Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2005
10/19/2005CN1685485A Substrate processing apparatus
10/19/2005CN1685484A Substrate processing apparatus
10/19/2005CN1685079A Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process
10/19/2005CN1684236A Vacuum device, its particle monitoring method, program and window part for particle monitoring
10/19/2005CN1224298C Electric plasma processing device
10/19/2005CN1224086C Method for mfg. semiconductor device
10/19/2005CN1223709C Modified base for use in chemical vapor deposition process
10/19/2005CN1223704C High molecular neutralizing membrane producing device using plasma technology and its producing method
10/19/2005CN1223703C Exhaust pipe with reactive by-product deposit preventing means and method of preventing the deposit
10/19/2005CN1223702C Plating method of metal film on surface of polymer
10/19/2005CN1223701C High stability low concentration gases, products comprising same and methods of making same
10/19/2005CN1223613C Continuous processing apparatus by plasma polymerization with vertical chamber
10/19/2005CN1223529C Die assembly for producing optical glass products and manufacturing method thereof
10/19/2005CN1223528C Die assembly for producing optical glass products and manufacturing method thereof
10/19/2005CN1223514C Flaky carbon nano tube, preparation method and special equipment
10/19/2005CN1223411C Adhesive film recovery device and method
10/18/2005US6956127 Alkyl group VA metal compounds
10/18/2005US6955959 Method of making a memory structure having a multilayered contact and a storage capacitor with a composite dielectric layer of crystalized niobium pentoxide and tantalum pentoxide films
10/18/2005US6955928 Closed loop residual gas analyzer process control technique
10/18/2005US6955836 Silicon oxide film formation method
10/18/2005US6955741 Semiconductor-processing reaction chamber
10/18/2005US6955725 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
10/18/2005US6955720 Plasma deposition of spin chucks to reduce contamination of Silicon wafers
10/18/2005US6955707 Using replacement modules; from nitrogen fluoride; reverse gas flow cycles using inert gas
10/18/2005US6955066 Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating
10/13/2005WO2005096362A1 Method and apparatus for forming metal silicate film, and method for manufacturing semiconductor device
10/13/2005WO2005096356A1 Susceptor
10/13/2005WO2005095670A2 Remote chamber methods for removing surface deposits
10/13/2005WO2005095669A1 Apparatus and process for producing thin films and devices
10/13/2005WO2005095263A2 Methods of forming alpha and beta tantalum films with controlled and new microstructures
10/13/2005WO2005095007A1 Method and apparatus for coating a substrate using dielectric barrier discharge
10/13/2005WO2005094983A2 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus
10/13/2005WO2005094982A2 Tailored and uniform coatings in microchannel apparatus
10/13/2005WO2005094318A2 Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma
10/13/2005US20050227500 Method for producing material of electronic device
10/13/2005US20050227499 Oxide-like seasoning for dielectric low k films
10/13/2005US20050227485 Method of forming metallic wiring layer, method of selective metallization, apparatus for selective metallization and substrate apparatus
10/13/2005US20050227459 Film formation method and apparatus for semiconductor process
10/13/2005US20050227453 Group III nitride semiconductor crystal, production method thereof and group III nitride semiconductor epitaxial wafer
10/13/2005US20050227442 Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics
10/13/2005US20050227431 Memory device with platinum-rhodium stack as an oxygen barrier
10/13/2005US20050227118 Plasma resistant member
10/13/2005US20050227115 Submerged plasma generator, method of generating plasma in liquid and method of decomposing toxic substance with plasma in liquid
10/13/2005US20050227079 Manufacture of porous diamond films
10/13/2005US20050227020 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
10/13/2005US20050227019 Method and device for cleaning raw material gas introduction tube used in cvd film forming apparatus
10/13/2005US20050227005 Method for gettering oxygen and water during vacuum deposition of sulfide films
10/13/2005US20050227003 Methods of forming material over substrates
10/13/2005US20050227002 Method and device for the plasma treatment of workpieces
10/13/2005US20050226997 Dicopper(I)oxalate complexes for use as precursor substances in metallic copper deposition
10/13/2005US20050226802 Gel and powder making
10/13/2005US20050224825 Production method for light emitting element
