Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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07/18/2006 | US7077159 Processing apparatus having integrated pumping system |
07/18/2006 | CA2148160C Method for treating continuous extended lengths of tubular member interiors |
07/13/2006 | WO2006074489A1 Low-frequency bias power in hdp-cvd processes |
07/13/2006 | WO2006073818A2 System for and method of forming via holes by use of selective plasma etching in a continuous inline shadow mask deposition process |
07/13/2006 | WO2006073568A2 MULTI-LAYER HIGH QUALITY GATE DIELECTRIC FOR LOW-TEMPERATURE POLY-SILICON TFTs |
07/13/2006 | WO2006073237A1 Apparatus and method for forming thin layer on film-shaped polymeric article using ecr-cvd and electron beam |
07/13/2006 | WO2006073236A1 Apparatus and method for forming thin metal layer on three-dimensional polymeric article using ecr-cvd and electron beam |
07/13/2006 | WO2006073017A1 Apparatus for manufacturing carbon film by plasma cvd, method for manufacturing the same, and carbon film |
07/13/2006 | WO2006073012A1 Dlc film-forming apparatus |
07/13/2006 | WO2006072288A2 Al2o3 multilayer plate |
07/13/2006 | WO2006057711A3 Method for preparing solid precursor tray for use in solid precursor evaporation system |
07/13/2006 | WO2006044419A3 Magnetic-field concentration in inductively coupled plasma reactors |
07/13/2006 | WO2006019438A3 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films |
07/13/2006 | WO2004023510A3 Capacitively coupled plasma reactor with uniform radial distribution of plasma |
07/13/2006 | US20060154480 Vaporizer for cvd, solution voporizing cvd system and voporization method for cvd |
07/13/2006 | US20060154451 Epitaxial growth method |
07/13/2006 | US20060154383 Processing apparatus and processing method |
07/13/2006 | US20060153996 Method and system for laser cladding |
07/13/2006 | US20060153994 subjecting a gas containing H2 and carbon(CH4) to a pulsed discharge, pulsed discharge has a succession of low-power states and of high-power states and a peak absorbed power, in order to obtain carbon containing radicals in the plasma, radicals deposit on the substrate in order to form a diamond film |
07/13/2006 | US20060153986 Evaporation method and apparatus using infrared guiding heater |
07/13/2006 | US20060153985 High throughput surface treatment on coiled flexible substrates |
07/13/2006 | US20060153973 Forming a barrier layer within the vias of a dielectric substrate; forming a ruthenium layer on the barrier; exposing a contact layer within the vias by removing material from the bottom surface during a punch-through step; and filling the vias with a copper material; high aspect ratio interconnects |
07/13/2006 | US20060151884 Insulatng film material containing organic silane or organic siloxane compound, method for produing sane, and semiconductor device |
07/13/2006 | US20060151852 In-situ formation of metal insulator metal capacitors cross reference to related applications |
07/13/2006 | US20060151461 Delivery of solid chemical precursors |
07/13/2006 | US20060151113 Apparatus for controlling flow rate of gases used in semiconductor deivce by differential pressure |
07/13/2006 | US20060150915 Vaporization source with baffle |
07/13/2006 | US20060150914 Plasma process device |
07/13/2006 | US20060150913 Low-frequency bias power in HDP-CVD processes |
07/13/2006 | US20060150912 Ion gun deposition and alignment for liquid-crystal applications |
07/13/2006 | US20060150911 Plasma generating electrode, plasma generator, and exhaust gas cleaner |
07/13/2006 | US20060150910 Alignment system, vertical tray transporting assembly, and deposition apparatus with the same |
07/13/2006 | US20060150909 Multi-place coating apparatus and process for plasma coating |
07/13/2006 | US20060150908 Method for the treatment of a web-type material in a plasma-assisted process |
07/13/2006 | US20060150907 Method and device for blacking components |
07/13/2006 | US20060150906 Wafer boat for reduced shadow marks |
07/13/2006 | US20060150905 Substrate processing apparatus |
07/13/2006 | US20060150904 Substrate-processing apparatus and method of producing a semiconductor device |
07/13/2006 | US20060150903 Method and apparatus for processing substrates |
07/13/2006 | US20060150862 Coatings |
07/13/2006 | DE102005003336B3 Deposition of a thin coating on a substrate surface, using plasma enhanced atomic layer deposition, has a pause between process and reactive gas feeds and a further pause for a plasma to be generated |
07/13/2006 | DE102004015216B4 Process and modular assembly to modify the surface of a metal substrate surface by exposure to plasma |
07/13/2006 | CA2588899A1 Al2o3 multilayer plate |
07/13/2006 | CA2571380A1 Dlc film-forming apparatus |
07/12/2006 | EP1678746A2 Method for forming a dielectric on a metallic layer and capacitor assembly |
07/12/2006 | EP1678353A2 Atomic layer deposition of hafnium-based high-k dielectric |
07/12/2006 | EP1678351A1 Method and system for selectively coating metal surfaces |
07/12/2006 | EP1677919A2 Diamond coated article and method of its production |
07/12/2006 | EP1677835A2 Method and device for supplying at least one machining station for a workpiece |
07/12/2006 | CN2794658Y Gas distrubutor having directed gas flow |
07/12/2006 | CN1802881A Amorphous carbon layer for heat exchangers |
07/12/2006 | CN1802739A A method of preparation of an epitaxial substrate |
