C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2006
12/05/2006	US7145667 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus
12/05/2006	US7145106 Heater module for semiconductor manufacturing equipment
12/05/2006	US7144826 Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment
12/05/2006	US7144823 Thermal treatment apparatus
12/05/2006	US7144810 Methods for forming rough ruthenium-containing layers and structures/methods using same
12/05/2006	US7144809 thin metal films by atomic layer deposition: tungsten nucleation layer over a silicon wafer; copper film from CuCl and triethylboron; vapor phase pulses in inert gas
12/05/2006	US7144793 Method of producing crystalline semiconductor material and method of fabricating semiconductor device
12/05/2006	US7144771 Methods of forming electronic devices including dielectric layers with different densities of titanium
12/05/2006	US7144655 Thin-film battery having ultra-thin electrolyte
12/05/2006	US7144629 Electrostatic-erasing abrasion-proof coating and method for forming the same
12/05/2006	US7144620 Chemical vapor deposition; low temperature oxidation; microelectronics
12/05/2006	US7144606 Exposing surface of silicon carbide or silicon oxycarbide to gas plasma of helium, argon, or inert gas such as a nitrous oxide (N2O); barrier, passivation, and dielectric layers; etch stops
11/2006
11/30/2006	WO2006127693A2 Method and apparatus for preventing ald reactants from damaging vacuum pumps
11/30/2006	WO2006127465A1 Integration process for fabricating stressed transistor structure
11/30/2006	WO2006127463A2 Method to increase tensile stress of silicon nitride films by using a post pecvd deposition uv cure
11/30/2006	WO2006127462A2 Method to increase the compressive stress of pecvd silicon nitride films
11/30/2006	WO2006127208A2 Systems and methods for thermal management of electronic components
11/30/2006	WO2006126598A1 Method for continuously depositing high resistance buffer layer/window layer (transparent conductive film) of cis based thin film solar cell and continuous film deposition equipment for carrying out that method
11/30/2006	WO2006126440A1 Method of film formation and computer-readable storage medium
11/30/2006	WO2006126330A1 METHOD FOR GROWTH OF GaN SINGLE CRYSTAL, METHOD FOR PREPARATION OF GaN SUBSTRATE, PROCESS FOR PRODUCING GaN-BASED ELEMENT, AND GaN-BASED ELEMENT
11/30/2006	WO2006125613A1 Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers
11/30/2006	WO2006092614A3 Method and apparatus for producing a coating on a substrate
11/30/2006	WO2006073596B1 Flame retardant metallized polyester films having anti-dripping properties
11/30/2006	WO2006053219A3 Vertical production of photovoltaic devices
11/30/2006	WO2006036196A9 Surface and composition enhancements to high aspect ratio c-mems
11/30/2006	WO2005098084A3 Systems and methods for synthesis of extended length nanostructures
11/30/2006	US20060270787 Stability to moisture and oxygen; organohydrosiloxanes stabilized with one or more antioxidant compounds such as 3-methoxyphenol, 2-methoxyphenol, 4-ethoxyphenol, 4-propoxyphenol, 4-butoxyphenol
11/30/2006	US20060270243 Alignment shield for evaporator used in thin film deposition
11/30/2006	US20060270222 Method of Depositing CVD Thin Film
11/30/2006	US20060270221 Heated gas feedthrough for cvd chambers
11/30/2006	US20060270220 Plasma processing apparatus and method
11/30/2006	US20060270219 Reducing stress in coatings produced by physical vapour deposition technical field
11/30/2006	US20060269888 Heating apparatus
11/30/2006	US20060269694 Plasma processing method
11/30/2006	US20060269691 Plasma treatment apparatus and plasma treatment method
11/30/2006	US20060269690 Formation technology for nanoparticle films having low dielectric constant
11/30/2006	US20060269688 Electrochemical method for the direct nanostructured deposition of material onto a substrate, and semiconductor component produced according to said method
11/30/2006	US20060269672 Local plasma processing
11/30/2006	US20060269671 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
11/30/2006	US20060269670 Systems and methods for thermal management of electronic components
11/30/2006	US20060269669 Apparatus and method for making carbon nanotube array
11/30/2006	US20060269668 In a quartz boat, positioning a second catalyst adjacent to a substrate having a film of first catalyst; directing acetylene and argon carrier toward the second catalyst to the substrate to produce a carbonaeous product for promoting catalytic activity of the first catalyst to grow the tubes
11/30/2006	US20060269667 Vaporizing a solution of bis(tert-butyl)dimethylhafnium dissolved in ethylcyclohexane or octane without decomposition or condensation; alternately delivering a vaporized precursor solution and a vaporized reaction solution to a deposition chamber tand repeating o form a monolayer of HfO2 on a substrate
11/30/2006	US20060269666 Optical element
11/30/2006	US20060269665 Non-pressure gradient single cycle CVI/CVD apparatus and method
11/30/2006	US20060269664 Oxidative chemical vapor deposition of electrically conductive and electrochromic polymers
11/30/2006	US20060269656 Reducing contamination in OLED processing systems
11/30/2006	US20060266291 Thin film forming device and thin film forming method
