Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2006
05/24/2006CN1777694A Film formation method and apparatus utilizing plasma cvd
05/24/2006CN1777693A Method for forming film
05/24/2006CN1777692A Control or modeling of a method for chemical infiltration in a vapor phase for the densification of porous substrates by carbon
05/24/2006CN1777691A Method and apparatus for reducing substrate backside deposition during processing
05/24/2006CN1776890A Method for controlling dielectric reflecting-resisting-layer characteristics and method for making dielectric reflection resisting-layer
05/24/2006CN1776841A Composite nano carbon-base film electrode and use therefor
05/24/2006CN1776041A Composite diamond coating-like spinning rings and preparing method thereof
05/24/2006CN1776027A Diamond coating-like biological material and its preparing method
05/24/2006CN1776016A Photocatalytic film formed article
05/24/2006CN1776010A Method for preparing carboxyl apatite coating by single-chamber sacrificial anode hydrothermal synthesis
05/24/2006CN1776009A Lighting MOCVD apparatus for growth of ZnO thin-film and P-type doping process
05/24/2006CN1776008A Vacuum chamber for vacuum processing device
05/24/2006CN1257547C Multiphase low dielectric constant material and method of deposition and use
05/24/2006CN1257537C Heat treating device
05/24/2006CN1257308C Preparation of corundum-mullite multiple phase ceramic coating
05/23/2006US7050860 Safety network system, safety slave, and communication method
05/23/2006US7050708 Delivery of solid chemical precursors
05/23/2006US7049751 Termination of secondary frequencies in RF power delivery
05/23/2006US7049549 Covering a substrates with various heating properties ; uniform temperature profile and uniform film deposition
05/23/2006US7049249 Method of improving stability in low k barrier layers
05/23/2006US7049247 Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
05/23/2006US7049233 Apparatus and method for manufacturing thin film electrode of hydrous ruthenium oxide
05/23/2006US7049232 Methods for forming ruthenium films with β-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same
05/23/2006US7049231 Methods of forming capacitors
05/23/2006US7049211 In-situ-etch-assisted HDP deposition using SiF4
05/23/2006US7049002 Glass substrates, including glass sheet and continuous float glass ribbon
05/23/2006US7048973 Metal film vapor phase deposition method and vapor phase deposition apparatus
05/23/2006US7048968 Methods of depositing materials over substrates, and methods of forming layers over substrates
05/23/2006US7048967 Organic film vapor deposition method and a scintillator panel
05/23/2006US7048824 Device for treating silicon wafers
05/23/2006US7048802 CVD reactor with graphite-foam insulated, tubular susceptor
05/23/2006US7047903 Method and device for plasma CVD
05/18/2006WO2006053218A2 Pressure control system in a photovoltaic substrate deposition
05/18/2006WO2006052277A2 Gas turbine engine components with aluminide coatings and method of forming such aluminide coatings on gas turbine engine components
05/18/2006WO2006036538A3 Organometallic precursor compounds
05/18/2006WO2006027381A3 Titanium oxide based hybrid material, respective preparation process and uses
05/18/2006WO2006024386A3 Layered composite comprising cubic boron nitride
05/18/2006WO2005124829A3 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
05/18/2006WO2005113852A3 Apparatuses and methods for atomic layer deposition
05/18/2006WO2005069703A3 Plasma treatment of large-scale components
05/18/2006WO2005065186A3 Showerhead electrode assembly for plasma processing apparatuses
05/18/2006WO2005050715A3 Nitridation of high-k dielectric films
05/18/2006US20060105911 Photocatalyst material and process for producing the same
05/18/2006US20060105195 Vapor deposition of dissimilar materials
05/18/2006US20060105183 Coated armor system and process for making the same
05/18/2006US20060105114 Multi-layer high quality gate dielectric for low-temperature poly-silicon TFTs
05/18/2006US20060105107 Reactor design for reduced particulate generation
05/18/2006US20060105106 Tensile and compressive stressed materials for semiconductors
05/18/2006US20060105105 High purity granular silicon and method of manufacturing the same
05/18/2006US20060105104 Method for introducing gas to treating apparatus having shower head portion
05/18/2006US20060102612 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer
