| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/08/2006 | CN1732177A Methods for making metallocene compounds |
| 02/08/2006 | CN1731561A Method for preparing Poly-SiGe film |
| 02/08/2006 | CN1730722A Large power heat gradient chemical gas phase infiltration process system monitoring device and method |
| 02/08/2006 | CN1730721A Superhard filming mold |
| 02/08/2006 | CN1730688A Vapour deposition in situ reaction method for preparing carbon nanotube reinforced aluminium matrix composite material |
| 02/08/2006 | CN1730418A Ceramic mould core |
| 02/08/2006 | CN1730387A Method for controlling carbon nanometer tube three-dimension graphics type growth by spray plating precious metal membrane |
| 02/08/2006 | CN1241316C Radio frequency power source for genrating an inducively coupled plasma |
| 02/08/2006 | CN1241242C Method for making insulation layer and semiconductor device and semiconductor device formed thereby |
| 02/08/2006 | CN1241237C Semiconductor or liquid crystal mfg. apparatus |
| 02/08/2006 | CN1241036C Method of preferential deposition of material on a substrate surface |
| 02/08/2006 | CN1240780C Organosilicon precursor for interlayer medium film with low dielectric constant |
| 02/08/2006 | CN1240612C Carbon nanometer for fuel battery, its preparing method and fuel battery therewith |
| 02/07/2006 | US6996320 Using deuterated source gases to fabricate low loss GeSiON and SiON waveguides |
| 02/07/2006 | US6995948 Thin-film magnetic head, method for producing the same and magnetic disk device using the same |
| 02/07/2006 | US6995515 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
| 02/07/2006 | US6995081 Systems and methods for forming tantalum silicide layers |
| 02/07/2006 | US6995071 Methods of forming MIM type capacitor structures using low temperature plasma processing |
| 02/07/2006 | US6995069 Dielectric capacitor manufacturing method and semiconductor storage device manufacturing method |
| 02/07/2006 | US6994887 By setting the ratio between the amount of the barrier gas supplied from first and second barrier gas supply ports and ratio between amounts of barrier gas and raw material gas enables to form a thin film without particles adhesion on the substrate |
| 02/07/2006 | US6994800 chemical precursors that are pure liquid compounds at room temperature, vaporized without decomposition, and they do not leave a nonvolatile residue during a process for the chemical vapor deposition of alkali metal-containing materials |
| 02/07/2006 | US6994769 In-situ cleaning of a polymer coated plasma processing chamber |
| 02/07/2006 | US6994319 Membrane gas valve for pulsing a gas |
| 02/07/2006 | CA2364964C Compound, non-chromium conversion coatings for aluminum alloys |
| 02/02/2006 | WO2006012179A2 Expanded thermal plasma apparatus |
| 02/02/2006 | WO2006012048A2 Deposition apparatus for providing uniform low-k dielectric |
| 02/02/2006 | WO2006011991A2 Apparatus for an optimized plasma chamber top piece |
| 02/02/2006 | WO2006011336A1 High-frequency plasma processing apparatus and high-frequency plasma processing method |
| 02/02/2006 | WO2006011169A1 Epitaxial reactor with susceptor controlled positioning |
| 02/02/2006 | WO2006010914A1 Improved deposition process |
| 02/02/2006 | WO2005042160A3 Reaction system for growing a thin film |
| 02/02/2006 | WO2004106008A3 Substrate handling system |
| 02/02/2006 | US20060024977 Low dielectric constant carbon films |
| 02/02/2006 | US20060024964 Method and apparatus of forming thin film using atomic layer deposition |
| 02/02/2006 | US20060024926 Method of forming a controlled and uniform lightly phosphorous doped silicon film |
| 02/02/2006 | US20060024451 Enhanced magnetic shielding for plasma-based semiconductor processing tool |
| 02/02/2006 | US20060024443 Chemical vapor deposition material and chemical vapor deposition |
| 02/02/2006 | US20060024442 Deposition methods for the formation of polycrystalline materials on mobile substrates |
| 02/02/2006 | US20060024441 Method of forming metal oxide and semimetal oxide |
| 02/02/2006 | US20060024440 Reduced oxygen arc spray |
| 02/02/2006 | US20060024439 System for controlling the sublimation of reactants |
| 02/02/2006 | US20060024435 Turbulent mixing aerosol nanoparticle reactor and method of operating the same |
| 02/02/2006 | US20060024428 treating surface of a polyimide base film , forming a tie layer on base, forming a Cu conductive layer on the tie layer, and depositing a Cu on the metal conductive layer sputtering to form a Cu plated layer; continuous process in vacuum chamber; no oxidation of Cu film; dust-free |
| 02/02/2006 | US20060024227 Array of single-walled carbon nanotubes and process for preparaton thereof |
| 02/02/2006 | US20060022606 Arrangement, method and electrode for generating a plasma |
| 02/02/2006 | US20060022348 Method of sealing low-k dielectrics and devices made thereby |
| 02/02/2006 | US20060022345 Layer arrangement |
