C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2006
10/05/2006	WO2006104582A2 Method and system for increasing tensile stress in a thin film using collimated electromagnetic radiation
10/05/2006	WO2006103982A1 Edge replacement cutter tip and method of manufacturing the same
10/05/2006	WO2006036393A3 Protected polymeric film
10/05/2006	WO2006029747A3 Cutting tool with oxide coating
10/05/2006	WO2006002429A3 Chamberless plasma deposition of coatings
10/05/2006	WO2005124859A3 Methods and apparatuses for depositing uniform layers
10/05/2006	US20060224276 Method for monitoring the position of a semiconductor processing robot
10/05/2006	US20060223339 Ald metal oxide deposition process using direct oxidation
10/05/2006	US20060223323 Method of forming an interconnect structure
10/05/2006	US20060223322 Method of forming a trench structure
10/05/2006	US20060223315 Thermal oxidation of silicon using ozone
10/05/2006	US20060223312 Method and apparatus for selective deposition of materials to surfaces and substrates
10/05/2006	US20060223306 Method for forming film, method for manufacturing semiconductor device, semiconductor device and substrate treatment system
10/05/2006	US20060223286 Atomic layer deposition apparatus
10/05/2006	US20060222894 Wear resistance, flaking resistance, high resistance to plastic deformation; used for machining of low carbon steel and stainless steel; hard coating comprising a laminar, multilayered structure of metal oxides chosen from aluminum, zirconium, titanium, hafnium or chromium
10/05/2006	US20060222790 Preparation of library that includes monodisperse nanoclusters
10/05/2006	US20060222779 Glow discharge-generated chemical vapor deposition
10/05/2006	US20060222772 Method and apparatus for the production of thin film coatings
10/05/2006	US20060222771 Methods for the reduction and elimination of particulate contamination with cvd of amorphous carbon
10/05/2006	US20060222770 Atomic layer deposition utilizing supercritical fluids to introduce precursors into reaction chambers; forming aluminum doped hafnium oxide; homogenous mixed films; capacitors
10/05/2006	US20060222769 Method for saturating a carrier gas with precursor vapor
10/05/2006	US20060222768 Method and system for precursor delivery
10/05/2006	US20060222767 Production device for multiple-system film and coating tool for multiple-system film
10/05/2006	US20060222481 Method of supporting a substrate in a gas cushion susceptor system
10/05/2006	US20060219363 Capacitive coupling plasma processing apparatus and method for using the same
10/05/2006	US20060219322 Superconducting wire and its production method
10/05/2006	US20060219179 Substrate gripping apparatus
10/05/2006	US20060219178 Device for applying semiconductor treatment to treatment subject substrate
10/05/2006	US20060219177 Method and system for depositing material on a substrate using a solid precursor
10/05/2006	US20060219176 Processing device
10/05/2006	US20060219175 Oxide-like seasoning for dielectric low k films
10/05/2006	US20060219174 Hermetic cap layers formed on low-k films by plasma enhanced chemical vapor deposition
10/05/2006	US20060219173 Apparatus for injecting plasma gas in atmosphere
10/05/2006	US20060219172 PVD equipment and electrode and deposition ring thereof
10/05/2006	US20060219171 Substrate processing apparatus
10/05/2006	US20060219170 Pore cathode for the mass production of photovoltaic devices having increased conversion efficiency
10/05/2006	US20060219169 Hdp-cvd seasoning process for high power hdp-cvd gapfil to improve particle performance
10/05/2006	US20060219168 Solid precursor vaporization system for use in chemical vapor deposition
10/05/2006	US20060219158 Body having a smooth diamond layer, device and method therefor
10/05/2006	US20060218762 System and method for detecting flow in a mass flow controller
10/05/2006	DE19581484B4 Vorrichtung zur Bildung von Dünnschichten An apparatus for forming thin films
10/05/2006	DE10123583B4 Vorrichtung und Verfahren zur Beschichtung und/oder Oberflächenbehandlung von Substraten mittels Niederdruck-Plasma sowie Verwendung der Vorrichtung Apparatus and method for coating and / or surface treatment of substrates using low-pressure plasma, and using the apparatus
10/04/2006	EP1708254A1 Process for producing monocrystal thin film and monocrystal thin film device
10/04/2006	EP1707649A2 Method for coating surfaces with a mixture.
