Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2006
07/26/2006EP1682445A1 Device and method for patterning structures on a substrate
07/26/2006EP1214459A4 Pulsed plasma processing method and apparatus
07/26/2006EP0789671B1 The combinatorial synthesis of novel materials
07/26/2006CN1808695A Thin film processing method and system
07/26/2006CN1808691A Vacuum processing apparatus
07/26/2006CN1808690A Film forming method, film forming system and recording medium
07/26/2006CN1807705A Method of producing a dopant gas species
07/26/2006CN1807681A Evaporating device and method utilizing same
07/26/2006CN1266749C Manufacture method of semiconductor device
07/26/2006CN1266746C Method for forming strong dielectric membrane
07/26/2006CN1266308C Film formation method for semiconductor processing
07/26/2006CN1266307C Method for preparing onion shape fulven by chemical vapour phase deposition
07/25/2006US7082346 Semiconductor manufacturing apparatus and semiconductor device manufacturing method
07/25/2006US7081639 Semiconductor photodetection device and fabrication process thereof
07/25/2006US7081418 Method of fabricating a multi-layered thin film by using photolysis chemical vapor deposition
07/25/2006US7081333 Depositing a stimulable phosphor onto the support to grow columnar crystals of the stimulable phosphor to form the stimulable phosphor layer, wherein depositing is conducted with rotating the support using a vacuum deposition apparatus comprising a vacuum vessel having a support rotation mechanism
07/25/2006US7081296 Method for growing thin films
07/25/2006US7081271 Cyclical deposition of refractory metal silicon nitride
07/25/2006US7081267 Nanostructured powders and related nanotechnology
07/25/2006US7081166 Planetary system workpiece support and method for surface treatment of workpieces
07/25/2006US7081165 Chemical vapor deposition apparatus having a susceptor with a grounded lift pin
07/25/2006US7080528 Method of forming a phosphorus doped optical core using a PECVD process
07/25/2006US7080440 Very low moisture o-ring and method for preparing the same
07/20/2006WO2006075998A2 Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
07/20/2006WO2006075709A1 Vaporizer and processor
07/20/2006WO2006075219A2 Low friction sliding mechanism
07/20/2006WO2006045576A3 Method for protecting parts made of creep-resistant steel from corroding
07/20/2006WO2006036196A3 Surface and composition enhancements to high aspect ratio c-mems
07/20/2006WO2005007936A3 Ultrahard diamonds and method of making thereof
07/20/2006US20060160370 Solid material gasification method, thin film formation process and apparatuses
07/20/2006US20060160360 Evaporation method and evaporator
07/20/2006US20060160359 Vacuum processing apparatus
07/20/2006US20060160344 Rhodium film and method of formation
07/20/2006US20060160336 Silicon layer production method and solar cell production method
07/20/2006US20060160333 Thermal treatment equipment and method for heat-treating
07/20/2006US20060159948 Resin product with plating film and manufacturing method thereof
07/20/2006US20060159920 Microstructured effect pigments
07/20/2006US20060159861 Additives to prevent degradation of alkyl-hydrogen siloxanes
07/20/2006US20060159848 Method of making wear-resistant components
07/20/2006US20060159847 Method and apparatus for low temperature dielectric deposition using monomolecular precursors
07/20/2006US20060159844 Process and apparatus for producing magnetic recording medium
07/20/2006US20060159843 Method of substrate treatment for manufacturing of color filters by inkjet printing systems
07/20/2006US20060158381 Slot array antenna and plasma processing apparatus
07/20/2006US20060157742 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same
07/20/2006US20060157714 Nitride semiconductor light emitting device
07/20/2006US20060157340 Transfer chamber for vacuum processing system
07/20/2006US20060157198 Member for plasma processing apparatus and plasma processing apparatus
07/20/2006US20060156988 Pin set for a reactor
07/20/2006US20060156987 Lift pin mechanism and substrate carrying device of a process chamber
07/20/2006US20060156986 Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article
07/20/2006US20060156985 Apparatus for method of treating exhaust gas
07/20/2006US20060156984 Plasma processing apparatus and plasma processing method
07/20/2006US20060156983 Low temperature, atmospheric pressure plasma generation and applications
