| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 11/23/2005 | CN1701132A Mocvd formation of Cu2S |
| 11/23/2005 | CN1700428A Method of controlling the uniformity of PECVD-deposited thin films |
| 11/23/2005 | CN1699650A Steel traveler and its manufacturing method |
| 11/23/2005 | CN1699620A Process for preparing a catalyst for synthesis of carbon nano tube |
| 11/23/2005 | CN1699619A Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device |
| 11/23/2005 | CN1228999C Apparatus for generating low temperature plasma at atmospheric pressure |
| 11/23/2005 | CN1228850C Semiconductor device and manufacture thereof |
| 11/23/2005 | CN1228823C Deposition of silicon oxide film |
| 11/23/2005 | CN1228821C Method and system for processing radio-frequency plasma |
| 11/23/2005 | CN1228819C Plasma working equipment |
| 11/23/2005 | CN1228813C Semiconductor making system |
| 11/23/2005 | CN1228481C Carbon fibre and composite using carbon fibre |
| 11/23/2005 | CN1228470C Atomic layer sedimentation reaction equipment |
| 11/23/2005 | CN1228213C Gas barrier synthetic resin vessel, device for producing the same, and article-received gas-barrier synthetic resin vessel |
| 11/22/2005 | US6967622 Plasma device and plasma generating method |
| 11/22/2005 | US6967384 Structure and method for ultra-small grain size polysilicon |
| 11/22/2005 | US6967177 Temperature control system |
| 11/22/2005 | US6967159 Systems and methods for forming refractory metal nitride layers using organic amines |
| 11/22/2005 | US6967154 Enhanced atomic layer deposition |
| 11/22/2005 | US6967134 Methods of forming nitrogen-containing masses, silicon nitride layers, and capacitor constructions |
| 11/22/2005 | US6967109 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 11/22/2005 | US6967072 Forming amorphous carbon layer on semiconductor stack; etching |
| 11/22/2005 | US6966952 Apparatus of depositing thin film with high uniformity |
| 11/22/2005 | US6966951 Apparatus of manufacturing a semiconductor device |
| 11/22/2005 | US6966936 Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system |
| 11/22/2005 | US6966771 Boat for heat treatment and vertical heat treatment equipment |
| 11/22/2005 | US6966348 Purgeable container for low vapor pressure chemicals |
| 11/22/2005 | US6966346 Gas supply apparatus and gas supply method |
| 11/22/2005 | CA2379491C Metal-gas reactor and process |
| 11/17/2005 | WO2005109482A1 Gas supply integration unit |
| 11/17/2005 | WO2005109478A1 P-type group iii nitride semiconductor and production method thereof |
| 11/17/2005 | WO2005109473A2 Adhesion improvement for dielectric layers to conductive materials |
| 11/17/2005 | WO2005109472A2 Mobile pvd/cvd coating center |
| 11/17/2005 | WO2005108643A1 Method and device for the low-temperature epitaxy on a plurality of semiconductor substrates |
| 11/17/2005 | WO2005108642A1 Method and apparatus of depositing low temperature inorganic films on plastic substrates |
| 11/17/2005 | WO2005108641A2 Multi-workpiece processing chamber |
| 11/17/2005 | WO2005107922A1 Exhaust gas collection device |
| 11/17/2005 | WO2005107392A2 System for vaporizing materials onto substrate surface |
| 11/17/2005 | WO2005060383A3 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| 11/17/2005 | WO2005049884A3 Method for depositing silicon carbide and ceramic films |
| 11/17/2005 | US20050256011 System and method for quality testing of superconducting tape |
| 11/17/2005 | US20050255714 Method for silicon nitride chemical vapor deposition |
| 11/17/2005 | US20050255713 Method and apparatus for forming nitrided silicon film |
| 11/17/2005 | US20050255712 Method of cvd for forming silicon nitride film on substrate |
| 11/17/2005 | US20050255698 Chemical vapor deposition of titanim |
| 11/17/2005 | US20050255689 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 11/17/2005 | US20050255329 Superalloy article having corrosion resistant coating thereon |
| 11/17/2005 | US20050255257 Method of controlling the film properties of PECVD-deposited thin films |
| 11/17/2005 | US20050255255 Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus |
| 11/17/2005 | US20050255246 Method of fabricating metal silicate layer using atomic layer deposition technique |
| 11/17/2005 | US20050255245 Method and apparatus for the chemical vapor deposition of materials |
| 11/17/2005 | US20050255243 Mixing different chemical precursors together in a chamber during a single pulse step in atomic layer deposition (ALD) to form a mono-layer having multiple chemical compounds on the surface; e.g. dielectric hafnium silicon nitride from hafnium dialkyl amides, tetrakis(dialkylamino)silane and ammonia |