11/30/2006	US20060266290 Substrate processing system
11/30/2006	US20060266289 Reaction system for growing a thin film
11/30/2006	US20060266288 High plasma utilization for remote plasma clean
11/30/2006	US20060266287 Method and system for passivating a processing chamber
11/30/2006	US20060266285 Mask material for masking holes in a component, comprising a resin containing particles or fibres of metal or oxide material, wherein the plastic is a UV polymerizing plastic such as polyurethane, a polyurethane oligomer, 2-Hydroxyl Methacrylate, Isobornyl Acrylate, Maleic acid, methyl methacrylate
11/30/2006	US20060266282 Variable temperature deposition methods
11/30/2006	US20060266081 Method of forming a phosphorus doped optical core using a pecvd process
11/30/2006	DE102005062482A1 Verfahren und Vorrichtungen zur Messung und Steuerung von Dünnschichtverarbeitungen Methods and apparatus for measurement and control of thin film processing
11/30/2006	DE102005024118A1 Process chamber for heating rotating semiconductor wafers, for dosing, has a dividing wall giving part-chambers for the wafer and the rotating unit with prevention of particle deposition on the wafer
11/30/2006	DE10044841B4 Plasmaverkapselung für elektronische und mikroelektronische Bauelemente wie OLEDs sowie Verfahren zu dessen Herstellung Plasmaverkapselung for electronic and microelectronic devices such as OLEDs and to processes for the preparation thereof
11/30/2006	DE10010766B4 Verfahren und Vorrichtung zur Beschichtung von insbesondere gekrümmten Substraten Method and apparatus for coating in particular curved substrates
11/30/2006	CA2609712A1 Systems and methods for thermal management of electronic components
11/29/2006	EP1727212A1 Semiconductor light-emitting device and illuminating device
11/29/2006	EP1727177A1 Process for producing layered member and layered member
11/29/2006	EP1726682A1 Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers.
11/29/2006	EP1726681A1 Coating system for silicon based substrates
11/29/2006	EP1726421A2 Die for shaping ceramic articles
11/29/2006	EP1725699A1 Plasma coating system for non-planar substrates
11/29/2006	EP1725698A1 Expanding thermal plasma deposition system
11/29/2006	EP1725697A2 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
11/29/2006	EP1725504A1 Method for depositing gallium oxide coatings on flat glass
11/29/2006	EP1725342A1 Coating method
11/29/2006	EP1348230B1 Susceptor pocket profile to improve process performance
11/29/2006	EP1185727A4 Sequential hydride vapor-phase epitaxy
11/29/2006	EP0975435B1 Modular coating fixture
11/29/2006	CN1871696A Method for forming insulating film, system for forming insulating film, and method for manufacturing semiconductor device
11/29/2006	CN1871694A Shower head and film-forming device using the same
11/29/2006	CN1871373A Plasma production device and method and RF driver circuit with adjustable duty cycle
11/29/2006	CN1870863A Casing of portable electronic device and its manufacturing method
11/29/2006	CN1870228A Hi-k dielectric layer deposition method on substrate
11/29/2006	CN1870223A Crystal growing method for single-crystal gan, and single-crystal gan substrate and manufacturing method thereof
11/29/2006	CN1870222A Method for generating nopolar GaN thick film on lithium aluminate chip
11/29/2006	CN1870217A Method for controlling and removing fog-shaped micro-defect of silicon gas-phase epitaxial layer
11/29/2006	CN1869282A Apparatus for forming carbon film on internal surface of plastic container and method of manufacturing plastic container
11/29/2006	CN1287004C Barrier coating
11/29/2006	CN1286750C Instrument and method for weighing pre-formed part during chemically depositing optical fiber pre-formed part
11/28/2006	US7142375 Films for optical use and methods of making such films
11/28/2006	US7141765 Heat treating device
11/28/2006	US7141763 Method and apparatus for rapid temperature change and control
11/28/2006	US7141756 Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method
11/28/2006	US7141576 4-quinazolineamine derivatives; antineoplastic agents; inhibitors of erb family tyrosine kinases and/or epidermal growth factor receptors
11/28/2006	US7141516 High frequency plasma generator and high frequency plasma generating method
11/28/2006	US7141512 Method of cleaning semiconductor device fabrication apparatus
11/28/2006	US7141500 Methods for forming aluminum containing films utilizing amino aluminum precursors
11/28/2006	US7141499 Apparatus and method for growth of a thin film
11/28/2006	US7141497 MOCVD apparatus and method
11/28/2006	US7141488 conveying germanium compounds in vapor phase to deposition chambers containing substrates, then decomposing the compounds and to form coatings on the substrates; metal organic chemical vapor deposition
11/28/2006	US7141483 Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill
11/28/2006	US7141278 Thin film forming method
11/28/2006	US7141138 Gas delivery system for semiconductor processing
11/28/2006	US7141120 Manufacturing apparatus of semiconductor device having introducing section and withdrawing section
11/28/2006	US7141095 Precursor material delivery system for atomic layer deposition

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