Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2005
11/03/2005US20050245013 Method for manufacturing a complementary metal-oxide semiconductor sensor
11/03/2005US20050244581 Forming a porous substrate from a fiber reinforcement made of refractory fibers; densifying by a first phase of carbon and by a second of silicon carbide; impregnating the porous substrate with molten silicon to fill in the pores of the substrate; noncracking;construction materials; air/spacecraft
11/03/2005US20050244570 Deposition thickness measuring method, material layer forming method, deposition thickness measuring apparatus, and material layer forming apparatus
11/03/2005US20050244324 Acicular silicon crystal and process for producing the same
11/03/2005US20050244304 Tailored and uniform coatings in microchannel apparatus
11/03/2005US20050242454 Manufacturing method of die for optical element molding
11/03/2005US20050242381 Ferroelectric capacitor, process for production thereof and semiconductor device using the same
11/03/2005US20050242156 DLC (diamond-like carbon) hard coating on copper based material for bearings
11/03/2005US20050242079 Heater Module for Semiconductor Manufacturing Equipment
11/03/2005US20050242061 Self-cleaning method for plasma CVD apparatus
11/03/2005US20050242060 Plasma processing method
11/03/2005US20050241931 Methods of manufacturing polycrystalline silicon thin film
11/03/2005US20050241768 High frequency plasma generator and high frequency plasma generating method
11/03/2005US20050241761 Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing
11/03/2005US20050241671 Method for removing a substance from a substrate using electron attachment
11/03/2005US20050241670 Method for cleaning a reactor using electron attachment
11/03/2005US20050241669 Method and system of dry cleaning a processing chamber
11/03/2005US20050241586 Vacuum vapor deposition apparatus
11/03/2005US20050241585 System for vaporizing materials onto a substrate surface
11/03/2005US20050241583 Method for the production of a disk-form workpiece based on a dielectric substrate as well as vacuum treatment installation for same
11/03/2005US20050241582 Atmospheric pressure plasma assembly
11/03/2005US20050241581 Chemical vapor deposition apparatuses and deposition methods
11/03/2005US20050241580 Method for depositing thin film and thin film deposition system having separate jet orifices for spraying purge gas
11/03/2005US20050241579 Face shield to improve uniformity of blanket CVD processes
11/03/2005US20050241578 Oxidizing method and oxidizing unit for object to be processed
11/03/2005US20050241571 Method of growing nitride single crystal on silicon substrate, nitride semiconductor light emitting device using the same, method of manufacturing the same
11/03/2005US20050241567 Ceramic thin film on various substrates, and process for producing same
11/03/2005US20050241340 Core insert for glass molding machine and method for making same
11/03/2005US20050241176 Reaction system for growing a thin film
11/03/2005DE19983211B4 System und Verfahren der Substratverarbeitung sowie deren Verwendung zur Hartscheibenherstellung System and method of substrate processing and the use thereof for the hard disk producing
11/03/2005DE102005015362A1 Production of praseodymium layers comprises depositing metallic praseodymium on thin silica, silicon oxynitride or silicon nitride layer, reacting deposited praseodymium with oxygen or water vapor and heating substrate in pure nitrogen
11/03/2005DE102004020328A1 Separating a carbon doped silicon containing dielectric layer by low temperature gas phase separation of a surface comprises reacting silicon organic compound with hydrogen peroxide to separate a dielectric layer on surface
11/03/2005DE102004018817A1 Removing material substrate surface for manufacturing semiconductor integrated circuits and devices by introducing pressurized processing solution in vessel to expose surface to processing solution
11/02/2005EP1592053A1 Wiring fabricating method
11/02/2005EP1592051A1 Cvd method for forming silicon nitride film on target substrate
11/02/2005EP1592044A1 Gas driven planetary rotation apparatus and methods of using the same
11/02/2005EP1592043A2 Device for measuring pressure for vacuum systems
11/02/2005EP1591559A1 Film formation method and apparatus utizing plasma cvd
11/02/2005EP1591558A1 Process to deposit a thin layer on an oxidized substrate layer
11/02/2005EP1591373A1 Packaging material
11/02/2005EP1590826A1 Plasma reactor including helical electrodes
11/02/2005EP1590498A1 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles
11/02/2005EP1590497A2 Method and apparatus for layer by layer deposition of thin films
11/02/2005CN1692506A Thin film multilayer body, electronic device using such thin film multilayer body, actuator, and method for manufacturing actuator
