| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/03/2006 | US20060169209 Substrate processing apparatus, substrate processing method, and storage medium storing program for implementing the method |
| 08/03/2006 | US20060169208 Substrate processing apparatus and substrate processing method |
| 08/03/2006 | US20060169207 Semiconductor manufacturing apparatus capable of preventing adhesion of particles |
| 08/03/2006 | US20060169206 Load lock system for ion beam processing |
| 08/03/2006 | US20060169205 Process and related apparatus for block coating |
| 08/03/2006 | US20060169026 Method of measuring gas barrier property of plastic molding |
| 08/03/2006 | DE102005004312A1 Gas distributor for a chemical vapor deposition or organic vapor phase deposition reactor is characterized in that process gases are distributed radially in a first plane and then circumferentially in a second plane |
| 08/03/2006 | DE102005004311A1 Depositing semiconductor layers on a series of substrates comprises passing each substrate through a series of process chambers in which a single layer is deposited |
| 08/03/2006 | DE102005003984A1 Gas inlet element for a chemical vapor deposition (CVD) reactor useful in CVD reactors with base outlets for introduction of process gas via edge side access holes and mixing chamber upstream of access holes for homogenizing gas composition |
| 08/02/2006 | EP1686595A1 Transparent base with transparent conductive film, method for producing same, and photoelectric converter comprising such base |
| 08/02/2006 | EP1686198A1 Ti precursor, method of preparing the same, method of preparing Ti-containing thin layer by employing the Ti precursor and Ti-containing thin layer |
| 08/02/2006 | EP1685272A1 Thermal chemical vapor deposition of silicon nitride |
| 08/02/2006 | EP1685271A1 Methods of producing carbon layers on titanium metal |
| 08/02/2006 | EP1685270A1 High capacitance electrode and methods of producing same |
| 08/02/2006 | EP1685075A2 Object with easily cleaned surfaces and method for production thereof |
| 08/02/2006 | EP1684921A1 Exhaust gas treatment |
| 08/02/2006 | EP1684915A1 Method and device for continuous treatment of the surface of an elongate object |
| 08/02/2006 | EP1551851B1 Fluorine-free metallic complexes for gas-phase chemical metal deposition |
| 08/02/2006 | EP1304731B1 Method of cleaning cvd device and cleaning device therefor |
| 08/02/2006 | EP1208002A4 Deposited thin film void-column network materials |
| 08/02/2006 | EP1038046A4 Plasma reactor with a deposition shield |
| 08/02/2006 | CN2801812Y Multifunction multiarc plasma sedimentation device |
| 08/02/2006 | CN2801811Y Quartz substrate support for horizontal fast heating chemical gaseous phase sedimentation system |
| 08/02/2006 | CN1813350A Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby |
| 08/02/2006 | CN1813342A Method for generating plasma, method for cleaning and method for treating substrate |
| 08/02/2006 | CN1812134A P-type and N-type zinc oxide thin film and producing method thereof |
| 08/02/2006 | CN1811493A Metal reflector and method manufacturing same |
| 08/02/2006 | CN1811012A Plasma film forming system |
| 08/02/2006 | CN1267975C Process for depositing film on surface of semiconductor chip |
| 08/02/2006 | CN1267578C Electrochemically roughened aluminium semiconductor processing apparatus surface |
| 08/02/2006 | CN1267577C Method of preparing (001) high orientation diamond film using H cation etching diamond nuclear |
| 08/02/2006 | CN1267576C Treatment of plasma |
| 08/01/2006 | US7085616 Atomic layer deposition apparatus |
| 08/01/2006 | US7084376 Semiconductor production device ceramic plate |
| 08/01/2006 | US7084288 Organometallic compound with hydrazine compound to form pattern with metal film and multilayer element |
| 08/01/2006 | US7084112 Activated polyethylene glycol compounds |
| 08/01/2006 | US7084080 Silicon source reagent compositions, and method of making and using same for microelectronic device structure |
| 08/01/2006 | US7084079 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications |
| 08/01/2006 | US7084078 Atomic layer deposited lanthanide doped TiOx dielectric films |
| 08/01/2006 | US7084077 Method of fabricating multilayer interconnect wiring structure having low dielectric constant insulator film with enhanced adhesivity |
| 08/01/2006 | US7084076 Method for forming silicon dioxide film using siloxane |
| 08/01/2006 | US7084068 Annealing furnace, manufacturing apparatus, annealing method and manufacturing method of electronic device |
| 08/01/2006 | US7083846 Ceramic member |
| 08/01/2006 | US7083827 Article such as turbine blade or vane; diffusing platinum into the substrate surface, and thereafter diffusing aluminum into the substrate surface |
| 08/01/2006 | US7083825 Composition used in producing calcium-rich getter thin film |
| 08/01/2006 | US7083701 Device and method for plasma processing, and slow-wave plate |
| 08/01/2006 | US7083679 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device |
| 07/27/2006 | WO2006078702A2 Apparatus and method for substrate treatment for manufacturing of color filters by inkjet printing systems |
| 07/27/2006 | WO2006078666A2 Reaction system for growing a thin film |
| 07/27/2006 | WO2006078585A2 Wafer support pin assembly |
| 07/27/2006 | WO2006078542A1 Processes for the production of organometallic compounds |
| 07/27/2006 | WO2006078340A2 Method and apparatus for processing metal bearing gases |
