| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/16/2006 | US20060032440 Apparatus and method for depositing a material on a substrate |
| 02/16/2006 | DE102004036063A1 Vorrichtung und Verfahren zur Plasmabeschichtung/Sterilisation Apparatus and method for plasma coating / sterilization |
| 02/16/2006 | DE102004035336A1 Reinraumfähige Beschichtungsanlage Cleanroom Compatible coating plant |
| 02/16/2006 | DE102004035335A1 Reinraumfähige Beschichtungsanlage Cleanroom Compatible coating plant |
| 02/16/2006 | CA2576935A1 Method of making vapour deposited oxygen-scavenging particles |
| 02/15/2006 | EP1626439A1 Method of forming fluorinated carbon film |
| 02/15/2006 | EP1626105A1 Surface-coated cermet cutting tool with hard coating layer having excellent chipping resistance in high-speed intermittent cutting work |
| 02/15/2006 | EP1625243A1 Cvd coating device |
| 02/15/2006 | EP0856070B1 Process for cleaning a vacuum processing chamber including the gas injection port |
| 02/15/2006 | CN2758969Y Flat electrode structure |
| 02/15/2006 | CN1735960A Plasma film forming system |
| 02/15/2006 | CN1735956A Tunable gas distribution plate assembly |
| 02/15/2006 | CN1735711A High rate deposition of titanium dioxide |
| 02/15/2006 | CN1735710A A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 02/15/2006 | CN1735709A Method and apparatus for layer by layer deposition of thin films |
| 02/15/2006 | CN1735708A Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
| 02/15/2006 | CN1735569A Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating |
| 02/15/2006 | CN1734727A Method of fabricating metal silicate layer using atomic layer deposition technique |
| 02/15/2006 | CN1734726A Method and apparatus for forming silicon oxide film |
| 02/15/2006 | CN1734712A Plasma processing apparatus and method |
| 02/15/2006 | CN1734711A Vacuum processing device |
| 02/15/2006 | CN1734710A Semiconductor processing equipment having tiled ceramic liner |
| 02/15/2006 | CN1733968A Thin films and a method for producing the same |
| 02/15/2006 | CN1733967A Precursor compounds for deposition of ceramic and metal films and preparation methods thereof |
| 02/15/2006 | CN1733966A Apparatus for heating substrate and method for controlling temperature of susceptor for heated substrate |
| 02/15/2006 | CN1733444A Method for manufacturing forming die for optical element, forming die for optical element and optical element |
| 02/15/2006 | CN1242656C Device for processing micro wave plasma and control method for processing plasma |
| 02/15/2006 | CN1242399C Tetrahedral amorphous carbon film and preparation method thereof |
| 02/15/2006 | CN1242094C Method for preparing film by liquid phase source atomizing and microwave plasma chemical gaseous deposition |
| 02/15/2006 | CN1242093C Horizontal reactor arrangement for vapor deposition |
| 02/15/2006 | CN1242092C Method for anticorrosion treatment of metal by plasma technique |
| 02/15/2006 | CN1242091C Method for growing epitaxial chip of nitride LED structure by MOCVD |
| 02/15/2006 | CN1242090C Carbon brake disc negative pressure directional flow outward thermal gradient chemical gas phase penetration process |
| 02/15/2006 | CN1241878C Preparation for carbon/carbon composite material solid cylindric workpieces with self-heating method |
| 02/15/2006 | CN1241831C Method for preparing AIN nanowire and its array |
| 02/14/2006 | US6998661 Integrated circuit structure including electrodes with PGO ferroelectric thin film thereon |
| 02/14/2006 | US6998497 Metal bis-triflimide compounds and methods for synthesis of metal bis-triflimide compounds |
| 02/14/2006 | US6998340 Method of manufacturing semiconductor device |
| 02/14/2006 | US6998275 Hydrogen-less CVD TiN process for FeRAM VIA0 barrier application |
| 02/14/2006 | US6998173 Formed by sintering in atmosphere having partial pressure and for part of time a nitrogen partial pressure; no carbon penetration or carbon precipitation in zone of binder enrichment |
| 02/14/2006 | US6998153 Nitriding silicon surface of wafer with nitrogen plasma; overcoating with nickel; annealing |
| 02/14/2006 | US6998152 Vaporization, transportation; using an ionic solvent |
| 02/14/2006 | US6998036 an alkylsulfonic acid surfactant; water soluble tin (II) and silver (I) salts; linear, organic thioether compounds as complexing agents; electrodeposition; oxidation resistance; solder is suitable for high and low current densities; nontoxic |
| 02/14/2006 | US6998034 in which time to deposit a film on a substrate can be prolonged or the degree of freedom to form a laminated film can be enhanced |
| 02/14/2006 | US6998014 Apparatus and method for plasma assisted deposition |
| 02/14/2006 | US6997993 Susceptor supporting construction |
| 02/14/2006 | US6997403 Liquid vaporizer with positive liquid shut-off |
| 02/09/2006 | WO2006015072A2 Closed loop clean gas methods and systems |
| 02/09/2006 | WO2006014612A2 Method of controlling the film properties of a cvd-deposited silicon nitride film |
| 02/09/2006 | WO2006013720A1 Thin film forming method and thin film forming apparatus |
| 02/09/2006 | WO2006012766A2 Adhesion layer for thin film transistors |
| 02/09/2006 | US20060030724 Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof |
| 02/09/2006 | US20060030163 Methods, complexes, and system for forming metal-containing films |
