Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2006
07/18/2006US7077159 Processing apparatus having integrated pumping system
07/18/2006CA2148160C Method for treating continuous extended lengths of tubular member interiors
07/13/2006WO2006074489A1 Low-frequency bias power in hdp-cvd processes
07/13/2006WO2006073818A2 System for and method of forming via holes by use of selective plasma etching in a continuous inline shadow mask deposition process
07/13/2006WO2006073568A2 MULTI-LAYER HIGH QUALITY GATE DIELECTRIC FOR LOW-TEMPERATURE POLY-SILICON TFTs
07/13/2006WO2006073237A1 Apparatus and method for forming thin layer on film-shaped polymeric article using ecr-cvd and electron beam
07/13/2006WO2006073236A1 Apparatus and method for forming thin metal layer on three-dimensional polymeric article using ecr-cvd and electron beam
07/13/2006WO2006073017A1 Apparatus for manufacturing carbon film by plasma cvd, method for manufacturing the same, and carbon film
07/13/2006WO2006073012A1 Dlc film-forming apparatus
07/13/2006WO2006072288A2 Al2o3 multilayer plate
07/13/2006WO2006057711A3 Method for preparing solid precursor tray for use in solid precursor evaporation system
07/13/2006WO2006044419A3 Magnetic-field concentration in inductively coupled plasma reactors
07/13/2006WO2006019438A3 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films
07/13/2006WO2004023510A3 Capacitively coupled plasma reactor with uniform radial distribution of plasma
07/13/2006US20060154480 Vaporizer for cvd, solution voporizing cvd system and voporization method for cvd
07/13/2006US20060154451 Epitaxial growth method
07/13/2006US20060154383 Processing apparatus and processing method
07/13/2006US20060153996 Method and system for laser cladding
07/13/2006US20060153994 subjecting a gas containing H2 and carbon(CH4) to a pulsed discharge, pulsed discharge has a succession of low-power states and of high-power states and a peak absorbed power, in order to obtain carbon containing radicals in the plasma, radicals deposit on the substrate in order to form a diamond film
07/13/2006US20060153986 Evaporation method and apparatus using infrared guiding heater
07/13/2006US20060153985 High throughput surface treatment on coiled flexible substrates
07/13/2006US20060153973 Forming a barrier layer within the vias of a dielectric substrate; forming a ruthenium layer on the barrier; exposing a contact layer within the vias by removing material from the bottom surface during a punch-through step; and filling the vias with a copper material; high aspect ratio interconnects
07/13/2006US20060151884 Insulatng film material containing organic silane or organic siloxane compound, method for produing sane, and semiconductor device
07/13/2006US20060151852 In-situ formation of metal insulator metal capacitors cross reference to related applications
07/13/2006US20060151461 Delivery of solid chemical precursors
07/13/2006US20060151113 Apparatus for controlling flow rate of gases used in semiconductor deivce by differential pressure
07/13/2006US20060150915 Vaporization source with baffle
07/13/2006US20060150914 Plasma process device
07/13/2006US20060150913 Low-frequency bias power in HDP-CVD processes
07/13/2006US20060150912 Ion gun deposition and alignment for liquid-crystal applications
07/13/2006US20060150911 Plasma generating electrode, plasma generator, and exhaust gas cleaner
07/13/2006US20060150910 Alignment system, vertical tray transporting assembly, and deposition apparatus with the same
07/13/2006US20060150909 Multi-place coating apparatus and process for plasma coating
07/13/2006US20060150908 Method for the treatment of a web-type material in a plasma-assisted process
07/13/2006US20060150907 Method and device for blacking components
07/13/2006US20060150906 Wafer boat for reduced shadow marks
07/13/2006US20060150905 Substrate processing apparatus
07/13/2006US20060150904 Substrate-processing apparatus and method of producing a semiconductor device
07/13/2006US20060150903 Method and apparatus for processing substrates
07/13/2006US20060150862 Coatings
07/13/2006DE102005003336B3 Deposition of a thin coating on a substrate surface, using plasma enhanced atomic layer deposition, has a pause between process and reactive gas feeds and a further pause for a plasma to be generated
07/13/2006DE102004015216B4 Process and modular assembly to modify the surface of a metal substrate surface by exposure to plasma
07/13/2006CA2588899A1 Al2o3 multilayer plate
07/13/2006CA2571380A1 Dlc film-forming apparatus
07/12/2006EP1678746A2 Method for forming a dielectric on a metallic layer and capacitor assembly
07/12/2006EP1678353A2 Atomic layer deposition of hafnium-based high-k dielectric
07/12/2006EP1678351A1 Method and system for selectively coating metal surfaces
07/12/2006EP1677919A2 Diamond coated article and method of its production
07/12/2006EP1677835A2 Method and device for supplying at least one machining station for a workpiece
07/12/2006CN2794658Y Gas distrubutor having directed gas flow
07/12/2006CN1802881A Amorphous carbon layer for heat exchangers
07/12/2006CN1802739A A method of preparation of an epitaxial substrate
