C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2007
01/02/2007	US7156973 coating dielectric polymers substrates with metallic or electroconductive backing layers and electrochemical polymerization using electroconductive monomers or mixture of monomers and activators, to form terminals used in direct methanol fuel cells
01/02/2007	US7156960 Method and device for continuous cold plasma deposition of metal coatings
01/02/2007	US7156951 Multiple zone gas distribution apparatus for thermal control of semiconductor wafer
01/02/2007	US7156950 Gas diffusion plate for use in ICP etcher
01/02/2007	US7156924 System and method for heating and cooling wafer at accelerated rates
01/02/2007	US7156923 Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method
01/02/2007	US7156922 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor
01/02/2007	US7156921 Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate
01/02/2007	US7156380 Safe liquid source containers
01/02/2007	US7156046 Plasma CVD apparatus
12/2006
12/28/2006	WO2006138701A2 Microwave plasma cooking
12/28/2006	WO2006138448A2 Liquid adhesive dispensing system
12/28/2006	WO2006138131A1 Method for silicon nitride chemical vapor deposition
12/28/2006	WO2006138126A2 Antistiction mems substrate and method of manufacture
12/28/2006	WO2006137929A2 Coated armor system and process for making the same
12/28/2006	WO2006137631A1 Fabrication method of gallium manganese nitride single crystal nanowire
12/28/2006	WO2006137541A1 Constitutional member for semiconductor processing apparatus and method for producing same
12/28/2006	WO2006137402A1 Gas treatment method and computer readable storage medium
12/28/2006	WO2006137401A1 Diamond semiconductor element and method for manufacturing same
12/28/2006	WO2006137332A1 Process for producing diamond-like carbon film
12/28/2006	WO2006137196A1 Method of forming interlayer insulation film, precursor solution for forming of interlayer insulation film, cvd material for forming of interlayer insulation film, and raw material for production of siloxane oligomer
12/28/2006	WO2006137192A1 Method of surface reconstruction for silicon carbide substrate
12/28/2006	WO2006136929A2 High colour diamond layer
12/28/2006	WO2006136741A1 Method for forming a dielectric film and novel precursors for implementing said method
12/28/2006	WO2006136584A1 Method of forming a high dielectric constant film and method of forming a semiconductor device
12/28/2006	WO2006111618A8 Source, an arrangement for installing a source, and a method for installing and removing a source
12/28/2006	WO2006111617A8 Reactor
12/28/2006	WO2006052576A3 Encapsulated wafer processing device and process for making thereof
12/28/2006	US20060292874 method for forming tungsten materials during vapor deposition processes
12/28/2006	US20060292864 Plasma-enhanced cyclic layer deposition process for barrier layers
12/28/2006	US20060292846 Material management in substrate processing
12/28/2006	US20060292845 Processing substrates using site-isolated processing
12/28/2006	US20060292788 Systems and methods of forming refractory metal nitride layers using disilazanes
12/28/2006	US20060292709 Method for fabricatiing three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstruture
12/28/2006	US20060292310 Process kit design to reduce particle generation
12/28/2006	US20060292303 Vapor deposition; atomic layer deposition; dielectrics; integrated circuits
12/28/2006	US20060292302 Apparatus and method for growing a synthetic diamond
12/28/2006	US20060292301 Method of depositing germanium films
12/28/2006	US20060291834 Method and apparatus for thermally treating substrates
12/28/2006	US20060289969 Laser assisted material deposition
12/28/2006	US20060289860 Semiconductor layer
12/28/2006	US20060289675 Chemical vapor deposition devices and methods
12/28/2006	US20060289401 Microwave plasma processing device and plasma processing gas supply member
12/28/2006	US20060289071 Apparatus for conveying gases to and from a chamber
12/28/2006	US20060288941 Evaporation source for evaporating an organic
12/28/2006	US20060288940 Evaporation source for evaporating an organic electroluminescent layer
12/28/2006	US20060288939 Evaporation source for evaporating an organic electroluminescent layer
12/28/2006	US20060288938 Systems and Methods for the Production of Highly Tetrahedral Amorphous Carbon Coatings
12/28/2006	US20060288937 Laser assisted material deposition
12/28/2006	US20060288935 Film formation method and apparatus for semiconductor process
12/28/2006	US20060288934 Electrode assembly and plasma processing apparatus