07/12/2006 | CN1802729A Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
07/12/2006 | CN1802723A System and method for inductive coupling of an expanding thermal plasma |
07/12/2006 | CN1800446A Delivery device |
07/12/2006 | CN1800445A Method of chemical gas phase precipitation for growing carbon doped silicon germanium alloy buffer layer and germanium film |
07/12/2006 | CN1800444A Film formation apparatus and method of using the same |
07/12/2006 | CN1799739A Coated cutting insert |
07/12/2006 | CN1264205C Method for making non-crystal metal oxide film, capacity element and semiconductor device |
07/12/2006 | CN1263979C Gas supply device and method |
07/12/2006 | CN1263890C Method for preparing diamond thin film self support round window sample |
07/12/2006 | CN1263696C Chemical vapor deposition of antimony-doped metal oxide |
07/12/2006 | CN1263695C Photoactive coating, coated article, and method of making same |
07/12/2006 | CN1263654C Plastic container having carbon-treated internal surface |
07/11/2006 | US7075111 Nitride semiconductor substrate and its production method |
07/11/2006 | US7075081 Method of fabrication of an infrared radiation detector and infrared detector device |
07/11/2006 | US7075037 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer |
07/11/2006 | US7074744 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
07/11/2006 | US7074719 ALD deposition of ruthenium |
07/11/2006 | US7074708 Method of decreasing the k value in sioc layer deposited by chemical vapor deposition |
07/11/2006 | US7074698 Method of fabricating semiconductor device using plasma-enhanced CVD |
07/11/2006 | US7074676 Memory film, method of manufacturing the memory film, memory element, semiconductor storage device, semiconductor integrated circuit, and portable electronic equipment |
07/11/2006 | US7074548 Using raw material fluid containing alcohol, supercritical fluid or liquid, and a condensation polymer containing an element of a target metal oxide compound, which may be prepared from a metal oxide. |
07/11/2006 | US7074501 Coatings with low permeation of gases and vapors |
07/11/2006 | US7074489 Organofluorosilicate glass films containing both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species; insulating layers for integrated circuits and associated electronic devices |
07/11/2006 | US7074461 plasma enhanced chemical vapor deposition of bis-trimethylsilylmethane and an oxygen retaining gas, such as oxygen, ozone, nitrous oxide, or hydrogen peroxide, in the presence of hydrogen; carbon loss in the SiOC film during post processing is minimized due to the supplied hydrogen |
07/11/2006 | US7074380 Method for manufacturing carbon fibers and electron emitting device using the same |
07/11/2006 | US7074298 High density plasma CVD chamber |
07/11/2006 | US7074278 Removable lid and floating pivot |
07/11/2006 | US7074275 Apparatus for treating workpieces |
07/11/2006 | US7073522 Apparatus for applying disparate etching solutions to interior and exterior surfaces |
07/11/2006 | CA2229476C Fluid control apparatus |
07/06/2006 | WO2006071527A2 Production of nanostructures by curie point induction heating |
07/06/2006 | WO2006071341A2 Method and apparatus to determine consumable part condition |
07/06/2006 | WO2006071126A1 Thin films prepared with gas phase deposition technique |
07/06/2006 | WO2006070956A1 Ultra hydrophilic ti-o-c based nano film and fabrication method thereof |
07/06/2006 | WO2006070799A1 METHOD FOR PRODUCING ZnO-BASED TRANSPARENT ELECTROCONDUCTIVE FILM BY MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) METHOD |
07/06/2006 | WO2006070689A1 Semiconductor manufacturing apparatus, abnormality detection in such semiconductor manufacturing apparatus, method for specifying abnormality cause or predicting abnormality, and recording medium wherein computer program for executing such method is recorded |
07/06/2006 | WO2006070165A1 Method for deposing a metallic carbonitride layer for producing barrier electrodes or layers |
07/06/2006 | WO2006070130A2 Method for preparing nanoparticles of a metal or a metal alloy, dispersed on a substrate, by chemical vapour deposition |
07/06/2006 | WO2006069908A1 Cvd reactor comprising an rf-heated treatment chamber |
07/06/2006 | WO2006015982A3 Method of making vapour deposited oxygen-scavenging particles |
07/06/2006 | WO2006000599A8 Lens-coating gas dispenser and corresponding coating device, lens and method |
07/06/2006 | WO2005062762A3 Chemical vapor deposition process using novel precursors |
07/06/2006 | WO2005060632A3 High-throughput ex-situ method for rare-earth-barium-copper-oxide (rebco) film growth |
07/06/2006 | WO2004114461A3 Plasma production device and method and rf driver circuit with adjustable duty cycle |
07/06/2006 | US20060148370 Method of manufacturing micro structure, and method of manufacturing mold material |
07/06/2006 | US20060148351 Application of an oxidizing agent to selected areas of the textile; coating the textile with pyrrole by vapor deposition to form a conductive coated textile having a polypyrrole network; stabilizing the conductive coated textile; and forming the conductive flexible textile arrays as a sensor |
07/06/2006 | US20060148273 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill |
07/06/2006 | US20060148271 Silicon source reagent compositions, and method of making and using same for microelectronic device structure |