Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2006
09/21/2006US20060211270 Methods for improving quality of high temperature oxide (HTO) formed from halogen-containing precursor and products thereof and apparatus therefor
09/21/2006US20060211244 Clustered surface preparation for silicide and metal contacts
09/21/2006US20060210766 Enhanced friction treatment for flexible panels and articles made thereby
09/21/2006US20060210723 Plasma enhanced atomic layer deposition system and method
09/21/2006US20060210713 Plasma enhanced atomic layer deposition system and method
09/21/2006US20060210712 Method of depositing thin film on substrate using impulse ALD process
09/21/2006US20060208634 Diffusion barrier coatings having graded compositions and devices incorporating the same
09/21/2006US20060208215 Method for hafnium nitride deposition
09/21/2006US20060207691 Metal layer forming methods and capacitor electrode forming methods
09/21/2006US20060207630 Device for cleaning cvd device and method of cleaning cvd device
09/21/2006US20060207509 Gas providing member and processing device
09/21/2006US20060207508 Film deposition using a spring loaded contact finger type shadow frame
09/21/2006US20060207507 Substrate supporting member and substrate processing apparatus
09/21/2006US20060207506 Heated gas line body feedthrough for vapor and gas delivery systems and methods of employing same
09/21/2006US20060207505 Method and apparatus for forming multi-layered thin film by using photolysis chemical vapor deposition
09/21/2006US20060207504 Film formation method and apparatus for semiconductor process
09/21/2006US20060207503 Vaporizer and method of vaporizing a liquid for thin film delivery
09/21/2006US20060207502 Plasma confinement ring assemblies having reduced polymer deposition characteristics
09/21/2006US20060207294 Method of forming a phosphorus doped optical core using a pecvd process
09/21/2006DE102005011940A1 Verfahren zur Herstellung von beschichteten Kohlenstoffpartikel und deren Verwendung in Anodenmaterialien für Lithium-Ionenbatterien A process for preparing coated carbon particles and their use in anode materials for lithium-ion batteries
09/20/2006EP1703550A1 Vapor growth device and production method for epitaxial wafer
09/20/2006EP1703549A1 Vapor growth device and porduction method for epitaxial wafer
09/20/2006EP1703546A2 Processing device
09/20/2006EP1702999A1 Method of depositing thin film on substrate using impulse ALD process
09/20/2006EP1702998A2 amorphous-carbon coated member
09/20/2006EP1702351A2 Exhaust conditioning system for semiconductor reactor
09/20/2006EP1702088A1 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
09/20/2006CN2818496Y Fast heater
09/20/2006CN1836317A Method for forming film, method for manufacturing semiconductor device, semiconductor device and substrate treatment system
09/20/2006CN1836316A Production of insulating film with low dielectric constant
09/20/2006CN1836060A Method and an apparatus for applying a coating on a substrate
09/20/2006CN1835961A Organic iridium compound, method for producing the compound and method for producing film
09/20/2006CN1835200A Vacuum apparatus, method for measuring a leak rate thereof, program used in measuring the leak rate and storage medium storing the program
09/20/2006CN1834289A A method for depositing thin film on wafer using impulse ALD
09/20/2006CN1834288A Low temp chemical gaseous deposition for preparing silicon nitride thin film
09/20/2006CN1834287A Method of preparing carbon-carbon composite material surface silicon carbide nano wire
09/20/2006CN1834286A Growth appts. of Chemical gaseous phase deposition
09/20/2006CN1834006A Growth appts. of carson nanotube array and growth method of multi-wall carbon nanotube array
09/20/2006CN1276478C Coating agent, plasma-resistant component having coating film fomed by the coating agent, plasma processing device provided with the plasma-resistant component
09/20/2006CN1276474C Method of improving flatness of wafer surface
09/20/2006CN1276473C Thermal treatment apparatus and thermal treatment method
09/20/2006CN1276472C Heat generator CVD device and heat generator CVD method adopting same
09/20/2006CN1276466C Substrate support member
09/20/2006CN1276125C Wedge shaped reaction tube in use for equipment of metal organic chemical vapor deposition
09/20/2006CN1276124C Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
09/20/2006CN1276123C Equipment for fabricating nesa of stannic oxide
