Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2007
01/17/2007EP1743953A1 Method for forming copper film
01/17/2007EP1743360A2 Method for depositing high-quality microcrystalline semiconductor materials
01/17/2007EP1743359A1 Methods for producing ruthenium film and ruthenium oxide film
01/17/2007EP1743043A2 High throughput discovery of materials through vapor phase synthesis
01/17/2007EP1565592B1 Method for cleaning a process chamber
01/17/2007EP1437328B1 Method for creating silicon dioxide film
01/17/2007EP1266043B1 Cemented carbide tool and method of making
01/17/2007EP1203108B1 Cooled window
01/17/2007CN1898783A Plasma processing apparatus
01/17/2007CN1898412A Carrier body and method for coating cutting tools
01/17/2007CN1898411A Exhaust conditioning system for semiconductor reactor
01/17/2007CN1898410A Deposition of titanium nitride film
01/17/2007CN1898409A Method and apparatus for forming a high quality low temperature silicon nitride layer
01/17/2007CN1898407A Method and apparatus for manufacturing a functional layer consisting of at least two components
01/17/2007CN1898192A Metal compound, material for forming thin film and method for preparing thin film
01/17/2007CN1897235A Production of thin-magnetic semiconductor epitaxial-thin-film of iron-doped cadmium sulfide
01/17/2007CN1897224A Production of iron-doped zinc sulfide growth thin film by growth
01/17/2007CN1896674A Improvement of metal radiating fin radiating speed by nano-carbon tube coating
01/17/2007CN1896306A Thin-film depositer
01/17/2007CN1896305A Production of multifunctional gas-phase depositer and solid oxide fuel single cell
01/17/2007CN1896304A Preparation of Si-C-N nano-composite superhard thin film
01/17/2007CN1896303A Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition
01/17/2007CN1896079A Tantal and vanadium compounds and their use in chemical vapour deposition (CVD)
01/17/2007CN1295756C Method of forming tungsten film on barrier film
01/17/2007CN1295745C Method and device for thermally treating substrates
01/16/2007US7164104 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
01/16/2007US7163901 Methods for forming thin film layers by simultaneous doping and sintering
01/16/2007US7163849 Fabrication method of semiconductor integrated circuit device
01/16/2007US7163749 Process for depositing finely dispersed organic-inorganic films and articles made therefrom
01/16/2007US7163747 Turbine component having masking layer which can very easily be removed following coating of the components
01/16/2007US7163735 Cutting tool insert; alternating nucleation, aluminizing; gradients in aluminum concentration
01/16/2007US7163721 Method to plasma deposit on organic polymer dielectric film
01/16/2007US7163719 Method of depositing thin film using hafnium compound
01/16/2007US7163718 Method of selective region vapor phase aluminizing
01/16/2007US7163608 Apparatus for synthesis of layers, coatings or films
01/16/2007US7163607 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system
01/16/2007US7163603 Plasma source assembly and method of manufacture
01/16/2007US7163602 Apparatus for generating planar plasma using concentric coils and ferromagnetic cores
01/16/2007US7163587 Reactor assembly and processing method
01/16/2007US7163586 Vapor deposition apparatus
01/16/2007US7163585 Method and apparatus for an improved optical window deposition shield in a plasma processing system
01/16/2007US7163197 Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method
01/16/2007CA2161362C Vessel of plastic having a barrier coating and a method of producing the vessel
01/11/2007WO2007005574A2 Method and system for energy returning ankle foot orthosis (erafo)
01/11/2007WO2007005088A2 Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films
01/11/2007WO2007004647A1 Carbon film
01/11/2007WO2007004576A1 Plasma treatment apparatus and plasma treatment method
01/11/2007WO2007004550A1 Method and apparatus for manufacturing semiconductor wafer
01/11/2007WO2007004443A1 Method for forming tungsten film, film-forming apparatus, storage medium and semiconductor device
01/11/2007WO2007003882A1 Method of treating an exhaust gas
01/11/2007WO2007003754A1 Low wetting hysteresis polysiloxane-based material and method for depositing same
