Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2006
04/04/2006US7021881 Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
04/04/2006US7020981 comprises two reaction chambers, inlets and exhaust lines and a flow control system configured to alternately constrict flow through the first and second exhausts; diffusion barrier forms between first inlet and the substrate; atomic layer deposition
03/2006
03/30/2006WO2006033731A2 Atomic layer deposition of copper using surface-activating agents
03/30/2006WO2006033268A1 Transparent conductive film
03/30/2006WO2006033166A1 Organic el light emitting element, manufacturing method thereof and display
03/30/2006WO2006032963A2 Methods for producing noble metal films, noble metal oxide films, and noble metal silicide films
03/30/2006WO2006032480A1 Machining tool and method for the production thereof
03/30/2006US20060068992 Method for growing thin oxide films
03/30/2006US20060068598 Film formation apparatus and method of using the same
03/30/2006US20060068173 Methods for forming and patterning of metallic films
03/30/2006US20060068126 Method for making an aligned carbon nanotube
03/30/2006US20060068107 Surface and composition enhancements to high aspect ratio C-MEMS
03/30/2006US20060068106 Methods for coating gemstones and other decorative objects
03/30/2006US20060068105 Film forming method and film forming apparatus
03/30/2006US20060068104 Thin-film formation in semiconductor device fabrication process and film deposition apparatus
03/30/2006US20060068103 Film forming method
03/30/2006US20060068101 Film forming method
03/30/2006US20060068100 Film forming method
03/30/2006US20060068099 Grading PrxCa1-xMnO3 thin films by metalorganic chemical vapor deposition
03/30/2006US20060068098 Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
03/30/2006US20060068097 Passivation on metal layer with exposure to oxygen and process with rhenium carbonyl precursor
03/30/2006US20060068096 Method of synthesising carbon nano tubes
03/30/2006US20060068081 Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program
03/30/2006US20060068080 Combinatorial discovery of nanomaterials
03/30/2006US20060065635 Deposition chamber surface enhancement and resulting deposition chambers
03/30/2006US20060065368 Gas delivery device for improved deposition of dielectric material
03/30/2006US20060065289 Method of cleaning a film-forming apparatus and film-forming apparatus
03/30/2006US20060065197 Vapor deposition apparatus
03/30/2006US20060065196 Susceptor
03/30/2006US20060065195 Microwave plasma generating device
03/30/2006US20060065194 Diffuser and semiconductor device manufacturing equipment having the same
03/30/2006DE102004046287A1 Automotive headlamp installation frame has multi-layered structure incorporating metalized intermediate layer on plastic
03/30/2006CA2580814A1 Apparatus and process for surface treatment of substrate using an activated reactive gas
03/29/2006EP1641031A2 Deposition of TiN films in a batch reactor
03/29/2006EP1640481A1 rotatable substrate holder
03/29/2006EP1640479A1 Conductive diamond electrode and process for producing the same
03/29/2006EP1640475A2 Precursor compounds for deposition of ceramic and metal films and preparation methods thereof
03/29/2006EP1640474A1 Thin film forming device and thin film forming method
03/29/2006EP1639150A2 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
03/29/2006EP1638701A2 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape
03/29/2006EP1638700A2 Ultraviolet (uv) and plasma assisted metalorganic chemical vapor deposition (mocvd) system
03/29/2006EP1432843B1 Method for making carbon doped oxide film
03/29/2006EP1404903B1 Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamber
03/29/2006EP1205964B1 Plasma process device, electrode structure thereof, and stage structure
03/29/2006EP1153157B1 Thermal barrier coating resistant to sintering
03/29/2006EP0953204B1 Capacitively coupled rf-plasma reactor and method for manufacturing workpieces
03/29/2006CN1754252A Method for producing hydrogenated silicon oxycarbide films
03/29/2006CN1754251A Method of improving interlayer adhesion
03/29/2006CN1754008A Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
03/29/2006CN1754007A Method for depositing silicon
03/29/2006CN1753730A Catalyst structure particularly for the production of field emission flat screens
03/29/2006CN1753720A Method and system for supplying high purity fluid
03/29/2006CN1753152A High density electro thick fluid chemical gaseous phase sedimentation process and method of improving film thickness unifomity
