Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2006
08/29/2006US7097901 bodies comprising cemented carbides and binders, and multilayer coatings comprising oxycarbonitrides and alumina, used for turning or machining cast iron and steels at high speeds
08/29/2006US7097886 Deposition process for high aspect ratio trenches
08/29/2006US7097878 Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films
08/29/2006US7097775 Coated microfluidic delivery system
08/29/2006US7097750 Device for fixing substrate for thin film sputter and method of fixing substrate using the same
08/29/2006US7097735 Plasma processing device
08/29/2006US7097713 Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates
08/29/2006US7097712 Apparatus for processing a semiconductor
08/29/2006US7097685 Toughness improved between the surface of antimony carbide/iron family metal phase and an inner region of one or more compounds of a metal or metals of group 4, 5 or 6 having an sodium chloride-type cubic crystal structure: plastic deformation resistance; both superior wear and chipping resistance
08/29/2006US7096819 Inductive plasma processor having coil with plural windings and method of controlling plasma density
08/29/2006US7096692 Visible-light-responsive photoactive coating, coated article, and method of making same
08/29/2006US7096656 Ring traveler and method for producing it
08/24/2006WO2006089080A2 Abrasion resistant coatings with color component for gemstones and such
08/24/2006WO2006088697A2 Methods of making gas distribution members for plasma processing apparatuses
08/24/2006WO2006088562A2 A method and system for improved delivery of a precursor vapor to a processing zone
08/24/2006WO2006088463A1 Atmospheric pressure molecular layer cvd
08/24/2006WO2006088448A1 Wafer carrier for growing gan wafers
08/24/2006WO2006088284A1 Method of depositing thin film
08/24/2006WO2006087958A1 Nitride semiconductor material and method for manufacturing nitride semiconductor crystal
08/24/2006WO2006087941A1 Gas-barrier film, process for producing gas-barrier film, resin base with the gas-barrier film for organic electroluminescent element, and organic electroluminescent element
08/24/2006WO2006087833A1 Hydrogen atom generation source in vacuum treatment apparatus, and hydrogen atom transportation method
08/24/2006WO2006087588A2 Apparatus and methods for growing nanofibres and nanotips
08/24/2006WO2006087495A1 Method for the densification of thin porous substrates by means of vapour phase chemical infiltration and device for loading such substrates
08/24/2006WO2006060827A3 Methods and apparatus for downstream dissociation of gases
08/24/2006WO2006055984A3 Substrate processing apparatus using a batch processing chamber
08/24/2006WO2006049794A3 Abrasion resistant coatings by plasma enhanced chemical vapor deposition
08/24/2006WO2006032963A3 Methods for producing noble metal films, noble metal oxide films, and noble metal silicide films
08/24/2006WO2006011991A3 Apparatus for an optimized plasma chamber top piece
08/24/2006WO2005102952A3 Photocatalytic substrate active under a visible light
08/24/2006WO2005052179A3 Method of making carbon nanotube arrays, and thermal interfaces using same
08/24/2006US20060189170 Plasma treatment apparatus and method for plasma treatment
08/24/2006US20060189168 Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device
08/24/2006US20060189165 Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric films
08/24/2006US20060189162 Adhesion improvement for low k dielectrics
08/24/2006US20060189161 Method and apparatus for treating organosiloxane coating film
08/24/2006US20060189159 Methods of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry, and methods of forming trench isolation in the fabrication of integrated circuitry
08/24/2006US20060189158 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry
08/24/2006US20060189138 Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device
08/24/2006US20060189046 Thin film forming method and forming device therefor
08/24/2006US20060188687 One piece shim
08/24/2006US20060188647 Process for producing probe carrier and apparatus thereof
08/24/2006US20060188646 System and method for detecting remaining amount of precursor in vessel during CVD process
08/24/2006US20060188645 Deposition device having a thermal control system
08/24/2006US20060186354 Apparatus and method for thermal processing
08/24/2006US20060186084 Patterning nanoline arrays with spatially varying pitch
08/24/2006US20060185795 Anodized substrate support
08/24/2006US20060185600 Multi-zone chuck
08/24/2006US20060185599 Effusion Cell Valve
08/24/2006US20060185598 Film precursor tray for use in a film precursor evaporation system and method of using
