| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 01/10/2007 | CN1891855A Chemical vaporization-coating device |
| 01/10/2007 | CN1294661C Nitride thin film of transition metal capable of being used as anode material of batteries and its preparation method |
| 01/10/2007 | CN1294630C Apparatus and method for heat treating semiconductor |
| 01/10/2007 | CN1294617C Assembly comprising heat-distribution plate and edge support |
| 01/10/2007 | CN1294293C Auxiliary grid hot wire chemical vapor deposition process for preparing nano-diamond thin film |
| 01/10/2007 | CN1294138C Methods of synthesizing ruthenium and osmium compounds |
| 01/09/2007 | US7161286 Substrate overcoated with nanparticle alloy catalyst; low temperature annealing |
| 01/09/2007 | US7160821 Method of depositing low k films |
| 01/09/2007 | US7160817 Dielectric material forming methods |
| 01/09/2007 | US7160809 Process and device for the deposition of an at least partially crystalline silicium layer on a substrate |
| 01/09/2007 | US7160765 Method for manufacturing a semiconductor device |
| 01/09/2007 | US7160746 GeBPSG top clad for a planar lightwave circuit |
| 01/09/2007 | US7160625 Dielectric layers comprising silicon compounds such as tert-butyltrimethoxysilane, formed by chemical vapor deposition, used in electrical and electronic apparatus |
| 01/09/2007 | US7160617 Boron doped diamond |
| 01/09/2007 | US7160616 DLC layer system and method for producing said layer system |
| 01/09/2007 | US7160585 Magnetic field and an electronic cyclotron resonance zone facilitating ionization and/or dissociation of the injected gas; screening operation |
| 01/09/2007 | US7160578 Method for depositing aluminum oxide coatings on flat glass |
| 01/09/2007 | US7160577 shorter atomic layer deposition (ALD) cycles and increased rates of production |
| 01/09/2007 | US7160576 Heat treatment with simultaneous administration of a carbon-emitting medium such as carbon monoxide or acetylene inside a processing space such as a furnace |
| 01/09/2007 | US7160417 Cassette for a load-lock |
| 01/09/2007 | US7160393 Vacuum chamber assembly |
| 01/09/2007 | US7160392 Method for dechucking a substrate |
| 01/09/2007 | US7159597 Transferring substrate out of the chamber; flowing a first gas into the substrate processing chamber and forming a plasma within the substrate chamber from the first gas in order to heat; extinguishing the plasma, flowing an etchant gas |
| 01/09/2007 | US7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems |
| 01/09/2007 | US7159536 Device and method for generating a local by micro-structure electrode dis-charges with microwaves |
| 01/04/2007 | WO2007002674A2 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
| 01/04/2007 | WO2007002672A2 Atomic layer deposition using alkaline earth metal beta-diketiminate precursors |
| 01/04/2007 | WO2007002569A1 Method of deposting germanium films |
| 01/04/2007 | WO2007002402A2 An apparatus and method for growing a synthetic diamond |
| 01/04/2007 | WO2007001832A1 Plasma treatment of dielectric material |
| 01/04/2007 | WO2007001343A2 Nanostructured fuel cell electrode |
| 01/04/2007 | WO2007001301A2 Atomic layer deposition (ald) system and method |
| 01/04/2007 | WO2007000469A1 Method for manufacturing flat substrates |
| 01/04/2007 | WO2007000271A1 Reinforced micromechanical part |
| 01/04/2007 | WO2007000255A2 Method for treating plasma and/or covering plasma of workpieces under continuous atmospheric pressure, in particular material plates or strips |
| 01/04/2007 | WO2007000186A1 Deposition method of ternary films |
| 01/04/2007 | WO2006020308A3 Vapor deposited functional organic coatings |
| 01/04/2007 | WO2005113854A3 Apparatus and methods of making nanostructures by inductive heating |
| 01/04/2007 | WO2005060602A3 Controlling the flow of vapors sublimated from solids |
| 01/04/2007 | US20070004931 Precursors for depositing silicon containing films |
| 01/04/2007 | US20070004232 Laser thermal processing chuck with a thermal compensating heater module |
| 01/04/2007 | US20070004203 Technique for forming nickel silicide by depositing nickel from a gaseous precursor |
| 01/04/2007 | US20070004186 Film forming method |
| 01/04/2007 | US20070004133 Capacitor for a semiconductor device and method of fabricating same |
| 01/04/2007 | US20070003698 Enhanced copper growth with ultrathin barrier layer for high performance interconnects |
| 01/04/2007 | US20070003696 Formation of thin semiconductor layers by low-energy plasma enhanced chemical vapor deposition and semiconductor heterostructure devices |
| 01/04/2007 | US20070001326 Vaporizer |
| 01/04/2007 | US20070001175 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer |
| 01/04/2007 | US20070000879 Microwave plasma processing method |
| 01/04/2007 | US20070000614 Method and apparatus for reducing substrate backside deposition during processing |
| 01/04/2007 | US20070000612 Substrate processing device |
| 01/04/2007 | US20070000611 Plasma control using dual cathode frequency mixing |
