| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/28/2006 | WO2006101225A1 Free-standing substrate, manufacturing method thereof and semiconductor light-emitting device |
| 09/28/2006 | WO2006101171A1 Production method for vacuum component, resin coating forming device and vacuum film forming system |
| 09/28/2006 | WO2006101130A1 Film-forming apparatus and film-forming method |
| 09/28/2006 | WO2006100956A1 Process for producing thin nitride film on sapphire substrate and thin nitride film producing apparatus |
| 09/28/2006 | WO2006100953A1 Method of film formation and apparatus for film formation |
| 09/28/2006 | WO2006100862A1 Substrate processing method and recording medium |
| 09/28/2006 | WO2006100432A1 Method of treating a gas stream |
| 09/28/2006 | WO2006100431A1 Trap device |
| 09/28/2006 | WO2006100429A1 Trap device |
| 09/28/2006 | WO2006100260A2 Surface treatment |
| 09/28/2006 | WO2006057709A3 Method for deposition of metal layers from metal carbonyl precursors |
| 09/28/2006 | WO2006012048A3 Deposition apparatus for providing uniform low-k dielectric |
| 09/28/2006 | WO2006012021A3 Methods and apparatus for optimal temperature control in a plasma processing system |
| 09/28/2006 | WO2005104186B1 Method and processing system for plasma-enhanced cleaning of system components |
| 09/28/2006 | US20060217830 Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
| 09/28/2006 | US20060216953 Method of forming film and film forming apparatus |
| 09/28/2006 | US20060216949 Method for cleaning heat treatment apparatus |
| 09/28/2006 | US20060216945 Methods of depositing materials over semiconductor substrates |
| 09/28/2006 | US20060216928 Cyclical deposition of refractory metal silicon nitride |
| 09/28/2006 | US20060216914 Method of growing non-polar a-plane gallium nitride |
| 09/28/2006 | US20060216840 Methods for assessing alignments of substrates within deposition apparatuses; and methods for assessing thicknesses of deposited layers within deposition apparatuses |
| 09/28/2006 | US20060216548 Nanolaminate thin films and method for forming the same using atomic layer deposition |
| 09/28/2006 | US20060216515 Diamond film coated tool and process for producing the same |
| 09/28/2006 | US20060216514 Diamond film-forming silicon and its manufacturing method |
| 09/28/2006 | US20060216433 Method of stabilizing film quality of low-dielectric constant film |
| 09/28/2006 | US20060216422 Methods and aparatus for turbine engine component coating |
| 09/28/2006 | US20060216420 Manufacturing process of thin film transistor |
| 09/28/2006 | US20060216419 Sublimation bed employing carrier gas guidance structures |
| 09/28/2006 | US20060216418 Formation of silicon nitride film |
| 09/28/2006 | US20060216417 System for control of gas injectors |
| 09/28/2006 | US20060216416 Flowing a buffer gas to form a gas barrier layer between the interior surface and at least a portion of the process gas used in the system so that the gas barrier layer inhibits contact between the interior surface and components of the process gas; especially for a chemical vapor deposition system |
| 09/28/2006 | US20060216415 Vapor aluminide coating gas manifold |
| 09/28/2006 | US20060216410 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 09/28/2006 | US20060216409 Film forming method and producing method for electron source substrate |
| 09/28/2006 | US20060216407 Method of and apparatus for manufacturing tape-formed oxide superconductor |
| 09/28/2006 | US20060216406 Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
| 09/28/2006 | US20060216220 Method for manufacturing diamond single crystal substrate, and diamond single crystal substrate |
| 09/28/2006 | US20060213539 Method for cleaning thin-film forming apparatus |
| 09/28/2006 | US20060213446 Temperature control unit for bubblers |
| 09/28/2006 | US20060213445 Deposition apparatuses |
| 09/28/2006 | US20060213444 Deposition apparatus and deposition method |
| 09/28/2006 | US20060213443 Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same |
| 09/28/2006 | US20060213442 Apparatus for fabricating electroluminescent display device |
| 09/28/2006 | US20060213441 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
| 09/28/2006 | US20060213440 Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
| 09/28/2006 | US20060213439 Plasma enhanced atomic layer deposition system having reduced contamination |
| 09/28/2006 | US20060213438 Plasma enhanced atomic layer deposition system |
| 09/28/2006 | US20060213437 Plasma enhanced atomic layer deposition system |
| 09/28/2006 | US20060213436 Substrate processing apparatus |
