Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2006
08/22/2006US7094712 High performance MIS capacitor with HfO2 dielectric
08/22/2006US7094710 Very low dielectric constant plasma-enhanced CVD films
08/22/2006US7094708 Method of CVD for forming silicon nitride film on substrate
08/22/2006US7094691 MOCVD of tungsten nitride thin films using W(CO)6 and NH3 for copper barrier applications
08/22/2006US7094690 Deposition methods and apparatuses providing surface activation
08/22/2006US7094685 Integration of titanium and titanium nitride layers
08/22/2006US7094680 Formation of a tantalum-nitride layer
08/22/2006US7094614 In-situ monitoring of chemical vapor deposition process by mass spectrometry
08/22/2006US7094447 forming a coating of (Ti,Al)(C,),N) and modifying the as-formed coating by applying alternating aluminizing and oxidizing treatments, the coating is provided with an aluminium content which increases toward the surface; nucleated alpha -Al2O3 with a growth texture; chemical vapor deposition (CVD)
08/22/2006US7094444 Method for repairing coated components using NiAl bond coats
08/22/2006US7094316 Externally excited torroidal plasma source
08/22/2006US7094315 Chamber configuration for confining a plasma
08/22/2006US7094313 Universal mid-frequency matching network
08/22/2006US7094312 Focused particle beam systems and methods using a tilt column
08/22/2006US7094284 Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same
08/22/2006US7093560 Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system
08/22/2006US7093559 Method for PECVD deposition of selected material films
08/17/2006WO2006086329A1 Processes for the production of organometallic compounds
08/17/2006WO2006085994A2 Multi-component substances and apparatus for preparation thereof
08/17/2006WO2006085925A2 Synthesis of a self assembled hybrid of ultrananocrystalline diamond and carbon nanotubes
08/17/2006WO2006085887A1 Sealable biaxially oriented polypropylene film for packaging
08/17/2006WO2006085752A1 Process for preparing a metal film on a substrate
08/17/2006WO2006085635A1 Tantalum carbide-covered carbon material and process for producing the same
08/17/2006WO2006085447A1 Thin film laminate structure, method for formation thereof, film formation apparatus, and storage medium
08/17/2006WO2006085425A1 Method of forming film and film forming apparatus
08/17/2006WO2006063171A3 Coated article with low-e coating including ir reflecting layer(s) and corresponding method
08/17/2006WO2006050482A3 High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric cvd films
08/17/2006WO2005104186A3 Method and processing system for plasma-enhanced cleaning of system components
08/17/2006US20060183347 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry
08/17/2006US20060183340 Coating and developing apparatus and coating and developing method
08/17/2006US20060183322 Deposition methods and apparatuses providing surface activation
08/17/2006US20060183055 Method for defining a feature on a substrate
08/17/2006US20060182895 Substrate covered with an intermediate coating and a hard carbon coating
08/17/2006US20060182891 Method and apparatus for producing biaxially oriented thin films
08/17/2006US20060182886 Method and system for improved delivery of a precursor vapor to a processing zone
08/17/2006US20060182885 Preparation of metal silicon nitride films via cyclic deposition
08/17/2006US20060182884 Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
08/17/2006US20060182883 Abrasion resistant coatings with color component for gemstones and such
08/17/2006US20060182874 Method of preparing an apparatus for positioning a molecule
08/17/2006US20060181669 Diffusion barrier coatings having graded compositions and devices incorporating the same
08/17/2006US20060180275 Methods of making gas distribution members for plasma processing apparatuses
08/17/2006US20060180180 System and method for cleaning semiconductor fabrication equipment parts
08/17/2006US20060180174 Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
08/17/2006US20060180087 Substrate susceptor for receiving a substrate to be deposited upon
08/17/2006US20060180086 Susceptor and vapor growth device
08/17/2006US20060180085 One piece shim
08/17/2006US20060180084 Substrate susceptor for receiving a substrate to be deposited upon
08/17/2006US20060180083 Positioning board for positioning heater lines during plasma enhanced CVD (PECVD)
08/17/2006US20060180082 Film formation apparatus
08/17/2006US20060180078 Gas reaction system and semiconductor processing apparatus
