| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/06/2007 | US7185602 Ion implantation ion source, system and method |
| 03/01/2007 | WO2007024493A1 Nitrogen profile engineering in high-k nitridation of a gate dielectric layer |
| 03/01/2007 | WO2007024094A1 Method of manufacturing vanadium oxide thin film |
| 03/01/2007 | WO2007023985A1 Piezoelectric device, liquid ejecting head using same, and liquid ejector |
| 03/01/2007 | WO2007023951A1 Substrate processing apparatus and substrate processing method |
| 03/01/2007 | WO2007023911A1 Process for producing semiconductor substrate |
| 03/01/2007 | WO2007023722A1 METHOD FOR PRODUCTION OF GaxIn1-xN (0≤x≤1) CRYSTAL, GaxIn1-xN (0≤x≤1) CRYSTAL SUBSTRATE, METHOD FOR PRODUCTION OF GaN CRYSTAL, GaN CRYSTAL SUBSTRATE AND PRODUCT |
| 03/01/2007 | WO2007023639A1 Substrate treating apparatus, and for the substrate treating apparatus, method of substrate delivery, program and program storing recording medium |
| 03/01/2007 | WO2007023559A1 Film forming process, mask for film formation, and film forming unit |
| 03/01/2007 | WO2007023535A1 Method of film formation, mask for film formation and film formation apparatus |
| 03/01/2007 | WO2007023239A1 Organometallic precursors for depositing a tantalum carbonitride or carbide film and method of depositing one such film |
| 03/01/2007 | WO2007022976A2 Method and device for the plasma treatment of the interior of hollow bodies |
| 03/01/2007 | WO2007008438A3 Sensor for pulsed deposition monitoring and control |
| 03/01/2007 | WO2007008438A2 Sensor for pulsed deposition monitoring and control |
| 03/01/2007 | WO2006096659A3 Method and system for coating sections of internal surfaces |
| 03/01/2007 | WO2006031452A3 Apparatus for the optimization of atmospheric plasma in a plasma processing system |
| 03/01/2007 | WO2006023637A3 In situ surface contaminant removal for ion implanting |
| 03/01/2007 | US20070049034 High aspect ratio gap fill application using high density plasma chemical vapor deposition |
| 03/01/2007 | US20070048977 Method of depositing Ge-Sb-Te thin film |
| 03/01/2007 | US20070048536 Tool with wear resistant coating |
| 03/01/2007 | US20070048456 Plasma enhanced chemical vapor deposition apparatus and method |
| 03/01/2007 | US20070048455 Thin film forming method |
| 03/01/2007 | US20070048453 Systems and methods for plasma doping microfeature workpieces |
| 03/01/2007 | US20070048451 Substrate movement and process chamber scheduling |
| 03/01/2007 | US20070048447 System and method for forming patterned copper lines through electroless copper plating |
| 03/01/2007 | US20070048446 Gas delivery system for semiconductor processing |
| 03/01/2007 | US20070048438 Thermochromic coatings |
| 03/01/2007 | US20070048434 System and method for distributing multiple materials from an agricultural vehicle |
| 03/01/2007 | US20070047889 GeBPSG top clad for a planar lightwave circuit |
| 03/01/2007 | US20070044916 Vacuum processing system |
| 03/01/2007 | US20070044915 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 03/01/2007 | US20070044720 Gate valve and substrate-treating apparatus including the same |
| 03/01/2007 | US20070044719 Processing chamber configured for uniform gas flow |
| 03/01/2007 | US20070044718 Wafer Holder and Semiconductor Manufacturing Apparatus |
| 03/01/2007 | US20070044717 Segmented resonant antenna for radio frequency inductively coupled plasmas |
| 03/01/2007 | US20070044716 Plasma processing apparatus |
| 03/01/2007 | US20070044715 Supplying rf power to a plasma process |
| 03/01/2007 | US20070044704 Colored coating and formulation |
| 03/01/2007 | DE20023858U1 Unabhängig von Aktivierungsbehandlungen zur Wasserstoffsorption befähigte Verbundmaterialien Regardless of activation treatments for hydrogen sorption capable of composite materials |
| 03/01/2007 | DE10328842B4 Suszeptor für eine chemische Gasphasenabscheidung, Verfahren zur Bearbeitung einer Halbleiterscheibe durch chemische Gasphasenabscheidung und nach dem Verfahren bearbeitete Halbleiterscheibe Susceptor for a chemical vapor deposition method for processing a semiconductor wafer by chemical vapor deposition and by the process machined wafer |
| 03/01/2007 | DE102006038885A1 Plasma deposition of germanium-antimony-tellurium thin layer, especially for use in phase-change random access memories, by supplying three precursors and reaction gas into chamber containing fixed wafer substrate |
| 03/01/2007 | DE102005040266A1 Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern Method and apparatus for inside plasma treatment of hollow bodies |
| 03/01/2007 | DE102005040087A1 Depositing method for depositing absorber layers for thin-layer solar cells covers layer-forming elements in a vapor phase while depositing them on a substrate |
| 02/28/2007 | EP1757713A1 Lens-coating gas dispenser and corresponding coating device, lens and method |
| 02/28/2007 | EP1757612A2 Tantal and Vanadium compounds and their use in Chemical Vapour deposition (CVD) |
| 02/28/2007 | EP1757389A1 Surface-coated cutting tool |
| 02/28/2007 | EP1756854A1 Gallium nitride-based semiconductor stacked structure, production method thereof, and compound semiconductor and light-emitting device each using the stacked structure |
