Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2005
10/26/2005CN1688808A Methods of handling wind turbing blades and mounting said blades a wind turbine, system and gripping unit for handling a wind turbine blade
10/26/2005CN1688745A Device for carrying out a plasma-assisted process
10/26/2005CN1688744A Systems and methods for forming zirconium and/or hafnium-containing layers
10/26/2005CN1688743A Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides
10/26/2005CN1688742A Systems and methods for forming metal oxides using alcohols
10/26/2005CN1688741A Pyrrolyl complexes of copper for copper metal deposition
10/26/2005CN1687482A Method for preparing nano silicone based luminescence composite film
10/26/2005CN1225021C High-K grating oxide with titanium buffering layer used for metal iron electric oxide and silicon single tube unit memory
10/26/2005CN1225005C Method and apparatus for controlling the volume of a plasma
10/26/2005CN1224851C Structure and manufacturing method of elliptical jacket type premade stick and light bias fiber
10/25/2005US6958572 Controlled non-normal alignment of catalytically grown nanostructures in a large-scale synthesis process
10/25/2005US6958504 Semiconductor storage device and method of manufacturing the same
10/25/2005US6958302 Atomic layer deposited Zr-Sn-Ti-O films using TiI4
10/25/2005US6958301 Method for forming Ta2O5 dielectric layer by using in situ N2O plasma treatment
10/25/2005US6958300 Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides
10/25/2005US6958277 Surface preparation prior to deposition
10/25/2005US6958267 Methods of forming perovskite-type dielectric materials with chemical vapor deposition
10/25/2005US6958253 Process for deposition of semiconductor films
10/25/2005US6958175 Film forming method and film forming device
10/25/2005US6958174 Solid material comprising a thin metal film on its surface and methods for producing the same
10/25/2005US6958112 Silicon dioxide deposition fromsilane and H2O2 or water oxidizer; greater density of ions having a single oxygen atom; improved redeposition properties; simultaneous high density plasma chemical vapor deposition and sputtering
10/25/2005US6958098 Semiconductor wafer support lift-pin assembly
10/25/2005US6958097 Device for holding and vacuum-sealing a container having an opening
10/25/2005US6958093 Free-standing (Al, Ga, In)N and parting method for forming same
10/25/2005US6957690 Apparatus for thermal treatment of substrates
10/25/2005US6957624 Apparatus and a method for forming an alloy layer over a substrate
10/20/2005WO2005098961A1 Method of forming gate insulating film, storage medium and computer program
10/20/2005WO2005098938A1 Ruthenium layer formation for copper film deposition
10/20/2005WO2005098930A2 Process for producing semi-conductor coated substrate
10/20/2005WO2005098925A1 Techniques promoting adhesion of porous low k film to underlying barrier layer
10/20/2005WO2005098924A1 Deposition of low dielectric constant films by n2o/cyclic organosiloxane plasma
10/20/2005WO2005098922A1 Semiconductor device manufacturing method
10/20/2005WO2005098913A1 METHOD FOR FORMING Ti FILM AND TiN FILM, CONTACT STRUCTURE, COMPUTER READABLE STORING MEDIUM AND COMPUTER PROGRAM
10/20/2005WO2005098897A1 Method and system for control of processing conditions in plasma processing systems
10/20/2005WO2005098086A2 Remote chamber methods for removing surface deposits
10/20/2005WO2005098085A2 Multi-stage curing of low k nano-porous films
10/20/2005WO2005098084A2 Systems and methods for synthesis of extended length nanostructures
10/20/2005WO2005098083A2 Miniature microwave plasma torch application and method of use thereof
10/20/2005WO2005098078A1 Apparatus for coating functional thin film on the metal surface and its coating method
10/20/2005WO2005098076A1 Ultra-hydrophilic and antibacterial thin film coated metal product, and it’s manufacturing method
10/20/2005WO2005098075A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/20/2005WO2005098074A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
10/20/2005WO2005097693A1 Method for producing a hollow cylinder from synthetic quartz glass, using a retaining device
10/20/2005WO2005097673A1 Method for treating surface of base, surface-treated base, material for medical use and instrument for medical use
10/20/2005WO2005097484A1 Transparent conductive film, method for producing transparent conductive film and organic electroluminescent device
10/20/2005WO2005097450A1 Process for producing metal mold for optical device forming
10/20/2005WO2005080629A8 SILICON COMPOUNDS FOR PRODUCING SiO2-CONTAINING INSULATING LAYERS ON CHIPS