| 07/27/2006 | WO2006077986A1 Transparent conductive film forming apparatus, multilayer transparent conductive film continuously forming apparatus and method of film forming therewith |
| 07/27/2006 | WO2006077712A1 Composition containing siloxane compound and phenol compound |
| 07/27/2006 | WO2006077353A1 Method for chemical infiltration in the gas phase for the densification of porous substrates with pyrolytic carbon |
| 07/27/2006 | WO2006076987A1 Method for the self-limited deposition of one or more monolayers and corresponding suitable starting material |
| 07/27/2006 | WO2006076924A1 A method for coating an object |
| 07/27/2006 | WO2006043157A3 Diamond coated surfaces |
| 07/27/2006 | WO2005065425A3 Localized synthesis and self-assembly of nanostructures |
| 07/27/2006 | US20060166515 In-situ-etch-assisted HDP deposition |
| 07/27/2006 | US20060166431 Methods to form electronic devices and methods to form a material over a semiconductive substrate |
| 07/27/2006 | US20060166009 Diamond-like carbon; heat treatment; for window units |
| 07/27/2006 | US20060165993 Novel cutting structures |
| 07/27/2006 | US20060165975 Substrate comprising a polar plasma-polymerised coating |
| 07/27/2006 | US20060165904 Semiconductor-manufacturing apparatus provided with ultraviolet light-emitting mechanism and method of treating semiconductor substrate using ultraviolet light emission |
| 07/27/2006 | US20060165894 Method for forming a ruthenium metal layer and a structure comprising the ruthenium metal layer |
| 07/27/2006 | US20060165893 Thermal barrier coating protected by alumina and method for preparing same |
| 07/27/2006 | US20060165892 Ruthenium containing layer deposition method |
| 07/27/2006 | US20060165891 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same |
| 07/27/2006 | US20060165890 Method and apparatus for monolayer deposition (MLD) |
| 07/27/2006 | US20060165889 Depositing a silicon nitride film with a different thickness for each region of the film from ammonia and silane using a single chamber-type apparatus; first and second nitride films deposited together have a greater thickness at the upper region as compared to the side regions and the lower region |
| 07/27/2006 | US20060165874 System and process for glazing glass to windows and door frames |
| 07/27/2006 | US20060165873 Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes |
| 07/27/2006 | US20060163527 Sp3 bond boron nitride emitting light in ultraviolet region, its producing method, and functional material using same |
| 07/27/2006 | US20060163201 Plasma processing system and plasma treatment process |
| 07/27/2006 | US20060162863 Semiconductor plasma-processing apparatus and method |
| 07/27/2006 | US20060162862 Apparatus for trapping residual products in semiconductor device fabrication equipment |
| 07/27/2006 | US20060162780 Pressure reduction process device, pressure reduction process method, and pressure regulation valve |
| 07/27/2006 | US20060162663 Vapor deposition apparatus |
| 07/27/2006 | US20060162662 Vacuum vapor deposition apparatus |
| 07/27/2006 | US20060162661 Mixing energized and non-energized gases for silicon nitride deposition |
| 07/27/2006 | US20060162660 Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program |
| 07/27/2006 | US20060162659 Coating plant with a charging lock and device therefor |
| 07/27/2006 | US20060162658 Ruthenium layer deposition apparatus and method |
| 07/27/2006 | US20060162657 Confinement ring drive |
| 07/27/2006 | US20060162656 Reduced volume, high conductance process chamber |
| 07/27/2006 | DE102006002705A1 Verfahren zur Herstellung verschleißbeständiger Komponenten Process for the production of wear resistant components |
| 07/27/2006 | DE102004053502B4 Verfahren zum Korrosionsschutz von Bauteilen aus warmfestem Stahl A method for corrosion protection of components from heat-resistant steel |
| 07/27/2006 | DE102004028030B4 Katalytisches Beschichtungsverfahren für strukturierte Substratoberflächen und mit einer Siliziumdioxid-Dünnschicht beschichtetes Substrat mit einer strukturierten Oberfläche Catalytic coating method for structured substrate surface and coated with a silicon dioxide thin film substrate with a structured surface |
| 07/27/2006 | DE10115228B4 Steuerung des anormalen Wachstums bei auf Dichlorsilan (DCS) basierenden CVD-Polycid WSix-Filmen Control the abnormal growth based on at dichlorosilane (DCS) CVD polycide WSi x films |
| 07/27/2006 | CA2595498A1 A chemical vapor infiltration method for densifying porous substrates with pyrolytic carbon |
| 07/26/2006 | EP1684336A1 Heat treatment apparatus and heat treatment method |
| 07/26/2006 | EP1683994A2 Gas panel |
| 07/26/2006 | EP1683893A1 Surface-coated cermet cutting tool with hard coating layer exhibiting excellent chipping resistance in high-speed intermittent cutting I |
| 07/26/2006 | EP1683890A1 Method for the formation of a thin layer on a substrate |
| 07/26/2006 | EP1683889A1 Surface treatment method and device |
| 07/26/2006 | EP1682701A2 LARGE AREA, UNIFORMLY LOW DISLOCATION DENSITY GaN SUBSTRATE AND PROCESS FOR MAKING THE SAME |
| 07/26/2006 | EP1682693A2 Thermal processing system with cross-flow liner |
| 07/26/2006 | EP1682692A2 Low temperature deposition of silicone nitride |
| 07/26/2006 | EP1682689A2 Methods of treating components of a deposition apparatus to form particle traps, and such components having particle traps thereon |