C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2006
11/09/2006	US20060252211 ATOMIC LAYER DEPOSITED NANOLAMINATES OF HfO2/ZrO2 FILMS AS GATE DIELECTRICS
11/09/2006	US20060252176 Memory element and its method of formation
11/09/2006	US20060252166 Nitride semiconductor thin film and method for growing the same
11/09/2006	US20060252160 Electron beam exposure device and exposure method
11/09/2006	US20060251912 forming a MoSi2 diffusion layer by chemical vapor deposition of silicon on a surface of a base material of Mo or alloy, transforming MoSi2 layer to Mo5Si3 diffusion layer by heating in pure H2 or Ar, chemical vapor depositing N2 on the surface of Mo5Si3 to form Mo2NSi3n4, finally vapor depositing silicon
11/09/2006	US20060251828 Plasma film-forming method and plasma film-forming apparatus
11/09/2006	US20060251825 Low dielectric constant insulating film and method of forming the same
11/09/2006	US20060251821 Multi-sectioned pulsed detonation coating apparatus and method of using same
11/09/2006	US20060251816 Method of obtaining surface coatings of silicon nitride(si3n4)on ceramic components and parts
11/09/2006	US20060251815 Atomic layer deposition methods
11/09/2006	US20060251814 Gravity-fed in-line continuous processing system and method
11/09/2006	US20060251813 Methods of forming material over substrates
11/09/2006	US20060251812 Methods for forming atomic layers and thin films including a tantalum amine derivative and devices including the same
11/09/2006	US20060251811 Heating to vaporize, providing thermally conductive path from perforated member at feeding location to heat sink, providing auger enclosure and rotatable auger for receiving powder; uniformity; OLED surfaces
11/09/2006	US20060251810 Metering material to promote rapid vaporization
11/09/2006	US20060251797 Device and method for applying a fluid medium to a substrate
11/09/2006	US20060251796 Waveform generator for microdeposition control system
11/09/2006	US20060249253 Manifold assembly for feeding reactive precursors to substrate processing chambers
11/09/2006	US20060249229 Metal layer forming methods and capacitor electrode forming methods
11/09/2006	US20060249200 Polycrystalline silicon material for solar power generation and silicon wafer for solar power generation
11/09/2006	US20060249081 Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit
11/09/2006	US20060249080 Silicon shelf towers
11/09/2006	US20060249079 Wafer heater and wafer chuck including the same
11/09/2006	US20060249078 High efficiency uv curing system
11/09/2006	US20060249077 Multiple inlet atomic layer deposition reactor
11/09/2006	US20060249076 Low overhead closed loop control system
11/09/2006	CA2673326A1 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
11/09/2006	CA2604124A1 Method of making diamond-like carbon hydrophilic using barrier discharge pyrolysis
11/08/2006	EP1720200A1 Epitaxially growing equipment
11/08/2006	EP1720197A1 Plasma processing apparatus and performance validation system therefore
11/08/2006	EP1720196A1 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level
11/08/2006	EP1719614A2 Aerogel substrate and process for producing the same
11/08/2006	EP1719551A2 Evacuation system
11/08/2006	EP1719181A1 Gradient deposition of low-k cvd materials
11/08/2006	EP1719167A2 Substrate support system for reduced autodoping and backside deposition
11/08/2006	EP1718784A1 Inlet system for an mocvd reactor
11/08/2006	EP1718783A2 Pressure gradient cvi/cvd apparatus and method
11/08/2006	EP1718574A1 Method for cleaning a substrate
11/08/2006	EP1456433B1 Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons
11/08/2006	EP0796355A4 Apparatus for generating plasma by plasma-guided microwave power
11/08/2006	CN2835255Y Device for preparing isotropic pyrolytic carbon materials for use of large-sized mechanical seal
11/08/2006	CN1860596A Method for producing material of electronic device
11/08/2006	CN1860588A Method for depositing metal layers using sequential flow deposition
11/08/2006	CN1860587A Method of forming a metal layer using an intermittent precursor gas flow process
11/08/2006	CN1860252A Gas distribution showerhead
11/08/2006	CN1860251A Methods of forming a phosphorus doped silicon dioxide comprising layer, and methods of forming trench isolation in the fabrication of integrated circuitry
11/08/2006	CN1859985A Diamond coated article and method of its production
11/08/2006	CN1858299A Microwave plasma device and method for preparing diamond film and etched carbon film
11/08/2006	CN1858298A Tunable plasma resonant cavity
11/08/2006	CN1858297A Forced pulse chemical gas phase permeating process