| 02/02/2006 | US20060022200 Method for producing semiconductor substrate and method for fabricating field effect transistor and semiconductor substrate and field effect transistor |
| 02/02/2006 | US20060021969 Method for controlling the temperature of a gas distribution plate in a process reactor |
| 02/02/2006 | US20060021703 Dual gas faceplate for a showerhead in a semiconductor wafer processing system |
| 02/02/2006 | US20060021582 Heat treatment apparatus |
| 02/02/2006 | US20060021581 Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 02/02/2006 | US20060021580 Plasma processing apparatus and impedance adjustment method |
| 02/02/2006 | US20060021579 Non-stick masking fixtures and methods of preparing same |
| 02/02/2006 | US20060021578 Chemical vapor deposition apparatus |
| 02/02/2006 | US20060021577 Plasma coating system for accommodating substrates of different shapes |
| 02/02/2006 | US20060021576 Multi-chamber processing with simultaneous workpiece transport and gas delivery |
| 02/02/2006 | US20060021575 Method for carrying object to be processed |
| 02/02/2006 | US20060021574 Multi-gas distribution injector for chemical vapor deposition reactors |
| 02/02/2006 | US20060021573 Vapor deposition systems and methods |
| 02/02/2006 | US20060021572 High Vacuum Plasma-Assisted Chemical Vapor Deposition System |
| 02/02/2006 | US20060021571 Vacuum pump line with nickel-chromium heater layer |
| 02/02/2006 | US20060021568 Shower head structure and treating device |
| 02/02/2006 | US20060021214 Methods for making device enclosures and devices with an integrated battery |
| 02/02/2006 | DE102004034312A1 Dichtungsanordnung und Verfahren zur Herstellung eines Dichtkörpers für eine Dichtungsanordnung A sealing arrangement and method for manufacturing a sealing body for a sealing arrangement |
| 02/01/2006 | EP1622192A1 Substrate transfer device of thin-film forming apparatus |
| 02/01/2006 | EP1621646A2 Thermal barrier coatings with high fracture toughness underlayer for improved impact resisitance |
| 02/01/2006 | EP1620579A2 Collection of unused precursors in ald |
| 02/01/2006 | EP1620578A2 Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
| 02/01/2006 | EP1620577A2 Control or modeling of a method for chemical infiltration in a vapor phase for the densification of porous substrates by carbon |
| 02/01/2006 | EP1620497A1 Object with a stratified composite material |
| 02/01/2006 | EP1620294A2 Chemical vapor deposition epitaxial growth |
| 02/01/2006 | EP1290251B8 Thick single crystal diamond layer method for making it and gemstones produced from the layer |
| 02/01/2006 | EP1230420A4 Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
| 02/01/2006 | CN1729556A Thin film forming apparatus and thin film forming method and thin film forming system |
| 02/01/2006 | CN1729379A Very low moisture O-ring and method for preparing the same |
| 02/01/2006 | CN1729137A Method of manufacturing micro structure, and method of manufacturing mold material |
| 02/01/2006 | CN1727410A Coating layer of Nano composite diamond, and preparation method |
| 02/01/2006 | CN1727082A Low temperature CVD chamber cleaning using dilute NF3 |
| 02/01/2006 | CN1239741C Cvd装置 Cvd device |
| 02/01/2006 | CN1239740C Precursor body for zirconia and Hf Oxide thin film deposition |
| 02/01/2006 | CN1239739C Method for preparing composite coat layer of diamond being plated slimline with low roughness in inside surface |
| 02/01/2006 | CN1239738C Method and getter devices for use in deposition of thin layers |
| 02/01/2006 | CN1239417C Die assembly for producing optical glass products and manufacturing method thereof |
| 02/01/2006 | CN1239387C Carbon nano transistor array and growth method thereof |
| 02/01/2006 | CN1239225C Method and apparatus for exhaust gas treatment in chemical vapor deposition / chemical gas phase penetration processes |
| 01/31/2006 | US6992270 Wafer bake system and method for operating the same |
| 01/31/2006 | US6992202 Single-source precursors for ternary chalcopyrite materials, and methods of making and using the same |
| 01/31/2006 | US6992200 Copper complexes and process for formation of copper-containing thin films by using the same |
| 01/31/2006 | US6992022 Fabrication method for semiconductor integrated devices |
| 01/31/2006 | US6992019 Methods for forming silicon dioxide layers on substrates using atomic layer deposition |
| 01/31/2006 | US6992011 Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma |
| 01/31/2006 | US6991975 Laser process |
| 01/31/2006 | US6991959 Method of manufacturing silicon carbide film |
| 01/31/2006 | US6991701 Plasma treatment method and apparatus |
| 01/31/2006 | US6991684 Heat-treating apparatus and heat-treating method |
| 01/31/2006 | US6991420 Tool for handling wafers and epitaxial growth station |
| 01/26/2006 | WO2006009686A1 Common rack for electroplating and pvd coating operations |
| 01/26/2006 | WO2006009590A1 Copper (i) compounds useful as deposition precursors of copper thin films |
| 01/26/2006 | WO2006009281A1 Plasma processing device and method, and flat panel display device manufacturing method |