11/02/2005CN1692480A Cvd method and device for forming silicon-containing insulation film
11/02/2005CN1692476A Plasma processing apparatus
11/02/2005CN1692186A Low-resistance n type semiconductor diamond and process for producing the same
11/02/2005CN1692177A Worktable device, film formation apparatus, and film formation method for semiconductor process
11/02/2005CN1691290A Method of processing plasma
11/02/2005CN1691283A Method of growing nitride single crystal, nitride semiconductor light emitting device, method of manufacturing the same
11/02/2005CN1225342C Ceramic base
11/01/2005US6960790 Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
11/01/2005US6960675 a tantalum complex recursor for a barrier layer selected from tantalum nitride, tantalum oxide or bismuth tantalum oxide
11/01/2005US6960539 Substrate for electronic devices, manufacturing method therefor, and electronic device
11/01/2005US6960538 Composite dielectric forming methods and composite dielectrics
11/01/2005US6960537 Incorporation of nitrogen into high k dielectric film
11/01/2005US6960534 Method for controlling the temperature of a gas distribution plate in a process reactor
11/01/2005US6960524 Method for production of a metallic or metal-containing layer
11/01/2005US6960264 Process for fabricating films of uniform properties on semiconductor devices
11/01/2005US6960263 Shadow frame with cross beam for semiconductor equipment
11/01/2005US6960262 Thin film-forming apparatus
10/2005
10/27/2005WO2005101518A1 Method for manufacturing semiconductor device
10/27/2005WO2005101500A2 Manufacture of porous diamond films
10/27/2005WO2005101473A1 Method of forming barrier film and method of forming electrode film
10/27/2005WO2005101461A1 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
10/27/2005WO2005100634A1 Tool comprising a wear-resistant coating
10/27/2005WO2005100633A1 Coatings, and methods and devices for the manufacture thereof
10/27/2005WO2005100632A1 Methods for coating a substrate and forming a coloured film and related device
10/27/2005WO2005100631A1 Method for coating a base body, device for carrying out said method, and coated base body
10/27/2005WO2005100629A1 Large area metallization pretreatment and surface activation system
10/27/2005WO2005099944A1 Coated member and method for manufacture thereof
10/27/2005WO2004108589A3 Nanoparticle coated nanostructured surfaces for detection, catalysis and device applications
10/27/2005US20050240028 Pyrrolyl complexes of copper for copper metal deposition
10/27/2005US20050239298 Process for deposition of a thin layer on an oxidized layer of a substrate
10/27/2005US20050239297 Growth of high-k dielectrics by atomic layer deposition
10/27/2005US20050239271 Heteroepitaxial growth method for gallium nitride
10/27/2005US20050238816 Method and apparatus of depositing low temperature inorganic films on plastic substrates
10/27/2005US20050238809 Device for deposition with chamber cleaner and method for cleaning the chamber
10/27/2005US20050238808 Methods for producing ruthenium film and ruthenium oxide film
10/27/2005US20050236679 Semiconductor device, and method and apparatus for manufacturing the same
10/27/2005US20050236427 Dispensing package
10/27/2005US20050236400 Resistive heaters and uses thereof
10/27/2005US20050235918 Substrate treating apparatus
10/27/2005US20050235917 Method and apparatus for monitoring film deposition in a process chamber
10/27/2005US20050235916 Universal mid-frquency matching network
10/27/2005US20050235915 Plasma surface treatment electrode assembly and arrangement
10/27/2005US20050235914 Conveyor device and film formation apparatus for a flexible substrate
10/27/2005US20050235905 Atomic layer deposition of hafnium-based high-k dielectric
10/27/2005DE102005013532A1 EUV-Lithographiesystem und Chuck zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and Chuck for solving reticles in a vacuum-insulated environment
10/27/2005CA2562299A1 Methods for coating a substrate and forming a coloured film and related device
10/26/2005EP1588410A1 A method of improving stability in low k barrier layers
10/26/2005EP1588404A2 Wafer handling apparatus
10/26/2005EP1587894A1 Controlled sulfur species deposition process
10/26/2005EP1316108A4 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof
10/26/2005EP1264329B1 Plasma deposition method and system
10/26/2005EP1074041B1 A high temperature multi-layered alloy heater assembly
10/26/2005CN2736370Y Stereo superhard composite blank
10/26/2005CN1689170A Method and apparatus for forming superconductor material on a tape substrate
10/26/2005CN1689147A Method for forming high dielectric film
10/26/2005CN1689139A Atomic layer deposition methods and atomic layer deposition device
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