C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2006
11/28/2006	US7140384 Substrate processing equipment having mass flow controller
11/28/2006	US7140321 Plasma processing apparatus and method
11/23/2006	WO2006124966A2 Low temperature absorption layer deposition and high speed optical annealing system
11/23/2006	WO2006124500A2 Spraying system for progressive spraying on non-rectangular objects
11/23/2006	WO2006124437A1 Bonding an adherent to a substrate via a primer
11/23/2006	WO2006123673A1 Process for producing silicon compound
11/23/2006	WO2006123526A1 Plasma treatment apparatus
11/23/2006	WO2006122744A1 Method for modifying a silicone rubber surface
11/23/2006	WO2006099619A9 Temperature control unit for bubblers
11/23/2006	WO2006097525A3 Method of forming silicon oxide containing films
11/23/2006	WO2006096641B1 Method and system for coating internal surfaces using reverse-flow cycling and other techniques
11/23/2006	WO2006053069A3 Low-k dielectric layer formed from aluminosilicate precursors
11/23/2006	WO2005106067A3 Thin-film coating for wheel rims
11/23/2006	WO2005072302A3 Method for depositing high-quality microcrystalline semiconductor materials
11/23/2006	WO2005067578A3 Method and apparatus for the chemical vapor deposition of materials
11/23/2006	US20060265100 Sequential pulse deposition
11/23/2006	US20060264323 Catalyst structure particularly for the production of field emission flat screens
11/23/2006	US20060264067 Surface pre-treatment for enhancement of nucleation of high dielectric constant materials
11/23/2006	US20060264062 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
11/23/2006	US20060264061 Solid source precursor delivery system
11/23/2006	US20060264045 Method and apparatus for preventing ALD reactants from damaging vacuum pumps
11/23/2006	US20060264044 Chemical vapor deposited film based on a plasma cvd method and method of forming the film
11/23/2006	US20060264038 Method for forming barrier film and method for forming electrode film
11/23/2006	US20060264031 Method for depositing tungsten-containing layers by vapor deposition techniques
11/23/2006	US20060263916 Infrared thermopile detector system for semiconductor process monitoring and control
11/23/2006	US20060263640 Alumina protective coating film and method for formation thereof
11/23/2006	US20060263626 Depositing by physical vapor deposition first layer of aluminum at least 1000 A thick on substrate, depositing layer of chromium about 200 A in thickness on the first layer of aluminum, and depositing second layer of aluminum about 100 A in thickness on chromium layer; flexible, corrosion resistance
11/23/2006	US20060263610 Visible-light-responsive photoactive coating, coated article, and method of making same
11/23/2006	US20060263605 Optical and optoelectronic articles
11/23/2006	US20060263525 Controlling or modeling a chemical vapor infiltration process for densifying porous substrates with carbon
11/23/2006	US20060263524 In a quartz boat, positioning a second catalyst adjacent to a substrate having a film of first catalyst; directing acetylene and argon carrier toward the second catalyst to the substrate to produce a carbonaeous product for promoting catalytic activity of the first catalyst to grow the tubes
11/23/2006	US20060263523 Positioning substrate; chemisorption; contacting cycles
11/23/2006	US20060263522 Apparatus for chemical vapor deposition (CVD) with showerhead and method thereof
11/23/2006	US20060263521 Scintillator panel and method of manufacturing radiation image sensor
11/23/2006	US20060263514 Device and method for forming improved resist layer
11/23/2006	US20060263513 Fluid dispenser with positive displacement pump
11/23/2006	US20060261422 Semiconductor device and method for manufacturing the same
11/23/2006	US20060261397 Lanthanide oxide/hafnium oxide dielectric layers
11/23/2006	US20060261389 Systems and methods for forming zirconium and/or hafnium-containing layers
11/23/2006	US20060261039 Molding a raw material resin; carbonizing molding; roughening simultaneously the inner and outer surfaces, purification, mechanical surface roughening and chemical surface etching; improved adhesion to CVD deposit film and also has a high degree of roundness
11/23/2006	US20060261037 Substrate processing method and substrate processing apparatus
11/23/2006	US20060260750 Plasma processing apparatuses and methods
11/23/2006	US20060260749 Substrate processing apparatus and substrate processing method
11/23/2006	US20060260748 Plasma processing apparatus and method
11/23/2006	US20060260547 Apparatus for coating substrates on both sides
11/23/2006	US20060260546 Semiconductor device and its manufacturing method
