| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/14/2006 | US20060201420 Apparatus for treating workpieces |
| 09/14/2006 | US20060201414 Low temperature load and bake |
| 09/14/2006 | DE102006004192A1 Heat exchange tube for cooling chip, comprises closed tube with capillary structure for carrying condensed fluid back to heat-receiving end |
| 09/14/2006 | DE102005011414A1 Verfahren zum Herstellen einer dünnen Magnesiumoxidschicht mittels Plasma-Oxidation A method for producing a thin magnesium oxide layer by means of plasma oxidation |
| 09/13/2006 | EP1699946A2 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 09/13/2006 | EP1699945A1 Cvd tantalum compounds for fet gate electrodes |
| 09/13/2006 | EP1699626A2 Diamond films and methods of making diamond films |
| 09/13/2006 | EP1525169B1 Apparatus and method for measuring the weight of an optical fiber preform during a chemical deposition process for forming the preform |
| 09/13/2006 | EP1368131B1 Protective cage for coating of medical devices |
| 09/13/2006 | CN1833473A Plasma processing method and apparatus |
| 09/13/2006 | CN1833313A Device and method for surface treatment such as plasma treatment |
| 09/13/2006 | CN1833312A Loading table and heat treating apparatus having the loading table |
| 09/13/2006 | CN1833310A 半导体层 Semiconductor layer |
| 09/13/2006 | CN1833295A Superconducting wire and its production method |
| 09/13/2006 | CN1833133A Flow system with high resolution proportional valve with customizable performance |
| 09/13/2006 | CN1833051A Method and device for coating or modifying surfaces |
| 09/13/2006 | CN1833050A Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 09/13/2006 | CN1833049A Hollow nickel shapes by vapor deposition |
| 09/13/2006 | CN1833047A Carbon-coated aluminum and method for producing same |
| 09/13/2006 | CN1832952A Rare earth metal complex, material for thin-film formation, and process for producing thin film |
| 09/13/2006 | CN1832112A Method for changing polar of gallium nitride epitaxial layer grown by hydride vapour phase epitaxy method |
| 09/13/2006 | CN1832111A Metal organic chemical vapour phase deposition reaction chamber structure for growing oxide film |
| 09/13/2006 | CN1832110A 外延生长方法 Epitaxial growth |
| 09/13/2006 | CN1832106A Temperature control system and substrate processing apparatus |
| 09/13/2006 | CN1832103A Semi-conductor manufacturing installation |
| 09/13/2006 | CN1831192A Film formation method and apparatus for semiconductor process, and storage medium |
| 09/13/2006 | CN1831191A Film formation method and apparatus for semiconductor process |
| 09/13/2006 | CN1831190A Method for preventing metals from being damaged by high density plasma chemical vapor deposition |
| 09/13/2006 | CN1831189A Coating formation by reactive deposition |
| 09/13/2006 | CN1831188A Method for preparing superconducting band of oxides |
| 09/13/2006 | CN1831187A Heater array electrode system used for stable growth of diamond membrane with large area |
| 09/13/2006 | CN1275299C Method for depositing selected thickness of interlevel dielectric material to achieve optimum global planarity on semiconductor wafer |
| 09/13/2006 | CN1274878C Composite diamond material by chemical vapour depositing diamond and polycrystal diamond and application thereof |
| 09/13/2006 | CN1274877C Chemical Vapor deposition process of tungsten atom layer |
| 09/12/2006 | US7106939 Optical and optoelectronic articles |
| 09/12/2006 | US7105883 Semiconductor device |
| 09/12/2006 | US7105461 Composite dielectric forming methods and composite dielectrics |
| 09/12/2006 | US7105460 Nitrogen-free dielectric anti-reflective coating and hardmask |
| 09/12/2006 | US7105441 Preheating of chemical vapor deposition precursors |
| 09/12/2006 | US7105362 Method of forming dielectric film |
| 09/12/2006 | US7105208 Methods and processes utilizing microwave excitation |
| 09/12/2006 | US7105080 Digital, programmable unit with storage means for the operating programs |
| 09/12/2006 | US7105075 DC power supply utilizing real time estimation of dynamic impedance |
| 09/12/2006 | US7105065 Metal layer forming methods and capacitor electrode forming methods |
| 09/12/2006 | US7105061 Method and apparatus for sealing substrate load port in a high pressure reactor |
| 09/12/2006 | US7105060 Method of forming an oxidation-resistant TiSiN film |
| 09/12/2006 | US7105059 Reaction apparatus for atomic layer deposition |
| 09/12/2006 | US7105055 In situ growth of oxide and silicon layers |
| 09/12/2006 | US7105054 Method and apparatus of growing a thin film onto a substrate |
| 09/12/2006 | US7104859 Methods for manufacturing carbon fibers, electron-emitting device, electron source, image display apparatus, light bulb, and secondary battery using a thermal CVD method |
