| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/29/2005 | US20050287297 Apparatus and methods of making nanostructures by inductive heating |
| 12/29/2005 | US20050287296 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings |
| 12/29/2005 | US20050287288 Strengthening the ceramic ball of a hip prosthesis by ion beam implantation to induce controlled bilateral compressive stress on the load-bearing surface and not make the ceramic amorphous; coating with a diamond-like-coating of bonding, amorphous, crosslinked carbon network; durability; noncracking |
| 12/29/2005 | US20050285982 Apparatus for manufacturing liquid crystal display device and liquid crystal display device manufactured using the same |
| 12/29/2005 | US20050285225 Semiconductor constructions comprising cerium oxide and titanium oxide |
| 12/29/2005 | US20050285103 Methods of forming semiconductor constructions comprising cerium oxide and titanium oxide |
| 12/29/2005 | US20050284575 Processing system and operating method of processing system |
| 12/29/2005 | US20050284550 Method and apparatus for treating substrates in a rotary installation |
| 12/29/2005 | US20050284375 Method and apparatus for processing a workpiece |
| 12/29/2005 | US20050284374 Expanded thermal plasma apparatus |
| 12/29/2005 | US20050284373 Apparatus for manufacturing a luminescent device using a buffer cassette |
| 12/29/2005 | US20050284372 Chamber component having grooved surface with depressions |
| 12/29/2005 | US20050284371 Deposition apparatus for providing uniform low-k dielectric |
| 12/29/2005 | US20050284370 High rate atomic layer deposition apparatus and method of using |
| 12/29/2005 | US20050284360 Atomic layer deposition using electron bombardment |
| 12/29/2005 | DE19752637B4 Verfahren zur Herstellung einer Leitungsanordnung einer Halbleitereinrichtung A process for producing a line arrangement of a semiconductor device |
| 12/29/2005 | DE10393964T5 Diamantbeschichtetes Silizium und Herstellungsverfahren dafür A diamond-coated silicon and production method thereof |
| 12/29/2005 | DE102004029677A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces |
| 12/29/2005 | DE102004028030A1 Beschichtungsverfahren für strukturierte Substratoberflächen Coating method for structured substrate surfaces |
| 12/29/2005 | DE102004025083A1 Production of a solid body electrolyte material region made from a chalcogenide material comprises using germanium and/or silicon as precursor compound or carrier compound in the form of an organic compound |
| 12/29/2005 | DE102004016436B3 Process of manufacturing self-cleaning window glass or glass building facade involves atomised application of silicon agent to titanium oxide surface |
| 12/28/2005 | EP1610374A1 Silicon wafer heat treatment jig, and silicon wafer heat treatment method |
| 12/28/2005 | EP1610369A1 Plasma film-forming method and plasma film-forming apparatus |
| 12/28/2005 | EP1610368A1 Plasma processing apparatus and method |
| 12/28/2005 | EP1610053A2 Fluid storage and dispensing system |
| 12/28/2005 | EP1609884A1 Thin film forming apparatus and method for forming thin film |
| 12/28/2005 | EP1609883A2 Coated metal cutting tool |
| 12/28/2005 | EP1609878A1 Carbon-coated aluminum and method for producing same |
| 12/28/2005 | EP1608794A1 Method for depositing compounds on a substrate by means of metalorganic chemical vapor deposition |
| 12/28/2005 | EP1608793A1 Titania coatings |
| 12/28/2005 | EP1608792A2 A method and apparatus for forming a high quality low temperature silicon nitride film |
| 12/28/2005 | EP1456871A4 Susceptor for epitaxial growth and epitaxial growth method |
| 12/28/2005 | EP1453595B1 Plasma treatment of porous materials |
| 12/28/2005 | EP1294959B1 Method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and a multi-functional multi-ply layer produced according to said method |
| 12/28/2005 | EP0938634B1 Gas panel |
| 12/28/2005 | EP0920435B1 Random access memory device and platinum chemical vapour deposition process used in its preparation |
| 12/28/2005 | CN1714434A Dielectric film forming method |
| 12/28/2005 | CN1714430A Plasma processing apparatus and plasma processing method |
| 12/28/2005 | CN1714169A Support system for a treatment apparatus |
| 12/28/2005 | CN1714168A Two-layer film for next generation damascene barrier application with good oxidation resistance |
| 12/28/2005 | CN1713355A Manufacturing method of semiconductor device |
| 12/28/2005 | CN1712561A Gas mixer |
| 12/28/2005 | CN1712560A Vertical CVD apparatus and CVD method using the same |
| 12/28/2005 | CN1234133C Preparation method of high-temp. superconducting layer |
| 12/28/2005 | CN1233870C Method of coating diamond on gradient hard alloy with cobalt-lean surface layer |
| 12/27/2005 | US6979657 Method for forming a dielectric layer in a semiconductor device |
| 12/27/2005 | US6979370 Methods, complexes, and system for forming metal-containing films |
| 12/27/2005 | US6979369 Fixing structures and supporting structures of ceramic susceptors, and supporting members thereof |
| 12/27/2005 | US6979368 Apparatus and method for producing a semiconductor device including a byproduct control system |
| 12/27/2005 | US6979367 Method of improving surface planarity |
| 12/27/2005 | US6978984 Raw material providing device for chemical vapor deposition process |
| 12/27/2005 | CA2276000C Vapor deposition apparatus |
| 12/27/2005 | CA2196894C Apparatus for and method of manufacturing plastic container coated with carbon film |
| 12/22/2005 | WO2005122229A1 Material for forming capacitor film |
| 12/22/2005 | WO2005121417A1 Support system for treatment apparatuses |
