| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/16/2006 | US7044731 Heat treatment apparatus |
| 05/16/2006 | US7044399 Heating systems |
| 05/16/2006 | US7044078 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus |
| 05/11/2006 | WO2006050482A2 High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric cvd films |
| 05/11/2006 | WO2006049865A1 Improved deposition rate plasma enhanced chemical vapor process |
| 05/11/2006 | WO2006049198A1 Carburetor and film-forming device |
| 05/11/2006 | WO2006049059A1 Metal compound, thin film-forming material, and method for producing thin film |
| 05/11/2006 | WO2006048282A1 Glass ceramic article having a diffusion barrier and method for producing a glass ceramic article having a diffusion barrier |
| 05/11/2006 | WO2006048276A1 Object comprising a barrier coating, and method for the production of such an object |
| 05/11/2006 | WO2006048241A1 Using polydentate ligands for sealing pores in low-k dielectrics |
| 05/11/2006 | WO2006048032A1 Counter track joint having a track inflection point |
| 05/11/2006 | WO2006047998A1 Coating of displacer components (tooth components) for providing a displacer unit with chemical resistance and tribological protection against wear |
| 05/11/2006 | WO2006033731A3 Atomic layer deposition of copper using surface-activating agents |
| 05/11/2006 | WO2006015072A9 Closed loop clean gas methods and systems |
| 05/11/2006 | WO2005095263A3 Methods of forming alpha and beta tantalum films with controlled and new microstructures |
| 05/11/2006 | US20060100094 Method and apparatus for manufacturing a catalyst |
| 05/11/2006 | US20060099831 Silicon source reagent compositions, and method of making and using same for microelectronic device structure |
| 05/11/2006 | US20060099830 Plasma implantation using halogenated dopant species to limit deposition of surface layers |
| 05/11/2006 | US20060099827 Photo-enhanced UV treatment of dielectric films |
| 05/11/2006 | US20060099820 Deposition method and apparatus |
| 05/11/2006 | US20060099805 Heat treating system and heat treating method |
| 05/11/2006 | US20060099725 Semiconductor device and process for producing the same |
| 05/11/2006 | US20060099433 Insert for metal cutting |
| 05/11/2006 | US20060099422 Coating method and coated element |
| 05/11/2006 | US20060099359 Internally coated hollow body, coating method and device |
| 05/11/2006 | US20060099348 Deposition method |
| 05/11/2006 | US20060099345 Controlling the application of vaporized organic material |
| 05/11/2006 | US20060099344 Controlling the vaporization of organic material |
| 05/11/2006 | US20060099343 Method of copper deposition from a supercritical fluid solution containing copper (I) complexes with monoanionic bidentate and neutral monodentate ligands |
| 05/11/2006 | US20060099342 Deposition of coatings |
| 05/11/2006 | US20060099341 High frequency plasma jet source and method for irradiating a surface |
| 05/11/2006 | US20060099340 Device and method for treating workpieces |
| 05/11/2006 | US20060099327 Method for producing polymer layers |
| 05/11/2006 | US20060099053 Vacuum treating device with lidded treatment container |
| 05/11/2006 | US20060098963 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer |
| 05/11/2006 | US20060097266 Large-diameter sic wafer and manufacturing method thereof |
| 05/11/2006 | US20060096951 Apparatus and method for controlling process non-uniformity |
| 05/11/2006 | US20060096946 Encapsulated wafer processing device and process for making thereof |
| 05/11/2006 | US20060096542 Heating crucible and deposition apparatus including the same |
| 05/11/2006 | US20060096541 Apparatus and method of forming a layer on a semiconductor substrate |
| 05/11/2006 | US20060096540 Apparatus to manufacture semiconductor |
| 05/11/2006 | US20060096539 Plasma film forming system |
| 05/11/2006 | US20060096538 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 05/11/2006 | US20060096537 Method and apparatus for forming a thin-film solar cell using a continuous process |
| 05/11/2006 | US20060096536 Pressure control system in a photovoltaic substrate deposition apparatus |
| 05/11/2006 | US20060096535 Apparatus for the application of a curable composition to a fastener and curable compositions suitable for application to a fastener |
| 05/11/2006 | US20060096534 Apparatus for depositing thin film on wafer |
| 05/11/2006 | US20060096533 Fluid control device |
| 05/11/2006 | US20060096532 Thin film forming apparatus |
| 05/11/2006 | US20060096531 Processing device and processing method |
| 05/11/2006 | US20060096524 Crystal growth method for nitride semiconductor and formation method for semiconductor device |
| 05/11/2006 | US20060096393 Apparatus for and method of sampling and collecting powders flowing in a gas stream |
