| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 03/16/2006 | DE10201992B4 Vorrichtung zur plasmagestützten Bearbeitung von Oberflächen planarer Substrate Apparatus for plasma-assisted processing of surfaces of planar substrates |
| 03/16/2006 | DE102005026606A1 Coating a container inner surface, e.g. for a motor coolant with antifreeze, evacuates the interior to be filled with a process gas to be ionized and ignited by a high frequency magnetic field and form a film deposit |
| 03/16/2006 | DE102004056170A1 Vorrichtung und Verfahren zur chemischen Gasphasenabscheidung mit hohem Durchsatz Apparatus and method for chemical vapor deposition with a high throughput |
| 03/16/2006 | DE102004042431A1 Verfahren zur Plasmabeschichtung von Werkstücken mit spektraler Auswertung der Prozeßparameter Process for the plasma coating of workpieces with spectral analysis of the process parameters |
| 03/16/2006 | CA2579950A1 Titanium oxide based hybrid material, respective preparation process and uses |
| 03/15/2006 | EP1634977A1 Process for inhibiting the formation of a secondary reaction zone (SRZ) and coating system therefor |
| 03/15/2006 | EP1634314A2 Vuv-excited device with blue-emitting phosphor |
| 03/15/2006 | EP1633904A2 Methods for forming aluminum containing films utilizing amino aluminum precursors |
| 03/15/2006 | EP1633903A2 Hydrophilic dlc on substrate with oxygen and/or hot water treatment |
| 03/15/2006 | EP1507723B1 Method and device for handling workpieces |
| 03/15/2006 | EP1305161A4 Electronic and optical materials |
| 03/15/2006 | EP1284806A4 Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
| 03/15/2006 | EP0420950B2 Coated glass articles |
| 03/15/2006 | CN1748043A Method of forming a ta2o5 comprising layer |
| 03/15/2006 | CN1747263A Surface-emitting type semiconductor laser |
| 03/15/2006 | CN1747133A Method and apparatus for controlling the volume of a plasma |
| 03/15/2006 | CN1747132A Plasma processing apparatus |
| 03/15/2006 | CN1245747C Substrate support member for use in FPP manufacturing apparatus |
| 03/15/2006 | CN1245347C Method for imparting hydrophilicity to substrate |
| 03/14/2006 | US7012294 Semiconductor constructions |
| 03/14/2006 | US7012150 mixing the cyclopentadiene and zinc powder in the alcohol solvent and thereafter adding the ruthenium chloride portionwise while holding the temperature of the system from -70 to 20 degree C. |
| 03/14/2006 | US7012030 Very low dielectric constant plasma-enhanced CVD films |
| 03/14/2006 | US7012001 Method for manufacturing a semiconductor device for use in a memory cell that includes forming a composite layer of tantalum oxide and titanium oxide over a bottom capacitor electrode |
| 03/14/2006 | US7011978 Methods of forming capacitor constructions comprising perovskite-type dielectric materials with different amount of crystallinity regions |
| 03/14/2006 | US7011890 Modulated/composited CVD low-k films with improved mechanical and electrical properties for nanoelectronic devices |
| 03/14/2006 | US7011877 Method for treating an optical disc layer to improve adhesion properties |
| 03/14/2006 | US7011868 Low dielectrics; elastic modulus; integrated circuits |
| 03/14/2006 | US7011867 α-alumina coated cutting tool |
| 03/14/2006 | US7011866 contacting hydrogen carrier gases and silane gases with heated catalysts and electric fields not higher than glow discharge voltage, to provide kinetic energy and carry vapor growth film on substrates; chemical vapor deposition; quality thin films |
| 03/14/2006 | US7011733 Method and apparatus for depositing films |
| 03/14/2006 | US7011712 Fixing structures and supporting structures of ceramic susceptors, and supporting members thereof |
| 03/14/2006 | US7011711 Chemical vapor deposition reactor |
| 03/14/2006 | US7011710 Concentration profile on demand gas delivery system (individual divert delivery system) |
| 03/14/2006 | US7011707 Production method for semiconductor substrate and semiconductor element |
| 03/14/2006 | US7011697 Electroless gold plating solution |
| 03/14/2006 | US7011614 Infrared thermopile detector system for semiconductor process monitoring and control |
| 03/14/2006 | US7011299 Liquid vapor delivery system and method of maintaining a constant level of fluid therein |
| 03/14/2006 | US7011134 Casting method for producing surface acoustic wave devices |
| 03/14/2006 | CA2249394C Barrier films having vapor coated evoh surfaces |
| 03/09/2006 | WO2006026716A1 Atomic layer deposited titanium aluminum oxide films |
| 03/09/2006 | WO2006026370A2 Method to reduce plasma damage during cleaning of semiconductor wafer processing chamber |
| 03/09/2006 | WO2006026091A1 Deposition of hard-mask with minimized hillocks and bubbles |
| 03/09/2006 | WO2006025515A1 RAW MATERIAL LIQUID FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND METHOD FOR PRODUCING Hf-Si CONTAINING COMPLEX OXIDE FILM USING SUCH RAW MATERIAL LIQUID |
| 03/09/2006 | WO2006025356A1 Gas barrier multilayer body and method for producing same |
| 03/09/2006 | WO2006024808A2 Method for transferring a functional organic molecule onto a transparent substrate |
| 03/09/2006 | WO2006024572A1 Cleaning process and operating process for a cvd reactor |
