| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/20/2006 | US20060081181 Film forming system and film forming method |
| 04/20/2006 | DE10348734B4 Verfahren zum selektiven Galvanisieren von Metalloberflächen und Selektiv-Galvanisierungssystem für Metalloberflächen A method for selective electroplating of metal surfaces and selective electroplating system for metal surfaces |
| 04/20/2006 | DE102004050822A1 Apparatus for cooling plate-form substrates, e.g. wafers, under vacuum, comprising cooling body with cooling surface to which substrate is applied via intermediate space filled with fluid |
| 04/20/2006 | DE102004050821A1 Vorrichtung und Verfahren zum Kühlen bandförmiger Substrate Apparatus and method for cooling substrates in strip form |
| 04/20/2006 | DE102004050474A1 Verfahren zur Herstellung eines mit einer Verschleißschutzbeschichtung beschichteten Bauteils A process for producing a coated with a wear protective coating component |
| 04/20/2006 | DE102004014430A1 Vorrichtung und Verfahren zur nasschemischen Präparation von hochreinen Festkörperoberflächen Apparatus and method for wet chemical preparation of highly pure solid surfaces |
| 04/20/2006 | CA2583486A1 An apparatus for and method of sampling and collecting powders flowing in a gas stream |
| 04/20/2006 | CA2582573A1 Alloyed tungsten produced by chemical vapour deposition |
| 04/19/2006 | EP1646735A2 Method for processing surfaces of aluminium alloy sheets and strips |
| 04/19/2006 | EP1579027B1 Plasma-enhanced film deposition |
| 04/19/2006 | EP1516075B1 Surface treatment system and method |
| 04/19/2006 | EP1299404B1 Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives |
| 04/19/2006 | EP1207911B1 Composition comprising radiopharmaceutical metal complexes in silica-coated containers |
| 04/19/2006 | EP1125324B1 Radical-assisted sequential cvd |
| 04/19/2006 | EP1012635B1 Methods for reducing reflection from optical substrates |
| 04/19/2006 | EP0954948A4 Model based temperature controller for semiconductor thermal processors |
| 04/19/2006 | CN1762044A Substrate processor and method of manufacturing device |
| 04/19/2006 | CN1762042A Substrate treatment appratus and method of manufacturing semiconductor device |
| 04/19/2006 | CN1761674A Precursors for deposition of metal oxide layers or films |
| 04/19/2006 | CN1761037A Vapor phase growing device |
| 04/19/2006 | CN1761032A Plasma processing apparatus and plasma processing method |
| 04/19/2006 | CN1760407A Method for preparing thin film of transparent hydrophobic born nitride |
| 04/19/2006 | CN1252804C Bismuth titanium silicon oxide, bismuth titanium silicon oxide film and preparation method of said film |
| 04/19/2006 | CN1252795C Manufacturing method of semiconductor device, manufacturing equipment |
| 04/19/2006 | CN1252792C Electrode assembly |
| 04/19/2006 | CN1252329C Carbon fiber mfg. method and its use, and ink for producing catalyst |
| 04/19/2006 | CN1252313C Method of cleaning and conditioning plasma reaction chamber |
| 04/19/2006 | CN1251962C Method of horizontal growth of carbon nanotube and field effect transistor using carbon nanotube |
| 04/19/2006 | CN1251809C Apparatus and method for coating formation by reactive deposition |
| 04/18/2006 | USRE39064 Electronic device manufacturing apparatus and method for manufacturing electronic device |
| 04/18/2006 | US7031600 Method and apparatus for silicon oxide deposition on large area substrates |
| 04/18/2006 | US7030475 Method and apparatus for forming a thin film |
| 04/18/2006 | US7030468 Low k and ultra low k SiCOH dielectric films and methods to form the same |
| 04/18/2006 | US7030450 Precursor for hafnium oxide layer and method for forming halnium oxide film using the precursor |
| 04/18/2006 | US7030168 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 04/18/2006 | US7030045 Method of fabricating oxides with low defect densities |
| 04/18/2006 | US7030043 Process for deposition of a thin layer on an oxidized layer of a substrate |
| 04/18/2006 | US7030042 Systems and methods for forming tantalum oxide layers and tantalum precursor compounds |
| 04/18/2006 | US7030041 Adhesion improvement for low k dielectrics |
| 04/18/2006 | US7030037 Atomic layer deposition apparatus and method |
| 04/18/2006 | US7030015 Method for forming a titanium nitride layer |
| 04/18/2006 | US7029940 Ammonia for use in manufacture of GaN-type compound semiconductor and method for manufacturing GaN-type compound semiconductor |
| 04/18/2006 | US7029928 Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz chamber |
| 04/18/2006 | US7029836 Radiographic image conversion panel and method for manufacturing the same |
| 04/18/2006 | US7029752 internally coated with DLC (diamond-like carbon) film wherein water vapor permeability is 0 0.006 g/container/day and oxygen permeability is 0 0.011 ml/container/day, such properties being obtained by optimizing the three conditions, composition, density and film thickness of the DLC film. |
| 04/18/2006 | US7029724 forming LaxMyMnO3, where M=Mg, Ca, Sr, or Ba, and 0.5<(x+y)<0.9 by flash vaporazation of the precursors and chemical vapor deposition; and annealing the manganate in oxygen to increase the Curie temperature of the manganate to 17- 50 degrees C. |
| 04/18/2006 | US7029723 Forming chemical vapor depositable low dielectric constant layers |
| 04/18/2006 | US7029722 Diffusing an oxidant into the polymer, and then diffusing pyrrole or a pyrrole derivative vapor for in situ oxidative polymerization of the vapor |
