C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2006
10/18/2006	CN1280190C Highly pure ultra-fine SiOx powder and method for production thereof
10/18/2006	CN1280023C Poly-p-xylene surface coating equipment of ancient books and literatures and its coating technology
10/17/2006	US7122938 Surface acoustic wave device
10/17/2006	US7122847 Nitride semiconductor thin film and method for growing the same
10/17/2006	US7122790 Mass analysis by photon desorption comprising at least one layer for contacting an analyte, and a substrate on which said layer is deposited. Upon irradiation said analyte desorbs and ionizes for analysis by mass spectrometry.
10/17/2006	US7122488 High density plasma process for the formation of silicon dioxide on silicon carbide substrates
10/17/2006	US7122486 Film forming method
10/17/2006	US7122464 Systems and methods of forming refractory metal nitride layers using disilazanes
10/17/2006	US7122450 Process for manufacturing a semiconductor device
10/17/2006	US7122222 Precursors for depositing silicon containing films and processes thereof
10/17/2006	US7122221 Method and apparatus for metal vapor coating
10/17/2006	US7122085 Sublimation bed employing carrier gas guidance structures
10/17/2006	US7121286 Gas flow of fluorine cleaning gas so as to flow from upstream toward an outlet port in a reaction chamber; flowing protective gas which reacts with the fluorine from vicinity of outlet port
10/17/2006	CA2292380C Coating of a discrete selective surface of an article
10/12/2006	WO2006107545A2 Method for forming a barrier/seed layer for copper metallization
10/12/2006	WO2006107036A1 Substrate processing method and substrate processing apparatus
10/12/2006	WO2006078666A3 Reaction system for growing a thin film
10/12/2006	WO2005102545A3 System and method of removing chamber residues from a plasma processing system in a dry cleaning process
10/12/2006	US20060228888 Atomic layer deposition of high k metal silicates
10/12/2006	US20060228571 Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment
10/12/2006	US20060228497 Plasma-assisted coating
10/12/2006	US20060228494 Method and system for depositing a layer from light-induced vaporization of a solid precursor
10/12/2006	US20060228490 Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems
10/12/2006	US20060228479 Bias enhanced nucleation of diamond films in a chemical vapor deposition process
10/12/2006	US20060228478 Method for manufacturing carbon fibers and method for manufacturing electron emitting device using the same, method for manufacturing display, and ink for producing catalyst for use in these methods
10/12/2006	US20060228477 Method for selective chemical vapor deposition of nanotubes
10/12/2006	US20060228476 Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
10/12/2006	US20060228475 Oxidation resistant coatings for ultra high temperature transition metals and transition metal alloys
10/12/2006	US20060228474 Leading edge components for high speed air and space craft
10/12/2006	US20060228473 Semiconductor-processing apparatus provided with self-cleaning device
10/12/2006	US20060228465 Thermal deposition coating method
10/12/2006	US20060226548 Very low dielectric constant plasma-enhanced cvd films
10/12/2006	US20060226519 Method and system for increasing tensile stress in a thin film using collimated electromagnetic radiation
10/12/2006	US20060226518 Method and system for increasing tensile stress in a thin film using multi-frequency electromagnetic radiation
10/12/2006	US20060225767 Method and apparatus for cleaning a cvd chamber
10/12/2006	US20060225657 Apparatus and method for depositing a dielectric film
10/12/2006	US20060225656 Plasma processing apparatus, slot antenna and plasma processing method
10/12/2006	US20060225655 Plasma enhanced atomic layer deposition system and method
10/12/2006	US20060225654 Disposable plasma reactor materials and methods
10/12/2006	US20060225652 Apparatus for vacuum coating of substrates of various sizes
10/12/2006	US20060225651 Method for manufacturing a semiconductor device and apparatus for manufacturing the same
10/12/2006	US20060225650 Atomic layer deposition apparatus with point of use generated reactive gas species
10/12/2006	US20060225649 Deposition reactor and method of determining its diffuser
10/12/2006	US20060225614 Tin-doped indium oxide microparticle dispersion, process for producing the same, interlayer for laminated glass having heat-ray blocking property produced with the dispersion and laminated glass
10/12/2006	DE10259174B4 Verwendung eines tribologisch beanspruchten Bauelements Use of a tribological stress component
10/12/2006	DE102005016405A1 Vorrichtung zur Vakuumbeschichtung von Substraten unterschiedlicher Größe Apparatus for vacuum coating substrates of different sizes
10/12/2006	CA2604494A1 Improved method and apparatus for treating bacterial infections in devices
10/11/2006	EP1710833A1 Semiconductor manufacturing apparatus and semiconductor manufacturing method using same
10/11/2006	EP1710416A1 Protective coating for an engine component scavenged by exhaust gases
10/11/2006	EP1709214A1 Carrier body and method for coating cutting tools.