09/20/2006CN1276122C Heating unit in use for metal-organic chemical vapor deposition system
09/20/2006CN1275851C Preparation method of carbon nano-pipe
09/19/2006US7109660 Plasma processing device and baffle plate thereof
09/19/2006US7109375 Co-polymer comprising: one or more di- tertiary amines including an amide or thioamide functional group linked to unsaturated tertiary amine compound;
09/19/2006US7109132 High density plasma chemical vapor deposition process
09/19/2006US7109131 System and method for hydrogen-rich selective oxidation
09/19/2006US7109114 HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performance
09/19/2006US7109113 Solid source precursor delivery system
09/19/2006US7109095 Method for fabricating semiconductor device
09/19/2006US7109070 Production of a composite material having a biodegradable plastic substrate and at least one coating
09/19/2006US7108771 Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films
09/19/2006US7108753 Staggered ribs on process chamber to reduce thermal effects
09/19/2006US7108751 Method and apparatus for determining consumable lifetime
09/19/2006US7108748 Low temperature load and bake
09/19/2006US7108747 Method for growing oxide thin films containing barium and strontium
09/19/2006US7108746 Silicon fixture with roughened surface supporting wafers in chemical vapor deposition
09/19/2006US7108041 Hollow nickel shapes by vapor deposition
09/19/2006US7108009 Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto
09/19/2006US7107998 Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
09/19/2006CA2341861C Plastic container having a carbon-treated internal surface
09/19/2006CA2299225C Method and apparatus for manufacturing ceramic-based composite member
09/14/2006WO2006096659A2 Method and system for coating sections of internal surfaces
09/14/2006WO2006096641A1 Method and system for coating internal surfaces using reverse-flow cycling and other techniques
09/14/2006WO2006095772A1 Method of forming zinc oxide layer, zinc oxide layer forming apparatus and zinc oxide layer
09/14/2006WO2006095560A1 Method of substrate treatment, recording medium and substrate treating apparatus
09/14/2006WO2006081104A3 Semiconductor wafer boat for a vertical furnace
09/14/2006WO2006034130B1 Apparatus and process for surface treatment of substrate using an activated reactive gas
09/14/2006WO2005103333A3 Wafer heater assembly
09/14/2006WO2003015129A3 Low-k dielectric thin films and chemical vapor deposition method of making same
09/14/2006US20060205230 Surface preparation prior to deposition
09/14/2006US20060205228 Atomic layer deposition methods
09/14/2006US20060205227 Atomic layer deposition methods
09/14/2006US20060205213 Substrate treating apparatus and method for manufacturing semiconductor device
09/14/2006US20060205194 Methods of depositing electrically active doped crystalline Si-containing films
09/14/2006US20060205191 Substrate processing method
09/14/2006US20060205187 Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
09/14/2006US20060205185 Method of epitaxial deoposition of an n-doped silicon layer
09/14/2006US20060205142 Methods of forming semiconductor constructions
09/14/2006US20060204904 Metal mask and manufacturing method thereof
09/14/2006US20060204662 Methods of making monolayers
09/14/2006US20060204660 As precursor for preparing iridium-based films on substrates
09/14/2006US20060204659 Copper-indium-selenium-containing thin films; Metal Organic Chemical Vapor Deposition
09/14/2006US20060204656 Systems and methods of applying ozone-depleting catalysts to air stream components
09/14/2006US20060204649 Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition
09/14/2006US20060204648 Multiple vacuum evaporation coating device and method for controlling the same
09/14/2006US20060204647 De-icing system for driveways, walkways, sidewalks and other surfaces
09/14/2006US20060204645 Method of coating a surgical instrument
09/14/2006US20060201624 Method of in-situ chamber cleaning
09/14/2006US20060201623 Low temperature wafer backside cleaning
09/14/2006US20060201533 Cvd apparatus and method for cleaning cvd apparatus
09/14/2006US20060201428 Shower head and method of fabricating the same
09/14/2006US20060201427 CVD coating device
09/14/2006US20060201426 Reactor for Producing Reactive Intermediates for Transport Polymerization
09/14/2006US20060201425 Precursor preparation for controlled deposition coatings