07/20/2006US20060156982 Apparatus for fabricating semiconductor device
07/20/2006US20060156981 Wafer support pin assembly
07/20/2006US20060156980 Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus
07/20/2006US20060156979 Substrate processing apparatus using a batch processing chamber
07/20/2006DE102005007825A1 Verfahren zur Herstellung einer reflexionsmindernden Beschichtung A process for preparing a reflection reducing coating
07/20/2006DE102005002674A1 Device for plasma-chemical gas phase deposition on substrate in vacuum has HF-electrode installed outside reaction chamber, and complete reaction chamber and/or parts of it are temporarily removable and/or exchangeable
07/20/2006CA2597898A1 Methods for making high-temperature coatings having pt metal modified .gamma.ni+.gamma.'-ni3a1 alloy compositions and a reactive element
07/19/2006EP1681715A1 Plasma processing apparatus
07/19/2006EP1681369A1 Metal thin film chip production method and metal thin film chip production device
07/19/2006EP1681366A1 Method for coating an object and object
07/19/2006EP1680529A2 Substrate heater assembly
07/19/2006EP1680528A2 Heat treatable coated article with diamond-like carbon (dlc) coating
07/19/2006CN1806317A Gas processing apparatus and film-forming apparatus
07/19/2006CN1806315A Method for forming ti film and tin film, contact structure, computer readable storing medium and computer program
07/19/2006CN1806064A Stress reduction of SIOC low K film by addition of alkylenes to OMCTS based processes
07/19/2006CN1805821A Coated cutting tool with brazed-in superhard blank
07/19/2006CN1805119A Chuck plate assembly with cooling means
07/19/2006CN1804665A Method for depositing carbon film on resin lens
07/19/2006CN1804117A Solid metal-organic compound package container and application thereof
07/19/2006CN1804116A Highly-oriented diamond film, method for manufacturing the same, and electronic device having highly-oriented diamond film
07/19/2006CN1804115A Method for preparing n type CVD co-doped diamond film
07/19/2006CN1804114A Thin film forming device and cleaning method thereof
07/19/2006CN1265684C Atmospheric plasma method and device for treating electricity conducting materials
07/19/2006CN1265441C Sprayer of wafer processing equipment with gap controller
07/19/2006CN1265435C Cleaning gas
07/19/2006CN1265434C Method for preparing p type ZnO crystal film
07/19/2006CN1265432C Reactor with mobile Persian blind baffle
07/19/2006CN1265021C Spray coating device using plasma continuous polymerization system
07/19/2006CN1265020C Method for corrosion-resistant treatment of metal by plasma
07/19/2006CN1264948C Ultraviolet short wave broad zone luminescent InAlGaN, and its prepn. method, and ultraviolet luminescent means therewith
07/18/2006US7079760 temperature controlled thermal treatment chamber, a temperature controlled substrate holder mounted within the chamber and configured to be insulated from it, and a vacuum pumping system coupled to the chamber.
07/18/2006US7079323 Surface treatment method and optical part
07/18/2006US7078862 plasma generating chamber, an antenna for generating plasma, a first and second electrode in the chamber, both antenna and second electrode facing first electrode; power supply for applying a voltage between the first electrode and the second electrode to extract particles from the generated plasma
07/18/2006US7078651 Thermal flux deposition by scanning
07/18/2006US7078341 Vapor deposition; overcoating semiconductor substrate
07/18/2006US7078309 Methods for producing a structured metal layer
07/18/2006US7078074 Using silicones; surface treatment; controlling pressure of container ; sealing
07/18/2006US7077936 Method of producing exchange coupling film and method of producing magnetoresistive sensor by using exchange coupling film
07/18/2006US7077935 O2 and H2O barrier material
07/18/2006US7077929 Apparatus for manufacturing a semiconductor device
07/18/2006US7077913 Apparatus for fabricating a semiconductor device
07/18/2006US7077912 Semiconductor manufacturing system
07/18/2006US7077911 MOCVD apparatus and MOCVD method
07/18/2006US7077904 Method for atomic layer deposition (ALD) of silicon oxide film
07/18/2006US7077902 Atomic layer deposition methods
07/18/2006US7077867 Prosthetic knee joint having at least one diamond articulation surface
07/18/2006US7077388 Bubbler for substrate processing