| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/01/2006 | US20060112884 High resolution substrate holder leveling device and method |
| 06/01/2006 | US20060112883 Replaceable precursor tray for use in a multi-tray solid precursor delivery system |
| 06/01/2006 | US20060112882 Multi-tray film precursor evaporation system and thin film deposition system incorporating same |
| 06/01/2006 | US20060112881 CVD coating device |
| 06/01/2006 | US20060112880 Treating apparatus |
| 06/01/2006 | US20060112879 Plasma processing apparatus |
| 06/01/2006 | US20060112878 System and method for controlling plasma with an adjustable coupling to ground circuit |
| 06/01/2006 | US20060112877 Nozzle and plasma apparatus incorporating the nozzle |
| 06/01/2006 | US20060112876 Semiconductor processing apparatus |
| 06/01/2006 | DE202006004142U1 Device for partially treating the surface of a component with low pressure plasma comprises an after-glow system head coupled with a vacuum chamber via a flexible feed line forming a low pressure plasma reactor |
| 05/31/2006 | EP1662556A1 Process for producing oxide thin film and production apparatus therefor |
| 05/31/2006 | EP1662551A2 Capacitor insulating film for a semiconductor memory device and method for fabricating the same |
| 05/31/2006 | EP1662023A1 Method of coating for diamond electrode |
| 05/31/2006 | EP1662021A2 Highly-oriented diamond film, method for manufacturing the same, and electronic device having highly-oriented diamond film |
| 05/31/2006 | EP1662020A1 Method for producing a copper thin film |
| 05/31/2006 | EP1661867A1 Article with photocatalytic film |
| 05/31/2006 | EP1661169A1 Method for depositing thin film on wafer |
| 05/31/2006 | EP1661161A2 Perimeter partition-valve with protected seals |
| 05/31/2006 | EP1661160A2 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 05/31/2006 | EP1660871A2 Photoluminescent heterodiamondoids as biological labels |
| 05/31/2006 | EP1660698A1 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| 05/31/2006 | EP1660697A1 Alkyl push flow for vertical flow rotating disk reactors |
| 05/31/2006 | EP1660618A2 Lubricated part having partial hard coating allowing reduced amounts of antiwear additive |
| 05/31/2006 | EP1660238A2 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape |
| 05/31/2006 | EP1449240B1 Incorporation of nitrogen into high k dielectric film |
| 05/31/2006 | EP1221177B1 Conformal lining layers for damascene metallization |
| 05/31/2006 | EP1190285B1 Method and device for conditioning atmosphere in a process chamber |
| 05/31/2006 | EP1135796B1 PROCESS FOR FORMING A SiON/SiO2 INTERLEVEL DIELECTRIC WITH AFTER-TREATMENT OF THE CVD SILICIUM OXYNITRIDE LAYER |
| 05/31/2006 | EP1021592B1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 05/31/2006 | CN1781183A Vacuum deposition apparatus and method and solar cell material |
| 05/31/2006 | CN1781182A Heat treatment apparatus and heat treatment method |
| 05/31/2006 | CN1781181A Substrate support having temperature controlled surface |
| 05/31/2006 | CN1780936A Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned |
| 05/31/2006 | CN1780935A Method for forming thin film and base having thin film formed by such method |
| 05/31/2006 | CN1780934A Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
| 05/31/2006 | CN1780933A Method of manufacturing crystalline film, method of manufacturing crystalline-film-layered substrate, method of manufacturing thermoelectric conversion element, and thermoelectric conversion element |
| 05/31/2006 | CN1780931A Pre-plating surface treatments for enhanced galvanic-corrosion resistance |
| 05/31/2006 | CN1780798A Method of making coated articles and coated articles made thereby. |
| 05/31/2006 | CN1780727A Conformal coatings for micro-optical elements |
| 05/31/2006 | CN1779938A Method and apparatus for controlling temperature of a substrate |
| 05/31/2006 | CN1779912A Metal oxide layer formed on substrates and its fabrication methods |
| 05/31/2006 | CN1779911A Chemical meteorological depositer with high-density plasma |
| 05/31/2006 | CN1778987A Electronic absorbing disk for chemical gas-phase depositor |
| 05/31/2006 | CN1778986A Methods and apparatus for sealing a chamber |
| 05/31/2006 | CN1258000C Chemical raw material dispensing system |
| 05/31/2006 | CN1257999C Apparatus for exhaust white powder elimination in substrate processing |
| 05/30/2006 | US7053546 Organic Light Emitting Device (OLED); substrate film made of SiOeCaHbXcYdZf X, Y and Z are selected from Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Pd, Ag, Pt, Au; high temperature tolerance, good gas and liquid resistance, superior planarity, and high transparency and high flexibility |
