| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/04/2006 | US20060094252 Methods to form electronic devices and methods to form a material over a semiconductive substrate |
| 05/04/2006 | US20060094238 Deposition of tungsten nitride |
| 05/04/2006 | US20060094192 Method for treating base oxide to improve high-K material deposition |
| 05/04/2006 | US20060093848 Atomic layer deposition of noble metals |
| 05/04/2006 | US20060093754 System and method for supplying precursor gases to an implantation tool |
| 05/04/2006 | US20060093753 Method of engineering a property of an interface |
| 05/04/2006 | US20060093752 Forming platinum group metal layer and separate layer containing aluminum and optionally nickel, chromium, silicon, and/or one or more reactive elements on a nickel-base superalloy substrate; diffusion heat treating the layers to form an overlay coating on articles for use in hostile thermal environments |
| 05/04/2006 | US20060093748 Method and apparatus for microplasma spray coating a portion of a compressor blade in a gas turbine engine |
| 05/04/2006 | US20060093742 Controlled dispensing of material |
| 05/04/2006 | US20060093741 Material with surface nanometer functional structure and method of manufacturing the same |
| 05/04/2006 | US20060093740 Method and device for manufacturing nanofilter media |
| 05/04/2006 | US20060093737 Method and apparatus for generating charged particles for deposition on a surface |
| 05/04/2006 | US20060093731 Semiconductor device fabrication method and fabrication apparatus |
| 05/04/2006 | US20060093730 Monitoring a flow distribution of an energized gas |
| 05/04/2006 | US20060091554 Multilayered barrier metal thin-films |
| 05/04/2006 | US20060091500 Nitride based semiconductor device and process for preparing the same |
| 05/04/2006 | US20060090855 Substrate mounting table, substrate processing apparatus and substrate temperature control method |
| 05/04/2006 | US20060090850 Chemical processing system and method |
| 05/04/2006 | US20060090849 Substrate processing apparatus |
| 05/04/2006 | US20060090848 Laser processing apparatus and laser processing method |
| 05/04/2006 | US20060090706 Support ring assembly |
| 05/04/2006 | US20060090705 Apparatus for fabricating display device |
| 05/04/2006 | US20060090704 Plasma processing apparatus |
| 05/04/2006 | US20060090703 Substrate processing method, system and program |
| 05/04/2006 | US20060090702 Duplex chemical vapor deposition system and pulsed processing method using the same |
| 05/04/2006 | US20060090701 Plasma reaction chamber with a built-in magnetic core |
| 05/04/2006 | US20060090700 Gas-introducing system and plasma CVD apparatus |
| 05/04/2006 | US20060090699 Thermal spraying apparatus and also a thermal spraying process |
| 05/04/2006 | US20060090694 Method for atomic layer deposition (ALD) of silicon oxide film |
| 05/04/2006 | DE4222137B4 Kraftstoff-Einspritzdüse für Diesel-Brennkraftmaschinen Fuel injection nozzle for diesel internal combustion engines |
| 05/04/2006 | DE19631407B4 Vorrichtung zur plasmachemischen Abscheidung von polykristallinem Diamant Device for the plasma-chemical deposition of polycrystalline diamond |
| 05/04/2006 | DE102004053708A1 Verfahren zur Herstellung eines Erzeugnisses mit Antibeschlag-Beschichtung, sowie verfahrensgemäß herstellbares Erzeugnis Process for the manufacture of a product with anti-fog coating, and according to the method manufacturable product |
| 05/04/2006 | DE102004053502A1 Verfahren zum Korrosionsschutz von Bauteilen aus warmfestem Stahl A method for corrosion protection of components from heat-resistant steel |
| 05/04/2006 | DE10018143B4 DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems DLC layer system and method and apparatus for producing such a layer system |
| 05/04/2006 | CA2590400A1 Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films |
| 05/03/2006 | EP1653502A1 Semiconductor layer |
| 05/03/2006 | EP1653484A1 Superconducting wire and its production method |
| 05/03/2006 | EP1652961A1 Method of manufacturing gas barrier film coated plastic container |
| 05/03/2006 | EP1652223A2 Methods of forming deuterated silicon nitride-containing materials |
| 05/03/2006 | EP1651802A1 Support system for treatment apparatuses |
| 05/03/2006 | EP1651798A1 Fabricated titanium article having improved corrosion resistance |
| 05/03/2006 | EP1651796A1 Substrate covered with an intermediate coating and a hard carbon coating |
| 05/03/2006 | EP1651794A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 05/03/2006 | EP1651793A2 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| 05/03/2006 | EP1458730B1 Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof |
| 05/03/2006 | EP1423558B1 Susceptor with epitaxial growth control devices and epitaxial reactor using the same |
