| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/23/2006 | US20060062920 Delivering particulate material to a vaporization zone |
| 03/23/2006 | US20060062919 Delivering organic powder to a vaporization zone |
| 03/23/2006 | US20060062918 Providing electrode over substrate;forming aorganic layer over electrode by: roviding first particulate organic material in first feeding path; mechanically transferring material consisting of the first particulate organic material to a first vaporization zone using an auger structure, forming electrde |
| 03/23/2006 | US20060062917 Vapor deposition of hafnium silicate materials with tris(dimethylamino)silane |
| 03/23/2006 | US20060062916 Atomic layer deposition apparatus and method |
| 03/23/2006 | US20060062915 Delivering particulate material to a vaporization zone |
| 03/23/2006 | US20060062914 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/23/2006 | US20060062913 Process for depositing btbas-based silicon nitride films |
| 03/23/2006 | US20060062912 Bond coat for a thermal barrier coating system and related method thereof |
| 03/23/2006 | US20060062910 Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof |
| 03/23/2006 | US20060062901 Fabrication method of front substrate of plasma display, evaporation process and evaporation apparatus |
| 03/23/2006 | US20060062900 simultaneously processing multiple portions of at least one substrate or portions of multiple substrates |
| 03/23/2006 | US20060062708 Reducing the level of silane, phosphine, germane, and/or arsine in a substrate (e.g., semiconductor) process chamber by reacting the hydride with hydrogen peroxide and optionally a carrier gas; the chamber may subsequently be purged |
| 03/23/2006 | US20060060559 Thin film forming method and system |
| 03/23/2006 | US20060060303 Plasma processing system and method |
| 03/23/2006 | US20060060302 RF grounding of cathode in process chamber |
| 03/23/2006 | US20060060146 Semiconductor manufacturing apparatus and methods |
| 03/23/2006 | US20060060145 Susceptor with surface roughness for high temperature substrate processing |
| 03/23/2006 | US20060060144 Substrate processing apparatus and method using the same |
| 03/23/2006 | US20060060143 Method and apparatus for forming a thin layer |
| 03/23/2006 | US20060060142 Substrate processing apparatus |
| 03/23/2006 | US20060060141 Process gas introducing mechanism and plasma processing device |
| 03/23/2006 | US20060060140 Apparatus for treating thin film and method of treating thin film |
| 03/23/2006 | US20060060139 Precursor gas delivery with carrier gas mixing |
| 03/23/2006 | US20060060138 Diffuser gravity support |
| 03/23/2006 | US20060060137 Deposition of TiN films in a batch reactor |
| 03/23/2006 | DE102005035443A1 Preparation of binding materials, useful for sealing electrical/electronic parts, comprises flame pyrolytic separation of silicon dioxide layer on a substrate; applying hardenable silicon composition over addition reaction; and hardening |
| 03/23/2006 | DE102004045321A1 Normal pressure chemical vapor deposition process for producing photoactive coatings uses gas mixture containing precursor which is sprayed at speed such that gap between mixing in precursor and striking substrate is below 0.01 seconds |
| 03/23/2006 | DE102004043384A1 Coated plastic substrate manufacture, in particular PET container with barrier coating, involves stretching substrate in specific temperature range to give irreversible plastic deformation before plasma coating stage |
| 03/23/2006 | DE102004042407A1 Schichtverbund mit kubischen Bornitrid Layer composite with cubic boron nitride |
| 03/23/2006 | DE102004036170A1 Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung Vacuum coating system and method for vacuum coating |
| 03/23/2006 | DE10123858B4 Atomschicht-Abscheidungsverfahren zur Bildung einer Siliciumnitrid-haltigen Dünnschicht Atomic layer deposition method of forming a silicon nitride thin film containing |
| 03/23/2006 | CA2579212A1 Cutting tool with oxide coating |
| 03/23/2006 | CA2553122A1 Plasma enhanced chemical vapor deposition apparatus and method |
| 03/22/2006 | EP1638139A1 Plasma processing device |
| 03/22/2006 | EP1637626A2 Method to protect internal components of semiconductor processing equipment |
| 03/22/2006 | EP1637624A1 Thin film forming device and thin film forming method |
| 03/22/2006 | EP1636832A1 A method of fault detection in manufacturing equipment |
| 03/22/2006 | EP1636400A1 Method and apparatus for generating a precursor for a semiconductor processing system |
| 03/22/2006 | EP1636399A1 Coating for a mechanical part, comprising at least one hydrogenated amorphous carbon, and method of depositing one such coating |
| 03/22/2006 | EP1635962A1 Cleaning a component of a process chamber |
| 03/22/2006 | EP1294959B8 Method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and a multi-functional multi-ply layer produced according to said method |
| 03/22/2006 | CN1751385A Organic thin-film transistor device and method for manufacturing same |
| 03/22/2006 | CN1751384A Plasma process device |
| 03/22/2006 | CN1751380A Carburetor, method of vaporizing material solution, and method of washing carburetor |
| 03/22/2006 | CN1751138A Gas gate for isolating regions of differing gaseous pressure |
| 03/22/2006 | CN1751135A Foodware with multilayer stick resistant ceramic coating and method of making |
| 03/22/2006 | CN1749545A Member for internal combustion engine and production method thereof |
| 03/22/2006 | CN1749430A Pecvd susceptor support construction |
| 03/22/2006 | CN1748917A Surface-coated cermet cutting tool |