11/08/2006	CN1284218C Substrate temperature measuring method
11/07/2006	US7132840 Method of electrical testing
11/07/2006	US7132556 Chelate complexes of calcium, strontium and barium with beta-ketiminate ligands having a scorpion tail; useful for MOCVD to form ceramic thin films on DRAM components
11/07/2006	US7132360 Method for treating a semiconductor surface to form a metal-containing layer
11/07/2006	US7132346 Atomic layer deposition of titanium using batch type chamber and method for fabricating capacitor by using the same
11/07/2006	US7132300 Method for forming ferroelectric film and semiconductor device
11/07/2006	US7132171 Irradiating an organosilicon compound
11/07/2006	US7132153 Coated cutting tool insert for machining of cast irons
11/07/2006	US7132134 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
11/07/2006	US7132129 Boronizing iron-based substrate and depositing diamond coating on the outer layer using process of chemical vapor deposition; hardness, wear resistance, and chemical stability
11/07/2006	US7132128 Method and system for depositing material on a substrate using a solid precursor
11/07/2006	US7132124 Die for molding honeycomb structure and manufacturing method thereof
11/07/2006	US7132040 Matching unit for semiconductor plasma processing apparatus
11/07/2006	US7132016 System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
11/07/2006	US7131391 Plasma reaction chamber liner comprising ruthenium
11/07/2006	US7131189 Continuous processing of thin-film batteries and like devices
11/02/2006	WO2006116776A2 Chemical vapor deposition system and method
11/02/2006	WO2006116411A2 System and method for depositing a material on a substrate
11/02/2006	WO2006116326A2 Method for decreasing chemical diffusion in parylene and trapping at parylene-to-parylene interfaces
11/02/2006	WO2006115148A1 Silicon carbide single-crystal wafer and process for producing the same
11/02/2006	WO2006081023A3 Method and apparatus for monolayer deposition (mld)
11/02/2006	WO2006079576A3 Gas inlet element for a cvd reactor
11/02/2006	WO2005104634A3 Method and system for performing atomic layer deposition
11/02/2006	US20060246741 ATOMIC LAYER DEPOSITED NANOLAMINATES OF HfO2/ZrO2 FILMS AS GATE DIELECTRICS
11/02/2006	US20060246737 New low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (pecvd)
11/02/2006	US20060246735 Film-forming apparatus component and method for cleaning same
11/02/2006	US20060246727 Integrated dual damascene clean apparatus and process
11/02/2006	US20060246675 Methods of forming capacitor constructions comprising perovskite-type dielectric materials
11/02/2006	US20060246218 Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
11/02/2006	US20060246212 Liquid emitting device and liquid emitting method
11/02/2006	US20060246211 Method of forming film upon a substrate
11/02/2006	US20060244083 Semiconductor device and method for manufacturing semiconductor device
11/02/2006	US20060243209 Substrate susceptors for receiving semiconductor substrates to be deposited upon
11/02/2006	US20060243208 Substrate susceptors for receiving semiconductor substrates to be deposited upon
11/02/2006	US20060243207 Fluid mixing and delivery system
11/02/2006	US20060243060 Method and apparatus for pressure control and flow measurement
11/02/2006	EP1717848A1 Method for producing silicon oxide film
11/02/2006	EP1717348A2 Coated cutting tool insert
11/02/2006	EP1717343A2 Method and apparatus for using solution based precursors for atomic layer deposition
11/02/2006	EP1717342A2 Coating system
11/02/2006	EP1717341A1 Process for producing transparent conductive film and process for producing tandem thin-film photoelectric converter
11/02/2006	EP1717340A2 Method of producing esthetically pleasing ornaments from bone components
11/02/2006	EP1717338A1 Thin film forming apparatus
11/02/2006	EP1716899A2 Liquid cooled trap
11/02/2006	EP1716270A1 Cvd reactor comprising a photodiode array
11/02/2006	EP1716269A2 Process for producing sio2-containing insulating layers on chips
11/02/2006	EP1716202A1 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum
11/02/2006	EP1715937A1 Method and apparatus for treating a fluorocompound-containing gas stream
11/02/2006	EP1222687A4 IMPROVED PECVD AND CVD PROCESSES FOR WNx DEPOSITION
11/02/2006	DE102005020143A1 Method for production of nozzle head with a high pressure recess for an atomizer useful for automobile fuel injection using nozzle head with metal oxide coating harder than unhardened nozzle of thickness less than one micron

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