| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/22/2006 | US20060130767 Purged vacuum chuck with proximity pins |
| 06/22/2006 | US20060130766 Deposition source and deposition apparatus including deposition source |
| 06/22/2006 | US20060130765 Arrangement for coating a substrate |
| 06/22/2006 | US20060130764 Susceptor for apparatus fabricating thin film |
| 06/22/2006 | US20060130763 Restricted radiated heating assembly for high temperature processing |
| 06/22/2006 | US20060130762 Wafer heating and temperature control by backside fluid injection |
| 06/22/2006 | US20060130761 Thin film processing system and method |
| 06/22/2006 | US20060130760 Vacuum coating unit and a method for the differentiated coating of spectacle lenses |
| 06/22/2006 | US20060130759 Substrate processing system for performing exposure process in gas atmosphere |
| 06/22/2006 | US20060130758 Methods and arrangement for the reduction of byproduct deposition in a plasma processing system |
| 06/22/2006 | US20060130757 Apparatus for active dispersion of precursors |
| 06/22/2006 | US20060130756 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications |
| 06/22/2006 | US20060130755 Pulsed mass flow measurement system and method |
| 06/22/2006 | US20060130743 Low temperature load and bake |
| 06/22/2006 | DE102005058691A1 Verfahren zum Abscheiden einer Metallverbindungsschicht und Vorrichtung zum Abscheiden einer Metallverbindungsschicht A method of depositing a metal interconnect layer and apparatus for depositing a metal interconnect layer |
| 06/22/2006 | DE102004061094A1 Deposition of single layers, on a flat or structured substrate, uses a limiter to stop the deposition automatically when the layer is closed |
| 06/22/2006 | DE102004059200A1 Device for cooling a substrate used in a vacuum deposition process comprises a brush-like unit with metallic bristles arranged between the substrate and a cooling body |
| 06/21/2006 | EP1672094A1 Coated semiconductor wafer and method and apparatus to obtain it |
| 06/21/2006 | EP1672093A1 Film-forming apparatus and film-forming method |
| 06/21/2006 | EP1671164A1 Fabrication of semiconductor metamaterials |
| 06/21/2006 | EP1670966A1 Vapour deposition method |
| 06/21/2006 | EP1670730A1 Synthesis of germanium sulphide and related compounds |
| 06/21/2006 | EP1570105B1 Method for chemical vapour deposition (cvd) of zrb sb x /sb c sb y /sb n sb z /sb (or x+y+z=1) layers and a cutting tool coated with said layer |
| 06/21/2006 | EP1238421A4 Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
| 06/21/2006 | EP1236224A4 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide |
| 06/21/2006 | EP1194950A4 Process for polycrystalline silicon film growth and apparatus for same |
| 06/21/2006 | EP1146958A4 Apparatus and method for point-of-use treatment of effluent gas streams |
| 06/21/2006 | EP0839217B1 A plasma enhanced chemical processing reactor and method |
| 06/21/2006 | CN2789274Y Chemical gas phase film forming device and down pulling mechanism thereof |
| 06/21/2006 | CN1791989A Barrier films for plastic substrates fabricated by atomic layer deposition |
| 06/21/2006 | CN1791972A 等离子体处理装置 Plasma processing apparatus |
| 06/21/2006 | CN1791971A A method of fault detection in manufacturing equipment |
| 06/21/2006 | CN1791706A Method for producing single crystal of multi- element oxide single crystal containing bismuth as constituting element |
| 06/21/2006 | CN1791702A A method to encapsulate phosphor via chemical vapor deposition |
| 06/21/2006 | CN1791701A Porous materials functionalized by vacuum deposition |
| 06/21/2006 | CN1790632A Alumina dielectric film material with high dielectric constant on silicon substrate and preparing method |
| 06/21/2006 | CN1790631A Method for eliminating graphics effect in furnace tube operation |
| 06/21/2006 | CN1790630A Method for depositing silicide on silicon substrate |
| 06/21/2006 | CN1790629A Film formation method and apparatus for semiconductor process |
| 06/21/2006 | CN1790617A Replacing method of valv device, processing system and sealing components |
| 06/21/2006 | CN1790613A Plasma processing method |
| 06/21/2006 | CN1789490A Susceptor for apparatus fabricating thin film |
| 06/21/2006 | CN1789489A Substrate processing apparatus |
| 06/21/2006 | CN1789488A Reaction container |
| 06/21/2006 | CN1789487A Method of depositing a metal compound layer and apparatus for depositing a metal compound layer |
| 06/21/2006 | CN1789485A Methods and apparatus for providing a floating seal for chamber doors |
| 06/21/2006 | CN1260808C Method for preparing capacitor in semiconductor assembly |
| 06/21/2006 | CN1260774C Substrate for ferroelectric unit or piezoelectric unit and its manufacturing method and function unit |
| 06/21/2006 | CN1260770C Zirconia toughtened ceramic components and coatings in semiconductor processing equipment and method of manufacturing thereof |
| 06/21/2006 | CN1260403C Deposition of atom layer by utilizing precursor containing nitrate |
