C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2006
12/14/2006	US20060278254 Method and apparatus for treating a substrate with dense fluid and plasma
12/14/2006	US20060278167 High-temperature evaporator cell and process for evaporating high-melting materials
12/14/2006	US20060278166 Vaporizer, various devices using the same, and vaporizing method
12/14/2006	US20060278165 Cluster tool architecture for processing a substrate
12/14/2006	US20060278164 Dual gate isolating maintenance slit valve chamber with pumping option
12/14/2006	US20060278163 High throughput deposition apparatus with magnetic support
12/14/2006	US20060278162 Vacuum treatment apparatus and vapor deposition apparatus
12/14/2006	DE102005028121A1 Verfahren zum Behandeln einer Oberfläche A method for treating a surface
12/14/2006	DE102005026339A1 Kupfer(I)perfluorcarboxylat-Komplexe und ihre Verwendung zur Erzeugung von Kupfer Copper (I) perfluorocarboxylate complexes and their use for the production of copper
12/13/2006	EP1732111A1 Susceptor
12/13/2006	EP1731299A1 Transparent conductive film, method for producing transparent conductive film and organic electroluminescent device
12/13/2006	EP1730087A1 Process for the deposition of aluminium oxide coatings
12/13/2006	EP1730072A2 Methods of forming alpha and beta tantalum films with controlled and new microstructures
12/13/2006	EP1729894A1 Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume
12/13/2006	EP1729892A1 Method and apparatus for coating a substrate using dielectric barrier discharge
12/13/2006	EP1346607A4 Resistive heaters and uses thereof
12/13/2006	EP1322797B1 Method of growing a thin film onto a substrate
12/13/2006	EP1307602B1 Chromium-containing cemented tungsten carbide body
12/13/2006	EP1184355B1 METHOD FOR MANUFACTURING Si-SiC MEMBER FOR SEMICONDUCTOR HEAT TREATMENT
12/13/2006	EP1102869A4 Esrf chamber cooling system and process
12/13/2006	EP1030745A4 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source
12/13/2006	CN2846706Y Alloy coated drilling bit
12/13/2006	CN2846442Y Device for producing diamond coating on spherical lining
12/13/2006	CN2846441Y Covering frame
12/13/2006	CN1879203A Method for manufacturing semiconductor device and substrate processing system
12/13/2006	CN1879198A Method for manufacturing compound semiconductor epitaxial substrate
12/13/2006	CN1879189A Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
12/13/2006	CN1878889A Thermal processing system with cross-flow liner
12/13/2006	CN1878888A Controlled vapor deposition of multilayered coatings adhered by an oxide layer
12/13/2006	CN1878722A Device and method for patterning structures on a substrate
12/13/2006	CN1877889A Film lithium ion cell with zinc selenide film as anode and method for preparing same
12/13/2006	CN1290157C CVD device and method of cleaning CVD device
12/13/2006	CN1289710C Thermal gradient chemical vapor deposition method for preparing carbon/carbon composite material
12/13/2006	CN1289286C Optical materials and optical devices
12/12/2006	US7148367 Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same
12/12/2006	US7148157 Use of phoslon (PNO) for borderless contact fabrication, etch stop/barrier layer for dual damascene fabrication and method of forming phoslon
12/12/2006	US7147910 Pyrolytic boron nitride crucible and method
12/12/2006	US7147900 Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
12/12/2006	US7147899 Process of masking cooling holes of a gas turbine component
12/12/2006	US7147810 Drapable diamond thin films and method for the preparation thereof
12/12/2006	US7147767 Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
12/12/2006	US7147749 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
12/12/2006	US7147748 Plasma processing method
12/12/2006	US7147747 Plasma processing apparatus and plasma processing method
12/12/2006	US7147720 Non-contact cool-down station for wafers
12/12/2006	US7147719 Double slit-valve doors for plasma processing
12/12/2006	US7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates
12/12/2006	US7147533 Method of producing an electron emitting device using a carbon fiber using a catalyst, capable of preferably growing carbon fibers at a low temperature without the need of a high temperature process for growing the carbon fibers or a high
12/07/2006	WO2006130298A2 Deposition methods, and deposition apparatuses
12/07/2006	WO2006129461A1 Thin film forming method and transparent conductive film
12/07/2006	WO2006107545A3 Method for forming a barrier/seed layer for copper metallization
