| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/12/2006 | CN1758826A Diffuser gravity support |
| 04/12/2006 | CN1757790A Film deposition apparatus, and film deposition system using the film deposition apparatus |
| 04/12/2006 | CN1757789A Manufacturing method of metal foil |
| 04/12/2006 | CN1251371C Surface-emitting type semiconductor laser and its manufacturing method |
| 04/12/2006 | CN1251311C Ultraviolet ray assisted processing device for semiconductor processing |
| 04/12/2006 | CN1251306C Method for increasing atom layer deposition rate |
| 04/12/2006 | CN1251293C Materials and gas chemistries for processing systems |
| 04/12/2006 | CN1250882C Conveyor for treating hollow bodies comprising advanced pressure distribution circuit |
| 04/12/2006 | CN1250779C Pyrolyzing borium nitride crucible and method |
| 04/12/2006 | CN1250770C Carbide coated steel articles and method of making them or method of wear-resistant china pin |
| 04/12/2006 | CN1250767C Gas shower head, film deposition apparatus, and film deposition method |
| 04/11/2006 | US7026257 Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor deposition |
| 04/11/2006 | US7026228 Methods of fabricating devices and semiconductor layers comprising cadmium mercury telluride, mercury telluride, and cadmium telluride |
| 04/11/2006 | US7026219 Integration of high k gate dielectric |
| 04/11/2006 | US7026172 Reduced thickness variation in a material layer deposited in narrow and wide integrated circuit trenches |
| 04/11/2006 | US7026169 Method of forming PZT ferroelectric film |
| 04/11/2006 | US7026052 Porous low k(<2.0) thin film derived from homo-transport-polymerization |
| 04/11/2006 | US7026046 Component comprising submicron hollow spaces |
| 04/11/2006 | US7026011 Aluminide coating of gas turbine engine blade |
| 04/11/2006 | US7026009 Evaluating textured coating on structure by: directing a beam of electrons onto surface grains of textured coating causing electrons to be backscattered, detecting backscattered electrons and generating a signal image, evaluating signal |
| 04/11/2006 | US7025896 Process for treating solid surface and substrate surface |
| 04/11/2006 | US7025895 Plasma processing apparatus and method |
| 04/11/2006 | US7025863 Vacuum system with separable work piece support |
| 04/11/2006 | US7025858 Apparatus for supporting wafer in semiconductor process |
| 04/11/2006 | US7025857 Plasma treatment apparatus, matching box, impedance matching device, and coupler |
| 04/11/2006 | US7025856 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 04/11/2006 | US7025833 Apparatus and method for web cooling in a vacuum coating chamber |
| 04/11/2006 | US7025831 Apparatus for surface conditioning |
| 04/11/2006 | US7025337 Method for maintaining a constant level of fluid in a liquid vapor delivery system |
| 04/11/2006 | US7025280 Adaptive real time control of a reticle/mask system |
| 04/11/2006 | CA1341504C Substituted superconductive bi-sr-ca-cu oxide and bi-sr-ca-ln-cu oxide compositions |
| 04/06/2006 | WO2006036865A2 Deposition of ruthenium metal layers in a thermal chemical vapor deposition process |
| 04/06/2006 | WO2006036461A1 Multilayer coatings by plasma enhanced chemical vapor deposition |
| 04/06/2006 | WO2006036196A2 Surface and composition enhancements to high aspect ratio c-mems |
| 04/06/2006 | WO2006035784A1 Process for formation of copper-containing film |
| 04/06/2006 | WO2006035629A1 Plasma processing apparatus |
| 04/06/2006 | WO2006035628A1 Plasma processing system |
| 04/06/2006 | WO2006035591A1 Method for forming copper wiring |
| 04/06/2006 | WO2006035364A1 Gas-barrier material |
| 04/06/2006 | WO2006035281A1 Precursor for film formation and method for forming ruthenium-containing film |
| 04/06/2006 | WO2006005067A3 Protective coating on a substrate and method of making thereof |
| 04/06/2006 | WO2005124849A3 System and method for forming multi-component dielectric films |
| 04/06/2006 | WO2004027110A3 Additives to prevent degradation of alkyl-hydrogen siloxanes |
| 04/06/2006 | US20060073276 Multi-zone atomic layer deposition apparatus and method |
| 04/06/2006 | US20060073275 Process and apparatus for producing single-walled carbon nanotube |
| 04/06/2006 | US20060073266 System and method for manufacturing physical barriers |
| 04/06/2006 | US20060070702 Substrate processing system for performing exposure process in gas atmosphere |
| 04/06/2006 | US20060070637 Supercritical fluid technology for cleaning processing chambers and systems |
| 04/06/2006 | US20060070576 Source for thermal physical vapor deposition of organic electroluminescent layers |
| 04/06/2006 | US20060070575 Solution-vaporization type CVD apparatus |
| 04/06/2006 | US20060070574 Method and system for binding halide-based contaminants |