03/29/2006CN1752282A Annealing technique for eliminating titanium nitride film stress and decreasing film resistance
03/29/2006CN1752281A RF grounding of cathode in process chamber
03/29/2006CN1752280A System for CD glow plasma CVD zin oxide film and preparing process
03/29/2006CN1752279A Apparatus for treating thin film and method of treating thin film
03/29/2006CN1752278A Method for mfg. diamond coating on spherical substrate and device thereof
03/29/2006CN1752277A System for continuous batch preparing diamond film
03/29/2006CN1248549C Induction coupling plasma generating equipment containing zigzag coil antenna
03/29/2006CN1248289C Inductive coupling type plasma device
03/29/2006CN1247813C Film including several components and its forming process
03/29/2006CN1247423C Distributed control method for transported material motion in material transport system
03/29/2006CN1247323C Material liquid supply apparatus having a cleaning function and method for detaching material container thereof
03/28/2006US7020173 Surface emitting semiconductor laser and method of fabricating the same
03/28/2006US7019399 Copper diffusion barriers made of diamond-like nanocomposits doped with metals
03/28/2006US7019263 Substrate heating apparatus and multi-chamber substrate processing system
03/28/2006US7019253 includes chamber and coil system for converting field-generating current into radio frequency magnetic field in the chamber containing ionized gas which reacts with the magnetic plasma
03/28/2006US7019159 Reacting hexachlorodisilane in an organic solvent with >6-fold moles of monohydrocarbylamine (C1-4 hydrocarbyl group); chemical vapor deposition of the disilane and oxygen gas to form silicon oxynitrides as dielectric films for semiconductors; good film deposition rates at low temperature
03/28/2006US7018947 Low resistivity silicon carbide
03/28/2006US7018940 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
03/28/2006US7018789 Photostimulable phosphor crystal and an activation metal
03/28/2006US7018729 For thin-film diamond-like carbon (DLC) mechanical/corrosion protection layer formed by low energy magnetron sputtering; magnetic media hard disk drive; nitrogen enhanced DLC layer in which nitrogen ion implantation into the magnetic layer is minimized
03/28/2006US7018683 Electron beam processing method
03/28/2006US7018676 Method and device for manufacturing ceramics, semiconductor device and piezoelectric device
03/28/2006US7018675 reacting ruthenium precursor and oxygen to form ruthenium oxide layer and heating ruthenium oxide layer in presence of a hydrogen-rich gas to convert ruthenium oxide layer to a smooth-surfaced ruthenium metal layer; conductive material for semiconductor capacitor plates
03/28/2006US7018553 Optical monitoring and control system and method for plasma reactors
03/28/2006US7018517 Transfer chamber for vacuum processing system
03/28/2006US7018506 Plasma processing apparatus
03/28/2006US7018505 Apparatus including chuck and matching box
03/28/2006US7018504 Loadlock with integrated pre-clean chamber
03/28/2006US7018479 Rotating semiconductor processing apparatus
03/28/2006US7018478 Method of growing a thin film onto a substrate
03/28/2006US7018469 Atomic layer deposition methods of forming silicon dioxide comprising layers
03/28/2006US7017652 Method and apparatus for transferring heat from a substrate to a chuck
03/28/2006US7017514 Method and apparatus for plasma optimization in water processing
03/28/2006US7017269 Suspended gas distribution plate
03/23/2006WO2006030918A1 Method for fabrication of group iii nitride semiconductor
03/23/2006WO2006030762A1 Transparent conductive film, process for producing the same, transparent conductive base material and luminescent device
03/23/2006WO2006030663A1 Surface-coated cutting tool having coating film on base
03/23/2006WO2006030617A1 METHOD OF VAPOR-PHASE GROWING, AND VAPOR-PHASE GROWING APPARATUS, FOR AlGaN
03/23/2006WO2006029747A2 Cutting tool with oxide coating
03/23/2006WO2006029743A1 Method and device for applying an electrically conductive transparent coating to a substrate
03/23/2006WO2006015072A3 Closed loop clean gas methods and systems
03/23/2006WO2005121388A9 Al2o3 ceramic tools with diffusion bonding enhanced layer
03/23/2006US20060063346 Method of forming a layer and method of forming a capacitor of a semiconductor device having the same
03/23/2006US20060063074 Thin-film battery having ultra-thin electrolyte
03/23/2006US20060062952 Dispensing package
03/23/2006US20060062931 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
03/23/2006US20060062930 Plasma-assisted carburizing