Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2006
06/08/2006DE102005056936A1 Bor-dotierte Diamantbeschichtung und diamantbeschichtetes Werkzeug Boron-doped diamond coating and diamond coated tool
06/08/2006DE102004058426A1 Hochtemperaturbeständiger Belag aus TiOx High temperature resistant coating of TiO x
06/08/2006DE102004057234A1 Substrate holder, has substrate holding plate and spring catching unit engaged at counter plate for attaching holder at counter plate such that upper surface of substrate holding plate rests upon lower surface of counter plate
06/07/2006EP1667217A1 Gas treatment device and heat readiting method
06/07/2006EP1666638A1 Protection of thermal barrier coating by an impermeable barrier coating
06/07/2006EP1666632A2 Porous low dielectric constant compositions and methods for making and using same
06/07/2006EP1666625A1 Method of coating a component inside an apparatus
06/07/2006EP1665354A2 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
06/07/2006EP1665339A2 High-purity crystal growth
06/07/2006EP1665323A2 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
06/07/2006EP1664394A2 Ultrahard diamonds and method of making thereof
06/07/2006EP1664380A2 Method and device for depositing single component or multicomponent layers and series of layers using non-continuous injection of liquid and dissolved starting material by a multi-channel injection unit
06/07/2006EP1664379A1 Metallization of substrate (s) by a liquid/vapor deposition process
06/07/2006EP1664378A2 Replaceable plate expanded thermal plasma apparatus and method
06/07/2006EP1664377A1 Method and an apparatus for applying a coating on a substrate
06/07/2006EP1664376A2 Apparatus for conveying gases to and from a chamber
06/07/2006EP1664375A2 Precursor delivery system
06/07/2006EP1664374A2 Atomic layer deposition methods of forming silicon dioxide comprising layers
06/07/2006EP1664373A2 Annealing single crystal chemical vapor deposition diamonds
06/07/2006EP1664372A1 Hollow nickel shapes by vapor deposition
06/07/2006EP1664371A1 Device for coating the inside of hollow bodies
06/07/2006EP1663892A1 Method for producing substrates comprising temperature-resistant protective coatings
06/07/2006EP1663866A2 Tough diamonds and method of making thereof
06/07/2006EP1663518A2 Glow discharge-generated chemical vapor deposition
06/07/2006EP1532289B1 Zirconium complex used for the cvd method and preparation method of a thin film using thereof
06/07/2006EP1390157A4 Method and apparatus for temperature controlled vapor deposition on a substrate
06/07/2006EP1300380A4 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating.
06/07/2006EP1198283A4 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
06/07/2006EP1086355B1 Ellipsometric method and control device for making a thin-layered component
06/07/2006CN1784773A Atomic layer deposited dielectric layers
06/07/2006CN1784767A Substrate transfer device for thin-film deposition apparatus
06/07/2006CN1784765A Wide temperature range chuck system
06/07/2006CN1783436A Method and apparatus for treating article to be treated
06/07/2006CN1783431A Plasma processing apparatus
06/07/2006CN1783430A Capacitive coupling plasma processing apparatus
06/07/2006CN1783429A Plasma control method and plasma control apparatus
06/07/2006CN1783423A High-rate etching using high pressure F2 plasma with argon diluent
06/07/2006CN1782133A Sulfur hexafluoride remote plasma source clean
06/07/2006CN1782130A Method for removing and re-coating diamond-like carbon film and its finished product
06/07/2006CN1782125A Method for forming dielectric film and dielectric film
06/07/2006CN1782124A Porous low dielectric constant compositions and methods for making and using same
06/07/2006CN1782123A Diamond-like carbon film and its preparing method
06/07/2006CN1782119A Method of coating a component inside an apparatus
06/07/2006CN1781608A Shower head of a wafer treatment apparatus having a gap controller
06/07/2006CN1258804C Method for growing p type zinc oxide crystal film by real-time nitrogen doping
06/07/2006CN1258803C Gaseous fluid conveying system and fluid heating and injecting device in said system
06/07/2006CN1258617C Method for depositing coating having relatively high dielectric constant onto substrate
06/07/2006CN1258500C Adhesive composite coating for diamond and diamond-containing materials and method for producing coating
06/07/2006CN1258420C Surface coated super hard alloy cutting tool
06/06/2006US7057335 Barrier coatings and methods in discharge lamps
06/06/2006US7056842 Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric films
06/06/2006US7056839 Method of forming a silica insulation film with a reduced dielectric constant
06/06/2006US7056835 Surface preparation prior to deposition
06/06/2006US7056834 Forming a plurality of thin-film devices using imprint lithography