| 11/17/2005 | US20050255242 Apparatus and method for high rate uniform coating, including non-line of sight |
| 11/17/2005 | US20050255241 Gas supply device and treating device |
| 11/17/2005 | US20050253509 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 11/17/2005 | US20050253285 Supporting unit for semiconductor manufacturing device and semiconductor manufacturing device with supporting unit installed |
| 11/17/2005 | US20050253220 Localized synthesis and self-assembly of nanostructures |
| 11/17/2005 | US20050252610 Plasma processor |
| 11/17/2005 | US20050252529 Low temperature CVD chamber cleaning using dilute NF3 |
| 11/17/2005 | US20050252455 Substrate transfer mechanism and subtrate transfer apparatus including same, particle removal method for the subtrate transfer mechanism and apparatus, program for executing the method, and storage medium for storing the program |
| 11/17/2005 | US20050252453 Apparatus and a method for forming an alloy layer over a substrate |
| 11/17/2005 | US20050252452 Polynuclear metal molecular beam apparatus |
| 11/17/2005 | US20050252451 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 11/17/2005 | US20050252450 Plasma spray method and apparatus for applying a coating utilizing particle kinetics |
| 11/17/2005 | US20050252449 Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| 11/17/2005 | US20050252448 Apparatus and method for preventing residual gases from polluting wafer |
| 11/17/2005 | US20050252447 Gas blocker plate for improved deposition |
| 11/17/2005 | US20050252262 Hot press forming method, and a plated steel material therefor and its manufacturing method |
| 11/17/2005 | US20050252191 Ring traveler and method for producing it |
| 11/17/2005 | US20050251990 Plasma uniformity control by gas diffuser hole design |
| 11/17/2005 | DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity |
| 11/16/2005 | EP1596428A1 Organic thin-film transistor device and method for manufacturing same |
| 11/16/2005 | EP1596426A1 Carburetor, method of vaporizing material solution, and method of washing carburetor |
| 11/16/2005 | EP1596419A2 High rate etching using fluorine plasma |
| 11/16/2005 | EP1595977A2 Superalloy article having corrosion resistant coating thereon |
| 11/16/2005 | EP1595976A1 Film-forming apparatus component and method for cleaning same |
| 11/16/2005 | EP1595974A2 Plasma uniformity control by gas diffuser hole design |
| 11/16/2005 | EP1595973A1 Low temperature CVD chamber cleaning using dilute NF3 |
| 11/16/2005 | EP1595970A1 Cooking interface for devices in large-scale and restaurant kitchens |
| 11/16/2005 | EP1595005A1 METHOD OF FORMING A Ta2O5 COMPRISING LAYER |
| 11/16/2005 | EP1531924A4 Hydrogen-selective silica-based membrane |
| 11/16/2005 | EP1493172B1 An atmospheric pressure plasma assembly |
| 11/16/2005 | EP1448805B1 Improved method for coating a support with a material |
| 11/16/2005 | EP1274875B1 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 11/16/2005 | EP1121706B1 Integrated power modules for plasma processing systems |
| 11/16/2005 | CN1698213A Semiconductor light-emitting element and method for manufacturing same; integrated semiconductor light-emitting device and method for manufacturing same; image display and method for manufacturing sam |
| 11/16/2005 | CN1698189A Method to improve cracking thresholds and mechanical properties of low-k dielectric material |
| 11/16/2005 | CN1698188A Method for depositing a low dielectric constant film |
| 11/16/2005 | CN1698184A Nitride semiconductor device and method for manufacturing same |
| 11/16/2005 | CN1697894A Diamond composite substrate and process for producing the same |
| 11/16/2005 | CN1697892A Cleaning of cvd chambers using remote source with cxfyoz based chemistry |
| 11/16/2005 | CN1697273A Semiconductor device and method for fabrication thereof |
| 11/16/2005 | CN1697131A Method of manufacturing semiconductor device and manufacturing line thereof |
| 11/16/2005 | CN1696342A Method and equipment for preparing single-crystal doped Nano zinc oxide tube through gaseous phase deposition |
| 11/16/2005 | CN1696341A Gas distribution system in constant flow and control method of chemical vapor deposition equipment for metallorgarics |
| 11/16/2005 | CN1696340A Chemical vapor deposition equipment and deposition method |
| 11/16/2005 | CN1696339A Method for preparing FeSe film with high curie temperature |
| 11/16/2005 | CN1696338A Chemical vapor deposition equipment |
| 11/16/2005 | CN1696337A Fabricating method of carbon nano tubes and CVD appts. applicating the same |
| 11/16/2005 | CN1227753C Nickel titanium memory alloy and piezoelectric ceramic hetero three step compounding technology |