| 04/06/2006 | US20060070573 Apparatus and method for coating an article |
| 04/06/2006 | DE19963283B4 Verfahren zur Herstellung eines GaN-Verbindungshalbleiters A method of making a GaN compound semiconductor |
| 04/06/2006 | DE102004045046A1 Verfahren und Vorrichtung zum Aufbringen einer elektrisch leitfähigen transparenten Beschichtung auf ein Substrat Method and apparatus for applying an electrically conductive transparent coating on a substrate |
| 04/06/2006 | CA2581626A1 Method and apparatus for growing a group (iii) metal nitride film and a group (iii) metal nitride film |
| 04/06/2006 | CA2578354A1 Multilayer coatings by plasma enhanced chemical vapor deposition |
| 04/05/2006 | EP1643547A1 Preparation of group 12 and 13 metal compounds having low levels of oxygenated impurities |
| 04/05/2006 | EP1643012A1 Method for high speed machining and coated cutting tool |
| 04/05/2006 | EP1643005A2 Depositing organic and/or inorganic nanolayers by plasma discharge |
| 04/05/2006 | EP1643004A1 Treating device using raw material gas and reactive gas |
| 04/05/2006 | EP1643003A1 Vaporizer for CVD apparatus |
| 04/05/2006 | EP1643002A1 Method for forming thin film and article with thin film |
| 04/05/2006 | EP1643001A1 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 04/05/2006 | EP1643000A1 Seed layer processes for MOCVD of ferroelectric thin films on high-K gate oxides |
| 04/05/2006 | EP1642653A2 Coated biomedical device and associated method |
| 04/05/2006 | EP1642328A1 Traps for particle entrapment in deposition chambers |
| 04/05/2006 | EP1642314A2 System and method for inductive coupling of an expanding thermal plasma |
| 04/05/2006 | EP1641958A2 Methods of forming a phosphorus doped silicon dioxide layer |
| 04/05/2006 | EP1641957A2 Composite refractory metal carbide coating on a substrate and method for making thereof |
| 04/05/2006 | EP1522090A4 Thermal processing system and configurable vertical chamber |
| 04/05/2006 | CN1757266A Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 04/05/2006 | CN1757098A Tailoring nitrogen profile in silicon oxynitride using rapid thermal annealing with ammonia under ultra-low pressure |
| 04/05/2006 | CN1756913A One piece shim |
| 04/05/2006 | CN1756912A One piece shim |
| 04/05/2006 | CN1755898A Deposition method and system for silicon nitride film |
| 04/05/2006 | CN1754984A Apparatus for treating thin film and method of treating thin film |
| 04/05/2006 | CN1754983A Vaporizer |
| 04/05/2006 | CN1754982A Vaporizer for CVD apparatus |
| 04/05/2006 | CN1754978A Methods and apparatus for reducing arcing during plasma processing |
| 04/05/2006 | CN1249789C Plasma processing container internal parts |
| 04/05/2006 | CN1249786C Method and apparatus for plasma cleaning of workpieces |
| 04/05/2006 | CN1249779C Method for mfg. crystal semiconductor material and method for mfg. semiconductor |
| 04/05/2006 | CN1249266C Manufacture of casing for portable electronic equipment |
| 04/05/2006 | CN1249265C Light cover patterning method for chemical gas phase deposition of focusing ion beam |
| 04/05/2006 | CN1248959C Carbon nano pipe array growth method |
| 04/05/2006 | CN1248957C Unidimensional aluminium nitride nanometer structure array and its preparation method |
| 04/04/2006 | US7024105 chemical vapor deposition chamber having ceramic substrate heater assembly disposed therein; for facilitating deposition of uniform material layers on substrates without depositing material along edge during fabrication of integrated circuits in semiconductor substrate processing system |
| 04/04/2006 | US7023393 Slot array antenna and plasma processing apparatus |
| 04/04/2006 | US7023092 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds |
| 04/04/2006 | US7022864 low pressure plasma enhanced chemical vapor deposition (PECVD) of a high strength dielectric film from diethoxymethyloxiranylsilane and/or diethoxyglycidylmethylsilane; more Si-C bonds and fewer Si-H bonds increases strength; peroxidation of the corresponding -vinyl- or -glycidyl silanes; semiconductors |
| 04/04/2006 | US7022624 Semiconductor device and method of fabricating the same |
| 04/04/2006 | US7022606 Underlayer film for copper, and a semiconductor device including the underlayer film |
| 04/04/2006 | US7022605 Atomic layer deposition methods |
| 04/04/2006 | US7022591 Method of fabricating a polysilicon thin film |
| 04/04/2006 | US7022545 Production method of SiC monitor wafer |
| 04/04/2006 | US7022403 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating |
| 04/04/2006 | US7022378 Annealing nitrided oxide layer in oxygen-free environment |
| 04/04/2006 | US7022298 Exhaust apparatus for process apparatus and method of removing impurity gas |
| 04/04/2006 | US7022192 Semiconductor wafer susceptor |
| 04/04/2006 | US7022184 Atomic layer CVD |