06/06/2006US7056833 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
06/06/2006US7056806 Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
06/06/2006US7056763 Composite structure for electronic microsystems and method for production of said composite structure
06/06/2006US7056560 Reacting organosilicon compound and hydrocarbon; vapor phase; aftertreatment with electron beams
06/06/2006US7056479 Depositing a metal catalyst on carbon paper, and passing feedstock carbon containing source over the substrate while applying electrical current to heat
06/06/2006US7056416 Atmospheric pressure plasma processing method and apparatus
06/06/2006US7056389 Method and device for thermal treatment of substrates
06/06/2006US7056388 Reaction chamber with at least one HF feedthrough
06/06/2006US7055809 Vaporizing reactant liquids for chemical vapor deposition film processing
06/06/2006US7055808 Vaporizing reactant liquids for chemical vapor deposition film processing
06/06/2006US7055263 Method for cleaning deposition chambers for high dielectric constant materials
06/06/2006US7055236 Joining method for high-purity ceramic parts
06/06/2006US7055212 Clean gas injector system for reactor chamber
06/06/2006CA2156301C Safety document and process for producing the same
06/03/2006CA2489199A1 Ceramic thin film on various substrates, and process for producing same
06/01/2006WO2006058240A1 Gas distribution system for improved transient vapor phase deposition
06/01/2006WO2006058061A1 Automatic reconstitution injector device
06/01/2006WO2006057959A1 High resolution substrate holder leveling device and method
06/01/2006WO2006057829A2 Scratch resistant coated article and method of making
06/01/2006WO2006057711A2 Method for preparing solid precursor tray for use in solid precursor evaporation system
06/01/2006WO2006057710A1 A solid precursor delivery system comprising replaceable stackable trays
06/01/2006WO2006057709A2 Method for deposition of metal layers from metal carbonyl precursors
06/01/2006WO2006057708A2 Method and system for measuring a flow rate in a solid precursor delivery system
06/01/2006WO2006057707A1 Method and system for performing in-situ cleaning of a deposition system
06/01/2006WO2006057706A2 Method for deposition of metal layers from metal carbonyl precursors
06/01/2006WO2006057659A1 Growth of carbon nanotubes at low temperature on a transition metal layer
06/01/2006WO2006057436A1 Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided
06/01/2006WO2006056091A1 Vacuum processing chamber for very large area substrates
06/01/2006WO2006056090A1 Method for applying selectively a layer to a structured substrate by the usage of a temperature gradient in the substrate
06/01/2006WO2006024808A3 Method for transferring a functional organic molecule onto a transparent substrate
06/01/2006WO2006003322A3 Ion implanter operating in pulsed plasma mode
06/01/2006US20060115957 Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
06/01/2006US20060115683 For milling of grey cast iron with or without cast skin under dry conditions at high cutting speeds and milling of nodular cast iron and compacted graphite iron with or without cast skin under dry conditions at high cutting speeds; cemented carbide cutting tool
06/01/2006US20060115662 enhanced wear resistance and toughness; utilizing short pulses of precursors followed by purging steps with an inert gas such as Ar
06/01/2006US20060115660 Durable thermal barrier coatings
06/01/2006US20060115600 Substrate table, production method therefor and plasma treating device
06/01/2006US20060115596 Solution/suspension of precursors of lead, zirconium and titanium, which do not undergo ligand exchange (2,2,6,6-tetramethyl-3,5-heptanedione complexes); vaporized including Ar, N2, H2, He, or NH3 as a carrier and O2, N2O, or O3 as an oxidizing reactant
06/01/2006US20060115595 Organometallic compounds
06/01/2006US20060115594 Apparatus for the efficient coating of substrates including plasma cleaning
06/01/2006US20060115593 Method for preparing solid precursor tray for use in solid precursor evaporation system
06/01/2006US20060115591 Pentaborane(9) storage and delivery
06/01/2006US20060115590 Method and system for performing in-situ cleaning of a deposition system
06/01/2006US20060115589 Method and system for measuring a flow rate in a solid precursor delivery system
06/01/2006US20060115588 System and method of fabrication and application of thin-films with continuously graded or discrete physical property parameters to functionally broadband monolithic microelectronic optoelectronic/sensor/actuator device arrays
06/01/2006US20060115580 Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
06/01/2006US20060115577 Photoresist supply apparatus and method of controlling the operation thereof