10/13/2005US20050224458 System and method of removing chamber residues from a plasma processing system in a dry cleaning process
10/13/2005US20050224457 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those
10/13/2005US20050224344 Plasma processing apparatus and method
10/13/2005US20050224337 Plasma processing apparatus and method
10/13/2005US20050224180 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
10/13/2005US20050223995 Vacuum treatment installation with a variable pump arrangement
10/13/2005US20050223994 Substrate susceptors for receiving semiconductor substrates to be deposited upon and methods of depositing materials over semiconductor substrates
10/13/2005US20050223993 Deposition apparatuses; methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses
10/13/2005US20050223992 Miniature microwave plasma torch application and method of use thereof
10/13/2005US20050223990 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process
10/13/2005US20050223989 System for forming composite polymer dielectric film
10/13/2005US20050223988 Coating device comprising a conveying device
10/13/2005US20050223987 Film forming apparatus
10/13/2005US20050223986 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
10/13/2005US20050223985 Deposition apparatuses, methods of assessing the temperature of semiconductor wafer substrates within deposition apparatuses, and methods for deposition of epitaxial semiconductive material
10/13/2005US20050223984 Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
10/13/2005US20050223983 Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
10/13/2005US20050223982 Apparatus and method for depositing thin film on wafer using remote plasma
10/13/2005US20050223981 Processing device using shower head structure and processing method
10/13/2005US20050223979 Pulsed mass flow delivery system and method
10/13/2005US20050223978 Technique for high efficiency metalorganic chemical vapor deposition
10/13/2005US20050223973 EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
10/13/2005DE202004014495U1 Hartmetallwendeschneidplatte mit Diamantschicht Carbide insert with diamond layer
10/13/2005DE19649409B4 Verfahren zum Herstellen eines Diamantfilms auf einem Substrat A method for producing a diamond film on a substrate
10/13/2005DE102004015216A1 Process and modular assembly to modify the surface of a metal substrate surface by exposure to plasma
10/13/2005DE102004015174A1 Verfahren zum Abscheiden von insbesondere Metalloxiden mittels nicht kontinuierlicher Precursorinjektion A method of depositing metal oxides by means of, in particular not continuous Precursorinjektion
10/13/2005CA2567032A1 Methods of forming alpha and beta tantalum films with controlled and new microstructures
10/13/2005CA2560834A1 Tailored and uniform coatings in microchannel apparatus
10/13/2005CA2560831A1 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus
10/13/2005CA2558591A1 Susceptor
10/12/2005EP1584100A2 A method and apparatus for forming a high quality low temperature silicon nitride layer
10/12/2005CN1682356A Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
10/12/2005CN1682344A Method and apparatus for the compensation of edge ring wear in a plasma processing chamber
10/12/2005CN1682343A Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
10/12/2005CN1682342A Upper electrode plate with deposition shield in a plasma processing system
10/12/2005CN1682341A Method and apparatus for an improved baffle plate in a plasma processing system
10/12/2005CN1682084A Thermal process station with heated lid
10/12/2005CN1681977A Acicular silicon crystal and process for producing the same
10/12/2005CN1681963A Continuous chemical vapor deposition process and process furnace
10/12/2005CN1681593A Photocatalyst material and process for producing the same
10/12/2005CN1681092A Plasma processing apparatus and method
10/12/2005CN1681079A In-situ dry clean chamber for front end of line fabrication
10/12/2005CN1681076A Process and apparatus for forming discrete microcavities in a filament wire using a polymer etching mask
10/12/2005CN1680620A Thin film forming method, optical film, polarizing film and image display
10/12/2005CN1680005A Method of treating a gas output from a processing chamber
10/12/2005CN1222976C Substrate processing method, film-forming method and method and apparatus for producing electronic resource
10/11/2005US6954350 Ceramic layered product and method for manufacturing the same
10/11/2005US6953918 Heating apparatus which has electrostatic adsorption function, and method for producing it
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