Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2007
02/22/2007US20070042185 Diamond diaphragm
02/22/2007US20070042178 Pulverized organic semiconductors and method for vapor phase deposition onto a support
02/22/2007US20070042153 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture
02/22/2007US20070042139 Luminescent coating
02/22/2007US20070042131 Non-intrusive plasma monitoring system for arc detection and prevention for blanket CVD films
02/22/2007US20070042123 Application robot with multiple application devices
02/22/2007US20070042121 carbon fiber reinforcement, densified by a matrix composed of the carbon phase and of a ceramic phase ( e.g SiC), and a refractory solid filler. Two monolithic ceramic shells cover the intermediate layers in order to give stiffness to the entire structure; ujsing polycarbosilane for forming SiC
02/22/2007US20070042120 Method of forming semiconductor layer
02/22/2007US20070042119 Vaporizer for atomic layer deposition system
02/22/2007US20070042118 Encapsulated thermal processing
02/22/2007US20070042117 Method and apparatus to control semiconductor film deposition characteristics
02/22/2007US20070042116 Adding carrier to gold bromide solution with deionized water, immersing carrier into solution for darkness, drying, grinding, then heating in argon atmosphere; cost efficiency
02/22/2007US20070040207 Electronic devices including dielectric layers with different densities of titanium
02/22/2007US20070039942 Active cooling substrate support
02/22/2007US20070039754 Method of providing a printed circuit board using laser assisted metallization and patterning of a microelectronic substrate
02/22/2007US20070039666 Copper base for electronic component, electronic component, and process for producing copper base for electronic component
02/22/2007US20070039550 Pulsed mass flow delivery system and method
02/22/2007US20070039549 Pulsed mass flow delivery system and method
02/22/2007DE19828843B4 Verfahren zur Herstellung von beschichteten Kurzfasern A process for the production of coated short fibers
02/22/2007DE102005050374A1 Wear resistant sliding layer of silicon-containing aluminum alloy, e.g. for crankshaft bearings, is formed by gas phase deposition and heat treated to form macrocrystalline silicon deposits
02/21/2007EP1755160A1 Copper base for electronic component, electronic component, and process for producing copper base for electronic component
02/21/2007EP1754800A1 Material for chemical vapor deposition and thin film forming method
02/21/2007EP1754690A1 Glazing unit and method for its production
02/21/2007EP1754684A1 Method for treating surface of base, surface-treated base, material for medical use and instrument for medical use
02/21/2007EP1754533A2 The combinatorial synthesis of novel materials
02/21/2007EP1754254A1 Lift pin with roller glide for reducing friction
02/21/2007EP1753958A1 Gas supply system for a pumping arrangement
02/21/2007EP1753890A1 AI<sb>2</sb>O<sb>3</sb> CERAMIC TOOLS WITH DIFFUSION BONDING ENHANCED LAYER
02/21/2007EP1753549A2 Methods for wet cleaning quartz surfaces of components for plasma processing chambers
02/21/2007EP1654754B1 Gas-supply assembly, in particular for a cvd process reactor for growing an epitaxial layer
02/21/2007EP1638701A4 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape
02/21/2007EP1397529B1 Application of dense plasmas generated at atmospheric pressure for treating gas effluents
02/21/2007EP1305838B1 Low-temperature fabrication of thin-film energy-storage devices
02/21/2007CN1918697A Process for producing monocrystal thin film and monocrystal thin film device
02/21/2007CN1918324A Process kit design for deposition chamber
02/21/2007CN1918323A Silicon compounds for producing sio2-containing insulating layers on chips
02/21/2007CN1918322A Barrier layer process and arrangement
02/21/2007CN1918321A Thin film forming apparatus
02/21/2007CN1917932A Method and apparatus for treating a fluorocompound-containing gas stream
02/21/2007CN1917164A Electrostatically clamped edge ring for plasma processing
02/21/2007CN1916238A Metal plating layer
02/21/2007CN1916234A Copper base for electronic component, electronic component, and process for producing copper base for electronic component
02/21/2007CN1916233A Organic metal compound supplying container
02/21/2007CN1301343C Vacuum exhaust system and monitoring and controlling method thereof
02/21/2007CN1301342C Application of dense plasmas generated at atmospheric pressure for treating gas effluents
02/20/2007US7180242 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
02/20/2007US7180163 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
02/20/2007US7180129 Semiconductor device including insulating layer
