| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 04/27/2006 | US20060088660 Methods of depositing lead containing oxides films |
| 04/27/2006 | US20060088655 provides methods and apparatus for controlling ion dosage in real time during plasma processes. In one embodiment, ion dosages may be controlled using in-situ measurement of the plasma from a mass distribution sensor combined with in-situ measurement from an RF probe. |
| 04/27/2006 | US20060087211 Plasma processing apparatus |
| 04/27/2006 | US20060086463 Substrate processing apparatus and substrate processing method |
| 04/27/2006 | US20060086460 Developing treatment apparatus |
| 04/27/2006 | US20060086458 Ceramic materials in plasma tool environments |
| 04/27/2006 | US20060086322 Device for production of a plasma sheet |
| 04/27/2006 | US20060086321 Substrate-to-mask alignment and securing system with temperature control for use in an automated shadow mask vacuum deposition process |
| 04/27/2006 | US20060086320 Method and device for plasma treating workpieces |
| 04/27/2006 | US20060086319 Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same |
| 04/27/2006 | US20060086318 Gas diffusion plate |
| 04/27/2006 | DE102004051684A1 Bearbeitungsvorrichtung mit Hoch- oder Unterdruckkammer Processing apparatus having high or low pressure chamber |
| 04/27/2006 | DE102004051578A1 Method for coating a foil for coating gas turbine blades comprises preparing a foil to be coated, preparing a holder for the foil, arranging the foil on the holder, welding the foil with the holder under vacuum and coating the foil |
| 04/26/2006 | EP1650789A1 Heat treatment apparatus and method of calibrating the apparatus |
| 04/26/2006 | EP1650788A1 Vapor deposition apparatus and vapor deposition method |
| 04/26/2006 | EP1650326A2 Plasma processing apparatus |
| 04/26/2006 | EP1650325A1 Method for forming metal oxide coating film and vapor deposition apparatus |
| 04/26/2006 | EP1650051A2 Method for surface treatment of plates made of synthetic material |
| 04/26/2006 | EP1649994A2 Die for extrusion forming of ceramics |
| 04/26/2006 | EP1649955A1 Diamond film coated tool and process for producing the same |
| 04/26/2006 | EP1649937A1 Coating medical device using air suspension |
| 04/26/2006 | EP1649520A1 Method for manufacturing absorber layers for solar cell |
| 04/26/2006 | EP1649504A2 Ultaviolet curing processes for advanced low-k materials |
| 04/26/2006 | EP1649499A2 Silicon crystallization using self-assembled monolayers |
| 04/26/2006 | EP1649494A2 Ethyleneoxide-silane and bridged silane precursors for forming low k films |
| 04/26/2006 | EP1649076A2 Apparatus and method for chemical source vapor pressure control |
| 04/26/2006 | EP1649075A2 Cvd diamond-coated composite substrate and method for making same |
| 04/26/2006 | EP1493175B1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
| 04/26/2006 | EP1440180B1 Method and device for depositing especially crystalline layers onto especially crystalline substrates |
| 04/26/2006 | CN2775071Y Large area zinc oxide transparent conductive film reactor of metal organic chemical vapour phase deposition |
| 04/26/2006 | CN1765007A Production method for antenna and production device for antenna |
| 04/26/2006 | CN1764738A Apparatus and method for depositing large area coating on explanate surface |
| 04/26/2006 | CN1764737A Titania coatings. |
| 04/26/2006 | CN1764735A Al composite material being crumbled with water, al film and al powder comprising the material and methods for preparation thereof, constitutional member for film-forming chamber method for recovering |
| 04/26/2006 | CN1764596A Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| 04/26/2006 | CN1763915A Method of cleaning thin film deposition system, thin film deposition system and program |
| 04/26/2006 | CN1763913A Substrate processing apparatus and substrate processing method |
| 04/26/2006 | CN1763912A Gas diffusion plate |
| 04/26/2006 | CN1763907A Apparatus and method for avoiding residual gas to pollute chip |
| 04/26/2006 | CN1763244A Hard alloy punch head surface treatment method by ion beam assisted deposition |
| 04/26/2006 | CN1763243A Method for controlling growth of carbon nanotube by ion Injection surface modification |
| 04/26/2006 | CN1763242A Deposition method |
| 04/26/2006 | CN1253928C Method and device for heat treatment |
| 04/26/2006 | CN1253918C Plasma processing system and method therefor |
| 04/26/2006 | CN1253917C Vacuum circuit for device for treating receptacle with low pressure plasma |
| 04/26/2006 | CN1253599C Abnormal growth control in chemical gas phase deposite multiple crystal silicide film based on dichloromethane |
| 04/25/2006 | US7034397 Oxygen bridge structures and methods to form oxygen bridge structures |
| 04/25/2006 | US7034369 Semiconductor device and method for manufacturing the same |
| 04/25/2006 | US7034169 Volatile metal β-ketoiminate complexes |
| 04/25/2006 | US7034091 Parallel deposition, synthesis and screening of an array of diverse materials at known locations on a single substrate surface |
| 04/25/2006 | US7033952 Apparatus and method using a remote RF energized plasma for processing semiconductor wafers |
| 04/25/2006 | US7033949 Structure and manufacturing method for nitride-based light-emitting diodes |