| 05/11/2006 | DE4446992B4 Vorrichtung zum Abscheiden von Schichten auf Substraten An apparatus for depositing layers on substrates |
| 05/11/2006 | DE102004053338A1 Reduction of oxide layer on a semiconductor surface by heat treatment in a chamber in a temperature-time process to a temperature of 900-1050degreesC useful in semiconductor technology, comprises treatment with CO2-containing process gas |
| 05/11/2006 | CA2582302A1 Improved deposition rate plasma enhanced chemical vapor process |
| 05/11/2006 | CA2582286A1 Abrasion resistant coatings by plasma enhanced chemical vapor deposition |
| 05/10/2006 | EP1655771A1 Method for forming film, method for manufacturing semiconductor device, semiconductor device and substrate treatment system |
| 05/10/2006 | EP1655392A1 Alumina layer with enhanced texture |
| 05/10/2006 | EP1655388A2 Alumina layer with controlled texture |
| 05/10/2006 | EP1655387A1 Enhanced alumina layer with texture |
| 05/10/2006 | EP1654754A1 Gas-supply assembly, in particular for a cvd process reactor for growing an epitaxial layer |
| 05/10/2006 | EP1654752A2 Holder for supporting wafers during semiconductor manufacture |
| 05/10/2006 | EP1654397A1 Method and device for coating or modifying surfaces |
| 05/10/2006 | CN1771343A Composition for making metal matrix composites |
| 05/10/2006 | CN1770390A Method for removing substance from substrate using electron attachment |
| 05/10/2006 | CN1769684A Collector |
| 05/10/2006 | CN1769518A Endpoint detector and particle monitor |
| 05/10/2006 | CN1769517A Apparatus for plasma chemical vapor deposition and method for fabricating semiconductor device by using the same |
| 05/10/2006 | CN1769516A Apparatus for depositing thin film on wafer |
| 05/10/2006 | CN1255582C Reaction chamber for an epitaxial reactor |
| 05/10/2006 | CN1255574C Apparatus for treatment plasma |
| 05/10/2006 | CN1255573C Low-permittivity material and processing method via CVD |
| 05/10/2006 | CN1255572C Instantaneously switch controlled vacuum unit for gaseous beam source furnace |
| 05/10/2006 | CN1255417C Ruthenium complex, its producing method and method for producing film |
| 05/09/2006 | US7043133 Silicon-oxycarbide high index contrast, low-loss optical waveguides and integrated thermo-optic devices |
| 05/09/2006 | US7042141 An epitaxial crystal thin film on a substrate, having formula Pb1-xLnxZryTi1-yO3, ( Ln represents any one selected from the group consisting of lanthanum, lanthanoid elements, niobium, calcium, barium, strontium, iron, manganese and tin) |
| 05/09/2006 | US7041993 Protective coatings for radiation source components |
| 05/09/2006 | US7041609 Systems and methods for forming metal oxides using alcohols |
| 05/09/2006 | US7041584 Method of manufacturing semiconductor device and the semiconductor device |
| 05/09/2006 | US7041546 Film forming method for depositing a plurality of high-k dielectric films |
| 05/09/2006 | US7041342 Thin-film solar cells and method of making |
| 05/09/2006 | US7041341 Process for the fabrication of oxide films |
| 05/09/2006 | US7041335 Titanium tantalum nitride silicide layer |
| 05/09/2006 | CA2190856C Apparatus for deposition of thin-film, solid state batteries |
| 05/04/2006 | WO2006047305A2 Substrate-to-mask alignment and securing system |
| 05/04/2006 | WO2006046531A1 Film-forming apparatus, film-forming method, program and recording medium |
| 05/04/2006 | WO2006046462A1 Edge replacement type cutting tip and method of manufacturing the same |
| 05/04/2006 | WO2006046386A1 Film forming method, semiconductor device manufacturing method, semiconductor device, program and recording medium |
| 05/04/2006 | WO2006045885A1 Method of depositing lead containing oxides films |
| 05/04/2006 | WO2006045460A1 Cutting tool, method for producing the same and the use thereof |
| 05/04/2006 | WO2006026370A3 Method to reduce plasma damage during cleaning of semiconductor wafer processing chamber |
| 05/04/2006 | WO2006021670A3 Device for introducing precursors into an enclosure, in a pulsed mode with measurement and control of the flow rate |
| 05/04/2006 | WO2006005837A3 Device for microwave plasma deposition of a coating on a surface of a thermoplastic container |
| 05/04/2006 | WO2005121397A3 Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
| 05/04/2006 | WO2005101500A3 Manufacture of porous diamond films |
| 05/04/2006 | WO2005098086A3 Remote chamber methods for removing surface deposits |
| 05/04/2006 | WO2005095670A3 Remote chamber methods for removing surface deposits |
| 05/04/2006 | WO2005081788A3 High throughput surface treatment on coiled flexible substrates |
| 05/04/2006 | WO2005081283A3 Substrate support system for reduced autodoping and backside deposition |
| 05/04/2006 | WO2005036607A3 System and method for feedforward control in thin film coating processes |