02/20/2007US7180095 Display device and manufacturing method thereof
02/20/2007US7179923 N-sulfonylaminocarbonyl containing compounds
02/20/2007US7179527 Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
02/20/2007US7179505 Manufacturing method of MoSi2-SiC nanocomposite coating
02/20/2007US7179397 Plasma processing methods and apparatus
02/20/2007US7179352 Vacuum treatment system and process for manufacturing workpieces
02/20/2007US7179334 System and method for performing semiconductor processing on substrate being processed
02/20/2007US7179022 Cutting tool coated with diamond
02/20/2007US7178584 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
02/15/2007WO2007019449A1 In-situ atomic layer deposition
02/15/2007WO2007019437A1 Atomic layer deposition of ruthenium-containing films using surface-activating agents and selected ruthenium complexes
02/15/2007WO2007019436A2 Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
02/15/2007WO2007019435A2 Atomic layer deposition of metal-containing films using surface-activating agents
02/15/2007WO2007018268A1 Material for insulating film, method of film formation therefrom and insulating film
02/15/2007WO2007018235A1 Method for forming w-based film, method for forming gate electrode, and method for manufacturing semiconductor device
02/15/2007WO2007018157A1 Substrate processing apparatus and substrate stage used therein
02/15/2007WO2007018121A1 Method for forming film of group iii nitride such as gallium nitride
02/15/2007WO2007018003A1 Method of forming metallic film and program-storing recording medium
02/15/2007WO2006107944A3 Improved method and apparatus for treating bacterial infections in devices
02/15/2007WO2006053129A3 Method and apparatus for forming a thin-film solar cell using a continuous process
02/15/2007WO2006052277A3 Gas turbine engine components with aluminide coatings and method of forming such aluminide coatings on gas turbine engine components
02/15/2007US20070037409 Composite dielectric forming methods and composite dielectrics
02/15/2007US20070037408 Method and apparatus for plasma processing
02/15/2007US20070037407 Method of cleaning semiconductor device fabrication apparatus
02/15/2007US20070036921 Diamond
02/15/2007US20070036914 Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer
02/15/2007US20070036896 Mosaic diamond substrates
02/15/2007US20070036895 Deposition methods utilizing microwave excitation
02/15/2007US20070036894 Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
02/15/2007US20070036893 Method for reproducible manufacturing of storage phosphor plates
02/15/2007US20070036892 Enhanced deposition of noble metals
02/15/2007US20070036890 Method of making a fuel cell component using a mask
02/15/2007US20070036887 Method for making a thin film layer
02/15/2007US20070034337 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
02/15/2007US20070034159 Semiconductor manufacturing device and its heating unit
02/15/2007US20070034158 Substrate processing apparatus and semiconductor device producing method
02/15/2007US20070034157 Plasma processing apparatus and plasma processing method
02/15/2007US20070034156 Method and apparatus for precision coating of molecules on the surfaces of materials and devices
02/15/2007US20070034155 Apparatus for processing substrate and apparatus for processing electron source substrate
02/15/2007US20070034154 Plasma source assembly and method of manufacture
02/15/2007US20070034153 Thermal management of inductively coupled plasma reactors
02/15/2007US20070034146 Silicon manufacturing apparatus
02/15/2007DE112005000134T5 Alkoxidverbindung, Material für die Bildung eines dünnen Films und Verfahren für die Bildung eines dünnen Films Alkoxide compound, material for the formation of a thin film and method for the formation of a thin film
02/15/2007DE102005037822A1 Vakuumbeschichtung mit Kondensatentfernung Vacuum coating with condensate removal
02/15/2007DE10048210B4 Vorrichtung und Verfahren zum Einschleusen eines Werkstücks über eine Vorvakuumkammer in eine Hochvakuumkammer und deren Verwendung Apparatus and method for introducing a workpiece through a pre-vacuum chamber in a high vacuum chamber and their use
02/14/2007EP1752991A1 Apparatus for manufacturing coated fuel particle for high temperature gas-cooled reactor
02/14/2007EP1752912A2 Fingerprint detection device and method of its manufacture, and apparatus for f orming a projective film
02/14/2007EP1752567A1 Process for producing wafer of silicon carbide single-crystal
02/14/2007EP1752566A1 Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
02/14/2007EP1752423A2 Method for spraying of glass particles
02/14/2007EP1752167A2 Resorbable implant with titanium coating
02/14/2007EP1751587A2 Films for optical use and methods of making such films