Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2005
12/21/2005EP1607493A2 Plasma processes for depositing low dielectric constant films
12/21/2005EP1606977A2 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
12/21/2005EP1606429A1 Method for cvd deposition of a silver film on a substrate
12/21/2005EP1102616B1 Esrf coolant degassing process
12/21/2005EP0878558B1 Coated material and method of manufacturing the same
12/21/2005CN1711650A Boron phosphide-based semiconductor light-emitting device, production method thereof and light-emitting diode
12/21/2005CN1711369A Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
12/21/2005CN1233024C Method for producing semiconductor integrated circuit device
12/21/2005CN1232439C Method for making carbon nano tube
12/20/2005US6977804 Electrostatic chuck support mechanism, support stand device and plasma processing equipment
12/20/2005US6977359 controlling parameters for semiconductor wafer vacuum-processing, considering cleaning frequency of vessel; improved uniformity of thin film thickness on wafers
12/20/2005US6977138 Reactive polymer coatings
12/20/2005US6977014 Architecture for high throughput semiconductor processing applications
12/15/2005WO2005119749A1 Gas treating device and film forming device
12/15/2005WO2005119733A1 Blocker plate bypass to distribute gases in a chemical vapor deposition system
12/15/2005WO2005118911A1 Plasma cvd equipment
12/15/2005WO2005118910A1 Method of forming metal laminate thin film or oxide thin film using supercritical fluid or subcritical fluid, and film forming apparatus therefor
12/15/2005WO2005118909A1 Diamond-coated hard metal indexable insert
12/15/2005WO2005118907A1 Variable quadruple electromagnet array, particularly used in a multi-step process for forming a metal barrier in a sputter reactor
12/15/2005WO2005118501A1 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating
12/15/2005WO2005118119A1 Method and apparatus to help promote contact of gas with vaporized material
12/15/2005WO2005101461B1 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
12/15/2005WO2005094982A3 Tailored and uniform coatings in microchannel apparatus
12/15/2005WO2005087974A3 Cvd processes for the deposition of amorphous carbon films
12/15/2005WO2005019491A3 Thermal cvd synthesis of nanostructures
12/15/2005US20050277780 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
12/15/2005US20050277302 Advanced low dielectric constant barrier layers
12/15/2005US20050277296 Method to reduce impurity elements during semiconductor film deposition
12/15/2005US20050277295 Coating process for patterned substrate surfaces
12/15/2005US20050277294 Method for treating a semiconductor surface to form a metal-containing layer
12/15/2005US20050277290 Integration of titanium and titanium nitride layers
12/15/2005US20050277256 Nanolaminates of hafnium oxide and zirconium oxide
12/15/2005US20050277224 Base material for forming diamond film and diamond film
12/15/2005US20050277223 Method of forming metal oxide using an atomic layer deposition process
12/15/2005US20050277209 Plasma leak monitoring method, plasma processing apparatus and plasma processing method
12/15/2005US20050276987 Method forming transparent conductive film, transparent conductive film, glass substrate including the same and photoelectric conversion device using that glass substrate
12/15/2005US20050276979 CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
12/15/2005US20050276932 Electron beam processing method
12/15/2005US20050276922 Method of forming thin dielectric layers
12/15/2005US20050275101 Amorphus TiN
12/15/2005US20050274714 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
12/15/2005US20050274694 Manufacturing method of semiconductor device
12/15/2005US20050274396 Methods for wet cleaning quartz surfaces of components for plasma processing chambers
12/15/2005US20050274325 Semiconductor heating apparatus
12/15/2005US20050274324 Plasma processing apparatus and mounting unit thereof
12/15/2005US20050274323 Massively parallel atomic layer deposition/chemical vapor deposition system
12/15/2005US20050274322 Reactor for producing reactive intermediates for low dielectric constant polymer thin films
12/15/2005US20050274321 Plasma processing apparatus and method
12/15/2005US20050274320 Erosion resistant process chamber components
12/15/2005DE4412915B4 Plasmabehandlungsanlage, Verfahren zu deren Betrieb und Verwendung derselben Plasma treatment equipment, process for their operation and use of the same
12/15/2005DE10253513B4 Mehrplatz-Beschichtungsvorrichtung und Verfahren zur Plasmabeschichtung Multi-coating apparatus and method for plasma coating