07/12/2006CN1802729A Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
07/12/2006CN1802723A System and method for inductive coupling of an expanding thermal plasma
07/12/2006CN1800446A Delivery device
07/12/2006CN1800445A Method of chemical gas phase precipitation for growing carbon doped silicon germanium alloy buffer layer and germanium film
07/12/2006CN1800444A Film formation apparatus and method of using the same
07/12/2006CN1799739A Coated cutting insert
07/12/2006CN1264205C Method for making non-crystal metal oxide film, capacity element and semiconductor device
07/12/2006CN1263979C Gas supply device and method
07/12/2006CN1263890C Method for preparing diamond thin film self support round window sample
07/12/2006CN1263696C Chemical vapor deposition of antimony-doped metal oxide
07/12/2006CN1263695C Photoactive coating, coated article, and method of making same
07/12/2006CN1263654C Plastic container having carbon-treated internal surface
07/11/2006US7075111 Nitride semiconductor substrate and its production method
07/11/2006US7075081 Method of fabrication of an infrared radiation detector and infrared detector device
07/11/2006US7075037 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer
07/11/2006US7074744 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
07/11/2006US7074719 ALD deposition of ruthenium
07/11/2006US7074708 Method of decreasing the k value in sioc layer deposited by chemical vapor deposition
07/11/2006US7074698 Method of fabricating semiconductor device using plasma-enhanced CVD
07/11/2006US7074676 Memory film, method of manufacturing the memory film, memory element, semiconductor storage device, semiconductor integrated circuit, and portable electronic equipment
07/11/2006US7074548 Using raw material fluid containing alcohol, supercritical fluid or liquid, and a condensation polymer containing an element of a target metal oxide compound, which may be prepared from a metal oxide.
07/11/2006US7074501 Coatings with low permeation of gases and vapors
07/11/2006US7074489 Organofluorosilicate glass films containing both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species; insulating layers for integrated circuits and associated electronic devices
07/11/2006US7074461 plasma enhanced chemical vapor deposition of bis-trimethylsilylmethane and an oxygen retaining gas, such as oxygen, ozone, nitrous oxide, or hydrogen peroxide, in the presence of hydrogen; carbon loss in the SiOC film during post processing is minimized due to the supplied hydrogen
07/11/2006US7074380 Method for manufacturing carbon fibers and electron emitting device using the same
07/11/2006US7074298 High density plasma CVD chamber
07/11/2006US7074278 Removable lid and floating pivot
07/11/2006US7074275 Apparatus for treating workpieces
07/11/2006US7073522 Apparatus for applying disparate etching solutions to interior and exterior surfaces
07/11/2006CA2229476C Fluid control apparatus
07/06/2006WO2006071527A2 Production of nanostructures by curie point induction heating
07/06/2006WO2006071341A2 Method and apparatus to determine consumable part condition
07/06/2006WO2006071126A1 Thin films prepared with gas phase deposition technique
07/06/2006WO2006070956A1 Ultra hydrophilic ti-o-c based nano film and fabrication method thereof
07/06/2006WO2006070799A1 METHOD FOR PRODUCING ZnO-BASED TRANSPARENT ELECTROCONDUCTIVE FILM BY MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) METHOD
07/06/2006WO2006070689A1 Semiconductor manufacturing apparatus, abnormality detection in such semiconductor manufacturing apparatus, method for specifying abnormality cause or predicting abnormality, and recording medium wherein computer program for executing such method is recorded
07/06/2006WO2006070165A1 Method for deposing a metallic carbonitride layer for producing barrier electrodes or layers
07/06/2006WO2006070130A2 Method for preparing nanoparticles of a metal or a metal alloy, dispersed on a substrate, by chemical vapour deposition
07/06/2006WO2006069908A1 Cvd reactor comprising an rf-heated treatment chamber
07/06/2006WO2006015982A3 Method of making vapour deposited oxygen-scavenging particles
07/06/2006WO2006000599A8 Lens-coating gas dispenser and corresponding coating device, lens and method
07/06/2006WO2005062762A3 Chemical vapor deposition process using novel precursors
07/06/2006WO2005060632A3 High-throughput ex-situ method for rare-earth-barium-copper-oxide (rebco) film growth
07/06/2006WO2004114461A3 Plasma production device and method and rf driver circuit with adjustable duty cycle
07/06/2006US20060148370 Method of manufacturing micro structure, and method of manufacturing mold material
07/06/2006US20060148351 Application of an oxidizing agent to selected areas of the textile; coating the textile with pyrrole by vapor deposition to form a conductive coated textile having a polypyrrole network; stabilizing the conductive coated textile; and forming the conductive flexible textile arrays as a sensor
07/06/2006US20060148273 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
07/06/2006US20060148271 Silicon source reagent compositions, and method of making and using same for microelectronic device structure