| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/30/2007 | CA2159296C Glass coating method and glass coated thereby |
| 01/25/2007 | WO2007011666A2 Method and apparatus for semiconductor processing |
| 01/25/2007 | WO2007011581A1 Improved support structure for radiative heat transfer |
| 01/25/2007 | WO2007010887A1 Gas treatment apparatus |
| 01/25/2007 | WO2007010568A1 System for supporting and rotating a susceptor inside a treatment chamber of a water treating apparatus |
| 01/25/2007 | WO2007009190A1 Duplex surface treatment of metal objects |
| 01/25/2007 | WO2006127462A3 Method to increase the compressive stress of pecvd silicon nitride films |
| 01/25/2007 | WO2006101697A3 Vaporizer and method of vaporizing a liquid for thin film delivery |
| 01/25/2007 | WO2006000561A8 Container-treatment machine comprising controlled gripping means for seizing containers by the neck |
| 01/25/2007 | US20070020940 Method of forming fluorinated carbon film |
| 01/25/2007 | US20070020924 Tungsten nitride atomic layer deposition processes |
| 01/25/2007 | US20070020890 Method and apparatus for semiconductor processing |
| 01/25/2007 | US20070020885 Tube Formed of Bonded Silicon Staves |
| 01/25/2007 | US20070020477 Cemented carbide body |
| 01/25/2007 | US20070020394 Methods and apparatus for vapor processing of micro-device workpieces |
| 01/25/2007 | US20070020393 Oxide coated cutting tool |
| 01/25/2007 | US20070020392 Functional organic based vapor deposited coatings adhered by an oxide layer |
| 01/25/2007 | US20070020391 heating to gas phase polymerization in one reactor to form polyimide; free of hazardous waste; free of support structure; flexibility in material selection |
| 01/25/2007 | US20070020390 Supplying method of chemicals |
| 01/25/2007 | US20070020389 Method of forming film, patterning and method of manufacturing electronic device using thereof |
| 01/25/2007 | US20070017700 Sp3 bonding boron nitride nitride thin film having self-forming surface shape being advantageous in exhibiting property of emitting electric field electrons, method for preparation thereof and use thereof |
| 01/25/2007 | US20070017637 Inductively coupled plasma processing apparatus |
| 01/25/2007 | US20070017446 Apparatus to treat a substrate |
| 01/25/2007 | US20070017445 Hybrid PVD-CVD system |
| 01/25/2007 | US20070017444 Rotatable valve |
| 01/25/2007 | US20070017443 Wireless operator interface for material application system |
| 01/25/2007 | DE102005033579A1 Verfahren zur Herstellung dünner Hafnium- oder Zirkonnitrid-Schichten A process for the production of thin hafnium or zirconium nitride layers |
| 01/25/2007 | DE102005033102A1 New tantalum- or niobium compounds useful as precursors for tantalum nitride- and niobium nitride layering by means of chemical vapor deposition procedure |
| 01/25/2007 | DE10150822B4 Verfahren zum Entfernen oxidierter Bereiche auf einer Grenzfläche einer Metalloberfläche A method for removing oxidized areas on a interface of a metal surface |
| 01/24/2007 | EP1746653A1 Method of fabrication of background noise standards, containing nanostructures on an insulating thin film. |
| 01/24/2007 | EP1746183A1 Process for obtaining thin films of zirconium nitride |
| 01/24/2007 | EP1746182A2 Hybrid pvd-cvd system |
| 01/24/2007 | EP1745504A1 An improved method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made |
| 01/24/2007 | EP1745160A1 Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials |
| 01/24/2007 | EP1745159A2 Apparatuses and methods for atomic layer deposition |
| 01/24/2007 | EP1451861A4 Apparatus and method for reactive atom plasma processing for material deposition |
| 01/24/2007 | EP1444724B1 Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is produced by means of a plasma-enhanced deposition method |
| 01/24/2007 | EP1222679B1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 01/24/2007 | CN1902738A Atomic layer deposition of high k metal silicates |
| 01/24/2007 | CN1902737A Substrate processing apparatus |
| 01/24/2007 | CN1902732A Edge flow faceplate for improvement of cvd film properties |
| 01/24/2007 | CN1902337A CVD tantalum compounds for FET gate electrodes |
| 01/24/2007 | CN1901222A Method and apparatus for epitaxially coating semiconductor wafer, and coated semiconductor wafer |
| 01/24/2007 | CN1900359A Hybrid PVD-CVD system |
| 01/24/2007 | CN1900356A Process for preparing diamond film under strong magnetic field |
| 01/24/2007 | CN1296975C Processing apparatus for plasma |
| 01/24/2007 | CN1296528C Apparatus and method for diamond production |
| 01/24/2007 | CN1296518C Composite material and method for production thereof |
| 01/24/2007 | CN1296517C Preparation for amorphous carbon thin-film hydrophobic material with rear surface fluorating process |
| 01/23/2007 | US7166965 Waveguide and microwave ion source equipped with the waveguide |
| 01/23/2007 | US7166884 Method for fabricating semiconductor device and semiconductor device |
| 01/23/2007 | US7166732 Copper (I) amidinate precursors for forming copper thin films in the manufacture of semiconductor devices; chemical vapor deposition or atomic layer deposition of the precursors on barrier substrates, especially Ti, TA, Nb or W silicides, nitrides or siliconitrides |
| 01/23/2007 | US7166516 Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN |
| 01/23/2007 | US7166480 Particle control device and particle control method for vacuum processing apparatus |
