| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/07/2006 | US7007933 Method and apparatus for supplying a source gas |
| 03/02/2006 | WO2006023894A2 Semiconductor processing components and semiconductor processing utilizing same |
| 03/02/2006 | WO2006023437A2 Sioc:h coated substrates and methods for their preparation |
| 03/02/2006 | WO2006022997A2 Method and system for substrate temperature profile control |
| 03/02/2006 | WO2006022905A2 Discharge-enhanced atmospheric pressure chemical vapor deposition |
| 03/02/2006 | WO2006022860A2 A chemical vapor deposition (cvd) apparatus usable in the manufacture of superconducting conductors |
| 03/02/2006 | WO2006022779A1 Plasma coating system for coating of substrates |
| 03/02/2006 | WO2006022778A2 Plasma arc coating system |
| 03/02/2006 | WO2006022423A1 Germanium-adding source for compound semiconductor, production method of compound semiconductor using the same and compound semiconductor |
| 03/02/2006 | WO2006022328A1 Film forming equipment and film forming method |
| 03/02/2006 | WO2006022282A1 Silicon carbide single crystal wafer and method for manufacturing the same |
| 03/02/2006 | WO2006022179A1 Cluster-free amorphous silicon film, process for producing the same and apparatus therefor |
| 03/02/2006 | WO2006022128A1 Quartz jig and semiconductor manufacturing equipment |
| 03/02/2006 | WO2006021670A2 Device for introducing precursors into an enclosure, in a pulsed mode with measurement and control of the flow rate |
| 03/02/2006 | WO2006021275A1 Wear-resistant coating and method for producing the same |
| 03/02/2006 | WO2005071739A3 Plasma-excited chemical vapor deposition method, silicon/oxygen/nitrogen-containing material and layered assembly |
| 03/02/2006 | WO2005064649A3 Exhaust conditioning system for semiconductor reactor |
| 03/02/2006 | WO2005050705A3 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 03/02/2006 | US20060046511 Porous substrate and its manufacturing method, and gan semiconductor multilayer substrate and its manufacturing method |
| 03/02/2006 | US20060046479 Adhesion improvement for low k dielectrics to conductive materials |
| 03/02/2006 | US20060046412 Method and system for sequential processing in a two-compartment chamber |
| 03/02/2006 | US20060046325 Group III nitride semiconductor substrate and its manufacturing method |
| 03/02/2006 | US20060046100 Cutting tool insert |
| 03/02/2006 | US20060046026 Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it |
| 03/02/2006 | US20060045987 Localized plasma processing |
| 03/02/2006 | US20060045972 Apparatus and method for coating photoresist |
| 03/02/2006 | US20060045970 ALD thin film deposition apparatus and thin film deposition method using same |
| 03/02/2006 | US20060045969 Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device |
| 03/02/2006 | US20060045968 Atomic layer deposition of high quality high-k transition metal and rare earth oxides |
| 03/02/2006 | US20060045958 Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel |
| 03/02/2006 | US20060043882 Method and apparatus for providing a substrate coating having predetermined resistivity, and uses therefor |
| 03/02/2006 | US20060042547 Portable microwave plasma discharge unit |
| 03/02/2006 | US20060042546 Plasma processing apparatus and controlling method therefor |
| 03/02/2006 | US20060042545 Plasma treatment apparatus, method of producing reaction vessel for plasma generation, and plasma treatment method |
| 03/02/2006 | US20060042544 Film formation apparatus and method of using the same |
| 03/02/2006 | US20060042462 Method of recycling fluorine using an adsorption purification process |
| 03/02/2006 | DE102005015517A1 Verarbeitungskammer mit einem Reflektor Processing chamber with a reflector |
| 03/02/2006 | DE102004062246A1 Verfahren zur effizienten Herstellung von Methyltrioxorhenium(VII) (MTO) und Organorhenium(VII)-oxiden A process for the efficient production of methyltrioxorhenium (VII) (MTO) and organorhenium (VII) oxide |
| 03/02/2006 | DE102004041235A1 Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben Wear-resistant coating and method of producing same |
| 03/02/2006 | DE102004041234A1 Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben Wear-resistant coating and method of producing same |
| 03/02/2006 | DE102004004177B4 Verfahren zur Herstellung dünner Schichten sowie dessen Verwendung A process for the production of thin layers and the use thereof |
| 03/02/2006 | CA2577307A1 Atmospheric pressure chemical vapor deposition |
| 03/01/2006 | EP1630859A1 Vaporizer and semiconductor processing apparatus |
| 03/01/2006 | EP1630848A1 Process and apparatus for plasma coating of workpieces with spectral evaluation of process parameters |
| 03/01/2006 | EP1630261A2 Substrate holder for a vapour deposition system |
| 03/01/2006 | EP1630260A2 Magnetic latch for a vapour deposition system |
| 03/01/2006 | EP1630256A1 Non-stick masking fixtures and methods of preparing same |