11/23/2006	US20060260545 Low temperature absorption layer deposition and high speed optical annealing system
11/23/2006	US20060260544 Substrate processing and method of manufacturing device
11/23/2006	DE102005024010A1 Testing routine process for component of vacuum coating unit maintenance or testing routine is applied to partial process automatically useful for industrial series production of coated parts
11/23/2006	DE102005023018A1 Modification of silicone rubber objects to produce a non-stick surface, e.g. on tubing for catheters or other medical uses, involves depositing a silicate-containing functional layer on the surface from a flame
11/23/2006	DE102004029911B4 Verfahren und Anordnung zur Herstellung anorganischer Schichten Method and apparatus for producing inorganic layers
11/22/2006	EP1724817A1 Film forming apparatus
11/22/2006	EP1724616A2 Process for manufacturing patterned optical filter layers on substrates
11/22/2006	EP1724374A1 Method and process for reactive gas cleaning of tool parts
11/22/2006	EP1724373A1 Precursors for cvd silicon carbo-nitride films
11/22/2006	EP1724039A1 Coated cutting tool
11/22/2006	EP1723266A1 Alumina coating, coated product and method of making the same
11/22/2006	EP1723265A2 High throughput surface treatment on coiled flexible substrates
11/22/2006	EP1623452B1 Wide temperature range chuck system
11/22/2006	EP1428049B1 Optical and optoelectronic articles
11/22/2006	EP1393359A4 Rector having a movable shuter
11/22/2006	EP1368822B1 Rhodium-rich oxygen barriers
11/22/2006	EP1258914B1 Heating element cvd device
11/22/2006	EP1057205B1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
11/22/2006	CN1868042A Method for manufacturing semiconductor device and substrate processing apparatus
11/22/2006	CN1868041A Low temperature deposition of silicon oxides and oxynitrides
11/22/2006	CN1867695A Method of improving post-develop photoresist profile on a deposited dielectric film
11/22/2006	CN1867694A Substrate heater assembly
11/22/2006	CN1865497A Method for continuous chemical vapor deposition and device thereof
11/22/2006	CN1865496A Substrate processing apparatus and substrate processing method
11/22/2006	CN1865495A Revolution and rotation arrangement in reaction chamber of metallorganics chemical vapor deposition device
11/22/2006	CN1286351C A manufacturing method of microstrip gas compartment detector substrate
11/22/2006	CN1285762C Nozzle plate unit for supplying fluid after dispersed and manufacturing method thereof
11/22/2006	CN1285761C Injector and method for prolonged introduction of reagents into plasma
11/22/2006	CN1285760C Plasma enhanced chemical deposition method of low vapor-prossure compound and device therefor
11/22/2006	CN1285759C Surface treatment system and method
11/22/2006	CN1285758C Low contamination plasma chamber components and method for making same
11/22/2006	CN1285757C Electrostatically clamped edge ring for plasma processing
11/21/2006	US7139627 Calibration of plural processing systems
11/21/2006	US7138364 Cleaning gas and etching gas
11/21/2006	US7138343 Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
11/21/2006	US7138336 Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof
11/21/2006	US7138158 Forming a dielectric layer using a hydrocarbon-containing precursor
11/21/2006	US7138034 Electrode member used in a plasma treating apparatus
11/21/2006	US7137546 Silicon tube formed of bonded staves
11/21/2006	US7137353 Method and apparatus for an improved deposition shield in a plasma processing system
11/21/2006	US7137352 Plasma processing system in which wafer is retained by electrostatic chuck
11/21/2006	US7137276 Durable photocatalyst; overcoating glass with titanium and tin oxide
11/16/2006	WO2006122015A2 Isolation valve for energetic and high temperature gasses
11/16/2006	WO2006121585A1 High efficiency uv cleaning of a process chamber
11/16/2006	WO2006121264A1 Multiple inlet tomic layer deposition reactor
11/16/2006	WO2006121068A1 Winding plasma cvd apparatus
11/16/2006	WO2006120449A1 Nanostructure production methods and apparatus
11/16/2006	WO2006104647A3 Method and system for forming avariable thickness seed layer
11/16/2006	WO2005121396A3 Controlled deposition of silicon-containing coatings adhered by an oxide layer
11/16/2006	WO2005090638A8 Remote chamber methods for removing surface deposits
11/16/2006	US20060258175 Systems and methods for forming metal oxides using metal compounds containing aminosilane ligands
11/16/2006	US20060258174 Substrate treatment apparatus and method of manufacturing semiconductor device
11/16/2006	US20060258170 Thermal processing unit
11/16/2006	US20060258150 Oxygen bridge structures and methods to form oxygen bridge structures

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