Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2006
10/25/2006CN1850348A Gas nozzle with function of increasing air-flow distribution evenness
10/25/2006CN1850347A Air-intaking nozzle with adjustable air-supplying evenness
10/25/2006CN1282159C Thin-film magnetic lead, method for generating said film and magnetic disk using said film
10/25/2006CN1281782C System and method for making thin-film structures using stepped profile mask
10/25/2006CN1281340C Coating method of making antistatic coating of display panel stick to earthing element directly
10/24/2006US7127286 Implantable device using ultra-nanocrystalline diamond
10/24/2006US7126284 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
10/24/2006US7126093 Heating systems
10/24/2006US7126092 Heater for wafer processing and methods of operating and manufacturing the same
10/24/2006US7125815 Methods of forming a phosphorous doped silicon dioxide comprising layer
10/24/2006US7125813 Method of depositing low K barrier layers
10/24/2006US7125812 CVD method and device for forming silicon-containing insulation film
10/24/2006US7125765 Semiconductor device and method for manufacturing same
10/24/2006US7125758 Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
10/24/2006US7125603 Microporous membrane with a pore size of 0.05 -1.5 micrometers having diamond-like glass plasma-deposited on its surface and in its pores that improves bulk wetting properties
10/24/2006US7125588 Plasma vapor deposition using high density plasma generated in presence of magnetic field
10/24/2006US7125587 Covering the slit with a polymeric sheet to maintain a vacuum within the fixture, allowing the ion beam exiting the vacuum fixture; for alignment of the liquid crystals
10/24/2006US7125583 Chemical vapor deposition chamber pre-deposition treatment for improved carbon doped oxide thickness uniformity and throughput
10/24/2006US7125582 Low-temperature silicon nitride deposition
10/24/2006US7125053 Pre-expanded connector for expandable downhole tubulars
10/24/2006CA2331945C Manufacturing method and apparatus of fiber reinforced composite member
10/19/2006WO2006110715A2 Bias enhanced nucleation of diamond films in a chemical vapor deposition process
10/19/2006WO2006110004A1 Diamond shell fabricated by using porous particle and the fabrication method thereof
10/19/2006WO2006109754A1 Method and device for forming vapor deposition film by surface liquid plasma
10/19/2006WO2006109735A1 Film forming method and film forming apparatus
10/19/2006WO2006109686A1 Material for insulating film and process for producing the same
10/19/2006WO2006083909A3 Method of making substitutionally carbon-highly doped crystalline si-layers by cvd
10/19/2006WO2006078719A3 Interface engineering to improve adhesion between low k stacks
10/19/2006WO2006075219A3 Low friction sliding mechanism
10/19/2006WO2006072288A3 Al2o3 multilayer plate
10/19/2006WO2006017596A3 Heated gas box for pecvd applications
10/19/2006WO2006012338A3 Forming high-k dielectric layers on smooth substrates
10/19/2006WO2005076918A3 Barrier layer process and arrangement
10/19/2006US20060235475 Implantable device using ultra-nanocrystalline diamond
10/19/2006US20060235182 Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films
10/19/2006US20060235143 Process for producing detachable dirt- and water-repellent surface coatings
10/19/2006US20060234518 Reacting silane with nitrogen; purging
10/19/2006US20060234517 Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same
10/19/2006US20060234514 Gas distribution showerhead featuring exhaust apertures
10/19/2006US20060234472 Method and device for pre-treating surfaces of substrates to be bonded
10/19/2006US20060234090 Magnetic recording medium and manufacturing method of the same
10/19/2006US20060234064 Dielectric-layer-coated substrate and installation for production thereof
10/19/2006US20060234062 Method for grafting a chemical compound to a support substrate
10/19/2006US20060234055 For metal-graphite composite material having substrate with surface having a carbon fiber content which is 10% or less of the carbon fiber content of the material, metal-containing intermediate layer (especially a zincate), and a metal coating (aluminum or alloy); hermetically sealed; corrosion resistant
10/19/2006US20060233969 Hybrid beam deposition system and methods for fabricating metal oxide-zno films, p-type zno films, and zno-based II-VI compound semiconductor devices
10/19/2006US20060233968 System and method for vaporizing a metal
10/19/2006US20060233953 Focusing an aerosol stream comprising a solution;depositing aerosol stream in a pattern onto a planar or non-planar substrate without use of masks; andprocessing substrate either or both of thermally and photochemically to achieve either or both of physical and electrical properties
