| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/18/2006 | EP1617456A1 Driving mechanism for a vacuum treating system |
| 01/18/2006 | EP1616977A2 Tool for chamfer milling of steel plates for oil pipes |
| 01/18/2006 | EP1616976A2 Coated insert |
| 01/18/2006 | EP1616974A1 METHOD FOR PREPARING ALUMINA COATING FILM COMPRISING a-TYPE C RYSTAL STRUCTURE AS PRIMARY CRYSTAL STRUCTURE AND METHOD FOR MANUFACTURING MEMBER COATED WITH LAMINATED COATING FILM |
| 01/18/2006 | EP1616043A2 Transient enhanced atomic layer deposition |
| 01/18/2006 | EP1616042A2 System and method for forming multi-component dielectric films |
| 01/18/2006 | CN1723530A Cooled deposition baffle in high density plasma semiconductor processing |
| 01/18/2006 | CN1723295A Method for making carbon doped oxide film |
| 01/18/2006 | CN1723097A Thermal flux processing by scanning electromagnetic radiation |
| 01/18/2006 | CN1723066A Trapping device, processing system, and method for removing impurities |
| 01/18/2006 | CN1721570A Method for aluminide coating a hollow article |
| 01/18/2006 | CN1721569A Coat base with curved surface and method for manufacturing such coat base |
| 01/18/2006 | CN1721108A Coated insert |
| 01/18/2006 | CN1237589C Method and device for manufacturing active matrix device containing top grid type TFT |
| 01/18/2006 | CN1237584C Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
| 01/18/2006 | CN1237577C Method for producing gallium nitride film semiconductor and colligation production method |
| 01/18/2006 | CN1237576C Gasifier and gasifying supply equipment |
| 01/18/2006 | CN1237423C Method, equipment and system for flow control of process gas in semiconductor manufacture |
| 01/18/2006 | CN1237204C High-density plasma chemical vapour-phase deposition equipment |
| 01/18/2006 | CN1237203C Semiconductor or liquid crystal producing device |
| 01/18/2006 | CN1237202C Visibly marked parts and method for using same |
| 01/18/2006 | CN1237201C Surface modifying technology of diamond-like film to titanium-nickel alloy |
| 01/18/2006 | CN1237200C Silicon dioxide deposition by plasma activated evaporation process |
| 01/17/2006 | US6987240 Thermal flux processing by scanning |
| 01/17/2006 | US6987197 Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film |
| 01/17/2006 | US6987073 Low selectivity deposition methods |
| 01/17/2006 | US6987063 Method to reduce impurity elements during semiconductor film deposition |
| 01/17/2006 | US6986965 Device enclosures and devices with integrated battery |
| 01/17/2006 | US6986955 Electronic and optical materials |
| 01/17/2006 | US6986914 Vapor deposition using metal halide; removal by-products; using scavenger |
| 01/17/2006 | US6986877 Method for preparing nano-carbon fiber and nano-carbon fiber |
| 01/17/2006 | US6986814 Gas distributor for vapor coating method and container |
| 01/17/2006 | US6986471 Rotary plasma spray method and apparatus for applying a coating utilizing particle kinetics |
| 01/12/2006 | WO2006005067A2 Protective coating on a substrate and method of making thereof |
| 01/12/2006 | WO2006004579A2 A chemical vapor deposition apparatus |
| 01/12/2006 | WO2006004221A1 Piston ring, piston, cylinder and piston pin having amorphous and hard carbon film |
| 01/12/2006 | WO2006003381A1 Deposition technique for producing high quality compound semiconductor materials |
| 01/12/2006 | WO2006003322A2 Ion implanter operating in pulsed plasma mode |
| 01/12/2006 | WO2005109473A3 Adhesion improvement for dielectric layers to conductive materials |
| 01/12/2006 | WO2005081658A3 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape |
| 01/12/2006 | WO2005062758A3 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 01/12/2006 | US20060009045 Method of manufacturing semiconductor device |
| 01/12/2006 | US20060009044 Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus |
| 01/12/2006 | US20060009017 Method of crystallizing semiconductor film and method of manufacturing display device |
| 01/12/2006 | US20060008972 Method of forming trench isolation in the fabrication of integrated circuitry |
| 01/12/2006 | US20060008969 Method of forming dielectric film |
| 01/12/2006 | US20060008957 Method of fabricating poly-crystalline silicon thin film and method of fabricating transistor using the same |
| 01/12/2006 | US20060008661 Manufacturable low-temperature silicon carbide deposition technology |
| 01/12/2006 | US20060008595 Film-forming method |