08/24/2006US20060185597 Film precursor evaporation system and method of using
08/24/2006US20060185596 Vapor phase growth method by controlling the heat output in the gas introduction region
08/24/2006US20060185595 Apparatus and process for carbon nanotube growth
08/24/2006US20060185594 Plasma treating apparatus and its electrode structure
08/24/2006US20060185593 Chemical vapor deposition system and method of exhausting gas from the system
08/24/2006US20060185592 Vertical batch processing apparatus
08/24/2006US20060185591 High temperature chemical vapor deposition apparatus
08/24/2006US20060185590 High temperature chemical vapor deposition apparatus
08/24/2006US20060185589 Silicon gas injector and method of making
08/24/2006US20060185588 Vapor deposition apparatus measuring film thickness by irradiating light
08/24/2006DE10064096B4 Verfahren zur dauerstabilen Hydrophilisierung einer Kontaktlinsenoberfläche und beschichtete Silikon-Kontaktlinse A method for permanently stable hydrophilisation a contact lens surface and coated silicone hydrogel contact lens
08/24/2006CA2597253A1 A method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
08/23/2006EP1692323A2 Method of producing nanostructure tips
08/23/2006EP1691939A1 Method and device for cleaning at least one process chamber used for coating at least one substrate
08/23/2006EP1691938A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
08/23/2006EP1691606A1 Antimicrobial composite material
08/23/2006EP1335829A4 Multilayered optical structures
08/23/2006EP1301341B1 Method for applying polymer coatings
08/23/2006EP1289807B1 Method and device for coating at least one wiper-blade element
08/23/2006EP1269225B1 Selective deposition of material on a substrate according to an interference pattern
08/23/2006EP1049813B1 Cvd reactor and process
08/23/2006CN2808933Y Combiner of remote plasma reactor
08/23/2006CN1823404A Process for producing semiconductor device and substrate treating apparatus
08/23/2006CN1823180A Capacitively coupled plasma reactor with uniform radial distribution of plasma
08/23/2006CN1822725A Anti-active oxygen corrosion new plane antenna radiation heater
08/23/2006CN1822426A Thin film lithium ion cell using silver selenide film as anode material and its preparing method
08/23/2006CN1822331A Method for preparing titanium silicide nano line by chemical gas phase deposition method
08/23/2006CN1822330A Method for producing gate stack sidewall spacers
08/23/2006CN1822320A Method for preparing GaN base diluted magnetic semiconductor material
08/23/2006CN1822319A Method for preparing poly crystal germanium silicon film
08/23/2006CN1822318A Semiconductor device and method for producing the same
08/23/2006CN1822317A Electrode subassembly
08/23/2006CN1822315A Substrate processing apparatus, control method adopted in substrate processing apparatus and program
08/23/2006CN1821441A Exhaust pipe with reactive by-product adhesion preventing means and method of preventing the adhesion
08/23/2006CN1821440A Preparation of metal silicon nitride films via cyclic deposition
08/23/2006CN1821439A Organic zinc source for preparing zinc oxide thin film and its preparing method
08/23/2006CN1821251A Precursors for silica or metal silicate films
08/23/2006CN1821053A Method for preparing four needle shape zinc oxide nano stick by low temperature catalyst-free gas phase deposition
08/23/2006CN1271701C Coating method for internal part with holes and internal part with holes
08/23/2006CN1271690C 等离子体清洗气体和等离子体清洁方法 Plasma cleaning gas and plasma cleaning methods
08/23/2006CN1271679C Semiconductor mfg. device and method for mfg. semiconductor
08/23/2006CN1271251C Method of preparing ZnO crystal whisker adopting atmosphere open type MOCVD and apparatus therefor
08/23/2006CN1271250C Method of preparing one-dimensional array material adopting atmosphere open type MOCVD and apparatus therefor
08/23/2006CN1271244C Method and device for preparing crystalized carbon film azotized
08/23/2006CN1271243C Nano crystallitic film of diamond, and preparation method
08/23/2006CN1271242C Plasma decomposition method and apparatus for preparing diamond-like film
08/23/2006CN1270946C Semiconductor substrate processing system and throughput enhancement method of the same
08/22/2006US7095179 generator comprising enclosures for confining gases, anodes, cathodes and power sources, used for ionization
08/22/2006US7095178 Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method
08/22/2006US7095157 Cast diamond tools and formation thereof by chemical vapor deposition
08/22/2006US7094994 Heat treatment apparatus and method of semiconductor wafer