Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2005
12/01/2005US20050263073 Furnace for heating a wafer and chemical vapor deposition apparatus having the same
12/01/2005US20050263072 Uniformity control for low flow process and chamber to chamber matching
12/01/2005US20050263071 Apparatus and system for manufacturing a semiconductor
12/01/2005DE10340703B4 Vorrichtung und Verfahren zur nahtlosen Beschichtung von Substraten sowie beschichtetes Substrat Apparatus and method for seamless coating substrates and coated substrate
12/01/2005DE102005021006A1 Verfahren zur Herstellung eines Teils aus dichtem thermostrukturellem Verbundwerkstoff A process for producing a part made of thermostructural composite dense
12/01/2005DE102004002678B4 Ventilnadel und Ventil Valve needle and valve
12/01/2005CA2566944A1 Bubbler for constant vapor delivery of a solid chemical
12/01/2005CA2562914A1 Plasma enhanced chemical vapor deposition of metal oxide
11/2005
11/30/2005EP1601009A1 Nitride semiconductor device and method for manufacturing same
11/30/2005EP1601003A2 Ultraviolet ray generator, ultraviolet ray irradation processing apparatus, and semiconductor manufacturing system
11/30/2005EP1599899A2 Atomic layer deposited dielectric layers
11/30/2005EP1599898A2 Method to improve cracking thresholds and mechanical properties of low-k dielectric material
11/30/2005EP1599614A2 Method to deposit an impermeable film onto a porous low-k dielectric film
11/30/2005EP1599613A1 Method for coating a substrate
11/30/2005EP1599488A2 Chemical vapor deposition precursors for deposition of tantalum-based materials
11/30/2005EP1599425A2 Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating
11/30/2005EP1290251B1 Thick single crystal diamond layer method for making it and gemstones produced from the layer
11/30/2005EP1272683B1 Dlc layer system and method for producing said layer system
11/30/2005EP1166180B1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
11/30/2005CN1703769A Treating apparatus and method of treating
11/30/2005CN1703533A Method and apparatus for forming thin film
11/30/2005CN1702836A Non-polar single crystalline A-plane nitride semiconductor wafer and preparation thereof
11/30/2005CN1702193A Ceramics for semiconductor processing equipment
11/30/2005CN1702192A Driving mechanism for vacuum process equipment
11/30/2005CN1702053A Anti-corrosion processing section
11/30/2005CN1702024A Vacuum treating device
11/30/2005CN1229517C Non-crystalline hard carbon film, mechanical part and method for producing non-crystalline hard carbon film
11/30/2005CN1229516C Surface treatment system and method thereof
11/30/2005CN1229295C Method for preparing fire resisting glass and special equipment
11/30/2005CN1229279C Array structure of nm-class carbon tubes and its preparing process
11/29/2005US6970644 Heating configuration for use in thermal processing chambers
11/29/2005US6969953 System and method for inductive coupling of an expanding thermal plasma
11/29/2005US6969830 Wafer chuck having thermal plate with interleaved heating and cooling elements
11/29/2005US6969677 Methods of forming conductive metal silicides by reaction of metal with silicon
11/29/2005US6969539 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
11/29/2005US6969313 Comprises a diamond layer having working surface with a shape which inversely corresponds to onfiguration of a diamond interface surface in an ephemeral mold, upon which diamond layer is deposited, and non-diamond layer joined to iamond layer
11/24/2005WO2005112101A2 Organometallic precursor compounds
11/24/2005WO2005112095A1 An improved method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
11/24/2005WO2005112083A1 Cyclic pulsed plasma atomic layer deposition method
11/24/2005WO2005112082A1 Cyclic pulsed two-level plasma atomic layer deposition apparatus and method
11/24/2005WO2005112081A1 Vaporizer with integral diaphragm
11/24/2005WO2005112080A1 Iii nitride semiconductor crystal and manufacturing method thereof, iii nitride semiconductor device and manufacturing method thereof, and light emitting device
11/24/2005WO2005111277A1 Method of growing sic single crystal and sic single crystal grown by same
11/24/2005WO2005111266A1 Susceptor for vapor deposition apparatus
11/24/2005WO2005111265A1 Method and system of dry cleaning a processing chamber
11/24/2005WO2005111264A1 Dlc coatings for loaded machine parts, intended for use in boundary-lubrication conditions
11/24/2005WO2005111180A1 Assembly of mutually co-operating machine parts, lubricated with biologically decomposable lubricant