| 04/25/2006 | US7033939 Chemistry for chemical vapor deposition of titanium containing films |
| 04/25/2006 | US7033937 Apparatus and method for use in manufacturing a semiconductor device |
| 04/25/2006 | US7033922 Method and system for controlling the presence of fluorine in refractory metal layers |
| 04/25/2006 | US7033843 Semiconductor manufacturing method and semiconductor manufacturing apparatus |
| 04/25/2006 | US7033721 Method for producing electrophotographic photosensitive member, electrophotographic photosensitive member and electrophotographic apparatus using the same |
| 04/25/2006 | US7033650 Method of producing a nanotube layer on a substrate |
| 04/25/2006 | US7033647 catalytically depositing gaseous carbon on a catalyst layer using an ion beam and sub-beams to modify nanotube properties; a multi-beam ion optical system controlls sub-beams |
| 04/25/2006 | US7033642 feeding TiCl4 to a substrate in vapor deposition chamber; then feeding both TiCl4 and a silane, directly depositing a titanium silicide layer onto doped silicon wafer without using underlying silicon |
| 04/25/2006 | US7033640 Method of coloring cut gemstones |
| 04/25/2006 | US7033560 Vapor deposition |
| 04/25/2006 | US7033485 Heating a coal tar pitch having a softening point 70-160 degrees C. to 300-600 degrees C. at a pressure of <5 Torr; withdrawing an output coal tar pitch from said processing vessel having a softening point of 140-300 degrees C. |
| 04/25/2006 | US7033471 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
| 04/25/2006 | US7033461 Thin film forming apparatus and method |
| 04/25/2006 | US7033445 Gridded susceptor |
| 04/25/2006 | US7033444 Plasma processing apparatus, and electrode structure and table structure of processing apparatus |
| 04/25/2006 | US7033443 Gas-cooled clamp for RTP |
| 04/25/2006 | US7033442 System and method for ventilation in the fabrication of integrated circuits |
| 04/25/2006 | US7033436 Crystal growth method for nitride semiconductor and formation method for semiconductor device |
| 04/25/2006 | US7032536 Thin film formation apparatus including engagement members for support during thermal expansion |
| 04/20/2006 | WO2006042109A2 An apparatus for and method of sampling and collecting powders flowing in a gas stream |
| 04/20/2006 | WO2006042074A2 Multi-zone atomic layer deposition apparatus and method |
| 04/20/2006 | WO2006041267A1 An apparatus for depositing thin film on a wafer |
| 04/20/2006 | WO2006041169A1 Substrate processing apparatus and semiconductor device manufacturing method |
| 04/20/2006 | WO2006040924A1 Shield body and vacuum processing apparatus |
| 04/20/2006 | WO2006040545A2 Alloyed tungsten produced by chemical vapour deposition |
| 04/20/2006 | WO2006012766A3 Adhesion layer for thin film transistors |
| 04/20/2006 | WO2006010451A3 Vacuum-coating installation and method |
| 04/20/2006 | WO2006007313A3 Improving water-barrier performance of an encapsulating film |
| 04/20/2006 | WO2005094983A3 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus |
| 04/20/2006 | WO2005080628A3 Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 04/20/2006 | WO2005010941A3 Ethyleneoxide-silane and bridged silane precursors for forming low k films |
| 04/20/2006 | US20060084281 Novel deposition of high-k MSiON dielectric films |
| 04/20/2006 | US20060084236 Plasma-enhanced chemical vapour deposition process for depositing silicon nitride or silicon oxynitride, process for producing one such layer arrangement, and layer arrangement |
| 04/20/2006 | US20060084225 Apparatus for forming dielectric structures in integrated circuits |
| 04/20/2006 | US20060083927 Thermal interface incorporating nanotubes |
| 04/20/2006 | US20060083879 Surface modification process |
| 04/20/2006 | US20060083857 Cyclopentadienylpyrrolylruthenium and its alkyl-subsstituted derivatives; liquid at 20 degrees C. and atmospheric pressure; useful semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions; films; coatings |
| 04/20/2006 | US20060083856 Evaporating a material attached to a 2nd electrode by causing an arc discharge between the material and the 1st electrode having sub-electrodes, generating ultrafine particles, and colliding the particles against a substrate; sub-electrodes are in radial alignment to the same portion of the material. |
| 04/20/2006 | US20060083853 Hydrophilic DLC on substrate with flame pyrolysis treatment |
| 04/20/2006 | US20060083849 Liquid crystal dispensing system which can read information of liquid crystal container and method of dispensing liquid crystal material using same |
| 04/20/2006 | US20060081334 Substrate processing method |
| 04/20/2006 | US20060081188 Deposition system |
| 04/20/2006 | US20060081187 Susceptor system |
| 04/20/2006 | US20060081186 Single-substrate-heat-processing apparatus for performing reformation and crystallization |
| 04/20/2006 | US20060081185 Thermal management of dielectric components in a plasma discharge device |
| 04/20/2006 | US20060081184 Evaporation mask with high precision deposition pattern |
| 04/20/2006 | US20060081183 Plasma treatment processing apparatus |
| 04/20/2006 | US20060081182 Method of cleaning thin film deposition system, thin film deposition system and program |