10/11/2006	EP1709213A2 Systems and methods for synthesis of extended length nanostructures
10/11/2006	EP1404891B1 Cvd system comprising a thermally differentiated substrate support
10/11/2006	EP1361837B1 Endoprothesis with galvanised silver layer
10/11/2006	EP1313890B1 Barrier coating for vitreous materials
10/11/2006	EP1035569B1 Method for forming plasma films
10/11/2006	EP0848658B1 Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
10/11/2006	CN2825653Y Table base space adjusting device with multiple measure base
10/11/2006	CN2825652Y Multi-domain heating bench for chemical vapor deposition chamber
10/11/2006	CN2825651Y Liner for sediment chamber
10/11/2006	CN1846300A Plasma processing device
10/11/2006	CN1846297A A method of forming a teos cap layer at low temperature and reduced deposition rate
10/11/2006	CN1846293A Method for balancing return currents in plasma processing apparatus
10/11/2006	CN1845797A Glow discharge-generated chemical vapor deposition
10/11/2006	CN1845662A Surface film-plating structure of heat radiation metal and its making method
10/11/2006	CN1844450A Hot wire for diamond film growth device and electrode structure thereof
10/11/2006	CN1844449A Device and method for surface treatment of hollow cathode plasma in inner surface of slimline
10/11/2006	CN1843998A Titanium silicide nano-nail prepared by chemical vapor deposition under normal pressure and preparation method thereof
10/11/2006	CN1279545C Lithium silicon compound radio-frequency wall processing technology used in nuclear fusion experimental device
10/11/2006	CN1279221C Method of depositing big grain polycrystalline silicon thin film on ceramic substrate
10/11/2006	CN1279211C Process and device for deposition of at least partially crystalline silicium layer on substrate
10/11/2006	CN1279210C Monophyletic mixture of metal oxygen silicide
10/10/2006	US7120556 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
10/10/2006	US7119946 Process for producing display device
10/10/2006	US7119441 Semiconductor interconnect structure
10/10/2006	US7119418 Supercritical fluid-assisted deposition of materials on semiconductor substrates
10/10/2006	US7119034 Atomic layer deposition method of forming an oxide comprising layer on a substrate
10/10/2006	US7119030 Process for lining a surface using an organic film
10/10/2006	US7119016 Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion
10/10/2006	US7118945 Method of forming insulating layer and method of fabricating thin film transistor using the same
10/10/2006	US7118783 Methods and apparatus for vapor processing of micro-device workpieces
10/10/2006	US7118782 Method for manufacturing diamond coatings
10/10/2006	US7118781 Methods for controlling formation of deposits in a deposition system and deposition methods including the same
10/10/2006	US7118780 Heat treatment method
10/10/2006	US7118779 Reactor surface passivation through chemical deactivation
10/10/2006	US7118683 Methods of etching silicon-oxide-containing compositions
10/10/2006	US7118630 Apparatus for depositing a low work function material
10/05/2006	WO2006105467A1 System and method for surface treatment
10/05/2006	WO2006105151A1 Diamond-diamond composites
10/05/2006	WO2006104921A2 A plasma enhanced atomic layer deposition system and method
10/05/2006	WO2006104864A2 A plasma enhanced atomic layer deposition system
10/05/2006	WO2006104863A2 A plasma enhanced atomic layer deposition system
10/05/2006	WO2006104853A1 Low-temperature chemical vapor deposition of low-resistivity ruthenium layers
10/05/2006	WO2006104841A2 Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
10/05/2006	WO2006104794A1 Method and system for precursor delivery
10/05/2006	WO2006104783A1 Method and system for refurbishing a metal carbonyl precursor
10/05/2006	WO2006104741A1 A plasma enhanced atomic layer deposition system having reduced contamination
10/05/2006	WO2006104736A1 Termination of secondary frequencies in rf power delivery
10/05/2006	WO2006104647A2 Method and system for forming avariable thickness seed layer
10/05/2006	WO2006104626A1 Method and system for depositing a layer from light-induced vaporization of a solid precursor
10/05/2006	WO2006104583A2 Method and system for increasing tensile stress in a thin film using multi-frequency electromagnetic radiation

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