| 09/28/2006 | DE112004002299T5 Verlängerte Nanostruktur und zugehörige Vorrichtung Extended nanostructure and associated apparatus |
| 09/28/2006 | CA2602274A1 Surface treatment |
| 09/27/2006 | EP1705699A1 Film forming device and film forming method |
| 09/27/2006 | EP1705263A1 Coated cutting tool insert |
| 09/27/2006 | EP1705262A1 Vapor aluminide coating using a gas manifold |
| 09/27/2006 | EP1704756A2 Plasma treatment of large-scale components |
| 09/27/2006 | EP1704267A2 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition |
| 09/27/2006 | EP1704264A1 A layered structure |
| 09/27/2006 | EP1458902B1 Method and installation for densifying porous substrate by gas-phase chemical infiltration |
| 09/27/2006 | EP1438315B1 Improved precursors for chemical vapour deposition |
| 09/27/2006 | EP1157598A4 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source |
| 09/27/2006 | EP1133453B1 Method for forming multicomponent glass particles |
| 09/27/2006 | EP0873343B1 Metal complex source reagents for chemical vapor deposition |
| 09/27/2006 | CN2820878Y Gas depositing thin film device of plasma reinforced heat wire chemistry |
| 09/27/2006 | CN1839218A Method and apparatus for depositing materials with tunable characteristics |
| 09/27/2006 | CN1839217A Methods of depositing materials over substrates, and methods of forming layers over substrates |
| 09/27/2006 | CN1839216A Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same |
| 09/27/2006 | CN1838381A Method for electrically discharging substrate, substrate processing apparatus and program |
| 09/27/2006 | CN1837404A Film-forming apparatus and film-forming method |
| 09/27/2006 | CN1837403A Vapor aluminide coating gas manifold |
| 09/27/2006 | CN1837402A Apparatus for depositing silicon carbide film by dust plasma under normal temperature |
| 09/27/2006 | CN1836811A Coated cutting tool insert |
| 09/27/2006 | CN1277290C Method for preparing low dielectric films |
| 09/27/2006 | CN1277128C Process for preparing optical element with anti-reflect film |
| 09/27/2006 | CN1276993C Method for depositing film using plasma chemical vapor deposition method |
| 09/27/2006 | CN1276992C Raw material composition for CVD and its manufacturing method and chemical gas-phase evaporation plating method of iridium or iridium compound film |
| 09/26/2006 | US7112926 Matching unit and plasma processing system |
| 09/26/2006 | US7112816 Carbon nanotube sensor and method of producing the same |
| 09/26/2006 | US7112760 Laser annealer and laser thin-film forming apparatus |
| 09/26/2006 | US7112758 Apparatus and method for solution plasma spraying |
| 09/26/2006 | US7112690 Volatile noble metal organometallic complexes |
| 09/26/2006 | US7112546 Method of manufacturing semiconductor devices comprising a deposition tool cleaning process having a moving plasma zone |
| 09/26/2006 | US7112544 In a reactor, substrates are simultaneously exposed to a first reactive material to form a first mass across the exposed surfaces of the substrates, the first reactive material is removed, and the substrates are exposed to a second reactive material to convert the first mass to a second mass |
| 09/26/2006 | US7112541 In-situ oxide capping after CVD low k deposition |
| 09/26/2006 | US7112538 In situ growth of oxide and silicon layers |
| 09/26/2006 | US7112531 Silicon oxide co-deposition/etching process |
| 09/26/2006 | US7112485 Systems and methods for forming zirconium and/or hafnium-containing layers |
| 09/26/2006 | US7112353 Film deposition apparatus and film deposition method |
| 09/26/2006 | US7112352 Apparatus and method for depositing large area coatings on planar surfaces |
| 09/21/2006 | WO2006099619A2 Temperature control unit for bubblers |
| 09/21/2006 | WO2006098792A2 High accuracy vapor generation and delivery for thin film deposition |
| 09/21/2006 | WO2006098260A1 Apparatus for film formation and method for film formation |
| 09/21/2006 | WO2006098259A1 SELECTIVE W-CVD PROCESS AND PROCESS FOR PRODUCING Cu MULTILAYER WIRING |
| 09/21/2006 | WO2006097679A1 Vacuum pumping arrangement |
| 09/21/2006 | WO2006097525A2 Method of forming silicon oxide containing films |
| 09/21/2006 | WO2006097380A1 Method for producing coated carbon particles and use of the latter in anode materials for lithium-ion batteries |
| 09/21/2006 | WO2006073596A3 Flame retardant metallized polyester films having anti-dripping properties |
| 09/21/2006 | WO2006065426A3 Pulsed mass flow delivery system and method |
| 09/21/2006 | WO2006057708A3 Method and system for measuring a flow rate in a solid precursor delivery system |
| 09/21/2006 | WO2006017136A3 Plasma uniformity control by gas diffuser curvature |
| 09/21/2006 | WO2006004579A3 A chemical vapor deposition apparatus |