Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2007
02/07/2007CN1909186A Processing chamber, flat display device production device, plasma treatment method using same
02/07/2007CN1909183A Semiconductor arts piece processing device
02/07/2007CN1909182A Semiconductor technology processing system and method
02/07/2007CN1908228A Method and apparatus for forming silicon-containing insulating film
02/07/2007CN1299323C Method and apparatus for making semiconductor device, cleaning method thereof and making system
02/07/2007CN1298888C Apparatus for use with CVI/CVD processes
02/07/2007CN1298887C Precursor solution for controling MOCVD deposited PCMO component and method
02/07/2007CN1298418C System and method for delivering an ultrapure chemical product
02/06/2007US7173219 Ceramic heaters
02/06/2007US7173216 LED heat lamp arrays for CVD heating
02/06/2007US7172956 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method
02/06/2007US7172918 Infrared thermopile detector system for semiconductor process monitoring and control
02/06/2007US7172792 Method for forming a high quality low temperature silicon nitride film
02/06/2007US7172731 Preventing equipment damage; glass bursts releasing fumes into environment when excess volume is too large to vent through safety valve
02/06/2007US7172675 Observation window of plasma processing apparatus and plasma processing apparatus using the same
02/06/2007US7172657 Cleaning method of treatment equipment and treatment equipment
02/06/2007US7171919 Diamond film depositing apparatus using microwaves and plasma
02/06/2007US7171918 Focused ion beam deposition
02/01/2007WO2007014032A1 s SEPARATION OF GROWN DIAMOND FROM DIAMOND SEEDS MOSAIC
02/01/2007WO2007013806A1 Method for passivating a substrate surface
02/01/2007WO2007013703A1 Injection type plasma treatment apparatus and method
02/01/2007WO2007013392A1 Edge replacing cutting tip and method for producing the same
02/01/2007WO2007013355A1 Substrate processing apparatus and method for manufacturing semiconductor device
02/01/2007WO2007012744A1 Apparatus for plasma-enhanced chemical vapour deposition (pecvd) of an internal barrier layer on a container, comprising a gas line insulated by an electromagnetic valve
02/01/2007WO2006044791A3 Thermal management of dielectric components in a plasma discharge device
02/01/2007WO2006022860A3 A chemical vapor deposition (cvd) apparatus usable in the manufacture of superconducting conductors
02/01/2007US20070026642 Surface modification method and surface modification apparatus for interlayer insulating film
02/01/2007US20070026540 Method of forming non-conformal layers
02/01/2007US20070026254 Method for processing surfaces of aluminium alloy sheets and strips
02/01/2007US20070026240 chemical vapor deposition of tin oxide; hydrogen chloride serves to prevent the oxidation reaction from occurring between tin tetrachloride and water vapor; crystallization in multi-steps
02/01/2007US20070026231 Method of coating an anode/collector with carbon nanotubes
02/01/2007US20070026162 Operating method for a large dimension plasma enhanced atomic layer deposition cavity and an apparatus thereof
02/01/2007US20070026159 can be deployed to patient care facilities for regional, local, or on-site and on-demand production of adequately pure Yttrium-90; generator column comprise a 90Sr stock adsorbed on a sorbent; milking solution elutes 90Y from the column; concentration column sorbent captures y90 from milking solution
02/01/2007US20070026151 Fluid Deposition Cluster Tool
02/01/2007US20070026150 Substrate processing system
02/01/2007US20070026149 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
02/01/2007US20070026148 Enclosure, support table with horizontal confining projections, gas supply passageway to form film; discharge passageway
02/01/2007US20070026147 Enhanced copper growth with ultrathin barrier layer for high performance interconnects
02/01/2007US20070026146 Vaporizing material at a uniform rate
02/01/2007US20070026145 Method and device for the production of a three-dimensional moulded body
02/01/2007US20070026144 Method of depositing thin film on wafer
02/01/2007US20070026141 Apparatus and method for producing magnetic recording medium
02/01/2007US20070026136 Process for improvement of IBAD texturing on substrates in a continuous mode
02/01/2007US20070026133 monitoring quality of pattern of fluid beads applied to moving substrate measures time delays between passage of reference point on substrate element and leading and trailing edges of bead
02/01/2007US20070023144 Gas line weldment design and process for cvd aluminum
02/01/2007US20070023142 Airfoil refurbishment method
02/01/2007US20070022959 Deposition apparatus for semiconductor processing
02/01/2007US20070022958 Abatement of fluorine gas from effluent
02/01/2007US20070022957 Deposition system