05/18/2006US20060102286 Plasma processing apparatus
05/18/2006US20060102285 Processing thin wafers
05/18/2006US20060102081 Wafer Guide, MOCVD Equipment, and Nitride Semiconductor Growth Method
05/18/2006US20060102080 Reduced particle generation from wafer contacting surfaces on wafer paddle and handling facilities
05/18/2006US20060102079 Reducing variability in delivery rates of solid state precursors
05/18/2006US20060102078 Wafer fab
05/18/2006US20060102077 Vacuum treatment system
05/18/2006US20060102076 Apparatus and method for the deposition of silicon nitride films
05/18/2006US20060101993 Process byproduct trap, methods of use, and system including same
05/18/2006DE10134461B4 Prozess zur Abscheidung von WSix-Schichten auf hoher Topografie mit definierter Stöchiometrie und dadurch hergestelltes Bauelement Process for the deposition of WSi x films on high topography with a defined stoichiometry and thus component produced
05/18/2006DE10042429B4 Oberflächenstabilisierung bei siliciumreichem Silicaglas unter Verwednung von verlängerter Post-Ablagerungsverzögerungszeit Surface stabilization in silicon-rich silica glass under Verwednung of prolonged post-deposition delay time
05/18/2006CA2586970A1 Vertical production of photovoltaic devices
05/18/2006CA2586969A1 Pressure control system in a photovoltaic substrate deposition
05/18/2006CA2586966A1 Method and apparatus for forming a thin-film solar cell using a continuous process
05/17/2006EP1657744A2 Wafer guide, MOCVD equipment, and nitride semiconductor growth method
05/17/2006EP1657741A1 Thermal processing unit and thermal processing method
05/17/2006EP1657740A1 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer
05/17/2006EP1657245A2 Organoiridium compound, process for producing the same, and process for producing film
05/17/2006EP1656469A1 Methods of depositing materials over substrates and methods of forming layers over substrates
05/17/2006EP1656468A1 Carrier device for magnetizable substrate
05/17/2006EP1656329A1 Object comprising a surface that is easy to clean, and method for the production thereof
05/17/2006EP1515976B1 Dicopper(i)oxalate complexes for use as precursor substances in metallic copper deposition
05/17/2006EP1193751B1 Electrode and method of manufacturing an electrode
05/17/2006CN2780781Y Multipiece insulator used for base plate sediment cavity back plate
05/17/2006CN1774794A Susceptor and vapor growth device
05/17/2006CN1774525A Gas delivery apparatus for atomic layer deposition
05/17/2006CN1774524A Electrochemical method for the direct nanostructured deposition of material onto a substrate, and semiconductor component produced according to said method
05/17/2006CN1774523A Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
05/17/2006CN1773686A Multilayer structure comprising a substrate and a layer of silicon and germanium deposited heteroepitaxially thereon, and a process for producing it
05/17/2006CN1772947A Diamond cone and its making process
05/17/2006CN1256763C Support device
05/17/2006CN1256760C Copper through-hole in low-K technology
05/17/2006CN1256755C Device and method for processing substrate
05/17/2006CN1256463C Corrosion-resistant hydrophilic multi-layer film forming method by plasma
05/17/2006CN1256462C Hot wire auxiliary microwave electron rotating resonance chemical gas phase settling method and device
05/17/2006CN1256185C Encapsulated long life electroluminescent inorganic material
05/16/2006US7045957 Polycrystal diamond thin film and photocathode and electron tube using the same
05/16/2006US7045747 Heater unit
05/16/2006US7045645 Reacting cyclopentadiene with ruthenium compound; sublimination; forming complex
05/16/2006US7045473 Solid material gasification method, thin film formation process and apparatus
05/16/2006US7045457 Film forming material, film forming method, and silicide film
05/16/2006US7045451 Preparation of group IVA and group VIA compounds
05/16/2006US7045445 Method for fabricating semiconductor device by using PECYCLE-CVD process
05/16/2006US7045170 Anti-stiction coating for microelectromechanical devices
05/16/2006US7045072 Cleaning process and apparatus for silicate materials
05/16/2006US7045045 Workpiece holder for processing apparatus, and processing apparatus using the same
05/16/2006US7045020 Cleaning a component of a process chamber
05/16/2006US7045014 Substrate support assembly
05/16/2006US7044997 Process byproduct trap, methods of use, and system including same