including a metal bonded to halogens and trialkylaluminum
10/04/2005US6951804 Formation of a tantalum-nitride layer
10/04/2005US6951787 Capacitor with stoichiometrically adjusted dielectric and method of fabricating same
10/04/2005US6951587 Ceramic heater system and substrate processing apparatus having the same installed therein
10/04/2005US6951220 Method of decontaminating equipment
10/01/2005CA2503320A1 Methods for the fabrication of gold-covered magnetic nanoparticles
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