| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/06/2006 | EP1697557A1 Playing field obstacle device |
| 09/06/2006 | EP1697296A2 Copper (i) formate complexes |
| 09/06/2006 | EP1355686B1 Methods for surface modification |
| 09/06/2006 | CN1830072A Gas treatment device and heat readiting method |
| 09/06/2006 | CN1830069A Adjustable gas distribution system |
| 09/06/2006 | CN1829571A Metalorganic chemical vapor deposition(MOCVD) process and apparatus to produce multi-layer high-temperature superconducting(HTS) coated tape |
| 09/06/2006 | CN1828911A Thin film transistor array substrate using low dielectric insulating layer and method of fabricating the same |
| 09/06/2006 | CN1827847A Methods and devices for monitoring and controlling thin film processing |
| 09/06/2006 | CN1827846A Method and apparatus for growing thick nano diamond film |
| 09/06/2006 | CN1827845A Method for manufacturing diamond-like film and part with coating manufactured thereby |
| 09/06/2006 | CN1827844A Method for directly printing circuit by nozzle |
| 09/06/2006 | CN1827230A Sprayer with metal organic source for preparing laminated structure of concentrator solar cell |
| 09/06/2006 | CN1273642C Coated hard alloy body and its usage |
| 09/06/2006 | CN1273641C Low-wst technology for quickly growing silicon-base film |
| 09/06/2006 | CN1273640C Fullerene coated component of semiconductor processing equipment |
| 09/05/2006 | US7103271 plane-shaped heating component faces one surface of a workpiece, irradiating light to raise the temperature of a semiconductor wafer; distortion-free; relieving stress by giving a distribution to a light irradiation intensity of an open loop control, reducing temperature variation |
| 09/05/2006 | US7102871 Electrostatic chuck assembly having disassembling device |
| 09/05/2006 | US7102236 Carbon containing silicon oxide film having high ashing tolerance and adhesion |
| 09/05/2006 | US7102235 Conformal lining layers for damascene metallization |
| 09/05/2006 | US7102189 Semiconductor device suitable for forming conductive film such as platinum with good coverage, and its manufacture |
| 09/05/2006 | US7102173 Nitride semiconductor device and method of manufacturing the same |
| 09/05/2006 | US7102132 Process monitoring using infrared optical diagnostics |
| 09/05/2006 | US7101948 Vapor deposition of silica; using free radical scavenger |
| 09/05/2006 | US7101815 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 09/05/2006 | US7101813 Atomic layer deposited Zr-Sn-Ti-O films |
| 09/05/2006 | US7101795 Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
| 09/05/2006 | US7101794 Coated semiconductor wafer, and process and device for producing the semiconductor wafer |
| 09/05/2006 | US7101775 Semiconductor device and method for manufacturing semiconductor device |
| 09/05/2006 | US7101774 Method of manufacturing compound single crystal |
| 09/05/2006 | US7101591 Process for producing an organic polymer film whereby when using it as an interlayer insulating film in a semiconductor device, the film exhibits higher adhesiveness at its interface where other semiconductor materials are in contact with the |
| 09/05/2006 | US7101458 Plasma processing method and apparatus |
| 09/05/2006 | US7100532 Plasma production device and method and RF driver circuit with adjustable duty cycle |
| 08/31/2006 | WO2006091448A2 Chemical vapor deposition reactor having multiple inlets |
| 08/31/2006 | WO2006091413A2 Silicon gas injector and method of making |
| 08/31/2006 | WO2006091405A2 High temperature chemical vapor deposition apparatus |
| 08/31/2006 | WO2006091291A2 Apparatus and process for carbon nanotube growth |
| 08/31/2006 | WO2006090602A1 Vapor deposited film by plasma cvd method |
| 08/31/2006 | WO2006090537A1 Gas mixer, film deposition equipment, and method for producing thin film |
| 08/31/2006 | WO2006090046A2 Composite material consisting of a porous matrix and metal or metal oxide nanoparticles |
| 08/31/2006 | WO2006089753A1 Saw band and method for the production of a saw band |
| 08/31/2006 | WO2006061785A3 Combustion chemical vapor deposition on temperature-sensitive substrates |
| 08/31/2006 | WO2006061784A3 Substrate temperature control for combustion chemical vapor deposition |
| 08/31/2006 | WO2006028573A3 Deposition of ruthenium and/or ruthenium oxide films |
| 08/31/2006 | WO2005074587A3 Treatment process for improving the mechanical , catalytic, chemical and biological activity of surfaces and articles treated therewith |
| 08/31/2006 | US20060194419 Crystalline-si-layer-bearing substrate and its production method, and crystalline si device |
| 08/31/2006 | US20060194377 Laser process |
| 08/31/2006 | US20060194347 Method for fabricating superlattice semiconductor structure using chemical vapor diposition |