| 01/23/2007 | US7166470 Dissolving two or more reagents in solvent, mixing together in different ratios, dispensing on subtrate, heating for calcining |
| 01/23/2007 | US7166372 creep resistance and high strength overcoatings comprising alloys of chromium, aluminum, yttrium and nickel, cobalt, iron or hafnium having discrete nitride particles, used on substrates such as blades and vanes for gas turbine engines |
| 01/23/2007 | US7166371 cutters comprising blades having tungsten carbide multilayer coatings, that wear uniformly thereby keeping the edge smooth |
| 01/23/2007 | US7166366 Chemical, mechanical and/or optical protective and/or diffusion barrier layer (16) disposed on a metal or plastic substrate (14). Said layer consists of an organic layer matrix (10) with metal-containing particles (12) dispersed therein |
| 01/23/2007 | US7166336 DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container |
| 01/23/2007 | US7166335 Layer formation method, and substrate with a layer formed by the method |
| 01/23/2007 | US7166325 Carbon nanotube devices |
| 01/23/2007 | US7166233 Introducing process gas into reactor chamber, creating plasma within chamber by establishing an RF electromagnetic field within chamber and allowing the field to interact with the process gas |
| 01/23/2007 | US7166206 Generating a stream of bubbles containing a source of the material, and applying a potential difference across the cathode and anode so that the resulting glow discharge forms a plasma of ionised gaseous molecules within the bubbles |
| 01/23/2007 | US7166187 Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
| 01/23/2007 | US7166185 Forming system for insulation film |
| 01/23/2007 | US7166170 Cylinder-based plasma processing system |
| 01/23/2007 | US7166167 Laser CVD device and laser CVD method |
| 01/23/2007 | US7166166 Method and apparatus for an improved baffle plate in a plasma processing system |
| 01/23/2007 | US7166165 Barrier coating for vitreous materials |
| 01/23/2007 | CA2368712C Coating method on the inner walls of the reaction tubes in a hydrocarbon pyrolysis reactor |
| 01/18/2007 | WO2007008677A2 Load port module |
| 01/18/2007 | WO2007008653A2 Method for depositing silicon-containing films |
| 01/18/2007 | WO2007008606A1 Method and system for deposition tuning in an epitaxial film growth apparatus |
| 01/18/2007 | WO2007008515A2 Seal arrangement with corrosion barrier and method |
| 01/18/2007 | WO2007007782A1 Multilayer structure and method for cleaning same |
| 01/18/2007 | WO2007007744A1 Substrate stage mechanism and substrate processing apparatus |
| 01/18/2007 | WO2007007680A1 Method of forming film and apparatus for film formation |
| 01/18/2007 | WO2007007395A1 Device for forming coating film on inner surface of container and method for producing container having coated inner surface |
| 01/18/2007 | WO2007006977A2 Apparatus for the pecvd deposition of an inner barrier layer on a container, comprising an optical plasma analysis device |
| 01/18/2007 | WO2007006525A1 Method and reactor for growing crystals |
| 01/18/2007 | WO2006122015A3 Isolation valve for energetic and high temperature gasses |
| 01/18/2007 | WO2006062576A3 Method and apparatus for improved baffle plate |
| 01/18/2007 | WO2006012179A3 Expanded thermal plasma apparatus |
| 01/18/2007 | WO2004114432A3 Improved electrode and associated devices and methods |
| 01/18/2007 | US20070015374 Apparatus and method for atomic layer deposition on substrates |
| 01/18/2007 | US20070015335 Production method for antenna and production device for antenna |
| 01/18/2007 | US20070014996 compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer; does not adversely affect the mechanical behavior of the substrate such as reduction in the flexure or tensile strength |
| 01/18/2007 | US20070014932 Placing a substrate on a susceptor including a center pin for lifting the substrate; energizing an electrode to applying a uniform electric field to the substrate; grounding the center pin; and forming a film on the substrate by chemical vapor deposition; uniform thickness |
| 01/18/2007 | US20070014925 Method for slot extrusion coating a liquid composition |
| 01/18/2007 | US20070014919 Atomic layer deposition of noble metal oxides |
| 01/18/2007 | US20070014714 at a relatively low temperature using water plasma; purity, quality for e.g. semiconductor devices; vacuum deposition |
| 01/18/2007 | US20070012402 Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatement |
| 01/18/2007 | US20070012401 Plasma processing apparatus |
| 01/18/2007 | US20070012251 Seal arrangement with corrosion barrier and method |
| 01/18/2007 | US20070012250 Inductively coupled plasma processing apparatus for very large area using dual frequency |
| 01/18/2007 | US20070012249 Film forming apparatus |
| 01/18/2007 | US20070012241 Methods of assessing the temperature of semiconductor wafer substrates within deposition apparatuses |
| 01/18/2007 | DE10205167C5 In-Line-Vakuumbeschichtungsanlage zur Zwischenbehandlung von Substraten In-line vacuum coating system for temporary treatment of substrates |
| 01/18/2007 | DE102006025683A1 Method of applying catalytically active material, directly to heat exchanger internal surfaces without use of a carrier layer uses streamless deposition (ELP) or chemical gas phase deposition (CVD) |
| 01/17/2007 | EP1743954A1 An ALD method for depositing a layer |