| 05/30/2006 | US7053009 Nanolaminate film atomic layer deposition method |
| 05/30/2006 | US7053002 Plasma preclean with argon, helium, and hydrogen gases |
| 05/30/2006 | US7052988 Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing |
| 05/30/2006 | US7052953 Dielectric material forming methods and enhanced dielectric materials |
| 05/30/2006 | US7052585 Overcoating glass substrate; sputtering titanium oxide; bombardment with carbon ion |
| 05/30/2006 | US7052584 Method of forming a capacitor |
| 05/30/2006 | US7052576 Pressure control apparatus and method of establishing a desired level of pressure within at least one processing chamber |
| 05/30/2006 | US7052552 Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD |
| 05/30/2006 | US7052546 High-purity crystal growth |
| 05/30/2006 | US7051759 Processing apparatus having integrated pumping system |
| 05/30/2006 | US7051671 Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article |
| 05/26/2006 | WO2006055236A2 Wafer processing system and method of manufacturing wafers |
| 05/26/2006 | WO2006054953A1 Doped metal oxide films and systems for fabricating the same |
| 05/26/2006 | WO2006054730A1 Process for producing glass plate with thin film |
| 05/26/2006 | WO2006054393A1 Method and apparatus for preparing thin film |
| 05/26/2006 | WO2005074526A3 Dual layer diffusion bonded chemical vapor coating for medical implants |
| 05/25/2006 | US20060111805 Fabrication system and fabrication method |
| 05/25/2006 | US20060111802 Fabrication system and fabrication method |
| 05/25/2006 | US20060110944 Dummy substrate for thermal reactor |
| 05/25/2006 | US20060110937 Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made |
| 05/25/2006 | US20060110929 Anhydrous film for lip make-up or care |
| 05/25/2006 | US20060110920 Low temperature nitride used as cu barrier layer |
| 05/25/2006 | US20060110578 Photocatalytic film formed article |
| 05/25/2006 | US20060110575 Slide element and method for production of said slide element |
| 05/25/2006 | US20060110546 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 05/25/2006 | US20060110535 Metal film production apparatus |
| 05/25/2006 | US20060110534 Methods and apparatus for forming a titanium nitride layer |
| 05/25/2006 | US20060110533 Methods and apparatus for forming a titanium nitride layer |
| 05/25/2006 | US20060110531 Method for depositing a coating having a relatively high dielectric constant onto a substrate |
| 05/25/2006 | US20060110530 Method for increasing deposition rates of metal layers from metal-carbonyl precursors |
| 05/25/2006 | US20060110526 Organic materials for an evaporation source |
| 05/25/2006 | US20060110525 Nanotechnological processing to a copper oxide superconductor increasing critical transition temperature |
| 05/25/2006 | US20060109297 Image alignment method and device for biochip-manufacturing apparatus |
| 05/25/2006 | US20060108573 Single crystalline gallium nitride thick film having reduced bending deformation |
| 05/25/2006 | US20060108331 Plasma processing apparatus and plasma processing method |
| 05/25/2006 | US20060108068 Substrate processing apparatus and substrate processing method |
| 05/25/2006 | US20060107973 Endpoint detector and particle monitor |
| 05/25/2006 | US20060107898 Method and apparatus for measuring consumption of reactants |
| 05/25/2006 | US20060107871 Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same |
| 05/24/2006 | EP1659621A1 Substrate including a deformation preventing layer |
| 05/24/2006 | EP1659130A1 Rare earth metal complex, material for thin-film formation, and process for producing thin film |
| 05/24/2006 | EP1658635A1 A method of forming a TEOS cap layer at low temperature and reduced deposition rate |
| 05/24/2006 | EP1592822A4 Disk coating system |
| 05/24/2006 | EP1516073B1 Metal dusting corrosion resistant alloys with oxides |
| 05/24/2006 | CN2783707Y Prepared gas bypassing device for long distance plasma reactor |
| 05/24/2006 | CN2782708Y Mixer for mixing technological gas |
| 05/24/2006 | CN1777977A Film forming method |
| 05/24/2006 | CN1777965A Foil for negative electrode of capacitor and process for producing the same |
| 05/24/2006 | CN1777707A Support system for treating device |
| 05/24/2006 | CN1777698A Microwave plasma processing method |
| 05/24/2006 | CN1777697A Transient enhanced atomic layer deposition |
| 05/24/2006 | CN1777696A Methods and apparatus for atomic layer deposition |
| 05/24/2006 | CN1777695A Film-forming apparatus and film-forming method |