| 12/22/2005 | WO2005121401A1 Thin film-forming material and method for producing thin film |
| 12/22/2005 | WO2005121400A1 Solution raw material for organic metal chemical vapor deposition and complex oxide dielectric thin film formed by using such raw material |
| 12/22/2005 | WO2005121399A1 Precursors for deposition of silicon nitride, silicon oxynitride and metal silicon oxynitrides |
| 12/22/2005 | WO2005121398A1 Thin diamond film coating method and cemented carbide member coated with diamond thin film |
| 12/22/2005 | WO2005121397A2 Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
| 12/22/2005 | WO2005121396A2 Controlled deposition of silicon-containing coatings adhered by an oxide layer |
| 12/22/2005 | WO2005121388A1 Al2o3 ceramic tools with diffusion bonding enhanced layer |
| 12/22/2005 | WO2005121047A1 Boron-containing layer system comprising a boron carbide layer, a b-c-n layer, and a carbon-modified hexahedral boron nitride layer, and method for the production of such a layer system |
| 12/22/2005 | WO2005120684A1 Non-thermal plasma reactor for low pressure drop and low specific energy density |
| 12/22/2005 | WO2004063421A3 Deposition chamber surface enhancement and resulting deposition chambers |
| 12/22/2005 | US20050283012 Copper (I) compounds useful as deposition precursors of copper thin films |
| 12/22/2005 | US20050282400 Method of forming a dielectric film |
| 12/22/2005 | US20050282398 Oxygen plasma treatment for enhanced HDP-CVD gapfill |
| 12/22/2005 | US20050282378 Interconnects forming method and interconnects forming apparatus |
| 12/22/2005 | US20050282372 Semiconductor device and a method of manufacture therefor |
| 12/22/2005 | US20050282365 Film formation apparatus and method for semiconductor process |
| 12/22/2005 | US20050282328 Removal of carbon from an insulative layer using ozone |
| 12/22/2005 | US20050282034 Ceramic or a metal base covered with a physically vapor deposited film formed from a group 3 compound such as Y2O3, with a value of ratio I400/I222 of peak intensity I400 assignable to (400) plane to peak intensity I222 assignable to (222) plane of X-ray diffraction not higher than 0.5. |
| 12/22/2005 | US20050281960 Transporting cellulose ester substrate to gap formed between electrodes; subjecting the first surface of substrate to plasma discharge treatment to form the layer at atmospheric pressure while supplying reactive gas |
| 12/22/2005 | US20050281959 Plasma generating apparatus and method of forming alignment film of liquid crystal display using the same |
| 12/22/2005 | US20050281952 Copper (i) compounds useful as deposition precursors of copper thin films |
| 12/22/2005 | US20050281951 Dielectric barrier discharge method for depositing film on substrates |
| 12/22/2005 | US20050281950 Deposition apparatus and method |
| 12/22/2005 | US20050281949 Massively parallel atomic layer deposition/chemical vapor deposition system |
| 12/22/2005 | US20050279642 Common rack for electroplating and PVD coating operations |
| 12/22/2005 | US20050279456 Plasma reactor with high productivity |
| 12/22/2005 | US20050279454 Pressure control system |
| 12/22/2005 | US20050279384 Method and processing system for controlling a chamber cleaning process |
| 12/22/2005 | US20050279382 Method for cleaning a process chamber |
| 12/22/2005 | US20050279285 Phosphor sheet manufacturing apparatus |
| 12/22/2005 | US20050279284 Temperature control system |
| 12/22/2005 | US20050279282 Method and apparatus for processing a semiconductor substrate |
| 12/22/2005 | US20050279281 Substrate processing apparatus |
| 12/22/2005 | US20050279138 Method and device for heat treatment |
| 12/22/2005 | DE102005023670A1 Metal wiring layer formation, for integrated circuit, involves forming metal nitride layer in contact hole, such that concentration of metal nitride layer at bottom of hole is less than that of metal nitride layer at opening of hole |
| 12/22/2005 | DE102005020666A1 Filmbildungsquelle, vakuumunterstützte Vorrichtung zur Filmbildung, Verfahren zur Herstellung eines organischen elektrolumineszierenden Bauelements, und organisches elektrolumineszierendes Bauelement Film-forming source, vacuum-assisted apparatus for film formation, method of manufacturing an organic electroluminescent device, and organic electroluminescent device |
| 12/22/2005 | DE102004026344A1 Verfahren zum Herstellen einer hydrophoben Beschichtung, Vorrichtung zum Durchführen des Verfahrens und Substrat mit einer hydrophoben Beschichtung A method for producing a hydrophobic coating apparatus for performing the method and substrate with a hydrophobic coating |
| 12/22/2005 | DE102004026121A1 Vapor phase deposition of high melting point substances as layers on substrate, employs beam to heat target, and plasma beam to transport liberated vapor to substrate |
| 12/22/2005 | DE102004010094B3 Halbleiterbauelement mit mindestens einer organischen Halbleiterschicht und Verfahren zu dessen Herstellung A semiconductor device comprising at least one organic semiconductor layer, and process for its preparation |
| 12/22/2005 | CA2566173A1 Al2o3 ceramic tools with diffusion bonding enhanced layer |
| 12/21/2005 | EP1608007A1 Method for forming insulating film in semiconductor device |
| 12/21/2005 | EP1608006A1 Film formation apparatus |
| 12/21/2005 | EP1608005A1 Vaporizer, film forming apparatus including the same, method of vaporization and method of forming film |
| 12/21/2005 | EP1608000A2 RF plasma processor |
| 12/21/2005 | EP1607498A1 Method for forming oxide coating film, oxide coating film and coating film structure |