12/28/2006	US20060288933 Chemical vapor deposition reactor
12/28/2006	US20060288738 Apparatus and method for measuring the weight of an optical fiber preform during a chemical deposition process for forming the preform
12/28/2006	DE112004001102T5 Verfahren zur Steuerung der Planheit und der Elektronenbeweglichkeit von mit Diamant beschichtetem Silizium und dadurch gebildeten Strukturen Method for controlling the flatness and the electron mobility of silicon coated with diamond and structures formed thereby
12/28/2006	DE102005029360A1 Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen Process for the continuous atmospheric pressure plasma treatment of workpieces, in particular material plates or webs
12/28/2006	DE102004008598B4 Verfahren für den Betrieb einer Inline-Beschichtungsanlage A method of operating an in-line coating line
12/28/2006	CA2611810A1 Liquid adhesive dispensing system
12/28/2006	CA2607202A1 High colour diamond layer
12/28/2006	CA2510958A1 Titanium nitride-covered safety shoe reinforcement element and method of making same
12/27/2006	EP1736307A1 Surface coating member and cutting tool
12/27/2006	EP1735831A2 Manufacture of porous diamond films
12/27/2006	EP1735825A2 Highly selective silicon oxide etching compositions
12/27/2006	EP1735481A1 Tool comprising a wear-resistant coating
12/27/2006	EP1735480A1 Pulsed mass flow delivery system and method
12/27/2006	EP1735479A1 Thermochromic coatings
12/27/2006	EP1506063B1 Atomisation of a precursor into an excitation medium for coating a remote substrate
12/27/2006	EP1092233B1 Method of forming a thin film
12/27/2006	CN2851277Y Chemical vapour deposition device
12/27/2006	CN1886829A Substrate treatment apparatus, substrate holding device, and semiconductor device manufacturing method
12/27/2006	CN1886533A Method for manufacturing diamond coatings
12/27/2006	CN1886412A Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds
12/27/2006	CN1885595A Integrated full-solid-state lithium ion thin film micro cell anode preparing method
12/27/2006	CN1885491A Vacuum processing apparatus and method operation thereof
12/27/2006	CN1885490A Structure for mounting loading table device, processing device, discharge prevention method between feeder lines
12/27/2006	CN1885488A Top electrode, plasma processing device and method
12/27/2006	CN1883854A Coated insert
12/27/2006	CN1292458C Nitride semiconductor growth method, nitride semiconductor substrate and device
12/27/2006	CN1292092C Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device
12/27/2006	CN1291972C Novel alkaline earth metal complexes and use thereof
12/27/2006	CN1291810C Coated turning tool for steel
12/27/2006	CN1291809C Amorphous carbon coated tools and manufacture thereof
12/26/2006	US7154220 Diffusion barrier coatings having graded compositions and devices incorporating the same
12/26/2006	US7154128 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device
12/26/2006	US7153787 CVD plasma assisted lower dielectric constant SICOH film
12/26/2006	US7153786 Method of fabricating lanthanum oxide layer and method of fabricating MOSFET and capacitor using the same
12/26/2006	US7153773 TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system
12/26/2006	US7153708 Seed layer processes for MOCVD of ferroelectric thin films on high-k gate oxides
12/26/2006	US7153705 Electronic device with electrode and its manufacture
12/26/2006	US7153580 Low κ dielectric inorganic/organic hybrid films and method of making
12/26/2006	US7153562 Coated cemented carbide insert
12/26/2006	US7153544 primary layer bonds the transparent electro-conductive thin film to the polymer film and provides good resistance to scuffing for the transparent electro-conductive film
12/26/2006	US7153543 Making by chemical vapor infiltration of carbon into a refractory carbide-forming precursor on a porous carbon matrix material to form refractory carbides distributed within the matrix; aircraft brake discs
12/26/2006	US7153542 Assembly line processing method
12/26/2006	US7153441 Method for manufacturing thin-film magnetic recording medium
12/26/2006	US7153388 Chamber for high-pressure wafer processing and method for making the same
12/26/2006	US7153387 Plasma processing apparatus and method of plasma processing
12/26/2006	US7153368 Susceptor with epitaxial growth control devices and epitaxial reactor using the same
12/26/2006	US7153367 Drive mechanism for a vacuum treatment apparatus
12/26/2006	US7153363 Atomic layer deposition
12/26/2006	US7153362 System and method for real time deposition process control based on resulting product detection

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