Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2006
08/10/2006WO2006082118A1 Process and device for depositing sequences of layers comprising a plurality of semiconductor components
08/10/2006WO2006082117A1 Gas distributor with pre-chambers arranged in planes
08/10/2006US20060178019 Low temperature deposition of silicon oxides and oxynitrides
08/10/2006US20060178006 Supercritical fluid-assisted deposition of materials on semiconductor substrates
08/10/2006US20060177697 Ceramic substrate, one side thereof having wafer-retaining face having resistive heating element provided either superficially or interiorly in the substrate and a recess formed in wafer-retaining face with room to carry semiconductor manufacturing wafer
08/10/2006US20060177602 Low temperature growth of oriented carbon nanotubes
08/10/2006US20060177601 Method of forming a ruthenium thin film using a plasma enhanced atomic layer deposition apparatus and the method thereof
08/10/2006US20060177600 Inductive plasma system with sidewall magnet
08/10/2006US20060177599 Dual plasma beam sources and method
08/10/2006US20060177598 Atomisation of a precursor into an excitation medium for coating a remote substrate
08/10/2006US20060177596 Method and apparatus for the production of metal coated steel products
08/10/2006US20060177594 Method of fabricating a polarizing layer on an interface
08/10/2006US20060177590 accurate monitoring of the level of a set accelerating agent introduced into the spray composition; using a sensor located in the slurry path to monitor, and adjust the amount of set accelerating agent introduced into the slurry; fire protection concrete coatings for steel beams and panels
08/10/2006US20060177584 having lenticular grain morphology or polyhedra-lenticular grain morphology at surface, chemical vapor deposition
08/10/2006US20060177583 Method for the formation of a metal film
08/10/2006US20060177581 Electron beam physical vapor deposition
08/10/2006US20060177580 Removing vapor deposition material adhering to equipment walls without atmospheric exposure; irradiation sublimation and vacuum pump exhaustion
08/10/2006US20060177579 Plasma enhanced atomic layer deposition using an apparatus of reaction chamber having a rotary disk, susceptors; spraying a first reactive gas, a second reactive gas of H2, N2, O2, N2O or NH3 excited by plasma and an inert gas
08/10/2006US20060177578 Feeding particulate material to a heated surface
08/10/2006US20060177577 Processes for the production of organometallic compounds
08/10/2006US20060177576 Heating to vaporize, providing thermally conductive path from perforated member at feeding location to heat sink, providing auger enclosure and rotatable auger for receiving powder; uniformity
08/10/2006US20060177575 Method of manufacturing gas barrier film coated plastic container
08/10/2006US20060177572 Codeposition of supported catalytic and polymeric material such as by combustion chemical vapor deposition where catalytic materials are added upstream and the polymeric material is added downstream, to impinge on the substrate; porous layers with high effective catalytic surface area, unique properties
08/10/2006US20060177566 Anodizing system with a coating thickness monitor and an anodized product
08/10/2006US20060177565 Paint circulation system
08/10/2006US20060175016 Plasma processing apparatus
08/10/2006US20060175012 Semiconductor fabrication equipment and method for controlling pressure
08/10/2006US20060175011 Method of cleaning substrate-processing device and substrate-processing device
08/10/2006US20060174837 Container and Exposure Apparatus Having the Same
08/10/2006US20060174836 Apparatus for heating wafer
08/10/2006US20060174835 Vacuum processing apparatus and method of using the same
08/10/2006US20060174834 Side RF coil and side heater for plasma processing apparatus
08/10/2006US20060174833 Substrate treating apparatus and method of substrate treatment
08/10/2006US20060174823 Surface acoustic wave devices and associated casting methods
08/10/2006US20060174815 Process for manufacturing a gallium rich gallium nitride film
08/10/2006US20060174801 Paper coating formulation having a reduced level of binder
08/10/2006DE10339220B4 Spiegel für eine Ablenkeinheit in einem Lasersystem, Verfahren zu dessen Herstellung sowie Ablenkeinheit für ein Lasersystem Mirror for a deflection unit in a laser system, to processes for its preparation and deflection unit for a laser system
08/10/2006DE102005004242A1 Driving part or gear production, used in manufacture of aerodynamic components, involves introduction of layer forming material into hot region of high enthalpy plasma jet and complete conversion of layer material into gas phase
08/10/2006CA2595761A1 Chemical vapor deposition of chalcogenide materials
08/09/2006EP1687460A2 Method and apparatus for fabricating a conformal thin film on a substrate
08/09/2006EP1687457A2 Metal carbide gate structure and method of fabrication
08/09/2006EP1686855A2 Applications of a coating material
08/09/2006EP1149184B1 Method and system for producing semiconductor crystals using temperature management
08/09/2006CN1816898A Substrate processing system
08/09/2006CN1816648A Substrate covered with an intermediate coating and a hard carbon coating
08/09/2006CN1816645A Method for deposition of titanium oxide by a plasma source
08/09/2006CN1816642A Hydrogen sulfide injection method for phosphor deposition