| 08/31/2006 | US20060194066 Titania coatings |
| 08/31/2006 | US20060193996 Method for pecvd deposition of selected material films |
| 08/31/2006 | US20060193983 Apparatus and methods for plasma vapor deposition processes |
| 08/31/2006 | US20060193981 Apparatus and method for masking vapor phase aluminide coating to achieve internal coating of cooling passages |
| 08/31/2006 | US20060193980 Method for forming film |
| 08/31/2006 | US20060193969 Method and apparatus for streaming a viscous material on a substrate |
| 08/31/2006 | US20060191639 Substrate holding structure and substrate processing device |
| 08/31/2006 | US20060191638 Etching apparatus for semiconductor fabrication |
| 08/31/2006 | US20060191636 Valve assembly, semiconductor device manufacturing apparatus comprising the same, and method of cleaning a trap of a semiconductor device manufactuing apparatus |
| 08/31/2006 | US20060191484 Chuck pedestal shield |
| 08/31/2006 | US20060191483 Substrate susceptor for receiving a substrate to be deposited upon |
| 08/31/2006 | US20060191482 Apparatus and method for processing wafer |
| 08/31/2006 | US20060191481 Apparatus for the formation of a metal film |
| 08/31/2006 | US20060191480 Plasma processing apparatus and semiconductor device manufactured by the same apparatus |
| 08/31/2006 | US20060191479 Surface treatment apparatus |
| 08/31/2006 | US20060191478 High density plasma CVD chamber |
| 08/31/2006 | US20060191477 Apparatus for the formation of a metal film |
| 08/31/2006 | DE4324320B4 Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung Method and apparatus for producing a formed as a thin film photovoltaic conversion device |
| 08/30/2006 | EP1696051A1 Coated cutting tool insert |
| 08/30/2006 | EP1696050A2 Annular furnace spacers and method of using same |
| 08/30/2006 | EP1695038A2 Controlling the flow of vapors sublimated from solids |
| 08/30/2006 | EP1694887A2 Controlled growth of gallium nitride nanostructures |
| 08/30/2006 | EP1694882A2 Method and system for forming a film of material using plasmon assisted chemical reactions |
| 08/30/2006 | EP1694822A2 Electromagnetic control of chemical catalysis |
| 08/30/2006 | EP1035568B1 Method of plasma processing |
| 08/30/2006 | EP0989915B1 Passivating a gas vessel and article produced |
| 08/30/2006 | EP0983454B1 A sealing system |
| 08/30/2006 | CN1826683A Silicon crystallization using self-assembled monolayers |
| 08/30/2006 | CN1826428A Method of forming thin film, thin film forming apparatus, program and computer-readable information recording medium |
| 08/30/2006 | CN1826427A High rate deposition for the formation of high quality optical coatings |
| 08/30/2006 | CN1826426A Method for forming copper film |
| 08/30/2006 | CN1826425A Method of manufacturing gas barrier film coated plastic container |
| 08/30/2006 | CN1825537A Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus |
| 08/30/2006 | CN1825536A Substrate processing apparatus and substrate processing method |
| 08/30/2006 | CN1825535A Vacuum processor |
| 08/30/2006 | CN1824831A Method for reducing grain generation in depositing low K procedure |
| 08/30/2006 | CN1824830A Technique for depositing carbon or boron nitride film by vertical furnace device |
| 08/30/2006 | CN1824829A Deposition system and method for measuring deposition thickness in the deposition system |
| 08/30/2006 | CN1824825A Method of forming shadow mask pattern |
| 08/30/2006 | CN1824824A Mask frame and method of fixing mask on the mask frame |
| 08/30/2006 | CN1824440A Coated cutting tool insert |
| 08/30/2006 | CN1272639C Scintillator panel |
| 08/30/2006 | CN1272467C Film forming method, optical film, and polarized film |
| 08/29/2006 | US7098474 thin film material of a carbon based material, silicon based material, silicon carbide based material, and cadmium sulfide based material, is between the hole injection layer and the hole transporting layer; heat resistance |
| 08/29/2006 | US7098428 System and method for an improved susceptor |
| 08/29/2006 | US7098150 Method for novel deposition of high-k MSiON dielectric films |
| 08/29/2006 | US7098149 Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| 08/29/2006 | US7098145 Fabrication of self-assembled monolayers |
| 08/29/2006 | US7098131 Methods for forming atomic layers and thin films including tantalum nitride and devices including the same |
| 08/29/2006 | US7098129 Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same |
| 08/29/2006 | US7098085 Method and apparatus for forming a thin semiconductor film, method and apparatus for producing a semiconductor device, and electro-optical apparatus |
| 08/29/2006 | US7098047 Wafer reuse techniques |
| 08/29/2006 | US7098045 Processing method utilizing an apparatus to be sealed against workpiece |