| 03/09/2006 | WO2006024386A2 Layered composite comprising cubic boron nitride |
| 03/09/2006 | US20060051972 Hybrid dielectric film |
| 03/09/2006 | US20060051971 Composite dielectric forming methods and composite dielectrics |
| 03/09/2006 | US20060051963 Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices |
| 03/09/2006 | US20060051950 Apparatus and a method for forming an alloy layer over a substrate |
| 03/09/2006 | US20060051940 Deposition from liquid sources |
| 03/09/2006 | US20060051602 Coating structure and method |
| 03/09/2006 | US20060051601 Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element |
| 03/09/2006 | US20060051572 Packaging material |
| 03/09/2006 | US20060051539 Dlc film coated plastic container, and device and method for manufacturing the plastic container |
| 03/09/2006 | US20060051522 Method of pulsed laser assisted surface modification |
| 03/09/2006 | US20060051520 Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters |
| 03/09/2006 | US20060051508 Focused ion beam deposition |
| 03/09/2006 | US20060051507 Electronic device manufacturing chamber and methods of forming the same |
| 03/09/2006 | US20060051506 Nitridation of high-k dielectrics |
| 03/09/2006 | US20060051495 Device and method for the evaporative deposition of a coating material |
| 03/09/2006 | US20060049138 Plasma generation device, plasma control method, and substrate manufacturing method |
| 03/09/2006 | US20060049136 Metal film production apparatus and metal film production method |
| 03/09/2006 | US20060048893 Atmospheric pressure plasma processing reactor |
| 03/09/2006 | US20060048711 Systems and methods of forming tantalum silicide layers |
| 03/09/2006 | US20060048710 Substrate processing apparatus |
| 03/09/2006 | US20060048709 Plasma processing apparatus |
| 03/09/2006 | US20060048708 Coater having interrupted conveyor system |
| 03/09/2006 | US20060048707 Anti-clogging nozzle for semiconductor processing |
| 03/09/2006 | US20060048706 Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device by using the same |
| 03/09/2006 | US20060048603 Composite metal product and method for the manufacturing of such a product |
| 03/09/2006 | DE112004000587T5 Winkeltreue Beschichtungen für mikrooptische Elemente Conformal coatings for micro-optical elements |
| 03/09/2006 | DE10358909B4 Plasma-CVD-Vorrichtung sowie Beschichtungsverfahren und Verfahren zur Herstellung eines Halbleiterbauteils unter Verwendung derselben Plasma CVD coating method and apparatus as well as method of manufacturing a semiconductor device using the same |
| 03/09/2006 | DE10357756B4 Verfahren zur Herstellung von Metall-Oxynitriden durch ALD-Prozesse unter Verwendung von NO und/oder N2O A process for the production of metal oxynitrides by ALD processes using NO and / or N2O |
| 03/08/2006 | EP1632590A2 Thick single crystal diamond layer method for making it and gemstones produced from the layer |
| 03/08/2006 | EP1632280A2 Plasma treated porous materials |
| 03/08/2006 | EP1631703A1 Electromagnetic rotation of platter |
| 03/08/2006 | EP1631697A1 Electrochemical method for the direct nanostructured deposition of material onto a substrate, and semiconductor component produced according to said method |
| 03/08/2006 | EP1631696A2 A method to encapsulate phosphor via chemical vapor deposition |
| 03/08/2006 | EP1631536A1 Method for preparation of alpha, beta-unsaturated cyclic ketones by dehydrogenation of secondary allylic cyclic alcohols |
| 03/08/2006 | EP1307606B1 Barrier coating |
| 03/08/2006 | EP1300878B1 Device for plasma processing |
| 03/08/2006 | CN1745453A Method and apparatus for plasma treatment of surface in vacuum |
| 03/08/2006 | CN1745158A Controlled sulfur species deposition process |
| 03/08/2006 | CN1744279A Method and device for preparing p-type zinc oxide crystal film by doping phosphorus |
| 03/08/2006 | CN1743501A Method and apparatus for dechucking a substrate |
| 03/08/2006 | CN1743500A Method for forming tungsten nitride film |
| 03/08/2006 | CN1743499A Method for preparing anti-high temperature oxidation mixed coating by electrophoretic codeposition |
| 03/08/2006 | CN1244716C Method for forming silicon containing film by using tri(dimethylamino) silicane atomic shell deposition |
| 03/08/2006 | CN1244714C Method and installation for densification of substrates by means of chemical gas phase infiltration |
| 03/08/2006 | CN1244491C Carbon nano tube array structure and its preparing method |
| 03/08/2006 | CN1244407C Cleanable manifold for low steam pressure chemical article container |
| 03/07/2006 | US7009487 Fabrication of nano-scale temperature sensors and heaters |
| 03/07/2006 | US7009298 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/07/2006 | US7008879 Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |
| 03/07/2006 | US7008801 Method of forming ferroelectric thin films on a high-k layer |
| 03/07/2006 | US7008672 Method of manufacturing a diamond composite and a composite produced by same |
| 03/07/2006 | US7008669 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element |
| 03/07/2006 | US7008484 Method and apparatus for deposition of low dielectric constant materials |