| 01/12/2006 | US20060008594 Plasma enhanced chemical vapor deposition system for forming carbon nanotubes |
| 01/12/2006 | US20060008593 Device for carrying out a plasma-assisted process |
| 01/12/2006 | US20060008584 Method of forming carbon nanotube |
| 01/12/2006 | US20060008583 Cleaning method for use in an apparatus for manufacturing a semiconductor device |
| 01/12/2006 | US20060008582 Method for making a photonic structure |
| 01/12/2006 | US20060005929 Plasma processing device and plasma generating method |
| 01/12/2006 | US20060005771 Apparatus and method of shaping profiles of large-area PECVD electrodes |
| 01/12/2006 | US20060005770 Independently moving substrate supports |
| 01/12/2006 | US20060005769 Plasma processing device |
| 01/12/2006 | US20060005768 Doping method, doping apparatus, and control system for doping apparatus |
| 01/12/2006 | US20060005767 Chamber component having knurled surface |
| 01/12/2006 | DE102004030344A1 Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD) An apparatus for coating optical glasses by means of plasma enhanced chemical vapor deposition (CVD) |
| 01/11/2006 | EP1615259A1 Susceptor and vapor growth device |
| 01/11/2006 | EP1614773A2 Insert for metal cutting |
| 01/11/2006 | EP1614770A1 Microwave plasma processing method |
| 01/11/2006 | EP1614769A1 Coated cutting tool |
| 01/11/2006 | EP1614768A1 Method for forming film |
| 01/11/2006 | EP1614720A1 Process for producing thin film metal non-oxide coated powder substrates and products produced therefrom |
| 01/11/2006 | EP1614136A2 Plasma generation using multi-step ionization |
| 01/11/2006 | EP1613792A2 Methods and apparatus for atomic layer deposition |
| 01/11/2006 | EP1613791A2 Methods and apparatus for controlling formation of deposits in a deposition system and deposition systems and methods including the same |
| 01/11/2006 | EP1613790A1 Method for hafnium nitride deposition |
| 01/11/2006 | EP1613789A2 Volatile copper(i) complexes for deposition of copper films by atomic layer deposition |
| 01/11/2006 | EP1390560B1 Process for making platelets |
| 01/11/2006 | EP0984876B1 Method for coating a rubber wiper blade |
| 01/11/2006 | CN1720648A Optical uses of diamondoid-containing materials |
| 01/11/2006 | CN1720413A Raw solution feeding system for vaporizer and method of cleaning the raw solution feeding system |
| 01/11/2006 | CN1720349A Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
| 01/11/2006 | CN1720348A Blocker plate bypass design to improve clean rate at the edge of the chamber |
| 01/11/2006 | CN1720347A Method for cleaning a process chamber |
| 01/11/2006 | CN1720346A Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 01/11/2006 | CN1720345A Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 01/11/2006 | CN1718854A Supplying device of chemical gaseous phase deposition solid state precusor |
| 01/11/2006 | CN1718853A Preparation method of diamond film coating layer bearing supporter |
| 01/11/2006 | CN1718852A Nano-diamond film suitable for SAW device, its preparation method and use |
| 01/11/2006 | CN1718795A Leadless copper base high temperature self lubricating composite material |
| 01/11/2006 | CN1718334A Insert for metal cutting |
| 01/11/2006 | CN1236657C Plasma process apparatus and method |
| 01/11/2006 | CN1236477C Silicone substrate film, its forming method and photocell |
| 01/11/2006 | CN1236102C Preheating reaction room |
| 01/11/2006 | CN1235771C Production device for DLC film-coated plastic container and production method therefor |
| 01/10/2006 | US6984893 Low temperature nitride used as Cu barrier layer |
| 01/10/2006 | US6984595 Layer member forming method |
| 01/10/2006 | US6984594 Deposition method of insulating layers having low dielectric constant of semiconductor devices |
| 01/10/2006 | US6984592 Systems and methods for forming metal-doped alumina |
| 01/10/2006 | US6984591 Precursor source mixtures |
| 01/10/2006 | US6984584 Contamination suppression in chemical fluid deposition |
| 01/10/2006 | US6984565 Method of manufacturing a semiconductor device |
| 01/10/2006 | US6984436 Graded material and method for synthesis thereof and method for processing thereof |
| 01/10/2006 | US6984417 Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material |
| 01/10/2006 | US6984415 Adding to a solid precursor in a liquid bubbler apparatus a liquid chosen to have a vapor pressure of the precursor under opertating conditions and that the precursor is insoluble in; attaching said bubbler to reactor; nitride, metal coatings |