| 02/28/2007 | EP1756329A1 Plasma enhanced chemical vapor deposition of metal oxide |
| 02/28/2007 | EP1756328A2 System and method for forming multi-component dielectric films |
| 02/28/2007 | EP1559133B1 Forced convection assisted rapid thermal furnace |
| 02/28/2007 | EP1501962B1 A method for modifying a metallic surface |
| 02/28/2007 | EP1159465B1 Method of atomic layer deposition |
| 02/28/2007 | EP1040292B1 Gas panel |
| 02/28/2007 | CN1922927A Vaporizing temperature sensitive materials for OLED |
| 02/28/2007 | CN1921069A Laser processing apparatus utilizing laser beam to irradiate semiconductor layer |
| 02/28/2007 | CN1921068A Particle sticking prevention apparatus and plasma processing apparatus |
| 02/28/2007 | CN1920262A Variable-throat exhaust turbocharger and method for manufacturing constituent members of variable throat mechanism |
| 02/28/2007 | CN1920093A Boron phosphor silicon oxide technology |
| 02/28/2007 | CN1920092A Method of depositing Ge-Sb-Te thin film |
| 02/28/2007 | CN1302512C Electrode member for plasma treating appts., plasma treating appts. and plasma treating method |
| 02/28/2007 | CN1302488C Resistance material, resistance produced by the same, method for producing resistance and solution for resistance material aggradation |
| 02/28/2007 | CN1302487C Oxide superconductor and its manufacturing method |
| 02/28/2007 | CN1302152C Chemical vapor depositing apparatus |
| 02/28/2007 | CN1302151C Method and device for producing ferroelectric apparatus |
| 02/28/2007 | CN1302150C Method for forming metal film |
| 02/28/2007 | CN1301900C Method for the selective production of ordered carbon nanotubes in a fluidised bed |
| 02/27/2007 | US7184657 Enhanced rapid thermal processing apparatus and method |
| 02/27/2007 | US7183604 High dielectric constant device |
| 02/27/2007 | US7183576 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD |
| 02/27/2007 | US7183229 Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device |
| 02/27/2007 | US7183208 Methods for treating pluralities of discrete semiconductor substrates |
| 02/27/2007 | US7183207 Chemical vapor deposition metallization processes and chemical vapor deposition apparatus used therein |
| 02/27/2007 | US7183197 Water-barrier performance of an encapsulating film |
| 02/27/2007 | US7183170 Manufacturing method of semiconductor device |
| 02/27/2007 | US7182980 Annular substrates are stacked in an enclosure; gas containing at least one precursor of a matrix material to be deposited within the pores of the substrates is channeled inside the enclosure; residual gas is extracted |
| 02/27/2007 | US7182979 High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor |
| 02/27/2007 | US7182879 Plasma processing method |
| 02/27/2007 | US7182842 Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
| 02/27/2007 | US7182819 Methods for cleaning a chamber of semiconductor device manufacturing equipment |
| 02/27/2007 | US7182817 Apparatus and method for developing latent fingerprints |
| 02/27/2007 | US7182816 Particulate reduction using temperature-controlled chamber shield |
| 02/27/2007 | US7182122 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus |
| 02/22/2007 | WO2007022144A1 Optical emission interferometry for pecvd using a gas injection hole |
| 02/22/2007 | WO2007021692A2 Method and apparatus to control semiconductor film deposition characteristics |
| 02/22/2007 | WO2007021520A2 Substrate support for increasing substrate temperature in plasma reactors |
| 02/22/2007 | WO2007020874A1 Thin film forming method and semiconductor device manufacturing method |
| 02/22/2007 | WO2007020872A1 Placing table structure, method for manufacturing placing table structure and heat treatment apparatus |
| 02/22/2007 | WO2007020810A1 Plasma processing apparatus |
| 02/22/2007 | WO2007002674A3 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
| 02/22/2007 | WO2007002672A3 Atomic layer deposition using alkaline earth metal beta-diketiminate precursors |
| 02/22/2007 | WO2006071816A3 Window protector for sputter etching of metal layers |
| 02/22/2007 | WO2006036215A3 Superconductor fabrication processes |
| 02/22/2007 | WO2005116291B1 Apparatus for directing plasma flow to coat internal passageways |
| 02/22/2007 | US20070042610 Method of depositing low k barrier layers |
| 02/22/2007 | US20070042581 Manufacturing method of semiconductor device and substrate processing apparatus |
| 02/22/2007 | US20070042508 Pulsed mass flow delivery system and method |
| 02/22/2007 | US20070042224 Process for producing thin hafnium or zirconium nitride coatings |
| 02/22/2007 | US20070042223 Light element complex hydride film and method for synthesis thereof |
| 02/22/2007 | US20070042187 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating |
| 02/22/2007 | US20070042186 hydrogenated DLC acts as fuel upon combustion with oxygen produces carbon dioxide and/or water; combustion heats the zirconium nitride to a temperature(s) well above the heat treating temperature, causing zirconium nitride to be transformed into a layer of zirconium oxide; scratch resistant and durable |