Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2007
03/14/2007CN1928152A Vapor phase growth device
03/14/2007CN1928151A Method for preparing thickness controllable trilayer type diamond membrane
03/14/2007CN1928150A Chemical vapor deposition high temperature furnace used water cooling furnace wall
03/14/2007CN1928148A Wear resistant coating and process of its manufacture
03/14/2007CN1305119C Method and apparatus for forming film
03/14/2007CN1305113C Gasifier and gasifying supply device
03/14/2007CN1304912C Carbon / carbon composite material heat gradient chemical gaseous phase permeation process temperature automatic controller
03/14/2007CN1304632C Cutting fool boron nitride composite coating layer and its preparation method
03/14/2007CN1304631C Technology for preparing nano tube of carbon by direct current glow plasma chemical vapour phase deposition process
03/13/2007US7190889 Non-contact heater and method for non-contact heating of a substrate for material deposition
03/13/2007US7189664 Method for producing hydrogenated silicon-oxycarbide films
03/13/2007US7189660 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device
03/13/2007US7189659 Method for fabricating a semiconductor device
03/13/2007US7189654 Manufacturing method for wiring
03/13/2007US7189611 Metal plating using seed film
03/13/2007US7189588 Group III nitride semiconductor substrate and its manufacturing method
03/13/2007US7189437 Mobile plating system and method
03/13/2007US7189436 Flash evaporation-plasma coating deposition method
03/13/2007US7189432 Varying conductance out of a process region to control gas flux in an ALD reactor
03/13/2007US7189431 Method for forming a passivated metal layer
03/13/2007US7189430 Controlling adjustment; vapor deposition using xylene
03/13/2007US7189426 Vapor deposition a layer of needle shaped x-ray fluorescent material with alkali metal compound and lanthanide compound
03/13/2007US7189425 Method of manufacturing a superconducting magnesium diboride thin film
03/13/2007US7189290 Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus
03/13/2007US7189287 Atomic layer deposition using electron bombardment
03/13/2007CA2294420C A non-sticking diamond like nanocomposite composition
03/13/2007CA2174309C Chemical vapour infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter
03/08/2007WO2007028156A2 System and method for forming patterned copper lines through electroless copper plating
03/08/2007WO2007027436A2 Processing thin wafers
03/08/2007WO2007027350A2 Method of removing surface deposits and passivating interior surfaces of the interior of a chemical vapour deposition (cvd) chamber
03/08/2007WO2007026876A1 Thin layer formation equipment and process for formation of thin layers
03/08/2007WO2007026859A1 Planar resonant element for measuring electron density of plasma, and method and device for measuring electron density of plasma
03/08/2007WO2007026762A1 Cleaning method
03/08/2007WO2007026554A1 Synthetic resin container with high barrier capability
03/08/2007WO2007026545A1 Plasma discharge processing device and production method of gas barrier film
03/08/2007WO2007026479A1 Chamber for vacuum treatment
03/08/2007WO2007025868A1 Coated articles
03/08/2007WO2007025509A1 Method for coating or decoating a component
03/08/2007WO2006091405A3 High temperature chemical vapor deposition apparatus
03/08/2007US20070054478 Method of forming polysilicon film using a laser annealing apparatus
03/08/2007US20070054472 Apparatus for preparing oxide thin film and method for preparing the same
03/08/2007US20070054064 Microwave plasma processing method, microwave plasma processing apparatus, and its plasma head
03/08/2007US20070054051 Deposition device
03/08/2007US20070054050 Photoresist coating apparatus and method
03/08/2007US20070054049 Method of growing a thin film onto a substrate
03/08/2007US20070054048 Extended deposition range by hot spots
03/08/2007US20070054047 Method of forming a tantalum-containing layer from a metalorganic precursor
03/08/2007US20070054046 Method of forming a tantalum-containing layer from a metalorganic precursor
03/08/2007US20070054045 Method for conditioning chemical vapor deposition chamber
03/08/2007US20070054044 Method for forming metal oxide coating film and vapor deposition apparatus
03/08/2007US20070054035 Method for preparing radiation image storage panel