| 03/22/2006 | CN1246887C Plasma processing device and semiconductor mfg. device |
| 03/22/2006 | CN1246508C Metal organic compound vapor deposition device for the growth of zinc oxide semiconductor film |
| 03/22/2006 | CN1246241C Method for producing optical fiber prefabricated member with reduced outside diameter variation |
| 03/21/2006 | USRE39020 Plasma process apparatus |
| 03/21/2006 | US7015646 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field |
| 03/21/2006 | US7015640 An organic electroluminescent devices having a flexible, radiation-transparent substrate coated with a protective coating of an inorganic and an organic material of varing thickness to resist diffusion of moisture and oxygen; comprises an electrode pair and a sandwiched organic light-emitting layer |
| 03/21/2006 | US7015426 Purged heater-susceptor for an ALD/CVD reactor |
| 03/21/2006 | US7015422 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
| 03/21/2006 | US7015168 Low dielectric constant fluorine and carbon-containing silicon oxide dielectric material characterized by improved resistance to oxidation |
| 03/21/2006 | US7015152 Providing an aluminum alkoxide precursor that is dissolved, emulsified or suspended in a liquid; providing a vapor generated from the aluminum alkoxide precursor; depositing an aluminum oxide film from vaporized precursor on a substrate |
| 03/21/2006 | US7015138 Multi-layered barrier metal thin films for Cu interconnect by ALCVD |
| 03/21/2006 | US7014710 Method of growing single crystal Gallium Nitride on silicon substrate |
| 03/21/2006 | US7013834 Plasma treatment system |
| 03/16/2006 | WO2006028941A2 Fretting wear protection for spline couplings |
| 03/16/2006 | WO2006028844A1 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors |
| 03/16/2006 | WO2006028573A2 Deposition of ruthenium and/or ruthenium oxide films |
| 03/16/2006 | WO2006028568A1 Soft de-chucking sequence |
| 03/16/2006 | WO2006028282A1 Nanoimprint mold, method of forming a nanopattern, and a resin-molded product |
| 03/16/2006 | WO2006027381A2 Titanium oxide based hybrid material, respective preparation process and uses |
| 03/16/2006 | WO2005093116A3 Replacing chamber components in a vacuum environment |
| 03/16/2006 | WO2005053828A3 Systems and methods for manufacture of carbon nanotubes |
| 03/16/2006 | WO2005031233A3 Thermal processing system with cross-flow liner |
| 03/16/2006 | US20060058444 Particulate metal oxide |
| 03/16/2006 | US20060057843 Methods and apparatus for forming barrier layers in high aspect ratio vias |
| 03/16/2006 | US20060057826 System and method for suppression of wafer temperature drift in cold-wall cvd systems |
| 03/16/2006 | US20060057824 Apparatus for producing nitride semiconductor, method for producing nitride semiconductor, and semiconductor laser device obtained by the method |
| 03/16/2006 | US20060057800 Methods for treating pluralities of discrete semiconductor substrates |
| 03/16/2006 | US20060057799 Substrate processing apparatus |
| 03/16/2006 | US20060057406 Thermal barrier coating with modulated grain structure and method therefor |
| 03/16/2006 | US20060057404 Laminating a plurality of unit layers, consisting of Zn, Bi or Sn single metal layer or alloy layer, by vapor deposition, plating; solder junction connects a semiconductor device; lead-free, uniformity as melting point, thickness |
| 03/16/2006 | US20060057384 Methods for the fabrication of gold-covered magnetic nanoparticles |
| 03/16/2006 | US20060057360 Nanostructures formed of branched nanowhiskers and methods of producing the same |
| 03/16/2006 | US20060057304 Biased pulse DC reactive sputtering of oxide films |
| 03/16/2006 | US20060057299 Chemical processing system and method |
| 03/16/2006 | US20060057287 Method of making chemical vapor composites |
| 03/16/2006 | US20060055004 Low K and ultra low K SiCOH dielectric films and methods to form the same |
| 03/16/2006 | US20060054989 Semiconductor devices having multilayer isolation structures and methods of forming semiconductor devices having multilayer isolation structures |
| 03/16/2006 | US20060054888 Semiconductor device and method for manufacturing semiconductor device |
| 03/16/2006 | US20060054593 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus |
| 03/16/2006 | US20060054493 Method for the production of a substrate and unit for the same |
| 03/16/2006 | US20060054491 Perpendicular deposition of carbon nanotubes from a pure aliphatic hydrocarbon plasma or mixture with an aromatic hydrocarbon on a substrate without excessively increasing the temperature of the substrate |
| 03/16/2006 | US20060054280 Apparatus of manufacturing display substrate and showerhead assembly equipped therein |
| 03/16/2006 | US20060054278 Plasma processing apparatus |
| 03/16/2006 | US20060054091 Support system for a treatment apparatus |
| 03/16/2006 | US20060054090 PECVD susceptor support construction |
| 03/16/2006 | US20060054089 Source for thermal physical vapor deposition of organic electroluminescent layers |
| 03/16/2006 | US20060054088 Vapor phase epitaxial growth apparatus and semiconductor wafer production method |
| 03/16/2006 | US20060054087 Process chamber for manufacturing seminconductor devices |
| 03/16/2006 | US20060054039 Process of and apparratus for three-dimensional printing |
| 03/16/2006 | DE19521344C5 Verwendung von Plasmapolymer-Hartstoff-Schichtenfolgen als Funktionsschichten in Stofftransport - oder Wärmetauschersystemen Use of plasma polymer-hard material layer sequences as functional layers in sediment transport - or heat exchanger systems |