10/04/2006	EP1706908A1 PRODUCTION METHOD FOR SILICON SOLAR CELLS COMPRISING mC-SILICON LAYERS
10/04/2006	EP1706902A2 Plasma-excited chemical vapor deposition method, silicon/oxygen/nitrogen-containing material and layered assembly
10/04/2006	EP1706446A1 Flexible fluid transfer tube
10/04/2006	EP1479267B1 System and method for lamp split zone control
10/04/2006	EP1100979B1 Coated grooving or parting insert
10/04/2006	CN2823274Y Multi-unit CVD cavity
10/04/2006	CN1842904A 半导体装置及其制造方法 Semiconductor device and manufacturing method thereof
10/04/2006	CN1842901A Process for producing oxide thin film and production apparatus therefor
10/04/2006	CN1842899A Substrate processing apparatus and method for manufacturing semiconductor device
10/04/2006	CN1842895A Substrate processing apparatus and method for manufacturing semiconductor device
10/04/2006	CN1842894A Method of depositing thin film on wafer
10/04/2006	CN1841800A Method of forming a low temperature-grown buffer layer, light emitting element, method of making same, and light emitting device
10/04/2006	CN1841696A Apparatus for processing substrate
10/04/2006	CN1841676A Formation of silicon nitride film by using atomic layer deposition method
10/04/2006	CN1841663A Semiconductor manufacturing apparatus
10/04/2006	CN1841654A Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same
10/04/2006	CN1841652A Load fixing device, processing system and method
10/04/2006	CN1841003A Thermal interface incorporating nanotubes
10/04/2006	CN1840737A Reflective and resistant coatings and methods for applying to composite structures
10/04/2006	CN1840733A Method for growing zinc oxide film on silicon substrate by using buffer layer
10/04/2006	CN1840267A Surface coated cutting tool made of cermet
10/04/2006	CN1278393C Gas distribution system of semiconductor machine table gas reaction chamber and method
10/04/2006	CN1278387C Diagnosing method for service life of semiconductor manufacturing apparatus
10/04/2006	CN1278386C Heat treating apparatus and heat-treating method
10/04/2006	CN1277951C Surface processer
10/03/2006	US7117064 Method of depositing dielectric films
10/03/2006	US7115895 Formation of high-mobility silicon—germanium structures by low-energy plasma enhanced chemical vapor deposition
10/03/2006	US7115840 Wafer bake apparatus
10/03/2006	US7115839 Heaters
10/03/2006	US7115530 Top surface roughness reduction of high-k dielectric materials using plasma based processes
10/03/2006	US7115529 Atomic layer deposition methods
10/03/2006	US7115528 Systems and method for forming silicon oxide layers
10/03/2006	US7115516 Method of depositing a material layer
10/03/2006	US7115508 Oxide-like seasoning for dielectric low k films
10/03/2006	US7115499 Cyclical deposition of tungsten nitride for metal oxide gate electrode
10/03/2006	US7115494 Method and system for controlling the presence of fluorine in refractory metal layers
10/03/2006	US7115438 Method for manufacturing a complementary metal-oxide semiconductor sensor
10/03/2006	US7115424 Method for manufacturing semiconductor device
10/03/2006	US7115310 Obtaining silicone oxide coatings by means of vapor-depositing a silicon oxide coating onto each side of the substrate film by a plasma chemical vapour deposition (PECVD) while straining the film
10/03/2006	US7115305 Method of producing regular arrays of nano-scale objects using nano-structured block-copolymeric materials
10/03/2006	US7115304 Atomic layer deposition; high-quality thin-film deposition technique based on sequential, self-limiting surface reactions
10/03/2006	US7115186 Liquid material evaporation apparatus for semiconductor manufacturing
10/03/2006	US7115185 Pulsed excitation of inductively coupled plasma sources
10/03/2006	US7115184 Plasma processing device
10/03/2006	US7115169 Replaceable shielding apparatus
10/03/2006	US7115166 Systems and methods for forming strontium- and/or barium-containing layers
10/03/2006	US7114669 Vaporizer includes nozzle with liquid exit and inlet; actuating seal adapted to engage liquid inlet to regulate a flow; andactuating a positive shut-off valve; carrier gas inlet coupled to body and a plurality of peltier cells coupled to the body
10/03/2006	CA2211441C Operating process and control device for a surface treatment system
10/03/2006	CA2211440C Operating process and control device for a surface treatment system with a moving solid substrate
10/03/2006	CA2180927C Process for producing corrosion resistant and wear resistant layers on materials that are based on iron
10/01/2006	CA2541195A1 Reflective and resistant coatings and methods for applying to composite structures
09/2006
09/28/2006	WO2006101889A2 Plasma confinement ring assemblies having reduced polymer deposition characteristics
09/28/2006	WO2006101886A2 A plasma enhanced atomic layer deposition system and method
09/28/2006	WO2006101697A2 Vaporizer and method of vaporizing a liquid for thin film delivery
09/28/2006	WO2006101646A1 Method for forming a ruthenium metal layer on a patterned substrate
09/28/2006	WO2006101578A1 Vapor phase treatment of dielectric materials

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