| 01/04/2007 | US20070000444 Vacuum evaporation apparatus and method of producing electro-optical device |
| 01/04/2007 | US20070000443 Vacuum vapor deposition apparatus |
| 01/04/2007 | US20070000407 Nano composite photocatalytic coating |
| 01/04/2007 | DE212005000023U1 Mobiles PVD/CVD-Beschichtungszentrum Mobile PVD / CVD coating center |
| 01/04/2007 | DE10202311B4 Vorrichtung und Verfahren zur Plasmabehandlung von dielektrischen Körpern Apparatus and method for plasma treatment of dielectric bodies |
| 01/04/2007 | DE102004045046B4 Verfahren und Vorrichtung zum Aufbringen einer elektrisch leitfähigen transparenten Beschichtung auf ein Substrat Method and apparatus for applying an electrically conductive transparent coating on a substrate |
| 01/03/2007 | EP1738848A2 Coating metal powder particles with metal by chemically reducing nonmetallic precursors |
| 01/03/2007 | EP1738100A2 Non-contact thermal platforms |
| 01/03/2007 | EP1737998A2 Remote chamber methods for removing surface deposits |
| 01/03/2007 | EP1737801A2 Photocatalytic substrate active under a visible light |
| 01/03/2007 | EP1651796B1 Substrate covered with an intermediate coating and a hard carbon coating |
| 01/03/2007 | EP1629517B1 Device for area-based surface treatment of an article by electric dielectric barrier discharge |
| 01/03/2007 | EP1618226B1 Carbon nanotube growth method |
| 01/03/2007 | EP1587894B1 Controlled sulfur species deposition process |
| 01/03/2007 | EP1381079B1 Heat treating method |
| 01/03/2007 | EP1313897B1 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates |
| 01/03/2007 | EP1257684B1 Method and apparatus for chemical vapor deposition of polysilicon |
| 01/03/2007 | EP1079423B1 Apparatus for gas processing |
| 01/03/2007 | EP1071123B1 Method for forming film |
| 01/03/2007 | CN2853812Y Radiation-type heater for gallium nitride material preparation process |
| 01/03/2007 | CN1890783A Substrate holder having a fluid gap and method of fabricating the substrate holder |
| 01/03/2007 | CN1890400A Growth of in-situ thin films by reactive evaporation |
| 01/03/2007 | CN1890398A A layered structure |
| 01/03/2007 | CN1890034A Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 01/03/2007 | CN1889291A Negative pole material for lithium battery and producing method thereof |
| 01/03/2007 | CN1889225A Hollow electrode structure including multi-hole and plasma polymerization processing apparatus utilizing the said structure |
| 01/03/2007 | CN1888462A Airplane carbon brake disc integral adhesive maintenance method |
| 01/03/2007 | CN1888133A No-brush temperature measuring method and device with CVD system substrate |
| 01/03/2007 | CN1888132A Aluminium material surface modifying diamond-like film coating process and apparatus |
| 01/03/2007 | CN1888103A Vapor depositing in-situ reaction process for preparing carbon nanotube reinforced copper-base composite material |
| 01/03/2007 | CN1887815A Nanometer multilayer hard AlN/SiO2 film |
| 01/03/2007 | CN1293789C Plasma device and plasma generating method |
| 01/03/2007 | CN1293615C Semiconductor manufacturing system |
| 01/03/2007 | CN1293608C 半导体器件及其制造方法以及等离子加工装置 Semiconductor device and manufacturing method, and a plasma processing apparatus |
| 01/03/2007 | CN1293607C Semiconducting film, semiconductor device and their production methods |
| 01/03/2007 | CN1293596C Chamber components having textured surfaces and method of manufacture |
| 01/03/2007 | CN1292891C Method for processing and producing surface with degree of lustre |
| 01/02/2007 | US7158864 Interlock apparatus and method for supplying gas to a semiconductor manufacturing device |
| 01/02/2007 | US7157756 Field effect transistor |
| 01/02/2007 | US7157666 Systems for producing semiconductors and members therefor |
| 01/02/2007 | US7157385 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry |
| 01/02/2007 | US7157384 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) |
| 01/02/2007 | US7157187 Heat resistance; performance; ultrathin electrolyte/dielectric films |
| 01/02/2007 | US7157145 Article having a plasmapolymer coating and method for producing the same |
| 01/02/2007 | US7157123 Substrate coating region and electrode cleaning region; rotatable electrode positioned in deposition chamber having interior cavitiy with magnet systems disposed |
| 01/02/2007 | US7157117 Functionalization of porous materials by vacuum deposition of polymers |
| 01/02/2007 | US7157111 Depositing an indium-containing thin film on the silicon substrate, patterning the indium film; annealing; selectively depositing a ferroelectric layer by metal oxide chemical vapor deposition; annealing; eliminates etching of the ferroelectric material, reduces damage caused by etching |
| 01/02/2007 | US7157024 Calcining compounds of tin, zinc, and antimony to produce tin dioxide doped zinc antimonate;electroconductivity, heat radiation absorptivity, antistatic agents, ultraviolet radiation absorbers |