02/01/2007US20070022956 Evaporator device
02/01/2007US20070022955 Vapor deposition device
02/01/2007US20070022954 Gas treatment device and heat readiting method
02/01/2007US20070022953 Source gas-supplying unit and chemical vapor deposition apparatus having the same
02/01/2007US20070022952 Unique passivation technique for a cvd blocker plate to prevent particle formation
02/01/2007US20070022951 Sensor for pulsed deposition monitoring and control
02/01/2007US20070022910 For oxidatively drying coatings
02/01/2007DE102005035904A1 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates
02/01/2007DE102005035673A1 Photokatalytisches Schichtsystem mit hohem Schalthub The photocatalytic layer system with high switching stroke
02/01/2007DE102005035247A1 Fluid distributer of binary structure useful for uniform distribution of fluids, especially in supply of process gas in coating equipment, several equal size plates with two top plates and distribution plates between them
02/01/2007DE102005034764A1 Verfahren zur Herstellung von funktionalen Fluor-Kohlenstoff-Polymerschichten mittels Plasmapolymerisation von Perfluorocycloalkanen Process for the preparation of functional fluorocarbon polymer layers by means of plasma polymerization of Perfluorocycloalkanen
02/01/2007CA2634297A1 Article having patterned decorative coating
01/2007
01/31/2007EP1748470A1 Iii nitride semiconductor crystal and manufacturing method thereof, iii nitride semiconductor device and manufacturing method thereof, and light emitting device
01/31/2007EP1748091A1 Carbon film
01/31/2007EP1747581A1 Formation of a silicon oxynitride layer on a high-k dielectric material
01/31/2007EP1747580A1 Stabilization of high-k dielectric materials
01/31/2007EP1747571A1 Method for the production of a disk-shaped workpiece based on a dielectric substrate, and vacuum processing system therefor
01/31/2007EP1747302A1 Bubbler for constant vapor delivery of a solid chemical
01/31/2007EP1463849B1 Boron doped diamond and method for its production
01/31/2007CN1906764A Gradient deposition of low-k cvd materials
01/31/2007CN1906736A Film-forming method
01/31/2007CN1906735A Method for depositing silicon carbide and ceramic films
01/31/2007CN1906734A Semiconductor treating device
01/31/2007CN1906329A Wear resistant coatings to reduce ice adhesion on air foils
01/31/2007CN1906327A Film forming method
01/31/2007CN1906326A Thermal chemical vapor deposition of silicon nitride
01/31/2007CN1906325A Method and apparatus for forming a metal layer
01/31/2007CN1906127A Apparatus for manufacturing carbon film by plasma CVD, method for manufacturing the same, and carbon film
01/31/2007CN1906026A Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components
01/31/2007CN1904137A Quasi-mono-dimension nano-structure of low sublimation temperature high deposition temperature metallic oxide and its thin film preparation method
01/31/2007CN1904136A Method of forming film, patterning and method of manufacturing electronic device using thereof
01/31/2007CN1904135A Preparation method of nano-grade capsule material based on composite mould plate technology
01/31/2007CN1298017C Lifting and supporting device, coating and etching method and apparatus
01/31/2007CN1297997C Film capacitor and its production method
01/31/2007CN1297686C A method and system for producing thin films
01/31/2007CN1297685C Surface modification method for alloy and intermetallic compound
01/30/2007US7170095 Semi-insulating GaN and method of making the same
01/30/2007US7170027 Microwave plasma processing method
01/30/2007US7169947 Dicopper(I) oxalate complexes for use as precursor substances in metallic copper deposition
01/30/2007US7169715 Forming a dielectric layer using porogens
01/30/2007US7169703 Forming an adsorbed molecular layer of organometallic compound on the layer-stacked plate, reducing the concentration of the organometallic compound in the gas, light irradiation against a selected region to form the metallization area, removing compound from non-selected area; integrated circuits
01/30/2007US7169690 Method of producing crystalline semiconductor material and method of fabricating semiconductor device
01/30/2007US7169673 Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics
01/30/2007US7169663 Semiconductor device with rare metal electrode
01/30/2007US7169479 Grain-oriented magnetic steel sheet comprising an electrically insulating coating
01/30/2007US7169255 Plasma processing apparatus
01/30/2007US7169254 Plasma processing system and apparatus and a sample processing method
01/30/2007US7169234 Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder
01/30/2007US7169233 Reactor chamber
01/30/2007US7169231 Gas distribution system with tuning gas
01/30/2007US7168447 Fluid distribution unit for dividing a stream of fluid into a plurality of partial streams