12/07/2006	WO2005094318A3 Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma
12/07/2006	US20060276055 Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method
12/07/2006	US20060276049 High efficiency trap for deposition process
12/07/2006	US20060276037 Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof
12/07/2006	US20060276029 Semiconductor device and method for manufacturing same
12/07/2006	US20060276020 Deposition methods for barrier and tungsten materials
12/07/2006	US20060275662 Anode for secondary battery, secondary battery, and method of manufacturing anode for secondary battery
12/07/2006	US20060275556 Method for depositing an amorphous layer primarily containing fluorine and carbon, and device suited for carrying out this method
12/07/2006	US20060275549 system for controlling placement of nanoparticles: creating dusty plasma comprising plurality of carbon nanotubes; positioning mask between dusty plasma and desired target, mask having plurality of openings extending therethrough; extinguishing dusty plasma; allow carbon nanotubes land on the target
12/07/2006	US20060275548 Method and apparatus for depositing a coating on a tape carrier
12/07/2006	US20060275547 Vapor Phase Deposition System and Method
12/07/2006	US20060275546 Apparatus and methods for isolating chemical vapor reactions at a substrate surface
12/07/2006	US20060275545 Rare earth metal complex material for thin film formation and process of forming thin film
12/07/2006	US20060275538 Method and apparatus for providing a substrate with viscous medium
12/07/2006	US20060275537 Method and apparatus for field-emission high-pressure-discharge laser chemical vapor deposition of free-standing structures
12/07/2006	US20060275104 Support system for treatment apparatuses
12/07/2006	US20060272774 Substrate support with clamping electrical connector
12/07/2006	US20060272579 Electron beam irradiation device
12/07/2006	US20060272578 CVD reactor comprising a photodiode array
12/07/2006	US20060272577 Method and apparatus for decreasing deposition time of a thin film
12/07/2006	DE10305159B4 Stanzverfahren Stamping
12/06/2006	EP1729551A1 Plasma generating equipment
12/06/2006	EP1729331A1 Method and apparatus for forming silicon dots
12/06/2006	EP1729328A1 Substrate processing device
12/06/2006	EP1728894A1 Atomic layer deposition (ald) method for producing a high quality layer
12/06/2006	EP1728893A2 Process for forming zinc oxide film
12/06/2006	EP1728889A2 CVI apparatus and method
12/06/2006	EP1728723A1 Synthetic resin container with high gas barrier performance
12/06/2006	EP1727925A1 Method and device for forming thin silicon nitride layers on the surface of substrates
12/06/2006	EP1727923A2 High throughput physical vapor deposition system for material combinatorial studies
12/06/2006	EP1302967A4 Method for producing an addressable field-emission cathode and an associated display structure
12/06/2006	EP1192050A4 Substrate treatment method
12/06/2006	CN2844139Y DC glowing plasma gas-phase depositer
12/06/2006	CN2844138Y Chemical gas-phase depositing cavity with storage channel
12/06/2006	CN1875483A Process for forming a dielectric on a copper-containing metallization and capacitor arrangement
12/06/2006	CN1875129A Surface treatment method and device
12/06/2006	CN1873914A Substrate processing method, substrate processing program and storage medium
12/06/2006	CN1873911A Plasma processing chamber, potential controlling apparatus, method, program and storage medium
12/06/2006	CN1873052A Method for controlling dust granules in preparing thin film by using pulsed radiofrequency plasma
12/06/2006	CN1873051A Process for forming zinc oxide film
12/06/2006	CN1872662A Nano line cluster of titanium silicide prepared by chemical vapor deposition under normal pressure, and preparation method
12/06/2006	CN1288725C Plasma machining apparatus
12/06/2006	CN1288721C Method for changing inclination angle of hydride gas phase transverse epitaxy GaN film
12/06/2006	CN1288713C Heating system and method of reactor for heating atmosphere
12/06/2006	CN1288711C Diffuser and rapid cycle chamber
12/06/2006	CN1288680C Method for producing GaMnN ferromagnetic film via hydride vapor phase epitaxy process
12/06/2006	CN1288277C Decision system during dry cleaning for semiconductor manufacture equipment
12/06/2006	CN1288113C Ceramic parts formed micro crowning on its surface and its mfg. method
12/06/2006	CN1288108C Anti-plasma member,its producing method and method for forming heat spraying coating

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