| 06/20/2006 | US7064224 Organometallic complexes and their use as precursors to deposit metal films |
| 06/20/2006 | US7064089 Plasma treatment apparatus and method for plasma treatment |
| 06/20/2006 | US7064088 Method for forming low-k hard film |
| 06/20/2006 | US7064083 Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof |
| 06/20/2006 | US7064077 Method for high aspect ratio HDP CVD gapfill |
| 06/20/2006 | US7063981 Producing a thin film on a substrate by subjecting the substrate to repeated pulses of gas or vapor-phase reactants |
| 06/20/2006 | US7063871 CVD process capable of reducing incubation time |
| 06/20/2006 | US7063870 Manufacture of functionally graded carbon-carbon composites |
| 06/15/2006 | WO2006062660A2 High purity granular silicon and method of manufacturing the same |
| 06/15/2006 | WO2006062576A2 Method and apparatus for improved baffle plate |
| 06/15/2006 | WO2006061785A2 Combustion chemical vapor deposition on temperature-sensitive substrates |
| 06/15/2006 | WO2006061784A2 Substrate temperature control for combustion chemical vapor deposition |
| 06/15/2006 | WO2006061598A1 Medical implant comprising a biological substrate and a diamond-like carbon coating |
| 06/15/2006 | WO2006040545A3 Alloyed tungsten produced by chemical vapour deposition |
| 06/15/2006 | WO2006023894A3 Semiconductor processing components and semiconductor processing utilizing same |
| 06/15/2006 | WO2006017070A3 Protective cotaing on a substrate and method of making thereof |
| 06/15/2006 | WO2005117125A3 Yield improvement in silicon-germanium epitaxial growth |
| 06/15/2006 | US20060128132 Method and system for controlling the presence of fluorine in refractory metal layers |
| 06/15/2006 | US20060127700 Coating film for inhibiting coke formation in ethylene dichloride pyrolysis cracker and method of producing the same |
| 06/15/2006 | US20060127692 Metal sulfide thin film and method for production thereof |
| 06/15/2006 | US20060127683 Insulating film material containing an organic silane compound, its production method and semiconductor device |
| 06/15/2006 | US20060127672 Method of providing a heat spreader |
| 06/15/2006 | US20060127601 Film formation method |
| 06/15/2006 | US20060127600 Film-forming system and film-forming method |
| 06/15/2006 | US20060127599 Process and apparatus for preparing a diamond substance |
| 06/15/2006 | US20060127597 Method for producing containing fullerene and apparatus for producing same |
| 06/15/2006 | US20060127584 Method and apparatus for applying flowable materials |
| 06/15/2006 | US20060127578 Precursors for silica or metal silicate films |
| 06/15/2006 | US20060127577 Niobium-based compositions and coatings, niobium oxides and their alloys applied by thermal spraying and their use as an anticorrosive |
| 06/15/2006 | US20060127576 Method and process reactor for sequential gas phase deposition by means of a process and an auxiliatry chamber |
| 06/15/2006 | US20060127574 Process and apparatus for the coating or modification of surfaces |
| 06/15/2006 | US20060127300 Method to grow carbon thin films consisting entirely of diamond grains 3-5 nm in size and high-energy grain boundaries |
| 06/15/2006 | US20060127068 Method and apparatus for silicon oxide deposition on large area substrates |
| 06/15/2006 | US20060125352 Method of manufacturing ceramic film and structure including ceramic film |
| 06/15/2006 | US20060125129 Vaporizer and apparatus for vaporizing and supplying |
| 06/15/2006 | US20060125099 reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or hydrogen plasma; very uniform thickness and excellent step coverage; good electrical conductors; microelectronics; similarly depositing molybdenum nitride suitable for layers alternating with silicon in X-ray mirrors |
| 06/15/2006 | US20060124634 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 06/15/2006 | US20060124455 Thin film forming device and thin film forming method |
| 06/15/2006 | US20060124349 Diamond-coated silicon and electrode |
| 06/15/2006 | US20060124244 Plasma processor and plasma processing method |
| 06/15/2006 | US20060124179 Raw solution feeding system for vaporizer and method of cleaning the raw solution feeding system |
| 06/15/2006 | US20060124151 Method for cleaning substrate processing chamber |
| 06/15/2006 | US20060124062 Vapor phase growth apparatus |
| 06/15/2006 | US20060124061 Molecule supply source for use in thin-film forming |
| 06/15/2006 | US20060124060 Heat-treating apparatus |
| 06/15/2006 | US20060124059 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution |
| 06/15/2006 | US20060124058 Substrate processing device |
| 06/15/2006 | US20060124057 Film formation apparatus |
| 06/15/2006 | US20060123862 Metal wire coated with a layer of metal material intended to reinforce elastomeric materials and methods for producing the same |
| 06/14/2006 | EP1670049A1 Production of insulating film with low dielectric constant |