11/24/2005WO2005073427A3 Method for the production of an ultra barrier layer system
11/24/2005US20050260864 Method of depositing low k films
11/24/2005US20050260854 Atomic layer deposition methods
11/24/2005US20050260839 Non-volatile resistance switching memory
11/24/2005US20050260835 Sheet type heat treating device and method for processing semiconductors
11/24/2005US20050260834 Method for forming a semiconductor
11/24/2005US20050260833 Constant emissivity deposition member
11/24/2005US20050260831 Method and apparatus for forming deposited film
11/24/2005US20050260824 Semiconductor device manufacturing method and manufacturing line thereof
11/24/2005US20050260823 Methods and apparatus for forming rhodium-containing layers
11/24/2005US20050260454 AI2O3 ceramic tools with diffusion bonding enhanced layer
11/24/2005US20050260411 Diamond-like carbon films with low dielectric constant and high mechanical strength
11/24/2005US20050260395 Diffusion barrier coatings having graded compositions and devices incorporating the same
11/24/2005US20050260357 Stabilization of high-k dielectric materials
11/24/2005US20050260356 Microcontamination abatement in semiconductor processing
11/24/2005US20050260348 Thin film including multi components and method of forming the same
11/24/2005US20050260347 Formation of a silicon oxynitride layer on a high-k dielectric material
11/24/2005US20050260346 Method for aluminide coating a hollow article
11/24/2005US20050260332 Formation of combinatorial arrays of materials using solution-based methodologies
11/24/2005US20050260081 Vacuum pumping system and method for monitoring of the same
11/24/2005US20050259853 Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
11/24/2005US20050258541 Semiconductor device and manufacturing method thereof
11/24/2005US20050258377 Radiation image conversion panel
11/24/2005US20050258164 Hot plate
11/24/2005US20050258137 Remote chamber methods for removing surface deposits
11/24/2005US20050258028 Thin-film coating for wheel rims
11/24/2005US20050257891 Plasma processing apparatus
11/24/2005US20050257856 Reactive gases with concentrations of increased stability and processes for manufacturing same
11/24/2005US20050257747 Worktable device, film formation apparatus, and film formation method for semiconductor process
11/24/2005US20050257746 Clamp member, film deposition apparatus, film deposition method, and semiconductor device manufacturing method
11/24/2005US20050257745 Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device
11/24/2005US20050257744 Apparatus for directing plasma flow to coat internal passageways
11/24/2005US20050257743 Plasma processing apparatus and method
11/24/2005US20050257742 Replaceable shielding apparatus
11/24/2005US20050257735 Method and apparatus for providing gas to a processing chamber
11/24/2005DE102004020185A1 Device for internal coating of a container e.g. PET flasks performs plasma based chemical gas phase deposition of a reaction product
11/24/2005DE102004019575A1 Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten A process for the production of transmission-enhancing and / or reflection-reducing optical layers
11/24/2005DE102004017572B3 Verfahren zur Herstellung eines Hohlzylinders aus synthetischem Quarzglas unter Einsatz einer Haltevorrichtung A process for preparing a hollow cylinder of synthetic quartz glass using a holding device
11/23/2005EP1598881A2 Method for removing a substance from a substrate using electron attachment
11/23/2005EP1598857A1 Production method for antenna and production device for antenna
11/23/2005EP1598456A1 Ring traveller and method for producing the same.
11/23/2005EP1598443A2 Superconductivity in boron-doped diamond thin film
11/23/2005EP1598442A1 Amorphous carbon film forming method and device
11/23/2005EP1598312A1 Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure
11/23/2005EP1597409A1 Apparatus and method for depositing large area coatings on planar surfaces
11/23/2005EP1597406A2 Foodware with multilayer stick resistant ceramic coating and method of making
11/23/2005EP1383939B1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
11/23/2005EP1218689B1 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
11/23/2005CN1701424A Method of CVD for forming silicon nitride film on substrate
11/23/2005CN1701422A Gas reaction system and semiconductor processing apparatus
11/23/2005CN1701417A Substrate-processing apparatus and method of producing semiconductor device
11/23/2005CN1701416A Heat treatment apparatus
11/23/2005CN1701133A Semiconductor processing method for processing substrate to be processed and its apparatus