08/17/2006US20060180076 Vapor deposition apparatus and vapor deposition method
08/17/2006DE102004061464A1 Feinlaminare Barriereschutzschicht Feinlaminare barrier protective layer
08/17/2006DE10200279B4 Gasinjektor-Anordnung mit Gasinjektoren aus einem Keramikmaterialblock mit Gasinjektorlöchern, die sich durch diesen erstrecken, und ein die Gasinjektor-Anordnung enthaltenes Ätzgerät Gas injector assembly with gas injectors of a ceramic block with Gasinjektorlöchern extending therethrough, and the gas injector arrangement contained etcher
08/16/2006EP1691421A1 Process for preparing a metal film on a substrate
08/16/2006EP1691400A1 Preparation of metal silicon nitride films via cyclic deposition
08/16/2006EP1691396A2 Plasma reactor with overhead electrode having cylindrical gas outlets
08/16/2006EP1690287A2 Method for depositing silicon carbide and ceramic films
08/16/2006EP1689908A2 Plasma thin-film deposition method
08/16/2006EP1689907A2 Plasma production device and method and rf driver circuit with adjustable duty cycle
08/16/2006EP1689582A1 Novel polymer films and textile laminates containing such polymer films
08/16/2006EP1488443B1 Device for confinement of a plasma within a volume
08/16/2006EP1332241A4 Electrostatically clamped edge ring for plasma processing
08/16/2006CN1820373A Gate insulating film forming method, computer-readable storage medium, and computer program
08/16/2006CN1820091A Method for forming metal oxide coating film and vapor deposition apparatus
08/16/2006CN1820090A Reactive deposition for electrochemical cell production
08/16/2006CN1819885A Diamond film coated tool and process for producing the same
08/16/2006CN1819123A High-throughput HDP-CVD processes for advanced gapfill applications
08/16/2006CN1819120A Method for decreasing granule amount of material layer with low dielectric constant
08/16/2006CN1819113A Vacuum processing apparatus and method of using the same
08/16/2006CN1818132A Inductive plasma system with sidewall magnet
08/16/2006CN1818131A Chemical gas-phase deposition for producing diamond thin filmon cutter with complex-formation
08/16/2006CN1270384C Semiconductor suitable for forming semiconductor film coating such as platinum and its manufacturing method
08/16/2006CN1270350C Method for epitaxial coating semiconductor chip, and semiconductor chip opitaxial coated
08/16/2006CN1270349C Device and method for generating local plasma by micro-structure electrode discharges with microwaves
08/16/2006CN1269989C Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
08/16/2006CN1269866C Production method for copolymer film, copolymer film for med therefrom, and semiconductor device using said copolymer film
08/15/2006US7092607 Optical waveguide device, and method of manufacturing optical waveguide device
08/15/2006US7091514 Non-polar (Al,B,In,Ga)N quantum well and heterostructure materials and devices
08/15/2006US7091138 Forming method and a forming apparatus of nanocrystalline silicon structure
08/15/2006US7091137 Bi-layer approach for a hermetic low dielectric constant layer for barrier applications
08/15/2006US7091135 Method of manufacturing semiconductor device
08/15/2006US7091133 Two-step formation of etch stop layer
08/15/2006US7090889 Boride thin films on silicon
08/15/2006US7090741 Semiconductor processing system
08/15/2006US7090727 Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same
08/15/2006US7090705 Electronic device, production method thereof, and plasma process apparatus
08/15/2006US7090394 Temperature gauge and ceramic susceptor in which it is utilized
08/10/2006WO2006083909A2 Method of making substitutionally carbon-highly doped crystalline si-layers by cvd
08/10/2006WO2006083821A1 Selective deposition of silicon-containing films
08/10/2006WO2006083725A2 Vacuum deposition of coating materials on powders
08/10/2006WO2006083600A1 High aspect ratio performance coatings for biological microfludics
08/10/2006WO2006083557A2 High yield spray application
08/10/2006WO2006083481A2 Chemical vapor deposition of chalcogenide materials
08/10/2006WO2006083363A2 Pentaborane(9) storage and delivery
08/10/2006WO2006082769A1 Glass member, reader, and image forming apparatus
08/10/2006WO2006082746A1 FILM OF SEMICONDUCTOR SINGLE CRYSTAL OF n-TYPE (100) FACE ORIENTED DIAMOND DOPED WITH PHOSPHORUS ATOM AND PROCESS FOR PRODUCING THE SAME
08/10/2006WO2006082739A1 Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same
08/10/2006WO2006082731A1 Film-forming apparatus, matching unit, and impedance control method
08/10/2006WO2006082717A1 Apparatus for forming thin film
08/10/2006WO2006082367A1 Trap device