| 04/18/2006 | US7029537 comprises nitrogen trifluoride for in situ etching/cleaning of cold wall process chambers such as rapid thermal chemical vaporization systems |
| 04/18/2006 | US7029536 Processing system and method for treating a substrate |
| 04/18/2006 | US7029505 Sheet type heat treating apparatus and method for processing semiconductors |
| 04/18/2006 | US7028696 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method |
| 04/14/2006 | CA2523327A1 Vapour-deposition material for the production of layers of high refractive index |
| 04/13/2006 | WO2006038672A1 Microwave plasma processing apparatus |
| 04/13/2006 | WO2006038659A1 Substrate treating apparatus and semiconductor device manufacturing method |
| 04/13/2006 | WO2006038623A1 Plasma film forming method and plasma film forming device |
| 04/13/2006 | WO2006037844A2 Cvd doped structures |
| 04/13/2006 | WO2006023437A3 Sioc:h coated substrates and methods for their preparation |
| 04/13/2006 | WO2005116650A3 High throughput discovery of materials through vapor phase synthesis |
| 04/13/2006 | WO2005093127A3 Method for the deposition in particular of metal oxides by non-continuous precursor injection |
| 04/13/2006 | WO2005090638A3 Remote chamber methods for removing surface deposits |
| 04/13/2006 | WO2005070005A3 Pyrolyzed thin film carbon |
| 04/13/2006 | WO2005006400A3 Substrate support having dynamic temperature control |
| 04/13/2006 | US20060079146 Device and method for fabricating display panel having ink-jet printing applied thereto |
| 04/13/2006 | US20060079090 Method for depositing nanolaminate thin films on sensitive surfaces |
| 04/13/2006 | US20060078691 atomic layer deposition by vibrating through a ultrasonic vibrating device, guiding the airborne particles via a low pressure air flow; forming a uniform protective coatings on a display device or a touch screen device |
| 04/13/2006 | US20060078689 Evaporation apparatus and process |
| 04/13/2006 | US20060078680 Method for forming a carbon nanotube and a plasma CVD apparatus for carrying out the method |
| 04/13/2006 | US20060078679 Vapor deposition using metal halide; removal by-products; using scavenger |
| 04/13/2006 | US20060078678 Method of forming a thin film by atomic layer deposition |
| 04/13/2006 | US20060078677 Method to improve transmittance of an encapsulating film |
| 04/13/2006 | US20060078676 chemical vapor deposition method for forming a porous organosilicate glass film on a substrate; organosilane and/or organosiloxane precursor and a porogen precursor; insulating layers in electronic devices |
| 04/13/2006 | US20060076244 Barrier enhancement process for copper interconnects |
| 04/13/2006 | US20060076109 Method and apparatus for controlling temperature of a substrate |
| 04/13/2006 | US20060076108 Method and apparatus for controlling temperature of a substrate |
| 04/13/2006 | US20060075972 Substrate processing apparatus and substrate processing method |
| 04/13/2006 | US20060075971 Heated substrate support and method of fabricating same |
| 04/13/2006 | US20060075970 Heated substrate support and method of fabricating same |
| 04/13/2006 | US20060075969 Heat transfer system for improved semiconductor processing uniformity |
| 04/13/2006 | US20060075968 Leak detector and process gas monitor |
| 04/13/2006 | US20060075967 Magnetic-field concentration in inductively coupled plasma reactors |
| 04/13/2006 | US20060075966 Apparatus and method for plasma assisted deposition |
| 04/13/2006 | DE102004049111A1 Forming high-gloss coatings on substrates, especially car wheels, by plasma pretreatment, plasma polymerization and sputtering with metal (compound) under vacuum, then applying covering layer of lacquer |
| 04/13/2006 | DE102004047659A1 Verfahren zur Herstellung eines Flansches für ein Halbleiterbauelement sowie nach diesem Verfahren hergestellter Flansch Process for the preparation of a flange for a semiconductor device prepared by this method as well as flange |
| 04/13/2006 | DE102004015217B4 Verfahren zur Ausbildung dünner Schichten aus Siliziumnitrid auf Substratoberflächen A method for forming thin layers of silicon nitride on substrate surfaces, |
| 04/12/2006 | EP1645661A1 Thermal barrier coatings with low thermal conductivity comprising lanthanide sesquioxides |
| 04/12/2006 | EP1645657A1 Method for forming thin film and base having thin film formed by such method |
| 04/12/2006 | EP1645656A1 Organometallic compounds suitable for use in vapor deposition processes |
| 04/12/2006 | EP1644972A2 Method and apparatus for silicone oxide deposition on large area substrates |
| 04/12/2006 | EP1644962A2 Substrate support having dynamic temperature control |
| 04/12/2006 | EP1644554A1 Method for deposition of titanium oxide by a plasma source |
| 04/12/2006 | EP1644553A2 High rate deposition for the formation of high quality optical coatings |
| 04/12/2006 | EP1644552A2 Reactive deposition for electrochemical cell production |
| 04/12/2006 | EP1644551A1 Coated multiphase bodies |
| 04/12/2006 | EP1476903B1 A method of calibrating and using a semiconductor processing system |
| 04/12/2006 | CN1759476A Method and apparatus for silicone oxide deposition on large area substrates |
| 04/12/2006 | CN1759474A Plasma processing apparatus and method |
| 04/12/2006 | CN1759466A Substrate support lift mechanism |
| 04/12/2006 | CN1759204A Microwave plasma processing device and plasma processing gas supply member |
| 04/12/2006 | CN1759203A Hybrid ball-lock attachment apparatus |