| 05/03/2006 | EP0833960B2 Use of plasma polymer layer sequences as functional layers in material transport or heat exchanger systems |
| 05/03/2006 | CN1768415A Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 05/03/2006 | CN1768414A Dummy wafer |
| 05/03/2006 | CN1768413A Gas-cooled clamp for rapid thermal processing |
| 05/03/2006 | CN1768341A A method for adjoining adjacent coatings on a processing element |
| 05/03/2006 | CN1768161A Thin film forming apparatus and method for forming thin film |
| 05/03/2006 | CN1768160A Method to deposit an impermeable film onto a porous low-K dielectric film |
| 05/03/2006 | CN1768159A Method for hafnium nitride deposition |
| 05/03/2006 | CN1768158A Nanolayer deposition process |
| 05/03/2006 | CN1767173A Novel pretreatment method for alumina atom illuvium |
| 05/03/2006 | CN1767146A Substrate processing apparatus, pressure control method for substrate processing apparatus |
| 05/03/2006 | CN1767145A Vacuum treatment device |
| 05/03/2006 | CN1766162A Leak detector and process gas monitor |
| 05/03/2006 | CN1766161A Cabin door open and close device using plasm macromolecule membrane continuous polymerization apparatus |
| 05/03/2006 | CN1766160A Collosol/gel preparation method for Sm2O3 photoelectric film |
| 05/03/2006 | CN1766159A Vapor deposition apparatus |
| 05/03/2006 | CN1766155A Fliming clamp mask and its filming apparatus |
| 05/03/2006 | CN1766153A Method for quick-speed preparing carbon/carbon composite material using heat gradient chemical gas phase infiltration |
| 05/03/2006 | CN1254567C Single-slice three-chambers type infrared heating superhigh vacuum CVD epitaxial system |
| 05/03/2006 | CN1254558C Process for preparing nano silicon film |
| 05/02/2006 | US7039264 Monolithic optical fibers with light channels extending along the length; integrated circuits |
| 05/02/2006 | US7038302 Glass substrate assembly, semiconductor device and method of heat-treating glass substrate |
| 05/02/2006 | US7038284 Methods for making a dielectric stack in an integrated circuit |
| 05/02/2006 | US7038263 Integrated circuits with rhodium-rich structures |
| 05/02/2006 | US7037859 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill |
| 05/02/2006 | US7037834 Constant emissivity deposition member |
| 05/02/2006 | US7037827 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same |
| 05/02/2006 | US7037595 Thin hafnium oxide film and method for depositing same |
| 05/02/2006 | US7037574 Atomic layer deposition for fabricating thin films |
| 05/02/2006 | US7037560 irradiating a UV ray on ozone to generate active oxygen atoms, thus modifying the metal oxide film by exposure to active oxygen atoms; insulating films such as tantalum oxide (Ta2O5) for semiconductors |
| 05/02/2006 | US7037555 Antimony, tin oxide |
| 05/02/2006 | US7037376 Backflush chamber clean |
| 05/02/2006 | US7037372 Method of growing a thin film onto a substrate |
| 05/02/2006 | US7036801 Vaporizer and apparatus for vaporizing and supplying |
| 05/02/2006 | US7036453 Apparatus for reducing plasma charge damage for plasma processes |
| 04/27/2006 | WO2006044791A2 Thermal management of dielectric components in a plasma discharge device |
| 04/27/2006 | WO2006044724A1 Method and system for wafer temperature control |
| 04/27/2006 | WO2006044446A2 Organometallic compounds and processes for preparation thereof |
| 04/27/2006 | WO2006044419A2 Magnetic-field concentration in inductively coupled plasma reactors |
| 04/27/2006 | WO2006044254A1 Process for plasma coating |
| 04/27/2006 | WO2006044198A2 Heat transfer system for improved semiconductor processing uniformity |
| 04/27/2006 | WO2006044164A2 Hydrophilic dlc on substrate with flame pyrolysis treatment |
| 04/27/2006 | WO2006044021A1 Substrate carrier for parallel wafer processing reactor |
| 04/27/2006 | WO2006043561A1 Liquid quantity monitor, semiconductor manufacturing equipment provided with liquid quantity monitor and method for monitoring liquid material and liquid quantity |
| 04/27/2006 | WO2006043504A1 Barrier film forming internal electrode and film forming device |
| 04/27/2006 | WO2006043433A1 Plasma cvd apparatus |
| 04/27/2006 | WO2006043432A1 Process for film production and semiconductor device utilizing film produced by the process |
| 04/27/2006 | WO2006043418A1 Alkoxide compound, thin film-forming material and method for forming thin film |
| 04/27/2006 | WO2005123979A3 Method and device for plasma-treating workpieces |
| 04/27/2006 | WO2005109472A3 Mobile pvd/cvd coating center |
| 04/27/2006 | WO2005107392A3 System for vaporizing materials onto substrate surface |
| 04/27/2006 | US20060089007 In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 04/27/2006 | US20060088666 Controlled vapor deposition of biocompatible coatings over surface-treated substrates |
| 04/27/2006 | US20060088661 Methods for chemical vapor deposition of titanium-silicon-nitrogen films |