10/19/2006US20060233947 Method for producing phosphor panels
10/19/2006US20060233945 Method for Painting an Object, and Corresponding Paint Plant
10/19/2006US20060233699 Plasma reactor and process for producing lower-energy hydrogen species
10/19/2006US20060233692 Nanotube/metal substrate composites and methods for producing such composites
10/19/2006US20060231208 Plasma processing apparatus, plasma processing method and wave retardation plate
10/19/2006US20060231205 Method and apparatus for cleaning a cvd chamber
10/19/2006US20060231035 Modified susceptor for barrel reactor
10/19/2006US20060231034 Power-supplying member and heating apparatus using the same
10/19/2006US20060231033 Tape-manufacturing system having extended operational capabilities
10/19/2006US20060231032 Film-forming method and apparatus using plasma CVD
10/19/2006US20060231031 Method and apparatus for treating a substrate
10/19/2006US20060231030 Modulated gap segmented antenna for inductively-coupled plasma processing system
10/19/2006US20060231029 Rf current return path for a large area substrate plasma reactor
10/19/2006US20060231028 Method for depositing metallic nitride series thin film
10/19/2006US20060231027 Load lock apparatus, processing system and substrate processing method
10/19/2006US20060231026 Vapor deposition systems having separate portions configured for purging using different materials
10/19/2006US20060231017 Atomic layer deposition methods and chemical vapor deposition methods
10/19/2006US20060231016 Deposition apparatuses
10/19/2006US20060230982 Coal tar and hydrocarbon mixture pitch and the preparation and use thereof
10/19/2006DE19735803B4 Elektrode-Elektrolyt-Anordnung, Verfahren zur Herstellung einer Elektrode-Elektrolyt-Anordnung und Verwendung einer Elektrode-Elektrolyt-Anordnung Electrode-electrolyte arrangement, process for preparing an electrode-electrolyte arrangement and use of an electrode-electrolyte arrangement
10/19/2006DE112004001308T5 Chemischer Bedampfungs-Reaktor Chemical vapor deposition reactor
10/19/2006DE112004001026T5 Verfahren und Vorrichtung zum Abscheiden von Materialien mit einstellbaren Eigenschaften und Ätzcharakteristiken Method and apparatus for depositing materials with tunable properties and etching characteristics
10/19/2006DE102005017632A1 Method of controlling local etching or deposition in modification of surfaces with pulsed determination of a removal or deposition profile ion streams useful in the high accuracy forming of optical component surfaces involving
10/18/2006EP1712656A1 Metal-containing compound purification
10/18/2006EP1712527A2 A furnace for carrying out a PCVD process
10/18/2006EP1712108A1 Cylindrical microwave chamber
10/18/2006EP1711962A2 Limited thermal budget formation of pre-metal dielectric layers
10/18/2006EP1711647A2 Method of producing carbon-encapsulated metal nanoparticles
10/18/2006EP1711643A2 Method for the production of an ultra barrier layer system
10/18/2006EP1421630B1 Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate
10/18/2006EP1372864B1 Manifolded fluid delivery system
10/18/2006CN2828063Y Vacuum phase deposition equipment with two deposit chambers
10/18/2006CN2828062Y Preparation system for continous batch preparing diamond film
10/18/2006CN1849704A Methods of forming deuterated silicon nitride-containing materials
10/18/2006CN1849703A Atomic layer deposition of high k metal oxide
10/18/2006CN1849697A Substrate support having dynamic temperature control
10/18/2006CN1849410A Alkyl push flow for vertical flow rotating disk reactors
10/18/2006CN1849409A Methods of treating deposition process components to form particle traps, and deposition process components having particle traps thereon
10/18/2006CN1849034A Plasma processing apparatus, slot antenna and plasma processing method
10/18/2006CN1848452A Gallium nitride based semiconductor device and method of manufacturing same
10/18/2006CN1848414A Thermal interface material producing method
10/18/2006CN1848380A Device and method for chemical vapour deposition (CVD)
10/18/2006CN1848377A Gate valve apparatus and processing system
10/18/2006CN1848376A Semiconductor processing system reaction chamber
10/18/2006CN1848372A Plasma reaction device
10/18/2006CN1848367A Plasma reaction chamber
10/18/2006CN1847651A Swash plate compressor
10/18/2006CN1847450A Chemical vapor deposition method
10/18/2006CN1846871A Single-admission and double-area adjustable nozzle
10/18/2006CN1280875C Low-K metal proelectrolyte semiconductor structure
10/18/2006CN1280873C Plasma treatment device and high-frequency power supply device
10/18/2006CN1280787C Method for depositing a thin film adhesion layer
10/18/2006CN1280448C Forming method of plating chrome on copper layer of printed circuit board