| 09/12/2006 | US7104476 Multi-sectored flat board type showerhead used in CVD apparatus |
| 09/12/2006 | US7104217 Plasma processing apparatus |
| 09/08/2006 | WO2006093319A1 Diamond-coated bearing or seal structure and fluid machine comprising the same |
| 09/08/2006 | WO2006093263A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093262A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093261A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093260A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093259A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093258A1 Method for forming tantalum nitride film |
| 09/08/2006 | WO2006093168A1 Cvd device, multilayer film forming method using it, and multilayer film formed by it |
| 09/08/2006 | WO2006092985A1 Microwave plasma processing device |
| 09/08/2006 | WO2006092927A1 Stain preventing film and device for producing stain preventing film |
| 09/08/2006 | WO2006092614A2 Method and apparatus for producing a coating on a substrate |
| 09/08/2006 | WO2006092550A1 Trap device |
| 09/08/2006 | WO2006078340A3 Method and apparatus for processing metal bearing gases |
| 09/08/2006 | WO2005081933A3 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium |
| 09/07/2006 | US20060199131 Loading table and heat treating apparatus having the loading table |
| 09/07/2006 | US20060199026 Alumina layer with controlled texture |
| 09/07/2006 | US20060199014 supplying discharge gas containing nitrogen into space formed between electrodes transferring energy of excited discharge gas to film forming gas, exposing substrate to film forming gas |
| 09/07/2006 | US20060199012 Manufacture of porous diamond films |
| 09/07/2006 | US20060198965 Method and system for coating internal surfaces using reverse-flow cycling |
| 09/07/2006 | US20060198958 Methods for producing silicon nitride films by vapor-phase growth |
| 09/07/2006 | US20060198956 Chemical vapor deposition of long vertically aligned dense carbon nanotube arrays by external control of catalyst composition |
| 09/07/2006 | US20060198955 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| 09/07/2006 | US20060198944 Feedback enhanced plasma spray tool |
| 09/07/2006 | US20060198769 Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers |
| 09/07/2006 | US20060197035 Organic film vapor deposition method and a scintillator panel |
| 09/07/2006 | US20060196605 Method and apparatus for plasma processing |
| 09/07/2006 | US20060196603 Gas baffle and distributor for semiconductor processing chamber |
| 09/07/2006 | US20060196538 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
| 09/07/2006 | US20060196426 Vacuum plasma generator |
| 09/07/2006 | US20060196425 Reflectors, substrate processing apparatuses and methods for the same |
| 09/07/2006 | US20060196424 Plasma generating electrode assembly |
| 09/07/2006 | US20060196423 Gradually changed film coating device and tool for using in the coating device |
| 09/07/2006 | US20060196422 Gate valve for semiconductor treatment system and vacuum container |
| 09/07/2006 | US20060196421 Apparatus for the deposition of high dielectric constant films |
| 09/07/2006 | US20060196420 High density plasma chemical vapor deposition apparatus |
| 09/07/2006 | US20060196419 Method and system for coating sections of internal surfaces |
| 09/07/2006 | US20060196418 Apparatuses and methods for deposition of material on surfaces |
| 09/07/2006 | US20060196417 Gas distribution systems for deposition processes |
| 09/07/2006 | DE10213287B4 Verfahren zur Ausbildung einer Wolframsilizidschicht A method of forming a tungsten silicide |
| 09/07/2006 | DE102006009504A1 Component module with cooling fins consisting of connector and numerous cooling fins and made of heat conductive materials containing metal and crystalline carbon with high heat conductive coefficient |
| 09/07/2006 | DE102006003754A1 Air cooler system for chips with fan, numerous cooling fins, cooler body and heat exchange tube, with cooler body formed by metal and crystalline carbon of high heat |
| 09/07/2006 | DE102005008889A1 Optisches Monitoringsystem für Beschichtungsprozesse Optical monitoring system for coating processes |
| 09/06/2006 | EP1699077A1 Plasma processing apparatus |
| 09/06/2006 | EP1698713A1 Scratch-resistant material and method to manufacture |
| 09/06/2006 | EP1698614A1 Metal compound, material for forming thin film and method for preparing thin film |
| 09/06/2006 | EP1698401A2 Protective cage for coating of medical devices |
| 09/06/2006 | EP1697559A1 Method for the organised growth of nanostructures |
| 09/06/2006 | EP1697558A2 Growth of in-situ thin films by reactive evaporation |