| 03/01/2006 | EP1630250A1 Chemical vapor deposition film formed by plasma cvd process and method for forming same |
| 03/01/2006 | EP1630249A2 Process for chemical vapor deposition of silicon nitride. |
| 03/01/2006 | EP1629543A1 Barrier films for plastic substrates fabricated by atomic layer deposition |
| 03/01/2006 | EP1629527A2 Adjustable gas distribution system |
| 03/01/2006 | EP1629522A2 Gas distribution system |
| 03/01/2006 | EP1629517A1 Device for area-based surface treatment of an article by electric dielectric barrier discharge |
| 03/01/2006 | EP1628807A2 Substrate handling system |
| 03/01/2006 | EP1507975B1 Methods of handling wind turbine blades and mounting said blades on a wind turbine, system and gripping unit for handling a wind turbine blade |
| 03/01/2006 | EP1473606A9 Safety network system, safety slave, and communication method |
| 03/01/2006 | EP1044074A4 Photoresist coating process control with solent vapor sensor |
| 03/01/2006 | CN1742522A Plasma processor and plasma processing method |
| 03/01/2006 | CN1742361A Heater of chemical vapor deposition apparatus for manufacturing a thin film |
| 03/01/2006 | CN1742360A Method of polycyrstallization, method of manufacturing polysilicon thin film transistor, and laser irradiation device therefor |
| 03/01/2006 | CN1742113A Vacuum processing apparatus |
| 03/01/2006 | CN1742112A Aluminum phosphate coatings |
| 03/01/2006 | CN1740387A Semiconductor manufacturing system |
| 03/01/2006 | CN1740386A Semiconductor or liquid crystal producing device |
| 03/01/2006 | CN1740385A Semiconductor or liquid crystal producing device |
| 03/01/2006 | CN1740384A Superhigh vacuum chemical vapor deposition epitoxy system with rotary lining |
| 03/01/2006 | CN1740383A Tangsten plating process for the surface of SiC ceramic grain |
| 03/01/2006 | CN1740382A Chemical copper plating process for the surface of SiC ceramic grain |
| 03/01/2006 | CN1739923A Openable chip accessing manipulator for high vacuum chemical vapor deposition and epitaxial system |
| 03/01/2006 | CN1244140C Method of forming a dielectric film on a semiconductor substrate |
| 03/01/2006 | CN1243855C Single crystal diamond prepared by CVD |
| 03/01/2006 | CN1243847C Plasma CVD apparatus |
| 03/01/2006 | CN1243846C Liquid distribution unit for dividing liquid current into plurality of partial currents |
| 03/01/2006 | CN1243845C Process for manufacturing vacuum vapour-phase deposition composite material wire and metal wire made from it |
| 02/28/2006 | US7005724 Semiconductor device and a method of manufacture therefor |
| 02/28/2006 | US7005601 Thermal flux processing by scanning |
| 02/28/2006 | US7005427 Containing silicon dioxide particles whose surface is positively charged; used for producing a film in a solution casting method; reduce the aggregation of solid materials during filtration prior to casting |
| 02/28/2006 | US7005392 Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same |
| 02/28/2006 | US7005391 Method of manufacturing inorganic nanotube |
| 02/28/2006 | US7005389 Methods for forming a thin film on an integrated circuit device by sequentially providing energies to activate the reactants |
| 02/28/2006 | US7005372 Deposition of tungsten nitride |
| 02/28/2006 | US7005303 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices |
| 02/28/2006 | US7005177 Hard-faced friction mating member |
| 02/28/2006 | US7005160 Methods for depositing polycrystalline films with engineered grain structures |
| 02/28/2006 | US7005055 Copper electrolytic solution containing amine compound having specific skeleton and organosulfur compound as additives, and electrolytic copper foil produced using the same |
| 02/28/2006 | US7005032 Wafer table for local dry etching apparatus |
| 02/28/2006 | US7004108 Apparatus for fixing an electrode in plasma polymerizing apparatus |
| 02/28/2006 | US7004107 Method and apparatus for monitoring and adjusting chamber impedance |
| 02/23/2006 | WO2006020659A2 Method of cryogenically coating a device |
| 02/23/2006 | WO2006020424A2 Multi-gas distribution injector for chemical vapor deposition reactors |
| 02/23/2006 | WO2006020409A2 Apparatus and method for depositing a material on a substrate |
| 02/23/2006 | WO2006020308A2 Vapor deposited functional organic coatings |
| 02/23/2006 | WO2006020188A1 Nanostructured coatings and related methods |
| 02/23/2006 | WO2006020006A1 Shadow frame with mask panels |
| 02/23/2006 | WO2006019177A1 Magnetic recording media and production method therefor |
| 02/23/2006 | WO2006019176A1 Magnetic recording medium and production process thereof |
| 02/23/2006 | WO2006019083A1 Gas barrier multilayer film and method for producing same |
| 02/23/2006 | WO2006018101A1 Method for production of reactors for the decomposition of gases |
| 02/23/2006 | WO2005083146A3 Vaporizing temperature sensitive materials for oled |
| 02/23/2006 | WO2005068682A3 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition |