C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2006
12/26/2006	US7152549 Vapor deposition system
12/21/2006	WO2006135446A2 Method of forming a porous metal catalyst on a substrate for nanotube growth
12/21/2006	WO2006135330A1 Coated cutting tool insert
12/21/2006	WO2006135325A1 A method of producing metal cutting tools
12/21/2006	WO2006135007A1 Film-forming and cleaning method
12/21/2006	WO2006134930A1 Process for production of semiconductor device and apparatus for treatment of substrate
12/21/2006	WO2006134879A1 Method for manufacturing semiconductor device and computer storage medium
12/21/2006	WO2006134862A1 Heat treatment apparatus
12/21/2006	WO2006134812A1 Process for producing organic el panel and process for producing organic el display device
12/21/2006	WO2006134781A1 Method and device for depositing film, deposited film and photosensitive body employing same
12/21/2006	WO2006134207A1 Method and apparatus for making a wear-resistant coating on a coating blade or equivalent
12/21/2006	WO2006134066A1 Coated spinning ring
12/21/2006	WO2006133730A1 Method for producing coated polymer
12/21/2006	WO2006052310A3 Nickel electroplating bath designed to replace monovalent copper strike solutions
12/21/2006	WO2005031803A3 Thermal processing system with cross flow injection system with rotatable injectors
12/21/2006	WO2004073849A3 Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
12/21/2006	US20060286817 Cvd method for forming silicon nitride film
12/21/2006	US20060286810 Atomic layer deposition (ALD) method and reactor for producing a high quality layer
12/21/2006	US20060286801 Process chamber assembly and apparatus for processing a substrate
12/21/2006	US20060286744 Semiconductor device suitable for forming conductive film such as platinum with good coverage, and its manufacture
12/21/2006	US20060286380 Components with bearing or wear-resistant surfaces
12/21/2006	US20060286297 Depositing a block copolymer on a substrate to form an ordered meso- scale structured array of the polymer materials, forming catalytic metal dots based on meso-scale structure, and growing nano-scale objects on dots to form an ordered array
12/21/2006	US20060286292 Fabricating thin-film magnetic recording heads using multi-layer DLC-type protective coatings
12/21/2006	US20060286290 Liquid adhesive dispensing system
12/21/2006	US20060284090 Material processing system and method
12/21/2006	US20060283553 Plasma chamber insert ring
12/21/2006	US20060283546 Method for encapsulating electronic devices and a sealing assembly for the electronic devices
12/21/2006	US20060283391 Gravity-fed in-line continuous processing system and method
12/21/2006	US20060283390 Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto
12/21/2006	US20060283389 System for growing silicon carbide crystals
12/21/2006	US20060283354 Method of producing composition for forming dielectric film, composition for forming dielectric film, dielectric film and method of producing dielectric film
12/21/2006	DE112004000573T5 Plasmagleichförmigkeit Plasma uniformity
12/20/2006	EP1734586A1 Method for manufacturing semiconductor device
12/20/2006	EP1734155A1 Coated cutting tool insert
12/20/2006	EP1734153A2 Titanium article having improved corrosion resistance
12/20/2006	EP1734151A1 A method and system for metalorganic chemical vapour deposition (MOCVD) and annealing of lead germanite (PGO) thin films films
12/20/2006	EP1733073A2 Method for the deposition in particular of metal oxides by non-continuous precursor injection
12/20/2006	EP1733072A2 Remote chamber methods for removing surface deposits
12/20/2006	EP1733071A2 Remote chamber methods for removing surface deposits
12/20/2006	EP1733070A1 Methods for coating a substrate and forming a coloured film and related device
12/20/2006	EP1733069A1 Method and apparatus for forming a metal layer
12/20/2006	EP1266054B1 Graded thin films
12/20/2006	EP1097470B1 Infra-red transparent thermal reactor cover member
12/20/2006	EP0750340B1 Nitrogen gas supply system
12/20/2006	CN2848874Y Rotary plating object frame for vacuum film plating
12/20/2006	CN2848873Y Atmospheric plasma jet coating gas protection device for porous titanium coating layer
12/20/2006	CN1883037A Plasma processing method and plasma processing apparatus
12/20/2006	CN1882714A Cleaning process and apparatus for silicate materials
12/20/2006	CN1882712A Replaceable plate expanded thermal plasma apparatus and method
12/20/2006	CN1882398A Exhaust gas treatment
12/20/2006	CN1882217A 等离子体处理装置 Plasma processing apparatus
12/20/2006	CN1881555A Substrate-placing platform, substrate processing device and production method of substrate-placing platform
12/20/2006	CN1881544A Method and apparatus for forming silicon nitride film
12/20/2006	CN1881543A Method and apparatus for forming silicon oxide film and program
12/20/2006	CN1881542A Substrate processing method,computer-readable recording medium and substrate processing device
12/20/2006	CN1881541A Film formation method and apparatus for semiconductor process
12/20/2006	CN1881533A Hydride gas phase extent device for manufacturing thick film nitride material
12/20/2006	CN1881529A Substrate processing device
12/20/2006	CN1291453C N and In codoping process in preparing hole type zinc oxide film
12/20/2006	CN1291063C Device for reinforcing organic metal chemical vapor deposition film and deposition method therefor
12/20/2006	CN1291062C Vacuum system, film deposition equipment, film deposition method
12/20/2006	CN1291061C Apparatus for conducting at least one operation on a substrate and components therefor
12/20/2006	CN1291060C Mobile plating system and method
12/19/2006	US7151053 Method of depositing dielectric materials including oxygen-doped silicon carbide in damascene applications
12/19/2006	US7151039 Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same
12/19/2006	US7150897 Method of making a cemented carbide tool and a cemented tool
12/19/2006	US7150849 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating
12/19/2006	US7150805 Plasma process device
12/19/2006	US7150801 Patterning carbon nanotube film on substrates; bonding to conductive binder
12/19/2006	US7150796 Method of removing PECVD residues of fluorinated plasma using in-situ H2 plasma
12/19/2006	US7150792 Film deposition system and film deposition method using the same
12/19/2006	US7150789 Atomic layer deposition methods
12/19/2006	US7150772 CVD coated cutting tool insert
12/19/2006	US7150418 Nozzle plate member for supplying fluids in dispersed manner and manufacturing method of the same
12/19/2006	CA2268320C Passivation of ink-jet printheads
12/14/2006	WO2006132920A1 Method and apparatus for decreasing deposition time of a thin film
12/14/2006	WO2006132878A2 Substrate support
12/14/2006	WO2006132751A2 High efficiency trap for deposition process
12/14/2006	WO2006132655A1 Ultraviolet curing process for low k dielectric films
12/14/2006	WO2006132274A1 Sealing structure of vacuum device
12/14/2006	WO2006132082A1 Process for producing silicon carbide single crystal
12/14/2006	WO2006131751A1 Cyclopentadienyl type hafnium and zirconium precursors and use thereof in atomic layer deposition
12/14/2006	WO2006088562A3 A method and system for improved delivery of a precursor vapor to a processing zone
12/14/2006	WO2005104164A3 Honeycomb optical window deposition shield and method for a plasma processing system
12/14/2006	WO2005070107A3 High throughput physical vapor deposition system for material combinatorial studies
12/14/2006	WO2004109761A3 Gas distribution system
12/14/2006	US20060281337 Method and apparatus for forming silicon oxide film
12/14/2006	US20060281323 Method of cleaning substrate processing apparatus
12/14/2006	US20060281317 A first conductive layer of a high-melting point metal is in contact with an insulating layer by droplet discharge; a second conductive layer of silver, gold, copper, or indium tin oxide in contact with the first conductive layer,has improved adhesiveness with the insulating layer; antipeeling agents
12/14/2006	US20060281310 Rotating substrate support and methods of use
12/14/2006	US20060281184 Active pulse monitoring in a chemical reactor
12/14/2006	US20060280877 Multinary deposition film production stabilizing device and method, and tool with multinary deposition film
12/14/2006	US20060280871 System and method for the treating substrates
12/14/2006	US20060280868 Method for treating vapor deposition apparatus, method for depositing thin film, vapor deposition apparatus and computer program product for achieving thereof
12/14/2006	US20060280867 Apparatus and method for depositing tungsten nitride
12/14/2006	US20060280866 Method and apparatus for mesoscale deposition of biological materials and biomaterials
12/14/2006	US20060278942 Antistiction MEMS substrate and method of manufacture
12/14/2006	US20060278865 Non-polar (Al,B,In,Ga)N quantum well and heterostructure materials and devices
12/14/2006	US20060278517 Damaging the surface of sintered Nd Fe B or Pr Fe B magnet by applying mechanical processing to cause a magnetic characteristic of the magnet to deteriorate; and restoring surface by sputtering a rare earth metal or alloy into fine particles or vapor, allowing product to diffuse and permeate the magnet
12/14/2006	US20060278341 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates

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