03/08/2007US20070051524 Process and apparatus for manufacturing structures guiding electromagnetic waves
03/08/2007US20070051470 Plasma processing apparatus and method
03/08/2007US20070051388 Apparatus and methods for using high frequency chokes in a substrate deposition apparatus
03/08/2007US20070051387 Method of cleaning plasma applicator in situ and plasma applicator employing the same
03/08/2007US20070051316 Chemical vapor deposition apparatus
03/08/2007US20070051315 Apparatus and method for producing nano-powder
03/08/2007US20070051314 Movable transfer chamber and substrate-treating apparatus including the same
03/08/2007US20070051313 Reaction apparatus for producing vapor-grown carbon fibers and continuous production system therefor
03/08/2007US20070051312 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems
03/08/2007US20070051311 System for and method of forming via holes by multiple deposition events in a continuous inline shadow mask deposition process
03/08/2007US20070051310 Semiconductor manufacturing apparatus
03/08/2007US20070051309 Pump ring
03/08/2007US20070051302 Method of producing crystalline semiconductor material and method of fabricating semiconductor device
03/08/2007US20070051050 Diamond particle for sintering tool and manufacturing method thereof and sintering tool using the same
03/08/2007DE102005041844A1 Verfahren zum Beschichten oder Entschichten eines Bauteils A method for coating or stripping of a component
03/07/2007EP1760771A1 Semiconductor device and method for fabricating the same
03/07/2007EP1760172A2 Diamondlike carbon hard multilayer film formed body and method for producing the same
03/07/2007EP1760170A2 Chemical vapor deposition apparatus
03/07/2007EP1759410A2 Organometallic precursor compounds
03/07/2007EP1759034A1 Ultra-hydrophilic and antibacterial thin film coated metal product, and it"s manufacturing method
03/07/2007EP1759033A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
03/07/2007EP1758830A1 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating
03/07/2007EP1663892B1 Method for producing substrates comprising temperature-resistant protective coatings
03/07/2007EP1511881B1 Surface treatment system and method
03/07/2007EP1238122B1 Method and apparatus for forming carbonaceous film
03/07/2007CN1926668A Formation of a silicon oxynitride layer on a high-K dielectric material
03/07/2007CN1926259A Reactive metal sources and deposition method for thioaluminate phosphors
03/07/2007CN1925127A Film tray for fabricating flexible display
03/07/2007CN1925117A Process capable of improving film uniformity before chemical mechanical grinding
03/07/2007CN1925111A Vacuum cavity chamber and vacuum processing device
03/07/2007CN1925107A Integrated metrology tools for monitoring and controlling large area substrate processing chambers
03/07/2007CN1924087A Plasma reinforced chemical vapour deposition apparatus
03/07/2007CN1924086A Liquid-conveying metallorganics chemical vapour deposition apparatus
03/07/2007CN1924085A Suspending mechanism for making course processing chamber spray head
03/07/2007CN1923508A TiN/AlON nano multilayer coating for cutting tool
03/07/2007CN1303650C p-Zn1-XMgXO crystal film and method for making same
03/07/2007CN1303630C E-beam/microwave gas jet PECVD method and apparatus for depositing and/or surface modification of thin film material
03/07/2007CN1303247C Non-linear hot wire structure used for preparing large area uniform thin film
03/06/2007US7186992 Method of fabricating a polarizing layer on an interface
03/06/2007US7186835 Composition comprising amino-imine compounds
03/06/2007US7186663 High density plasma process for silicon thin films
03/06/2007US7186642 Low temperature nitride used as Cu barrier layer
03/06/2007US7186582 Providing a chemical vapor deposition chamber having disposed therein a substrate:introducing a gas comprised of a higher-order silane of the formula SinH2n+2 and a germanium precursor to the chamber, wherein n=3 6; and depositing a SiGe-containing film onto the substrate
03/06/2007US7186446 Plasma enhanced ALD of tantalum nitride and bilayer
03/06/2007US7186385 For semiconductor processing system
03/06/2007US7186315 Plasma treatment apparatus
03/06/2007US7186314 Plasma processor and plasma processing method
03/06/2007US7186298 Wafer support system
03/06/2007US7186295 Quartz thin film
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