12/15/2005DE102004025679A1 High-frequency plasma discharge impedance altering device for apparatus used to treat or coat substrate, varies magnetic field generated in discharge chamber to achieve desired impedance measurement
12/15/2005DE102004025139A1 Verfahren zur Aufbringung von Heißgas-Korrosionsschutzschichten A process for the application of hot gas corrosion protection layers
12/15/2005DE102004024207A1 Verfahren und Vorrichtung zur Niedertemperaturepitaxie auf einer Vielzahl von Halbleitersubstraten Method and apparatus for Niedertemperaturepitaxie on a plurality of semiconductor substrates
12/15/2005DE102004006131B4 Bandbeschichtungsanlage mit einer Vakuumkammer und einer Beschichtungswalze Tape coating system with a vacuum chamber and a coating roll
12/14/2005EP1605522A1 Semiconductor light-emitting element and method for manufacturing same; integrated semiconductor light-emitting device and method for manufacturing same; image display and method for manufacturing same; and illuminating device and method for manufacturing same
12/14/2005EP1605500A1 Semiconductor device and method for manufacturing semiconductor device
12/14/2005EP1605077A2 Process and device for treating substrates in a rotary apparatus
12/14/2005EP1605076A2 Method for preventing contamination during the fabrication of a semiconductor device
12/14/2005EP1605075A1 Semiconductor processing method for processing substrate to be processed and its apparatus
12/14/2005EP1604757A2 Manufacturing method of die for optical element molding
12/14/2005EP1604394A2 Method of improving interlayer adhesion
12/14/2005EP1604389A2 Processing system and method for thermally treating a substrate
12/14/2005EP1604388A2 Processing system and method for chemically treating a substrate
12/14/2005EP1604387A2 Processing system and method for treating a substrate
12/14/2005EP1604386A2 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers
12/14/2005EP1604049A1 Method and apparatus for treating a substrate
12/14/2005EP1603924A2 Alcoholates of rare earth mtals a precursors for metaloxides layers or films
12/14/2005EP1507894B1 Coating device comprising a conveying device
12/14/2005EP0984877B1 Wiper blade rubber with a protective layer
12/14/2005CN1708833A Heat treating system and heat treating method
12/14/2005CN1708830A Thin film forming apparatus
12/14/2005CN1708602A Susceptor system
12/14/2005CN1708601A Susceptor system
12/14/2005CN1706984A Silicon nitride layer forming process
12/14/2005CN1706983A Mold with super hard coating
12/14/2005CN1231544C Metallic coating with oxidation resistance and fatigue resistance
12/13/2005US6974781 Reactor precoating for reduced stress and uniform CVD
12/13/2005US6974780 Semiconductor processing methods of chemical vapor depositing SiO2 on a substrate
12/13/2005US6974771 Methods and apparatus for forming barrier layers in high aspect ratio vias
12/13/2005US6974766 In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
12/13/2005US6974762 Adhesion of carbon doped oxides by silanization
12/08/2005WO2005117097A1 Lift pin with roller glide for reducing friction
12/08/2005WO2005117088A1 Microcontamination abatement in semiconductor processing
12/08/2005WO2005117087A1 Formation of a silicon oxynitride layer on a high-k dielectric material
12/08/2005WO2005117086A1 Stabilization of high-k dielectric materials
12/08/2005WO2005117083A1 Substrate processing apparatus
12/08/2005WO2005117078A1 Gallium nitride-based semiconductor stacked structure, production method thereof, and compound semiconductor and light-emitting device each using the stacked structure
12/08/2005WO2005116650A2 High throughput discovery of materials through vapor phase synthesis
12/08/2005WO2005116452A1 Gas supply system for a pumping arrangement
12/08/2005WO2005116307A1 Process for producing wafer of silicon carbide single-crystal
12/08/2005WO2005116306A1 Nanocrystal diamond film, process for producing the same and apparatus using nanocrystal diamond film
12/08/2005WO2005116293A1 Thin film forming equipment and thin film forming method
12/08/2005WO2005116292A1 Material for chemical vapor deposition and thin film forming method
12/08/2005WO2005116291A2 Apparatus for directing plasma flow to coat internal passageways
12/08/2005WO2005116287A1 Aisrcraft wheel part having improved corrosion resistance
12/08/2005WO2005058789A3 Copper (i) formate complexes
12/08/2005WO2005056861A3 Diamond films and methods of making diamond films
12/08/2005WO2005043648A3 Synergetic sp-sp2-sp3 carbon materials and deposition methods thereof
12/08/2005WO2005033001A3 Methods for preparation of one-dimensional carbon nanostructures
1 ... 376 377 378 379 380 381 382 383 384 385 386 387 388 389 390 391 392 393 394 395 396 ... 719