01/11/2007WO2007003720A1 Low wetting hysteresis hydrophobic surface coating, method for depositing same, microcomponent and use
01/11/2007WO2007003648A1 Hard-coated body and method for production thereof
01/11/2007WO2007003502A2 Parylene coating and method for the production thereof
01/11/2007WO2006057828A3 Hydrophobic coating including underlayer(s) deposited via flame pyrolysis
01/11/2007WO2006039211A3 Corrosion resistant apparatus for control of a multi-zone nozzle in a plasma processing system
01/11/2007WO2005116291A3 Apparatus for directing plasma flow to coat internal passageways
01/11/2007US20070010076 Polycrystalline SiGe junctions for advanced devices
01/11/2007US20070010071 Method and apparatus for forming silicon oxynitride film
01/11/2007US20070009717 Electron-beam treated CDO films
01/11/2007US20070009660 Method for local application of diffusion aluminide coating
01/11/2007US20070009659 Process for the self-limiting deposition of one or more monolayers
01/11/2007US20070009658 Pulse nucleation enhanced nucleation technique for improved step coverage and better gap fill for WCVD process
01/11/2007US20070009652 Continuous OLED coating machine
01/11/2007US20070009651 Substrate treatment method and substrate treatment apparatus
01/11/2007US20070009650 Paste dispenser and method of controlling the same
01/11/2007US20070009649 Substrate processing apparatus
01/11/2007US20070009345 Load port module
01/11/2007US20070007646 Substrate treatment apparatus, substrate holding device, and semiconductor device manufacturing method
01/11/2007US20070007128 Silicon film forming apparatus
01/11/2007US20070007123 Silicon dot forming method and silicon dot forming apparatus
01/11/2007US20070006807 Magnetic mask holder
01/11/2007US20070006799 Silicon wafer support fixture with roughended surface
01/11/2007DE102005032860A1 Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung A coated hard material body, and methods for their preparation
01/11/2007DE102005030584A1 Technik zur Herstellung von Nickelsilizid durch Abscheiden von Nickel aus einem gasförmigen Vorstufenmaterial Technique for producing nickel silicide by depositing nickel from a gaseous precursor material
01/11/2007CA2613091A1 Hard-coated body and method for production thereof
01/10/2007EP1742273A1 Method of forming gate insulating film, storage medium and computer program
01/10/2007EP1741803A2 Free radical initiator in remote plasma chamber clean
01/10/2007EP1741802A1 Film-forming apparatus and film-forming method
01/10/2007EP1741794A2 Surface strengthening method
01/10/2007EP1741495A1 Method to obtain a composite material having a catalytic bonding layer
01/10/2007EP1741128A2 Gas distribution system having fast gas switching capabilities
01/10/2007EP1740737A1 Method for coating a base body, device for carrying out said method, and coated base body
01/10/2007EP1740304A2 Tailored and uniform coatings in microchannel apparatus
01/10/2007EP1740303A2 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus
01/10/2007EP1563116B1 Device for carrying out a surface treatment of substrates under vacuum
01/10/2007EP1399967B1 Method of making full color display panels
01/10/2007EP1040500A4 A plasma generating apparatus having an electrostatic shield
01/10/2007CN1894438A Method and system for forming a film of material using plasmon assisted chemical reactions
01/10/2007CN1894437A Playing field obstacle device
01/10/2007CN1894192A Copper(I) formate complexes
01/10/2007CN1893822A 抗微生物复合材料 Antimicrobial composite
01/10/2007CN1893154A Silicon composite, making method, and non-aqueous electrolyte secondary cell negative electrode material
01/10/2007CN1893040A Thermo-interface material producing method
01/10/2007CN1892980A Chamber isolation valve RF grounding
01/10/2007CN1891861A Process kit design particle generation
01/10/2007CN1891859A Method and apparatus for forming silicon oxynitride film and program thereof
01/10/2007CN1891858A Method and process for reactive gas cleaning of tool parts
01/10/2007CN1891857A Carbonyl metal gas-phase deposition apparatus and method
01/10/2007CN1891856A Free radical initiator in remote plasma chamber clean