08/09/2006CN1815690A Vacuum processing apparatus
08/09/2006CN1815689A Plasma processing apparatus
08/09/2006CN1814858A Scale-viewing temperature area temperature stabilizing method in chemical gaseous phase deposition course
08/09/2006CN1269191C Treatment apparatus and method therefor
08/09/2006CN1269189C Photovoltage element and producing method and equipment thereof
08/09/2006CN1269188C Filling container for solid organic metal compound use and its filling method
08/09/2006CN1269184C Method for manufacturing lead straight pattern layer by silicon dioxide
08/09/2006CN1269183C Rapid cycle chamber having top vent with nitrogen purge
08/09/2006CN1268783C Method for growth of InN film through In deposition in advance
08/09/2006CN1268414C Method and installation for treating flue gas containing hydrocarbons
08/08/2006US7088047 reduced electron temperature for etching oxide film, ensure high selectivity by reducing a volume of chamber, can accurately fabricate a large-diameter semiconductor wafer by establishing rotation symmetry of a plasma density profile; ground end of antenna elements is positioned close to the chamber
08/08/2006US7087774 Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition
08/08/2006US7087535 Multilayer; overcoating substrate with dielectric; atomic layer deposition
08/08/2006US7087485 Method of fabricating an oxide collar for a trench capacitor
08/08/2006US7087482 Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same
08/08/2006US7087481 Systems and methods for forming metal oxides using metal compounds containing aminosilane ligands
08/08/2006US7087295 Surface-coated cutting tool
08/08/2006US7087271 Silicon oxycarbide; vapor deposition
08/08/2006US7087266 Thermal barrier coating and process therefor
08/08/2006US7087119 Atomic layer deposition with point of use generated reactive gas species
08/08/2006US7086347 Apparatus and methods for minimizing arcing in a plasma processing chamber
08/03/2006WO2006081234A2 Ruthenium layer deposition apparatus and method
08/03/2006WO2006081233A2 Confinement ring drive
08/03/2006WO2006081104A2 Semiconductor wafer boat for a vertical furnace
08/03/2006WO2006081023A2 Method and apparatus for monolayer deposition (mld)
08/03/2006WO2006081020A1 Method and apparatus for monolayer deposition
08/03/2006WO2006081004A2 Methods and arrangement for the reduction of byproduct deposition in a plasma processing system
08/03/2006WO2006080889A1 Cemented carbide insert for wear resistance demanding short hole drilling operations
08/03/2006WO2006080586A1 METHOD FOR FORMING GaN FILM, SEMICONDUCTOR DEVICE, METHOD FOR FORMING GROUP III NITRIDE THIN FILM, AND SEMICONDUCTOR DEVICE HAVING GROUP III NITRIDE THIN FILM
08/03/2006WO2006080205A1 CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF
08/03/2006WO2006044019A3 Low temperature sin deposition methods
08/03/2006WO2006034130A3 Apparatus and process for surface treatment of substrate using an activated reactive gas
08/03/2006WO2006014591A3 Permeation barriers for flexible electronics
08/03/2006US20060172545 Purge process conducted in the presence of a purge plasma
08/03/2006US20060172534 Atomic layer deposition methods
08/03/2006US20060172485 Systems and methods for forming metal oxides using alcohols
08/03/2006US20060172134 Carbon-coated aluminum and method for producing same
08/03/2006US20060172088 Exposing a conductively doped silicon surface to TiCl4 without exposing it to any measurable silane for a first period of time and then exposing the surface to a mixture of TiCl4 and a silane for a second period of time
08/03/2006US20060172087 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers
08/03/2006US20060172085 Method and apparatus for chemical plasma processing of plastic container
08/03/2006US20060172083 Method of fabricating a thin film
08/03/2006US20060172078 Liquid is supplied to an unpressurized space in a pressure generating part in a constant flow, where the pressure of liquid is generated by means of gravity influencing the liquid, and the pressurized liquid is arranged to be supplied to the flame spraying at constant pressure and flow rate
08/03/2006US20060172071 Method of applying paint
08/03/2006US20060172068 Deposition of multilayer structures including layers of germanium and/or germanium alloys
08/03/2006US20060172067 metal organic chemical vapor deposition of chalcogenide materials comprising germanium, antimony and tellurium; preparing electrical and optical chalcogenide materials; high purity thin films at relatively low temperatures
08/03/2006US20060172065 Vacuum deposition of coating materials on powders
08/03/2006US20060172062 Method for manufacturing a plating seed layer of electronic elements
08/03/2006US20060172060 for depositing a coating material, such as a drug or therapeutic agent, onto a medical device and, more particularly, for verifying material drop size and volume of any material being deposited using imaging system having an exposure time, and plurality of sequential strobe light firings
08/03/2006US20060171102 Foil for negative electrode of capacitor and process for producing the same
08/03/2006US20060170000 Nitride-based compound semiconductor substrate and method for fabricating the same
08/03/2006US20060169317 Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
08/03/2006US20060169211 Vapor deposition source and vapor deposition apparatus having the same
08/03/2006US20060169210 Chamber for uniform heating of large area substrates