| 02/09/2006 | US20060030148 Formation of a tantalum-nitride layer |
| 02/09/2006 | US20060030088 Shadow frame with cross beam for semiconductor equipment |
| 02/09/2006 | US20060029862 Negative electrode for non-aqueous electrolyte secondary battery, production method thereof and nonaqueous electrolyte secondary battery |
| 02/09/2006 | US20060029831 For turning of steel such as stainless steels; coating a sintered, pretreated body by CVD with innermost layer system of two layers of titanium oxycarbonitride, second layer system of alumina, and outermost layer system of titanium carbonitride, using acetonitrile source; high wear resistance, toughness |
| 02/09/2006 | US20060029830 NbSi-2 base nanocomposite coating and manufacturing method thereof |
| 02/09/2006 | US20060029792 Process for manufacturing self-assembled nanoparticles |
| 02/09/2006 | US20060029757 A laminate containing an electroconductive layer and a transparent inorganic oxide barrier film; improved permselectivity of water vapor and molecular oxygen while retaining a predetermined thickness; food, medicine and electronics packaging materials, light emitting diode display panels |
| 02/09/2006 | US20060029748 Deposition method |
| 02/09/2006 | US20060029747 Elimination of flow and pressure gradients in low utilization processes |
| 02/09/2006 | US20060029746 Plasma arc coating system |
| 02/09/2006 | US20060029745 High throughput ILD fill process for high aspect ratio gap fill |
| 02/09/2006 | US20060029738 Electrodeposition on semiconductors; purging |
| 02/09/2006 | US20060029737 Atomic layer deposition method of forming an oxide comprising layer on a substrate |
| 02/09/2006 | US20060029736 Method to reduce fixed charge in CVD ozone deposited films |
| 02/09/2006 | US20060029735 Oxidation process apparatus and oxidation process |
| 02/09/2006 | US20060029734 Film forming method |
| 02/09/2006 | US20060029733 Non-line-of-sight process for coating complexed shaped structures |
| 02/09/2006 | US20060029732 Vapor deposited functional organic coatings |
| 02/09/2006 | US20060029723 repairing a coated high pressure turbine blade, which has been exposed to engine operation, to restore coated airfoil contour dimensions of the blade, and improve upon the prior bond coat |
| 02/09/2006 | US20060029721 Applying polymer coating to substrate by performing a bake-out cycle with a chemical vapor deposition system and performing a deposition cycle with the chemical vapor deposition system; enhances adherence of the polymeric materials to the surface of the substrate; coating medical equipment, stents |
| 02/09/2006 | US20060027851 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries |
| 02/09/2006 | US20060027836 Semiconductor substrate |
| 02/09/2006 | US20060027326 Semiconductor substrate processing chamber and substrate transfer chamber interfacial structure |
| 02/09/2006 | US20060027171 Wafer boat for reducing wafer warpage |
| 02/09/2006 | US20060027170 Deposition boat and manufacturing method of organic EL display therewith |
| 02/09/2006 | US20060027169 Method and system for substrate temperature profile control |
| 02/09/2006 | US20060027168 Power supply antenna and power supply method |
| 02/09/2006 | US20060027167 Processing apparatus and processing method |
| 02/09/2006 | US20060027166 Substrate Processing Apparatus And Substrate Processing Method Using Such Substrate Processing Apparatus |
| 02/09/2006 | US20060027165 Heated gas box for PECVD applications |
| 02/09/2006 | DE10232206B4 Sprühvorrichtung für eine Wafer-Behandlungsvorrichtung mit einer Zwischenraum-Steuervorrichtung Spray device for a wafer processing apparatus having a gap-control device |
| 02/09/2006 | DE102004034448A1 Measurement of layer thickness of a coating on a substrate useful in semiconductor production involves preparing composition of first material containing two substrates and depositing layers of second and third materials on first substrate |
| 02/09/2006 | DE102004034417A1 Beschichtetes Substrat mit gewölbter Oberfläche und Verfahren zur Herstellung eines solchen beschichteten Substrats A coated substrate with a curved surface and methods for producing such coated substrate |
| 02/08/2006 | EP1624494A1 Transparent conductive substrate for solar battery and method for producing same |
| 02/08/2006 | EP1623455A1 Ozone post-deposition treatment to remove carbon in a flowable oxide film |
| 02/08/2006 | EP1623454A2 Reactor surface passivation through chemical deactivation |
| 02/08/2006 | EP1374984B1 Titanium alloy vacuum container and vacuum part |
| 02/08/2006 | EP1055012B1 Plasma processes for depositing low dielectric constant films |
| 02/08/2006 | CN2756644Y Intercommunication type multiple reaction room high temperature organic metal chemical gas phase depositing device |
| 02/08/2006 | CN2756643Y Gas filter |
| 02/08/2006 | CN2756321Y Nozzle structure for producing zine celenide |
| 02/08/2006 | CN1732288A A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 02/08/2006 | CN1732287A Method for forming tungsten nitride film |
| 02/08/2006 | CN1732286A Deposition processes using group 8 (VIII) metallocene precursors |
| 02/08/2006 | CN1732285A Protective shield and system for gas distribution |
| 02/08/2006 | CN1732284A Vacuum deposition apparatus and method of producing vapor-deposited film |
| 02/08/2006 | CN1732283A Method for preparing coated wire |