10/20/2005WO2005049886A3 Plasma thin-film deposition method
10/20/2005US20050234220 Low density, low dielectric, metalizable polymer films
10/20/2005US20050233926 Etchants for removing titanium contaminant species from titanium substrates
10/20/2005US20050233910 Thick films of yba<sb>2</sb>cu<sb>3</sb>o <sb>7-y</sb> and preparation method thereof
10/20/2005US20050233599 Method for producing material of electronic device
10/20/2005US20050233598 Method of fabricating high-k dielectric layer having reduced impurity
10/20/2005US20050233595 Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
10/20/2005US20050233592 Method of manufacturing semiconductor device using flexible tube
10/20/2005US20050233591 Techniques promoting adhesion of porous low K film to underlying barrier layer
10/20/2005US20050233576 Method of depositing dielectric materials in damascene applications
10/20/2005US20050233555 Adhesion improvement for low k dielectrics to conductive materials
10/20/2005US20050233553 Method of fabricating semiconductor by nitrogen doping of silicon film
10/20/2005US20050233529 Integration of high k gate dielectric
10/20/2005US20050233495 Novel technique to grow high quality ZnSe epitaxy layer on Si substrate
10/20/2005US20050233380 High throughput discovery of materials through vapor phase synthesis
10/20/2005US20050233257 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer
10/20/2005US20050233159 Method of making a tantalum layer and apparatus using a tantalum layer
10/20/2005US20050233156 System and method for forming multi-component dielectric films
10/20/2005US20050233155 Process for controlling thin film uniformity and products produced thereby
10/20/2005US20050233093 Film formation method and apparatus utilizing plasma CVD
10/20/2005US20050233092 Method of controlling the uniformity of PECVD-deposited thin films
10/20/2005US20050233091 Plasma-assisted coating
10/20/2005US20050233079 Introducing a reactive gas into a space near a surface of a substrate to be processed is such a way as to prevent substantial deposition of the metal film, and depositing the metal film on the surface of the substrate from a gaseous phase including a metal carbonyl compound
10/20/2005US20050233078 Method and system for forming a film of material using plasmon assisted chemical reactions
10/20/2005US20050233077 Method and device for plasma treating workpieces
10/20/2005US20050232843 Method of producing carbon fiber aggregate
10/20/2005US20050230834 Multi-stage curing of low K nano-porous films
10/20/2005US20050230830 Method and apparatus for production of metal film or the like
10/20/2005US20050230378 Resistive heaters and uses thereof
10/20/2005US20050230350 In-situ dry clean chamber for front end of line fabrication
10/20/2005US20050230242 Large area metallization pretreatment and surface activation system
10/20/2005US20050229955 Device for the generating and controlling of the cleaning agent flow in a process chamber
10/20/2005US20050229857 Support fixture for semiconductor wafers and associated fabrication method
10/20/2005US20050229856 Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
10/20/2005US20050229855 Apparatus for thermal treatment of substrates
10/20/2005US20050229854 Method and apparatus for temperature change and control
10/20/2005US20050229853 Multideposition SACVD reactor
10/20/2005US20050229852 Plant for vacuum coating of objects treated in batches
10/20/2005US20050229851 Plasma cvd film forming apparatus and method for manufacturing cvd film coated plastic container
10/20/2005US20050229850 Rotary machine for cvd coatings
10/20/2005US20050229849 High productivity plasma processing chamber
10/20/2005US20050229848 Thin-film deposition apparatus
10/20/2005US20050229847 Method and device for in situ layer thickness determination
10/19/2005EP1587153A1 Organic el device and method of manufacturing the same
10/19/2005EP1587139A2 Method of making a tantalum layer and apparatus using a tantalum layer
10/19/2005EP1587137A1 Deposition process for non-volatile resistance switching memory
10/19/2005EP1587131A2 Plasma reactor with high productivity
10/19/2005EP1586674A1 Coatings, and methods and devices for the manufacture thereof
10/19/2005EP1586673A1 Component for film forming device and method of washing the component
10/19/2005EP1585845A1 Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles
10/19/2005EP1095378B1 Primary target for forming fission products
10/19/2005CN2735539Y 成膜装置 Film forming apparatus
10/19/2005CN1685486A Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
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